{"id":"https://openalex.org/W7130530412","doi":"https://doi.org/10.1109/apccas67402.2025.11378293","title":"Mask 3D Parameter Prediction in EUV Lithography by Convolutional Neural Network","display_name":"Mask 3D Parameter Prediction in EUV Lithography by Convolutional Neural Network","publication_year":2025,"publication_date":"2025-10-12","ids":{"openalex":"https://openalex.org/W7130530412","doi":"https://doi.org/10.1109/apccas67402.2025.11378293"},"language":null,"primary_location":{"id":"doi:10.1109/apccas67402.2025.11378293","is_oa":false,"landing_page_url":"https://doi.org/10.1109/apccas67402.2025.11378293","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2025 IEEE Asia Pacific Conference on Circuits and Systems (APCCAS)","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":null,"display_name":"Atsushi Takahashi","orcid":null},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Atsushi Takahashi","raw_affiliation_strings":["Institute of Science Tokyo,Tokyo,Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute of Science Tokyo,Tokyo,Japan","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5094110542","display_name":"Moe SUGIYAMA","orcid":null},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Moe Sugiyama","raw_affiliation_strings":["Institute of Science Tokyo,Tokyo,Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute of Science Tokyo,Tokyo,Japan","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5043084588","display_name":"Masayuki Shimoda","orcid":"https://orcid.org/0000-0003-4627-0957"},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Masayuki Shimoda","raw_affiliation_strings":["Institute of Science Tokyo,Tokyo,Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute of Science Tokyo,Tokyo,Japan","institution_ids":[]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5111564224","display_name":"Hiroyoshi Tanabe","orcid":null},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Hiroyoshi Tanabe","raw_affiliation_strings":["Institute of Science Tokyo,Tokyo,Japan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute of Science Tokyo,Tokyo,Japan","institution_ids":[]}]}],"institutions":[],"countries_distinct_count":0,"institutions_distinct_count":4,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.574367,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":null,"issue":null,"first_page":"1","last_page":"4"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9449999928474426,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9449999928474426,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","score":0.003800000064074993,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10638","display_name":"Optical measurement and interference techniques","score":0.0032999999821186066,"subfield":{"id":"https://openalex.org/subfields/1707","display_name":"Computer Vision and Pattern Recognition"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/extreme-ultraviolet-lithography","display_name":"Extreme ultraviolet lithography","score":0.609000027179718},{"id":"https://openalex.org/keywords/convolutional-neural-network","display_name":"Convolutional neural network","score":0.5806000232696533},{"id":"https://openalex.org/keywords/artificial-neural-network","display_name":"Artificial neural network","score":0.46239998936653137},{"id":"https://openalex.org/keywords/lithography","display_name":"Lithography","score":0.44769999384880066},{"id":"https://openalex.org/keywords/pattern-recognition","display_name":"Pattern recognition (psychology)","score":0.32690000534057617}],"concepts":[{"id":"https://openalex.org/C162996421","wikidata":"https://www.wikidata.org/wiki/Q371965","display_name":"Extreme ultraviolet lithography","level":2,"score":0.609000027179718},{"id":"https://openalex.org/C81363708","wikidata":"https://www.wikidata.org/wiki/Q17084460","display_name":"Convolutional neural network","level":2,"score":0.5806000232696533},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.5393999814987183},{"id":"https://openalex.org/C154945302","wikidata":"https://www.wikidata.org/wiki/Q11660","display_name":"Artificial intelligence","level":1,"score":0.4893999993801117},{"id":"https://openalex.org/C50644808","wikidata":"https://www.wikidata.org/wiki/Q192776","display_name":"Artificial neural network","level":2,"score":0.46239998936653137},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.44769999384880066},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.36489999294281006},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.3517000079154968},{"id":"https://openalex.org/C153180895","wikidata":"https://www.wikidata.org/wiki/Q7148389","display_name":"Pattern recognition (psychology)","level":2,"score":0.32690000534057617},{"id":"https://openalex.org/C31972630","wikidata":"https://www.wikidata.org/wiki/Q844240","display_name":"Computer vision","level":1,"score":0.31779998540878296},{"id":"https://openalex.org/C11413529","wikidata":"https://www.wikidata.org/wiki/Q8366","display_name":"Algorithm","level":1,"score":0.313400000333786},{"id":"https://openalex.org/C182873914","wikidata":"https://www.wikidata.org/wiki/Q5157329","display_name":"Computational lithography","level":5,"score":0.289900004863739},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.271699994802475},{"id":"https://openalex.org/C108583219","wikidata":"https://www.wikidata.org/wiki/Q197536","display_name":"Deep learning","level":2,"score":0.2687000036239624},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.2599000036716461},{"id":"https://openalex.org/C99498987","wikidata":"https://www.wikidata.org/wiki/Q2210247","display_name":"Noise (video)","level":3,"score":0.25589999556541443}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/apccas67402.2025.11378293","is_oa":false,"landing_page_url":"https://doi.org/10.1109/apccas67402.2025.11378293","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2025 IEEE Asia Pacific Conference on Circuits and Systems (APCCAS)","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":21,"referenced_works":["https://openalex.org/W1594489858","https://openalex.org/W2149602086","https://openalex.org/W2545512137","https://openalex.org/W2558069187","https://openalex.org/W2584977578","https://openalex.org/W3089295587","https://openalex.org/W3131298955","https://openalex.org/W3198499620","https://openalex.org/W3204784258","https://openalex.org/W4281560905","https://openalex.org/W4306176367","https://openalex.org/W4367307962","https://openalex.org/W4380786438","https://openalex.org/W4386763932","https://openalex.org/W4388867577","https://openalex.org/W4390493952","https://openalex.org/W4394599867","https://openalex.org/W4399573072","https://openalex.org/W4409154790","https://openalex.org/W4409655270","https://openalex.org/W4410276399"],"related_works":[],"abstract_inverted_index":null,"counts_by_year":[],"updated_date":"2026-06-11T09:08:48.828518","created_date":"2026-02-20T00:00:00"}