{"id":"https://openalex.org/W2242213143","doi":"https://doi.org/10.1109/asscc.2015.7387432","title":"A cell current compensation scheme for 3D NAND FLASH memory","display_name":"A cell current compensation scheme for 3D NAND FLASH memory","publication_year":2015,"publication_date":"2015-11-01","ids":{"openalex":"https://openalex.org/W2242213143","doi":"https://doi.org/10.1109/asscc.2015.7387432","mag":"2242213143"},"language":"en","primary_location":{"id":"doi:10.1109/asscc.2015.7387432","is_oa":false,"landing_page_url":"https://doi.org/10.1109/asscc.2015.7387432","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2015 IEEE Asian Solid-State Circuits Conference (A-SSCC)","raw_type":"proceedings-article"},"type":"conference-paper","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5058827163","display_name":"Sungwook Choi","orcid":"https://orcid.org/0000-0001-9847-8755"},"institutions":[{"id":"https://openalex.org/I134353371","display_name":"SK Group (South Korea)","ror":"https://ror.org/03696td91","country_code":"KR","type":"company","lineage":["https://openalex.org/I134353371"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"SungWook Choi","raw_affiliation_strings":["FLASH Development Division, SKHynix, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"FLASH Development Division, SKHynix, Korea","institution_ids":["https://openalex.org/I134353371"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5090761234","display_name":"KyuTae Park","orcid":null},"institutions":[{"id":"https://openalex.org/I134353371","display_name":"SK Group (South Korea)","ror":"https://ror.org/03696td91","country_code":"KR","type":"company","lineage":["https://openalex.org/I134353371"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"KyuTae Park","raw_affiliation_strings":["FLASH Development Division, SKHynix, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"FLASH Development Division, SKHynix, Korea","institution_ids":["https://openalex.org/I134353371"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5077313464","display_name":"Marco Passerini","orcid":"https://orcid.org/0009-0004-5853-1389"},"institutions":[{"id":"https://openalex.org/I134353371","display_name":"SK Group (South Korea)","ror":"https://ror.org/03696td91","country_code":"KR","type":"company","lineage":["https://openalex.org/I134353371"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Marco Passerini","raw_affiliation_strings":["FLASH Development Division, SKHynix, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"FLASH Development Division, SKHynix, Korea","institution_ids":["https://openalex.org/I134353371"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5034420119","display_name":"HeeJoung Park","orcid":null},"institutions":[{"id":"https://openalex.org/I134353371","display_name":"SK Group (South Korea)","ror":"https://ror.org/03696td91","country_code":"KR","type":"company","lineage":["https://openalex.org/I134353371"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"HeeJoung Park","raw_affiliation_strings":["FLASH Development Division, SKHynix, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"FLASH Development Division, SKHynix, Korea","institution_ids":["https://openalex.org/I134353371"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5050439245","display_name":"DoYoung Kim","orcid":null},"institutions":[{"id":"https://openalex.org/I134353371","display_name":"SK Group (South Korea)","ror":"https://ror.org/03696td91","country_code":"KR","type":"company","lineage":["https://openalex.org/I134353371"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"DoYoung Kim","raw_affiliation_strings":["FLASH Development Division, SKHynix, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"FLASH Development Division, SKHynix, Korea","institution_ids":["https://openalex.org/I134353371"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5027629597","display_name":"ChiHyun Kim","orcid":null},"institutions":[{"id":"https://openalex.org/I134353371","display_name":"SK Group (South Korea)","ror":"https://ror.org/03696td91","country_code":"KR","type":"company","lineage":["https://openalex.org/I134353371"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"ChiHyun Kim","raw_affiliation_strings":["FLASH Development Division, SKHynix, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"FLASH Development Division, SKHynix, Korea","institution_ids":["https://openalex.org/I134353371"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5070408579","display_name":"KunWoo Park","orcid":null},"institutions":[{"id":"https://openalex.org/I134353371","display_name":"SK Group (South Korea)","ror":"https://ror.org/03696td91","country_code":"KR","type":"company","lineage":["https://openalex.org/I134353371"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"KunWoo Park","raw_affiliation_strings":["FLASH Development Division, SKHynix, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"FLASH Development Division, SKHynix, Korea","institution_ids":["https://openalex.org/I134353371"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5100765041","display_name":"Jinwoong Kim","orcid":"https://orcid.org/0000-0003-3237-9863"},"institutions":[{"id":"https://openalex.org/I134353371","display_name":"SK Group (South Korea)","ror":"https://ror.org/03696td91","country_code":"KR","type":"company","lineage":["https://openalex.org/I134353371"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"JinWoong Kim","raw_affiliation_strings":["FLASH Development Division, SKHynix, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"FLASH Development Division, SKHynix, Korea","institution_ids":["https://openalex.org/I134353371"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I134353371"],"apc_list":null,"apc_paid":null,"fwci":null,"has_fulltext":false,"cited_by_count":18,"citation_normalized_percentile":null,"cited_by_percentile_year":null,"biblio":{"volume":null,"issue":null,"first_page":"1","last_page":"4"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11181","display_name":"Advanced Data Storage Technologies","score":0.9979000091552734,"subfield":{"id":"https://openalex.org/subfields/1705","display_name":"Computer Networks and Communications"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11181","display_name":"Advanced Data Storage Technologies","score":0.9979000091552734,"subfield":{"id":"https://openalex.org/subfields/1705","display_name":"Computer Networks and Communications"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/nand-gate","display_name":"NAND gate","score":0.8903881907463074},{"id":"https://openalex.org/keywords/compensation","display_name":"Compensation (psychology)","score":0.6618506908416748},{"id":"https://openalex.org/keywords/flash","display_name":"Flash (photography)","score":0.6501247882843018},{"id":"https://openalex.org/keywords/degradation","display_name":"Degradation (telecommunications)","score":0.6153625845909119},{"id":"https://openalex.org/keywords/wafer","display_name":"Wafer","score":0.5231265425682068},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.4890187680721283},{"id":"https://openalex.org/keywords/electronic-engineering","display_name":"Electronic engineering","score":0.4727536141872406},{"id":"https://openalex.org/keywords/memory-cell","display_name":"Memory cell","score":0.44130945205688477},{"id":"https://openalex.org/keywords/scheme","display_name":"Scheme (mathematics)","score":0.440807044506073},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.3638749122619629},{"id":"https://openalex.org/keywords/logic-gate","display_name":"Logic gate","score":0.362575888633728},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.3468281626701355},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.2827932834625244},{"id":"https://openalex.org/keywords/transistor","display_name":"Transistor","score":0.24532634019851685},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.16312089562416077},{"id":"https://openalex.org/keywords/mathematics","display_name":"Mathematics","score":0.11143922805786133},{"id":"https://openalex.org/keywords/voltage","display_name":"Voltage","score":0.10603973269462585},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.10262316465377808},{"id":"https://openalex.org/keywords/optics","display_name":"Optics","score":0.0750616192817688}],"concepts":[{"id":"https://openalex.org/C124296912","wikidata":"https://www.wikidata.org/wiki/Q575178","display_name":"NAND gate","level":3,"score":0.8903881907463074},{"id":"https://openalex.org/C2780023022","wikidata":"https://www.wikidata.org/wiki/Q1338171","display_name":"Compensation (psychology)","level":2,"score":0.6618506908416748},{"id":"https://openalex.org/C2777526259","wikidata":"https://www.wikidata.org/wiki/Q221836","display_name":"Flash (photography)","level":2,"score":0.6501247882843018},{"id":"https://openalex.org/C2779679103","wikidata":"https://www.wikidata.org/wiki/Q5251805","display_name":"Degradation (telecommunications)","level":2,"score":0.6153625845909119},{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.5231265425682068},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.4890187680721283},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.4727536141872406},{"id":"https://openalex.org/C2776638159","wikidata":"https://www.wikidata.org/wiki/Q18343761","display_name":"Memory cell","level":4,"score":0.44130945205688477},{"id":"https://openalex.org/C77618280","wikidata":"https://www.wikidata.org/wiki/Q1155772","display_name":"Scheme (mathematics)","level":2,"score":0.440807044506073},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.3638749122619629},{"id":"https://openalex.org/C131017901","wikidata":"https://www.wikidata.org/wiki/Q170451","display_name":"Logic gate","level":2,"score":0.362575888633728},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.3468281626701355},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.2827932834625244},{"id":"https://openalex.org/C172385210","wikidata":"https://www.wikidata.org/wiki/Q5339","display_name":"Transistor","level":3,"score":0.24532634019851685},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.16312089562416077},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.11143922805786133},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.10603973269462585},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.10262316465377808},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.0750616192817688},{"id":"https://openalex.org/C134306372","wikidata":"https://www.wikidata.org/wiki/Q7754","display_name":"Mathematical analysis","level":1,"score":0.0},{"id":"https://openalex.org/C11171543","wikidata":"https://www.wikidata.org/wiki/Q41630","display_name":"Psychoanalysis","level":1,"score":0.0},{"id":"https://openalex.org/C15744967","wikidata":"https://www.wikidata.org/wiki/Q9418","display_name":"Psychology","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/asscc.2015.7387432","is_oa":false,"landing_page_url":"https://doi.org/10.1109/asscc.2015.7387432","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2015 IEEE Asian Solid-State Circuits Conference (A-SSCC)","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[{"id":"https://metadata.un.org/sdg/7","score":0.6600000262260437,"display_name":"Affordable and clean energy"}],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":3,"referenced_works":["https://openalex.org/W2169118178","https://openalex.org/W2543571638","https://openalex.org/W6728861025"],"related_works":["https://openalex.org/W2054139911","https://openalex.org/W1577524679","https://openalex.org/W2386432552","https://openalex.org/W4230869547","https://openalex.org/W2489439822","https://openalex.org/W2355887979","https://openalex.org/W4285309357","https://openalex.org/W3165307257","https://openalex.org/W2515312339","https://openalex.org/W2145098804"],"abstract_inverted_index":{"The":[0,42,58],"3D":[1],"NAND,":[2],"so-called":[3],"vertical":[4],"NAND":[5,23,69],"has":[6,40,61],"cell":[7,17,55],"Vt":[8,18,56],"degradation":[9],"especially":[10],"in":[11,64,74],"low":[12],"temperature,":[13],"and":[14,20,70],"it":[15],"affects":[16],"distribution":[19],"shift":[21],"when":[22],"operates.":[24],"To":[25],"solve":[26],"this":[27],"problem,":[28],"the":[29,47],"temperature":[30,43,53],"compensation":[31],"scheme":[32,60],"by":[33],"ATS(Analog":[34],"Temp":[35],"Sensor)":[36],"using":[37],"CTAT":[38],"circuit":[39],"proposed.":[41],"compensated":[44,54],"bias":[45],"controls":[46],"bit":[48],"line":[49],"level":[50],"to":[51],"generate":[52],"distribution.":[57],"proposed":[59],"been":[62],"implemented":[63],"36":[65],"stacks,":[66],"256Gb":[67],"MLC":[68],"proved":[71],"its":[72],"effect":[73],"silicon":[75],"wafer.":[76]},"counts_by_year":[{"year":2025,"cited_by_count":1},{"year":2024,"cited_by_count":2},{"year":2023,"cited_by_count":3},{"year":2022,"cited_by_count":4},{"year":2021,"cited_by_count":1},{"year":2020,"cited_by_count":1},{"year":2019,"cited_by_count":2},{"year":2018,"cited_by_count":3},{"year":2017,"cited_by_count":1}],"updated_date":"2026-07-14T23:27:15.235271","created_date":"2025-10-10T00:00:00"}
