{"id":"https://openalex.org/W2783505800","doi":"https://doi.org/10.1109/asicon.2017.8252681","title":"3D scaling for insulated gate bipolar transistors (IGBTs) with low V&lt;inf&gt;ce(sat)&lt;/inf&gt;","display_name":"3D scaling for insulated gate bipolar transistors (IGBTs) with low V&lt;inf&gt;ce(sat)&lt;/inf&gt;","publication_year":2017,"publication_date":"2017-10-01","ids":{"openalex":"https://openalex.org/W2783505800","doi":"https://doi.org/10.1109/asicon.2017.8252681","mag":"2783505800"},"language":"en","primary_location":{"id":"doi:10.1109/asicon.2017.8252681","is_oa":false,"landing_page_url":"https://doi.org/10.1109/asicon.2017.8252681","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2017 IEEE 12th International Conference on ASIC (ASICON)","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5089215725","display_name":"Kazuo Tsutsui","orcid":"https://orcid.org/0000-0002-5472-5539"},"institutions":[{"id":"https://openalex.org/I114531698","display_name":"Tokyo Institute of Technology","ror":"https://ror.org/0112mx960","country_code":"JP","type":"education","lineage":["https://openalex.org/I114531698"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"K. Tsutsui","raw_affiliation_strings":["Tokyo Inst. of Technology, Yokohama, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Tokyo Inst. of Technology, Yokohama, Japan","institution_ids":["https://openalex.org/I114531698"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5007637720","display_name":"Kuniyuki Kakushima","orcid":"https://orcid.org/0000-0002-8527-1402"},"institutions":[{"id":"https://openalex.org/I114531698","display_name":"Tokyo Institute of Technology","ror":"https://ror.org/0112mx960","country_code":"JP","type":"education","lineage":["https://openalex.org/I114531698"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"K. Kakushima","raw_affiliation_strings":["Tokyo Inst. of Technology, Yokohama, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Tokyo Inst. of Technology, Yokohama, Japan","institution_ids":["https://openalex.org/I114531698"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5001044242","display_name":"Takuya Hoshii","orcid":"https://orcid.org/0000-0002-2873-8715"},"institutions":[{"id":"https://openalex.org/I114531698","display_name":"Tokyo Institute of Technology","ror":"https://ror.org/0112mx960","country_code":"JP","type":"education","lineage":["https://openalex.org/I114531698"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"T. Hoshii","raw_affiliation_strings":["Tokyo Inst. of Technology, Yokohama, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Tokyo Inst. of Technology, Yokohama, Japan","institution_ids":["https://openalex.org/I114531698"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5034723564","display_name":"Akira Nakajima","orcid":"https://orcid.org/0000-0002-7307-9763"},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"A. Nakajima","raw_affiliation_strings":["Sangyo Gijutsu Sogo Kenkyujo, Chiyoda-ku, Tokyo, JP"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Sangyo Gijutsu Sogo Kenkyujo, Chiyoda-ku, Tokyo, JP","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5103241865","display_name":"Shin\u2013ichi Nishizawa","orcid":"https://orcid.org/0000-0001-5793-4443"},"institutions":[{"id":"https://openalex.org/I135598925","display_name":"Kyushu University","ror":"https://ror.org/00p4k0j84","country_code":"JP","type":"education","lineage":["https://openalex.org/I135598925"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"S. Nishizawa","raw_affiliation_strings":["Kyushu University, Fukuoka, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Kyushu University, Fukuoka, Japan","institution_ids":["https://openalex.org/I135598925"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5044481452","display_name":"Hitoshi Wakabayashi","orcid":"https://orcid.org/0000-0001-5509-521X"},"institutions":[{"id":"https://openalex.org/I114531698","display_name":"Tokyo Institute of Technology","ror":"https://ror.org/0112mx960","country_code":"JP","type":"education","lineage":["https://openalex.org/I114531698"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"H. Wakabayashi","raw_affiliation_strings":["Tokyo Kogyo Daigaku, Meguro-ku, Tokyo, JP"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Tokyo Kogyo Daigaku, Meguro-ku, Tokyo, JP","institution_ids":["https://openalex.org/I114531698"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5021447227","display_name":"Iriya Muneta","orcid":"https://orcid.org/0000-0001-7620-4948"},"institutions":[{"id":"https://openalex.org/I114531698","display_name":"Tokyo Institute of Technology","ror":"https://ror.org/0112mx960","country_code":"JP","type":"education","lineage":["https://openalex.org/I114531698"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"I. Muneta","raw_affiliation_strings":["Tokyo Inst. of Technology, Yokohama, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Tokyo Inst. of Technology, Yokohama, Japan","institution_ids":["https://openalex.org/I114531698"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5040361414","display_name":"Katsuhiro Sat\u014d","orcid":"https://orcid.org/0000-0002-5419-4344"},"institutions":[{"id":"https://openalex.org/I4210133125","display_name":"Mitsubishi Electric (Japan)","ror":"https://ror.org/033y26782","country_code":"JP","type":"company","lineage":["https://openalex.org/I1306287861","https://openalex.org/I4210133125"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"K. Sato","raw_affiliation_strings":["Mitusbishi Electric, Fukuoka, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Mitusbishi Electric, Fukuoka, Japan","institution_ids":["https://openalex.org/I4210133125"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5008244529","display_name":"Tomoko Matsudai","orcid":null},"institutions":[{"id":"https://openalex.org/I1292669757","display_name":"Toshiba (Japan)","ror":"https://ror.org/0326v3z14","country_code":"JP","type":"company","lineage":["https://openalex.org/I1292669757"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"T. Matsudai","raw_affiliation_strings":["Toshiba Electronic Devices & Storage Corp., Tokyo, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Toshiba Electronic Devices & Storage Corp., Tokyo, Japan","institution_ids":["https://openalex.org/I1292669757"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5039190082","display_name":"Wataru Saito","orcid":"https://orcid.org/0000-0001-9700-6713"},"institutions":[{"id":"https://openalex.org/I1292669757","display_name":"Toshiba (Japan)","ror":"https://ror.org/0326v3z14","country_code":"JP","type":"company","lineage":["https://openalex.org/I1292669757"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"W. Saito","raw_affiliation_strings":["Toshiba Electronic Devices & Storage Corp., Tokyo, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Toshiba Electronic Devices & Storage Corp., Tokyo, Japan","institution_ids":["https://openalex.org/I1292669757"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5036826888","display_name":"Takuya Saraya","orcid":"https://orcid.org/0000-0002-3796-7747"},"institutions":[{"id":"https://openalex.org/I74801974","display_name":"The University of Tokyo","ror":"https://ror.org/057zh3y96","country_code":"JP","type":"education","lineage":["https://openalex.org/I74801974"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"T. Saraya","raw_affiliation_strings":["The University of Tokyo, Tokyo, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"The University of Tokyo, Tokyo, Japan","institution_ids":["https://openalex.org/I74801974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5112491181","display_name":"K. Itou","orcid":null},"institutions":[{"id":"https://openalex.org/I74801974","display_name":"The University of Tokyo","ror":"https://ror.org/057zh3y96","country_code":"JP","type":"education","lineage":["https://openalex.org/I74801974"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"K. Itou","raw_affiliation_strings":["The University of Tokyo, Tokyo, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"The University of Tokyo, Tokyo, Japan","institution_ids":["https://openalex.org/I74801974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5102865884","display_name":"Munetoshi Fukui","orcid":"https://orcid.org/0009-0000-4411-4622"},"institutions":[{"id":"https://openalex.org/I74801974","display_name":"The University of Tokyo","ror":"https://ror.org/057zh3y96","country_code":"JP","type":"education","lineage":["https://openalex.org/I74801974"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"M. Fukui","raw_affiliation_strings":["The University of Tokyo, Tokyo, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"The University of Tokyo, Tokyo, Japan","institution_ids":["https://openalex.org/I74801974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5108194765","display_name":"Shinichi Suzuki","orcid":null},"institutions":[{"id":"https://openalex.org/I74801974","display_name":"The University of Tokyo","ror":"https://ror.org/057zh3y96","country_code":"JP","type":"education","lineage":["https://openalex.org/I74801974"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"S. Suzuki","raw_affiliation_strings":["The University of Tokyo, Tokyo, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"The University of Tokyo, Tokyo, Japan","institution_ids":["https://openalex.org/I74801974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5071031997","display_name":"Masaharu Kobayashi","orcid":"https://orcid.org/0000-0002-7945-6136"},"institutions":[{"id":"https://openalex.org/I74801974","display_name":"The University of Tokyo","ror":"https://ror.org/057zh3y96","country_code":"JP","type":"education","lineage":["https://openalex.org/I74801974"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"M. Kobayashi","raw_affiliation_strings":["The University of Tokyo, Tokyo, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"The University of Tokyo, Tokyo, Japan","institution_ids":["https://openalex.org/I74801974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110991035","display_name":"Toshihiko Takakura","orcid":null},"institutions":[{"id":"https://openalex.org/I74801974","display_name":"The University of Tokyo","ror":"https://ror.org/057zh3y96","country_code":"JP","type":"education","lineage":["https://openalex.org/I74801974"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"T. Takakura","raw_affiliation_strings":["The University of Tokyo, Tokyo, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"The University of Tokyo, Tokyo, Japan","institution_ids":["https://openalex.org/I74801974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5091874162","display_name":"Toshiro Hiramoto","orcid":"https://orcid.org/0000-0001-9469-2631"},"institutions":[{"id":"https://openalex.org/I74801974","display_name":"The University of Tokyo","ror":"https://ror.org/057zh3y96","country_code":"JP","type":"education","lineage":["https://openalex.org/I74801974"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"T. Hiramoto","raw_affiliation_strings":["The University of Tokyo, Tokyo, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"The University of Tokyo, Tokyo, Japan","institution_ids":["https://openalex.org/I74801974"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5004609434","display_name":"Atsushi Ogura","orcid":"https://orcid.org/0000-0003-2008-7695"},"institutions":[{"id":"https://openalex.org/I16656306","display_name":"Meiji University","ror":"https://ror.org/02rqvrp93","country_code":"JP","type":"education","lineage":["https://openalex.org/I16656306"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"A. Ogura","raw_affiliation_strings":["Meiji University, Kawasaki, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Meiji University, Kawasaki, Japan","institution_ids":["https://openalex.org/I16656306"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5036555728","display_name":"Yohichiroh Numasawa","orcid":null},"institutions":[{"id":"https://openalex.org/I16656306","display_name":"Meiji University","ror":"https://ror.org/02rqvrp93","country_code":"JP","type":"education","lineage":["https://openalex.org/I16656306"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Y. Numasawa","raw_affiliation_strings":["Meiji University, Kawasaki, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Meiji University, Kawasaki, Japan","institution_ids":["https://openalex.org/I16656306"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110029316","display_name":"Ichiro Omura","orcid":null},"institutions":[{"id":"https://openalex.org/I207014233","display_name":"Kyushu Institute of Technology","ror":"https://ror.org/02278tr80","country_code":"JP","type":"education","lineage":["https://openalex.org/I207014233"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"I. Omura","raw_affiliation_strings":["Kyushu Inst. of Technoloav, Kitakvushu, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Kyushu Inst. of Technoloav, Kitakvushu, Japan","institution_ids":["https://openalex.org/I207014233"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5113568983","display_name":"Hiromichi Ohashi","orcid":null},"institutions":[{"id":"https://openalex.org/I114531698","display_name":"Tokyo Institute of Technology","ror":"https://ror.org/0112mx960","country_code":"JP","type":"education","lineage":["https://openalex.org/I114531698"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"H. Ohashi","raw_affiliation_strings":["Tokyo Inst. of Technology, Yokohama, Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Tokyo Inst. of Technology, Yokohama, Japan","institution_ids":["https://openalex.org/I114531698"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5102754192","display_name":"Hiroshi Iwai","orcid":"https://orcid.org/0000-0001-5550-4140"},"institutions":[{"id":"https://openalex.org/I114531698","display_name":"Tokyo Institute of Technology","ror":"https://ror.org/0112mx960","country_code":"JP","type":"education","lineage":["https://openalex.org/I114531698"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"H. Iwai","raw_affiliation_strings":["Tokyo Kogyo Daigaku, Meguro-ku, Tokyo, JP"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Tokyo Kogyo Daigaku, Meguro-ku, Tokyo, JP","institution_ids":["https://openalex.org/I114531698"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":22,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.18822553,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"10","issue":null,"first_page":"1137","last_page":"1140"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10361","display_name":"Silicon Carbide Semiconductor Technologies","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10361","display_name":"Silicon Carbide Semiconductor Technologies","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9995999932289124,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/scaling","display_name":"Scaling","score":0.7635626196861267},{"id":"https://openalex.org/keywords/bipolar-junction-transistor","display_name":"Bipolar junction transistor","score":0.6365022659301758},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.5174375176429749},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.5050497651100159},{"id":"https://openalex.org/keywords/insulated-gate-bipolar-transistor","display_name":"Insulated-gate bipolar transistor","score":0.5002315044403076},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.49567925930023193},{"id":"https://openalex.org/keywords/voltage","display_name":"Voltage","score":0.49164754152297974},{"id":"https://openalex.org/keywords/transistor","display_name":"Transistor","score":0.47031867504119873},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.3718324601650238},{"id":"https://openalex.org/keywords/mathematics","display_name":"Mathematics","score":0.21684929728507996},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.18452182412147522},{"id":"https://openalex.org/keywords/geometry","display_name":"Geometry","score":0.058854490518569946}],"concepts":[{"id":"https://openalex.org/C99844830","wikidata":"https://www.wikidata.org/wiki/Q102441924","display_name":"Scaling","level":2,"score":0.7635626196861267},{"id":"https://openalex.org/C23061349","wikidata":"https://www.wikidata.org/wiki/Q188946","display_name":"Bipolar junction transistor","level":4,"score":0.6365022659301758},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.5174375176429749},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5050497651100159},{"id":"https://openalex.org/C28285623","wikidata":"https://www.wikidata.org/wiki/Q176110","display_name":"Insulated-gate bipolar transistor","level":3,"score":0.5002315044403076},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.49567925930023193},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.49164754152297974},{"id":"https://openalex.org/C172385210","wikidata":"https://www.wikidata.org/wiki/Q5339","display_name":"Transistor","level":3,"score":0.47031867504119873},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.3718324601650238},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.21684929728507996},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.18452182412147522},{"id":"https://openalex.org/C2524010","wikidata":"https://www.wikidata.org/wiki/Q8087","display_name":"Geometry","level":1,"score":0.058854490518569946}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1109/asicon.2017.8252681","is_oa":false,"landing_page_url":"https://doi.org/10.1109/asicon.2017.8252681","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2017 IEEE 12th International Conference on ASIC (ASICON)","raw_type":"proceedings-article"},{"id":"pmh:oai:t2r2.star.titech.ac.jp:50450084","is_oa":false,"landing_page_url":"http://t2r2.star.titech.ac.jp/cgi-bin/publicationinfo.cgi?q_publication_content_number=CTT100783276","pdf_url":null,"source":{"id":"https://openalex.org/S4377196385","display_name":"Tokyo Tech Research Repository (Tokyo Institute of Technology)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"host_organization":"https://openalex.org/I114531698","host_organization_name":"Tokyo Institute of Technology","host_organization_lineage":["https://openalex.org/I114531698"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"","raw_type":"Conference Paper"}],"best_oa_location":null,"sustainable_development_goals":[{"score":0.7099999785423279,"display_name":"Affordable and clean energy","id":"https://metadata.un.org/sdg/7"}],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":2,"referenced_works":["https://openalex.org/W2039915069","https://openalex.org/W2297491642"],"related_works":["https://openalex.org/W2318746575","https://openalex.org/W3164416905","https://openalex.org/W2394855236","https://openalex.org/W2385832380","https://openalex.org/W2060044332","https://openalex.org/W2380046073","https://openalex.org/W2162081524","https://openalex.org/W2149388787","https://openalex.org/W2378831118","https://openalex.org/W4324123959"],"abstract_inverted_index":{"Three":[0],"dimensionally":[1],"(3D)":[2],"scaled":[3,66],"IGBTs":[4],"that":[5],"have":[6],"a":[7],"scaling":[8,27],"factor":[9],"of":[10],"3":[11],"(k=3)":[12],"with":[13],"respect":[14],"to":[15,30,56],"current":[16],"commercial":[17],"products":[18],"(k=1)":[19],"were":[20],"fabricated":[21],"for":[22,63],"the":[23,31,39,64],"first":[24],"time.":[25],"The":[26],"was":[28,60],"applied":[29],"lateral":[32],"and":[33],"vertical":[34],"dimensions":[35],"as":[36,38],"well":[37],"gate":[40],"voltage.":[41],"A":[42],"significant":[43],"decrease":[44],"in":[45],"ON":[46],"resistance,":[47],"-":[48,59],"V":[49,58],"<sub":[50],"xmlns:mml=\"http://www.w3.org/1998/Math/MathML\"":[51],"xmlns:xlink=\"http://www.w3.org/1999/xlink\">ce(sat)</sub>":[52],"reduction":[53],"from":[54],"1.70":[55],"1.26":[57],"experimentally":[61],"confirmed":[62],"3D":[65],"IGBTs.":[67]},"counts_by_year":[],"updated_date":"2026-06-11T09:08:48.828518","created_date":"2025-10-10T00:00:00"}