{"id":"https://openalex.org/W2795307012","doi":"https://doi.org/10.1109/biocas.2017.8325136","title":"Improving the pH sensitivity of ISFET arrays with reactive ion etching","display_name":"Improving the pH sensitivity of ISFET arrays with reactive ion etching","publication_year":2017,"publication_date":"2017-10-01","ids":{"openalex":"https://openalex.org/W2795307012","doi":"https://doi.org/10.1109/biocas.2017.8325136","mag":"2795307012"},"language":"en","primary_location":{"id":"doi:10.1109/biocas.2017.8325136","is_oa":false,"landing_page_url":"https://doi.org/10.1109/biocas.2017.8325136","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2017 IEEE Biomedical Circuits and Systems Conference (BioCAS)","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5054027777","display_name":"Nicolas Moser","orcid":"https://orcid.org/0000-0002-6689-0486"},"institutions":[{"id":"https://openalex.org/I47508984","display_name":"Imperial College London","ror":"https://ror.org/041kmwe10","country_code":"GB","type":"education","lineage":["https://openalex.org/I47508984"]}],"countries":["GB"],"is_corresponding":false,"raw_author_name":"Nicolas Moser","raw_affiliation_strings":["Dept. of Electrical and Electronic Engineering, Imperial College London, SW7 2BT, United Kingdom"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Dept. of Electrical and Electronic Engineering, Imperial College London, SW7 2BT, United Kingdom","institution_ids":["https://openalex.org/I47508984"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5103141411","display_name":"Christoforos Panteli","orcid":"https://orcid.org/0000-0002-6554-7192"},"institutions":[{"id":"https://openalex.org/I47508984","display_name":"Imperial College London","ror":"https://ror.org/041kmwe10","country_code":"GB","type":"education","lineage":["https://openalex.org/I47508984"]}],"countries":["GB"],"is_corresponding":false,"raw_author_name":"Christoforos Panteli","raw_affiliation_strings":["Dept. of Electrical and Electronic Engineering, Imperial College London, SW7 2BT, United Kingdom"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Dept. of Electrical and Electronic Engineering, Imperial College London, SW7 2BT, United Kingdom","institution_ids":["https://openalex.org/I47508984"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5026250753","display_name":"Dora Ma","orcid":"https://orcid.org/0000-0003-0607-4556"},"institutions":[{"id":"https://openalex.org/I47508984","display_name":"Imperial College London","ror":"https://ror.org/041kmwe10","country_code":"GB","type":"education","lineage":["https://openalex.org/I47508984"]}],"countries":["GB"],"is_corresponding":false,"raw_author_name":"Dora Ma","raw_affiliation_strings":["Dept. of Electrical and Electronic Engineering, Imperial College London, SW7 2BT, United Kingdom"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Dept. of Electrical and Electronic Engineering, Imperial College London, SW7 2BT, United Kingdom","institution_ids":["https://openalex.org/I47508984"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5038289380","display_name":"C. Toumazou","orcid":null},"institutions":[{"id":"https://openalex.org/I47508984","display_name":"Imperial College London","ror":"https://ror.org/041kmwe10","country_code":"GB","type":"education","lineage":["https://openalex.org/I47508984"]}],"countries":["GB"],"is_corresponding":false,"raw_author_name":"Chris Toumazou","raw_affiliation_strings":["Dept. of Electrical and Electronic Engineering, Imperial College London, SW7 2BT, United Kingdom"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Dept. of Electrical and Electronic Engineering, Imperial College London, SW7 2BT, United Kingdom","institution_ids":["https://openalex.org/I47508984"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5015031715","display_name":"Kristel Fobelets","orcid":"https://orcid.org/0000-0001-5607-8243"},"institutions":[{"id":"https://openalex.org/I47508984","display_name":"Imperial College London","ror":"https://ror.org/041kmwe10","country_code":"GB","type":"education","lineage":["https://openalex.org/I47508984"]}],"countries":["GB"],"is_corresponding":false,"raw_author_name":"Kristel Fobelets","raw_affiliation_strings":["Dept. of Electrical and Electronic Engineering, Imperial College London, SW7 2BT, United Kingdom"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Dept. of Electrical and Electronic Engineering, Imperial College London, SW7 2BT, United Kingdom","institution_ids":["https://openalex.org/I47508984"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5069244062","display_name":"Pantelis Georgiou","orcid":"https://orcid.org/0000-0003-2476-3857"},"institutions":[{"id":"https://openalex.org/I47508984","display_name":"Imperial College London","ror":"https://ror.org/041kmwe10","country_code":"GB","type":"education","lineage":["https://openalex.org/I47508984"]}],"countries":["GB"],"is_corresponding":false,"raw_author_name":"Pantelis Georgiou","raw_affiliation_strings":["Dept. of Electrical and Electronic Engineering, Imperial College London, SW7 2BT, United Kingdom"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Dept. of Electrical and Electronic Engineering, Imperial College London, SW7 2BT, United Kingdom","institution_ids":["https://openalex.org/I47508984"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I47508984"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":1,"citation_normalized_percentile":{"value":0.25948305,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":94},"biblio":{"volume":"8","issue":null,"first_page":"1","last_page":"4"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11472","display_name":"Analytical Chemistry and Sensors","score":1.0,"subfield":{"id":"https://openalex.org/subfields/1502","display_name":"Bioengineering"},"field":{"id":"https://openalex.org/fields/15","display_name":"Chemical Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11472","display_name":"Analytical Chemistry and Sensors","score":1.0,"subfield":{"id":"https://openalex.org/subfields/1502","display_name":"Bioengineering"},"field":{"id":"https://openalex.org/fields/15","display_name":"Chemical Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11160","display_name":"Acoustic Wave Resonator Technologies","score":0.9993000030517578,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9983000159263611,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/isfet","display_name":"ISFET","score":0.8292672038078308},{"id":"https://openalex.org/keywords/passivation","display_name":"Passivation","score":0.7047722339630127},{"id":"https://openalex.org/keywords/etching","display_name":"Etching (microfabrication)","score":0.6464431881904602},{"id":"https://openalex.org/keywords/sensitivity","display_name":"Sensitivity (control systems)","score":0.6417462825775146},{"id":"https://openalex.org/keywords/cmos","display_name":"CMOS","score":0.5738626718521118},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.5290611982345581},{"id":"https://openalex.org/keywords/reactive-ion-etching","display_name":"Reactive-ion etching","score":0.4873290956020355},{"id":"https://openalex.org/keywords/attenuation","display_name":"Attenuation","score":0.4607160687446594},{"id":"https://openalex.org/keywords/analytical-chemistry","display_name":"Analytical Chemistry (journal)","score":0.44384995102882385},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.4372316002845764},{"id":"https://openalex.org/keywords/ion","display_name":"Ion","score":0.4187096953392029},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.31580686569213867},{"id":"https://openalex.org/keywords/electronic-engineering","display_name":"Electronic engineering","score":0.296463280916214},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.28867286443710327},{"id":"https://openalex.org/keywords/chemistry","display_name":"Chemistry","score":0.2681353688240051},{"id":"https://openalex.org/keywords/transistor","display_name":"Transistor","score":0.14193928241729736},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.1251649558544159},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.11453172564506531},{"id":"https://openalex.org/keywords/voltage","display_name":"Voltage","score":0.07928255200386047},{"id":"https://openalex.org/keywords/optics","display_name":"Optics","score":0.07062661647796631}],"concepts":[{"id":"https://openalex.org/C154275363","wikidata":"https://www.wikidata.org/wiki/Q904133","display_name":"ISFET","level":5,"score":0.8292672038078308},{"id":"https://openalex.org/C33574316","wikidata":"https://www.wikidata.org/wiki/Q917260","display_name":"Passivation","level":3,"score":0.7047722339630127},{"id":"https://openalex.org/C100460472","wikidata":"https://www.wikidata.org/wiki/Q2368605","display_name":"Etching (microfabrication)","level":3,"score":0.6464431881904602},{"id":"https://openalex.org/C21200559","wikidata":"https://www.wikidata.org/wiki/Q7451068","display_name":"Sensitivity (control systems)","level":2,"score":0.6417462825775146},{"id":"https://openalex.org/C46362747","wikidata":"https://www.wikidata.org/wiki/Q173431","display_name":"CMOS","level":2,"score":0.5738626718521118},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5290611982345581},{"id":"https://openalex.org/C130472188","wikidata":"https://www.wikidata.org/wiki/Q1640159","display_name":"Reactive-ion etching","level":4,"score":0.4873290956020355},{"id":"https://openalex.org/C184652730","wikidata":"https://www.wikidata.org/wiki/Q2357982","display_name":"Attenuation","level":2,"score":0.4607160687446594},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.44384995102882385},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.4372316002845764},{"id":"https://openalex.org/C145148216","wikidata":"https://www.wikidata.org/wiki/Q36496","display_name":"Ion","level":2,"score":0.4187096953392029},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.31580686569213867},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.296463280916214},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.28867286443710327},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.2681353688240051},{"id":"https://openalex.org/C172385210","wikidata":"https://www.wikidata.org/wiki/Q5339","display_name":"Transistor","level":3,"score":0.14193928241729736},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.1251649558544159},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.11453172564506531},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.07928255200386047},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.07062661647796631},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C145598152","wikidata":"https://www.wikidata.org/wiki/Q176097","display_name":"Field-effect transistor","level":4,"score":0.0},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1109/biocas.2017.8325136","is_oa":false,"landing_page_url":"https://doi.org/10.1109/biocas.2017.8325136","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2017 IEEE Biomedical Circuits and Systems Conference (BioCAS)","raw_type":"proceedings-article"},{"id":"pmh:oai:spiral.imperial.ac.uk:10044/1/51847","is_oa":false,"landing_page_url":"http://hdl.handle.net/10044/1/51847","pdf_url":null,"source":{"id":"https://openalex.org/S4306401396","display_name":"Spiral (Imperial College London)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"host_organization":"https://openalex.org/I47508984","host_organization_name":"Imperial College London","host_organization_lineage":["https://openalex.org/I47508984"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"BioCAS 2017","raw_type":"Conference Paper"}],"best_oa_location":null,"sustainable_development_goals":[{"id":"https://metadata.un.org/sdg/6","score":0.8199999928474426,"display_name":"Clean water and sanitation"}],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":11,"referenced_works":["https://openalex.org/W3489370","https://openalex.org/W1588454386","https://openalex.org/W2028403508","https://openalex.org/W2052803981","https://openalex.org/W2055993378","https://openalex.org/W2082133857","https://openalex.org/W2087000982","https://openalex.org/W2110795091","https://openalex.org/W2467093478","https://openalex.org/W2483664965","https://openalex.org/W2580139528"],"related_works":["https://openalex.org/W2070736010","https://openalex.org/W2359313340","https://openalex.org/W4388376001","https://openalex.org/W3001471993","https://openalex.org/W1912896571","https://openalex.org/W2389091192","https://openalex.org/W2009420109","https://openalex.org/W2093286625","https://openalex.org/W3138583210","https://openalex.org/W2362770635"],"abstract_inverted_index":{"In":[0],"this":[1],"paper,":[2],"we":[3,70],"report":[4],"a":[5,20],"method":[6],"to":[7,66,86],"improve":[8],"sensitivity":[9,57,81],"for":[10,60,64,116],"CMOS":[11,33],"ISFET":[12],"arrays":[13],"using":[14,35],"Reactive":[15],"Ion":[16],"Etching":[17],"(RIE)":[18],"as":[19,119],"post-processing":[21],"technique.":[22],"The":[23,52,90,105],"process":[24],"etches":[25],"away":[26],"the":[27,31,87,102,109,112],"passivation":[28],"layers":[29],"of":[30,92,111],"commercial":[32],"process,":[34],"an":[36],"oxygen":[37],"(O":[38],"<sub":[39,47],"xmlns:mml=\"http://www.w3.org/1998/Math/MathML\"":[40,48],"xmlns:xlink=\"http://www.w3.org/1999/xlink\">2</sub>":[41],")":[42,50],"and":[43,55,69,79],"sulfur":[44],"hexafluoride":[45],"(SF":[46],"xmlns:xlink=\"http://www.w3.org/1999/xlink\">6</sub>":[49],"plasma.":[51],"resulting":[53],"attenuation":[54,74],"pH":[56,80],"are":[58],"characterised":[59],"five":[61],"dies":[62],"etched":[63],"0":[65],"15":[67],"minutes,":[68],"demonstrate":[71],"that":[72],"capacitive":[73],"is":[75,95],"reduced":[76,97],"by":[77,83],"196%":[78],"increased":[82],"260%":[84],"compared":[85],"non-etched":[88],"equivalent.":[89],"spread":[91],"trapped":[93],"charge":[94],"also":[96],"which":[98],"relaxes":[99],"requirements":[100],"on":[101],"analogue":[103],"front-end.":[104],"technique":[106],"significantly":[107],"improves":[108],"performance":[110],"fully-integrated":[113],"sensing":[114],"system":[115],"applications":[117],"such":[118],"DNA":[120],"detection.":[121]},"counts_by_year":[{"year":2021,"cited_by_count":1}],"updated_date":"2026-06-26T08:34:08.712188","created_date":"2025-10-10T00:00:00"}