{"id":"https://openalex.org/W4391183729","doi":"https://doi.org/10.1109/asicon58565.2023.10396559","title":"An iTFET with Control Gate for Low Power Applications in RF and Digital Circuits","display_name":"An iTFET with Control Gate for Low Power Applications in RF and Digital Circuits","publication_year":2023,"publication_date":"2023-10-24","ids":{"openalex":"https://openalex.org/W4391183729","doi":"https://doi.org/10.1109/asicon58565.2023.10396559"},"language":"en","primary_location":{"id":"doi:10.1109/asicon58565.2023.10396559","is_oa":false,"landing_page_url":"http://dx.doi.org/10.1109/asicon58565.2023.10396559","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2023 IEEE 15th International Conference on ASIC (ASICON)","raw_type":"proceedings-article"},"type":"conference-paper","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5092052651","display_name":"Ho-Hin Tse","orcid":null},"institutions":[{"id":"https://openalex.org/I142974352","display_name":"National Sun Yat-sen University","ror":"https://ror.org/00mjawt10","country_code":"TW","type":"education","lineage":["https://openalex.org/I142974352"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Ho-Hin Tse","raw_affiliation_strings":["National Sun Yat-Sen University,Department of Electrical Engineering,Kaohsiung,Taiwan, R.O.C.,80424"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Sun Yat-Sen University,Department of Electrical Engineering,Kaohsiung,Taiwan, R.O.C.,80424","institution_ids":["https://openalex.org/I142974352"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5081056996","display_name":"Zheng\u2010Hong Zhong","orcid":null},"institutions":[{"id":"https://openalex.org/I142974352","display_name":"National Sun Yat-sen University","ror":"https://ror.org/00mjawt10","country_code":"TW","type":"education","lineage":["https://openalex.org/I142974352"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Zheng-Hong Zhong","raw_affiliation_strings":["National Sun Yat-Sen University,Department of Electrical Engineering,Kaohsiung,Taiwan, R.O.C.,80424"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Sun Yat-Sen University,Department of Electrical Engineering,Kaohsiung,Taiwan, R.O.C.,80424","institution_ids":["https://openalex.org/I142974352"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5045184588","display_name":"Jyi-Tsong Lin","orcid":"https://orcid.org/0000-0002-0321-5424"},"institutions":[{"id":"https://openalex.org/I142974352","display_name":"National Sun Yat-sen University","ror":"https://ror.org/00mjawt10","country_code":"TW","type":"education","lineage":["https://openalex.org/I142974352"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Jyi-Tsong Lin","raw_affiliation_strings":["National Sun Yat-Sen University,Department of Electrical Engineering,Kaohsiung,Taiwan, R.O.C.,80424"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"National Sun Yat-Sen University,Department of Electrical Engineering,Kaohsiung,Taiwan, R.O.C.,80424","institution_ids":["https://openalex.org/I142974352"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I142974352"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.31062969,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"31","issue":null,"first_page":"1","last_page":"4"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12808","display_name":"Ferroelectric and Negative Capacitance Devices","score":0.9995999932289124,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.45701104402542114},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.37795180082321167},{"id":"https://openalex.org/keywords/topology","display_name":"Topology (electrical circuits)","score":0.3334903120994568},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.16949594020843506}],"concepts":[{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.45701104402542114},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.37795180082321167},{"id":"https://openalex.org/C184720557","wikidata":"https://www.wikidata.org/wiki/Q7825049","display_name":"Topology (electrical circuits)","level":2,"score":0.3334903120994568},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.16949594020843506}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/asicon58565.2023.10396559","is_oa":false,"landing_page_url":"http://dx.doi.org/10.1109/asicon58565.2023.10396559","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2023 IEEE 15th International Conference on ASIC (ASICON)","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[{"display_name":"Industry, innovation and infrastructure","id":"https://metadata.un.org/sdg/9","score":0.47999998927116394}],"awards":[],"funders":[{"id":"https://openalex.org/F4320322108","display_name":"Ministry of Science and Technology","ror":"https://ror.org/032e49973"}],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":32,"referenced_works":["https://openalex.org/W91687147","https://openalex.org/W1530660804","https://openalex.org/W1558289276","https://openalex.org/W1954467615","https://openalex.org/W2025300232","https://openalex.org/W2032197740","https://openalex.org/W2041710839","https://openalex.org/W2048848279","https://openalex.org/W2097197299","https://openalex.org/W2099133288","https://openalex.org/W2131217820","https://openalex.org/W2132841962","https://openalex.org/W2510363982","https://openalex.org/W2581498729","https://openalex.org/W2758437414","https://openalex.org/W2767002025","https://openalex.org/W2791898697","https://openalex.org/W2811340888","https://openalex.org/W2913982738","https://openalex.org/W2954216994","https://openalex.org/W2965181161","https://openalex.org/W2997161100","https://openalex.org/W3035425879","https://openalex.org/W3036422995","https://openalex.org/W3119301513","https://openalex.org/W3198316005","https://openalex.org/W4224509142","https://openalex.org/W4226170735","https://openalex.org/W4232881281","https://openalex.org/W4284880392","https://openalex.org/W4285582074","https://openalex.org/W6631657168"],"related_works":["https://openalex.org/W4391375266","https://openalex.org/W2748952813","https://openalex.org/W2390279801","https://openalex.org/W2358668433","https://openalex.org/W4396701345","https://openalex.org/W2376932109","https://openalex.org/W2001405890","https://openalex.org/W4396696052","https://openalex.org/W4402327032","https://openalex.org/W2382290278"],"abstract_inverted_index":{"In":[0],"this":[1,29],"study,":[2],"we":[3],"introduce":[4],"a":[5,41,96,124,132,137,185],"device":[6,98],"configuration":[7],"for":[8,140],"the":[9,46,53,59,65,77,84,128,167,175],"simulated":[10],"high":[11],"Schottky":[12],"barrier":[13],"inductive":[14],"line":[15],"tunneling":[16],"TFET":[17],"(iTFET)":[18],"equipped":[19],"with":[20],"an":[21,101,109,114],"advanced":[22],"control":[23,56,147],"gate.":[24],"The":[25,145],"unique":[26],"aspect":[27],"of":[28,36,106,111,117,169],"design":[30,173],"architecture":[31],"lies":[32],"in":[33,40,44,127,158,166],"its":[34],"elimination":[35],"ion":[37],"implantation,":[38],"resulting":[39],"significant":[42],"reduction":[43],"both":[45,159],"thermal":[47],"budget":[48],"and":[49,61,69,113,131,162],"process-related":[50],"complexities.":[51],"Additionally,":[52],"strategically":[54],"positioned":[55],"gate":[57,148],"between":[58],"source":[60],"drain":[62],"regions":[63],"bolsters":[64],"device's":[66],"overall":[67],"performance":[68],"reliability.":[70],"This":[71],"modification":[72],"primarily":[73],"serves":[74],"to":[75,177],"enhance":[76],"ON-state":[78],"current":[79,86],"(ION),":[80],"while":[81,183],"concurrently":[82],"diminishing":[83],"OFF-state":[85],"(IOFF)":[87],"via":[88],"precise":[89],"electric":[90],"field":[91],"control.":[92],"Simulation":[93],"outcomes":[94],"reveal":[95],"compelling":[97],"performance,":[99],"showcasing":[100],"average":[102],"subthreshold":[103],"swing":[104],"(SSAVG)":[105],"31.5":[107],"mV/dec,":[108],"IONvalue":[110],"4.96\u00d7106A/\u03bcm,":[112],"impressive":[115],"ION/IOFFratio":[116],"1.1\u00d7108at":[118],"VDS=":[119],"0.2V.":[120],"Such":[121],"advancements":[122],"promise":[123],"marked":[125],"increase":[126],"cut-off":[129,160],"frequency":[130,161],"broadened":[133],"gain":[134,163],"bandwidth,":[135],"setting":[136],"new":[138],"precedent":[139],"superior":[141],"analog":[142,153],"RF":[143],"performance.":[144],"innovative":[146],"structure,":[149],"when":[150],"integrated":[151],"into":[152],"designs,":[154],"offers":[155],"potential":[156],"improvements":[157],"bandwidth.":[164],"Moreover,":[165],"realm":[168],"digital":[170],"applications,":[171],"our":[172],"demonstrates":[174],"capability":[176],"operate":[178],"effectively":[179],"at":[180],"low":[181],"VDD,":[182],"maintaining":[184],"commendable":[186],"intrinsic":[187],"gain.":[188]},"counts_by_year":[],"updated_date":"2026-07-29T14:22:42.915294","created_date":"2025-10-10T00:00:00"}
