{"id":"https://openalex.org/W2588930539","doi":"https://doi.org/10.1109/aspdac.2017.7858300","title":"Lithography hotspot detection by two-stage cascade classifier using histogram of oriented light propagation","display_name":"Lithography hotspot detection by two-stage cascade classifier using histogram of oriented light propagation","publication_year":2017,"publication_date":"2017-01-01","ids":{"openalex":"https://openalex.org/W2588930539","doi":"https://doi.org/10.1109/aspdac.2017.7858300","mag":"2588930539"},"language":"en","primary_location":{"id":"doi:10.1109/aspdac.2017.7858300","is_oa":false,"landing_page_url":"https://doi.org/10.1109/aspdac.2017.7858300","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2017 22nd Asia and South Pacific Design Automation Conference (ASP-DAC)","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5101768297","display_name":"Yoichi Tomioka","orcid":"https://orcid.org/0000-0003-3509-6607"},"institutions":[{"id":"https://openalex.org/I141591182","display_name":"University of Aizu","ror":"https://ror.org/02pg0e883","country_code":"JP","type":"education","lineage":["https://openalex.org/I141591182"]}],"countries":["JP"],"is_corresponding":true,"raw_author_name":"Yoichi Tomioka","raw_affiliation_strings":["University of Aizu Aizu-Wakamatsu City, Fukushima, Japan","University of Aizu, Aizu-Wakamatsu City, Fukushima, Japan"],"affiliations":[{"raw_affiliation_string":"University of Aizu Aizu-Wakamatsu City, Fukushima, Japan","institution_ids":["https://openalex.org/I141591182"]},{"raw_affiliation_string":"University of Aizu, Aizu-Wakamatsu City, Fukushima, Japan","institution_ids":["https://openalex.org/I141591182"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5024868001","display_name":"Tetsuaki Matsunawa","orcid":null},"institutions":[{"id":"https://openalex.org/I1292669757","display_name":"Toshiba (Japan)","ror":"https://ror.org/0326v3z14","country_code":"JP","type":"company","lineage":["https://openalex.org/I1292669757"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Tetsuaki Matsunawa","raw_affiliation_strings":["Toshiba Corporation Yokohama, Kanagawa, Japan","Toshiba Corporation, Yokohama, Kanagawa, Japan"],"affiliations":[{"raw_affiliation_string":"Toshiba Corporation Yokohama, Kanagawa, Japan","institution_ids":["https://openalex.org/I1292669757"]},{"raw_affiliation_string":"Toshiba Corporation, Yokohama, Kanagawa, Japan","institution_ids":["https://openalex.org/I1292669757"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5063283976","display_name":"Chikaaki Kodama","orcid":"https://orcid.org/0000-0002-1955-7357"},"institutions":[{"id":"https://openalex.org/I1292669757","display_name":"Toshiba (Japan)","ror":"https://ror.org/0326v3z14","country_code":"JP","type":"company","lineage":["https://openalex.org/I1292669757"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Chikaaki Kodama","raw_affiliation_strings":["Toshiba Corporation Yokohama, Kanagawa, Japan","Toshiba Corporation, Yokohama, Kanagawa, Japan"],"affiliations":[{"raw_affiliation_string":"Toshiba Corporation Yokohama, Kanagawa, Japan","institution_ids":["https://openalex.org/I1292669757"]},{"raw_affiliation_string":"Toshiba Corporation, Yokohama, Kanagawa, Japan","institution_ids":["https://openalex.org/I1292669757"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5037815960","display_name":"Shigeki Nojima","orcid":null},"institutions":[{"id":"https://openalex.org/I1292669757","display_name":"Toshiba (Japan)","ror":"https://ror.org/0326v3z14","country_code":"JP","type":"company","lineage":["https://openalex.org/I1292669757"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Shigeki Nojima","raw_affiliation_strings":["Toshiba Corporation Yokohama, Kanagawa, Japan","Toshiba Corporation, Yokohama, Kanagawa, Japan"],"affiliations":[{"raw_affiliation_string":"Toshiba Corporation Yokohama, Kanagawa, Japan","institution_ids":["https://openalex.org/I1292669757"]},{"raw_affiliation_string":"Toshiba Corporation, Yokohama, Kanagawa, Japan","institution_ids":["https://openalex.org/I1292669757"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":4,"corresponding_author_ids":["https://openalex.org/A5101768297"],"corresponding_institution_ids":["https://openalex.org/I141591182"],"apc_list":null,"apc_paid":null,"fwci":2.2935,"has_fulltext":false,"cited_by_count":22,"citation_normalized_percentile":{"value":0.88777555,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":90,"max":99},"biblio":{"volume":null,"issue":null,"first_page":"81","last_page":"86"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9995999932289124,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9995999932289124,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13114","display_name":"Image Processing Techniques and Applications","score":0.994700014591217,"subfield":{"id":"https://openalex.org/subfields/2214","display_name":"Media Technology"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12072","display_name":"Machine Learning and Algorithms","score":0.9926999807357788,"subfield":{"id":"https://openalex.org/subfields/1702","display_name":"Artificial Intelligence"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/hotspot","display_name":"Hotspot (geology)","score":0.7722494602203369},{"id":"https://openalex.org/keywords/cascade","display_name":"Cascade","score":0.6569762229919434},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.6493015289306641},{"id":"https://openalex.org/keywords/classifier","display_name":"Classifier (UML)","score":0.5856103897094727},{"id":"https://openalex.org/keywords/lithography","display_name":"Lithography","score":0.5492855310440063},{"id":"https://openalex.org/keywords/artificial-intelligence","display_name":"Artificial intelligence","score":0.5462788939476013},{"id":"https://openalex.org/keywords/histogram","display_name":"Histogram","score":0.523579478263855},{"id":"https://openalex.org/keywords/pattern-recognition","display_name":"Pattern recognition (psychology)","score":0.5208654999732971},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.15304720401763916},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.11272671818733215},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.07869035005569458}],"concepts":[{"id":"https://openalex.org/C146481406","wikidata":"https://www.wikidata.org/wiki/Q105131","display_name":"Hotspot (geology)","level":2,"score":0.7722494602203369},{"id":"https://openalex.org/C34146451","wikidata":"https://www.wikidata.org/wiki/Q5048094","display_name":"Cascade","level":2,"score":0.6569762229919434},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.6493015289306641},{"id":"https://openalex.org/C95623464","wikidata":"https://www.wikidata.org/wiki/Q1096149","display_name":"Classifier (UML)","level":2,"score":0.5856103897094727},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.5492855310440063},{"id":"https://openalex.org/C154945302","wikidata":"https://www.wikidata.org/wiki/Q11660","display_name":"Artificial intelligence","level":1,"score":0.5462788939476013},{"id":"https://openalex.org/C53533937","wikidata":"https://www.wikidata.org/wiki/Q185020","display_name":"Histogram","level":3,"score":0.523579478263855},{"id":"https://openalex.org/C153180895","wikidata":"https://www.wikidata.org/wiki/Q7148389","display_name":"Pattern recognition (psychology)","level":2,"score":0.5208654999732971},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.15304720401763916},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.11272671818733215},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.07869035005569458},{"id":"https://openalex.org/C127313418","wikidata":"https://www.wikidata.org/wiki/Q1069","display_name":"Geology","level":0,"score":0.0},{"id":"https://openalex.org/C42360764","wikidata":"https://www.wikidata.org/wiki/Q83588","display_name":"Chemical engineering","level":1,"score":0.0},{"id":"https://openalex.org/C115961682","wikidata":"https://www.wikidata.org/wiki/Q860623","display_name":"Image (mathematics)","level":2,"score":0.0},{"id":"https://openalex.org/C8058405","wikidata":"https://www.wikidata.org/wiki/Q46255","display_name":"Geophysics","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/aspdac.2017.7858300","is_oa":false,"landing_page_url":"https://doi.org/10.1109/aspdac.2017.7858300","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2017 22nd Asia and South Pacific Design Automation Conference (ASP-DAC)","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[{"score":0.4300000071525574,"id":"https://metadata.un.org/sdg/9","display_name":"Industry, innovation and infrastructure"}],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":16,"referenced_works":["https://openalex.org/W1981627777","https://openalex.org/W1988790447","https://openalex.org/W2024046085","https://openalex.org/W2038835846","https://openalex.org/W2055299283","https://openalex.org/W2057596653","https://openalex.org/W2068961782","https://openalex.org/W2089689336","https://openalex.org/W2092970276","https://openalex.org/W2096945460","https://openalex.org/W2124386111","https://openalex.org/W2161969291","https://openalex.org/W2170802486","https://openalex.org/W3147744269","https://openalex.org/W4247085725","https://openalex.org/W6664060705"],"related_works":["https://openalex.org/W2153719181","https://openalex.org/W1971748923","https://openalex.org/W2060986072","https://openalex.org/W1566155057","https://openalex.org/W3110732990","https://openalex.org/W3120641340","https://openalex.org/W64588465","https://openalex.org/W2117825986","https://openalex.org/W2079855347","https://openalex.org/W1995257921"],"abstract_inverted_index":{"In":[0,18],"advanced":[1],"semiconductor-process":[2],"technology,":[3],"the":[4,40,60,76,83,90,97,106,129,132],"ability":[5],"to":[6,51,59,72,124],"detect":[7],"and":[8,88,115],"repair":[9],"lithography":[10],"hotspots,":[11],"which":[12],"can":[13],"affect":[14],"printability,":[15],"is":[16],"essential.":[17],"this":[19],"paper,":[20],"we":[21],"propose":[22],"a":[23,34,46,110],"two-stage":[24],"cascade":[25,54],"classifier":[26,32,55],"for":[27],"accurate":[28],"hotspot":[29,66],"detection.":[30],"Our":[31],"uses":[33],"novel":[35],"layout":[36],"feature":[37],"based":[38],"on":[39,121],"propagation":[41],"of":[42,78,85,92,99],"light":[43],"passing":[44],"through":[45],"photomask.":[47],"We":[48],"performed":[49],"experiments":[50],"evaluate":[52],"our":[53],"by":[56],"applying":[57],"it":[58],"ICCAD-2012":[61],"CAD":[62],"contest":[63],"problem.":[64],"The":[65,102],"detection":[67],"performance":[68],"was":[69],"evaluated":[70],"according":[71],"two":[73],"indices:":[74],"(I1)":[75],"number":[77,84,91,98],"correctly":[79,93],"detected":[80,94],"hotspots":[81,87,95],"over":[82,96],"actual":[86],"(I2)":[89],"false":[100],"hotspots.":[101],"results":[103],"showed":[104],"that":[105],"proposed":[107],"method":[108],"gained":[109],"1.15%":[111],"improvement":[112,118],"in":[113,119],"I1":[114],"24.4":[116],"times":[117],"I2":[120],"average":[122],"compared":[123],"existing":[125],"state-of-the-art":[126],"methods,":[127],"even":[128],"one":[130],"with":[131],"best":[133],"I1.":[134]},"counts_by_year":[{"year":2024,"cited_by_count":2},{"year":2023,"cited_by_count":2},{"year":2022,"cited_by_count":2},{"year":2020,"cited_by_count":4},{"year":2019,"cited_by_count":6},{"year":2018,"cited_by_count":5},{"year":2017,"cited_by_count":1}],"updated_date":"2025-11-25T14:43:58.451035","created_date":"2025-10-10T00:00:00"}