{"id":"https://openalex.org/W4409882774","doi":"https://doi.org/10.1109/access.2025.3565002","title":"Novel Multi-Scale Attention Generative Adversarial Network for Photovoltaic Solar Cell Defect Inspection Using Electroluminescence Images","display_name":"Novel Multi-Scale Attention Generative Adversarial Network for Photovoltaic Solar Cell Defect Inspection Using Electroluminescence Images","publication_year":2025,"publication_date":"2025-01-01","ids":{"openalex":"https://openalex.org/W4409882774","doi":"https://doi.org/10.1109/access.2025.3565002"},"language":"en","primary_location":{"id":"doi:10.1109/access.2025.3565002","is_oa":true,"landing_page_url":"https://doi.org/10.1109/access.2025.3565002","pdf_url":null,"source":{"id":"https://openalex.org/S2485537415","display_name":"IEEE Access","issn_l":"2169-3536","issn":["2169-3536"],"is_oa":true,"is_in_doaj":true,"is_core":true,"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"journal"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEEE Access","raw_type":"journal-article"},"type":"article","indexed_in":["crossref","doaj"],"open_access":{"is_oa":true,"oa_status":"gold","oa_url":"https://doi.org/10.1109/access.2025.3565002","any_repository_has_fulltext":true},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5111208302","display_name":"Yuanjun Guan","orcid":null},"institutions":[{"id":"https://openalex.org/I113940042","display_name":"Shanghai University","ror":"https://ror.org/006teas31","country_code":"CN","type":"education","lineage":["https://openalex.org/I113940042"]}],"countries":["CN"],"is_corresponding":true,"raw_author_name":"Yuanjun Guan","raw_affiliation_strings":["School of Microelectronics, Shanghai University, Shanghai, China"],"affiliations":[{"raw_affiliation_string":"School of Microelectronics, Shanghai University, Shanghai, China","institution_ids":["https://openalex.org/I113940042"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5103076718","display_name":"Yang Liu","orcid":"https://orcid.org/0009-0005-6017-7582"},"institutions":[{"id":"https://openalex.org/I113940042","display_name":"Shanghai University","ror":"https://ror.org/006teas31","country_code":"CN","type":"education","lineage":["https://openalex.org/I113940042"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Yang Liu","raw_affiliation_strings":["School of Microelectronics, Shanghai University, Shanghai, China"],"affiliations":[{"raw_affiliation_string":"School of Microelectronics, Shanghai University, Shanghai, China","institution_ids":["https://openalex.org/I113940042"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5108128673","display_name":"Jiayi Wang","orcid":null},"institutions":[{"id":"https://openalex.org/I113940042","display_name":"Shanghai University","ror":"https://ror.org/006teas31","country_code":"CN","type":"education","lineage":["https://openalex.org/I113940042"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Jiayi Wang","raw_affiliation_strings":["School of Microelectronics, Shanghai University, Shanghai, China"],"affiliations":[{"raw_affiliation_string":"School of Microelectronics, Shanghai University, Shanghai, China","institution_ids":["https://openalex.org/I113940042"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5038814130","display_name":"Tao Wang","orcid":"https://orcid.org/0009-0007-1188-666X"},"institutions":[{"id":"https://openalex.org/I113940042","display_name":"Shanghai University","ror":"https://ror.org/006teas31","country_code":"CN","type":"education","lineage":["https://openalex.org/I113940042"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Tao Wang","raw_affiliation_strings":["School of Microelectronics, Shanghai University, Shanghai, China"],"affiliations":[{"raw_affiliation_string":"School of Microelectronics, Shanghai University, Shanghai, China","institution_ids":["https://openalex.org/I113940042"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5108934379","display_name":"Qianchuan Yi","orcid":null},"institutions":[{"id":"https://openalex.org/I113940042","display_name":"Shanghai University","ror":"https://ror.org/006teas31","country_code":"CN","type":"education","lineage":["https://openalex.org/I113940042"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Qianchuan Yi","raw_affiliation_strings":["School of Microelectronics, Shanghai University, Shanghai, China"],"affiliations":[{"raw_affiliation_string":"School of Microelectronics, Shanghai University, Shanghai, China","institution_ids":["https://openalex.org/I113940042"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5026463384","display_name":"Wenxin Jiang","orcid":"https://orcid.org/0000-0003-2608-8576"},"institutions":[{"id":"https://openalex.org/I113940042","display_name":"Shanghai University","ror":"https://ror.org/006teas31","country_code":"CN","type":"education","lineage":["https://openalex.org/I113940042"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Wenxin Jiang","raw_affiliation_strings":["School of Microelectronics, Shanghai University, Shanghai, China"],"affiliations":[{"raw_affiliation_string":"School of Microelectronics, Shanghai University, Shanghai, China","institution_ids":["https://openalex.org/I113940042"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5101364005","display_name":"Xiaopu Gu","orcid":null},"institutions":[{"id":"https://openalex.org/I113940042","display_name":"Shanghai University","ror":"https://ror.org/006teas31","country_code":"CN","type":"education","lineage":["https://openalex.org/I113940042"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Xiaopu Gu","raw_affiliation_strings":["School of Microelectronics, Shanghai University, Shanghai, China"],"affiliations":[{"raw_affiliation_string":"School of Microelectronics, Shanghai University, Shanghai, China","institution_ids":["https://openalex.org/I113940042"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100341417","display_name":"Yichen Zhang","orcid":"https://orcid.org/0000-0002-6162-4066"},"institutions":[{"id":"https://openalex.org/I4210146919","display_name":"Shanghai Industrial Technology Institute","ror":"https://ror.org/03j1pdd39","country_code":"CN","type":"facility","lineage":["https://openalex.org/I4210146919"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Yichen Zhang","raw_affiliation_strings":["Shanghai Industrial &#x03BC; Technology Research Institute, Shanghai, China","Shanghai Industrial &#x03BC;Technology Research Institute, Shanghai, China"],"affiliations":[{"raw_affiliation_string":"Shanghai Industrial &#x03BC; Technology Research Institute, Shanghai, China","institution_ids":["https://openalex.org/I4210146919"]},{"raw_affiliation_string":"Shanghai Industrial &#x03BC;Technology Research Institute, Shanghai, China","institution_ids":["https://openalex.org/I4210146919"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5032012513","display_name":"Zhang Li","orcid":"https://orcid.org/0000-0002-0121-0187"},"institutions":[{"id":"https://openalex.org/I4210146919","display_name":"Shanghai Industrial Technology Institute","ror":"https://ror.org/03j1pdd39","country_code":"CN","type":"facility","lineage":["https://openalex.org/I4210146919"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Li Zhang","raw_affiliation_strings":["Shanghai Industrial &#x03BC; Technology Research Institute, Shanghai, China","Shanghai Industrial &#x03BC;Technology Research Institute, Shanghai, China"],"affiliations":[{"raw_affiliation_string":"Shanghai Industrial &#x03BC; Technology Research Institute, Shanghai, China","institution_ids":["https://openalex.org/I4210146919"]},{"raw_affiliation_string":"Shanghai Industrial &#x03BC;Technology Research Institute, Shanghai, China","institution_ids":["https://openalex.org/I4210146919"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5000097879","display_name":"Tianyan Han","orcid":null},"institutions":[{"id":"https://openalex.org/I4210146919","display_name":"Shanghai Industrial Technology Institute","ror":"https://ror.org/03j1pdd39","country_code":"CN","type":"facility","lineage":["https://openalex.org/I4210146919"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Tianyan Han","raw_affiliation_strings":["Shanghai Industrial &#x03BC; Technology Research Institute, Shanghai, China","Shanghai Industrial &#x03BC;Technology Research Institute, Shanghai, China"],"affiliations":[{"raw_affiliation_string":"Shanghai Industrial &#x03BC; Technology Research Institute, Shanghai, China","institution_ids":["https://openalex.org/I4210146919"]},{"raw_affiliation_string":"Shanghai Industrial &#x03BC;Technology Research Institute, Shanghai, China","institution_ids":["https://openalex.org/I4210146919"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5101581226","display_name":"Binbing Huang","orcid":"https://orcid.org/0000-0001-9011-7752"},"institutions":[{"id":"https://openalex.org/I4210146919","display_name":"Shanghai Industrial Technology Institute","ror":"https://ror.org/03j1pdd39","country_code":"CN","type":"facility","lineage":["https://openalex.org/I4210146919"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Binbing Huang","raw_affiliation_strings":["Shanghai Industrial &#x03BC; Technology Research Institute, Shanghai, China","Shanghai Industrial &#x03BC;Technology Research Institute, Shanghai, China"],"affiliations":[{"raw_affiliation_string":"Shanghai Industrial &#x03BC; Technology Research Institute, Shanghai, China","institution_ids":["https://openalex.org/I4210146919"]},{"raw_affiliation_string":"Shanghai Industrial &#x03BC;Technology Research Institute, Shanghai, China","institution_ids":["https://openalex.org/I4210146919"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5073732340","display_name":"Lilei Hu","orcid":"https://orcid.org/0000-0002-8493-2440"},"institutions":[{"id":"https://openalex.org/I113940042","display_name":"Shanghai University","ror":"https://ror.org/006teas31","country_code":"CN","type":"education","lineage":["https://openalex.org/I113940042"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Lilei Hu","raw_affiliation_strings":["School of Microelectronics, Shanghai University, Shanghai, China"],"affiliations":[{"raw_affiliation_string":"School of Microelectronics, Shanghai University, Shanghai, China","institution_ids":["https://openalex.org/I113940042"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":12,"corresponding_author_ids":["https://openalex.org/A5111208302"],"corresponding_institution_ids":["https://openalex.org/I113940042"],"apc_list":{"value":1850,"currency":"USD","value_usd":1850},"apc_paid":{"value":1850,"currency":"USD","value_usd":1850},"fwci":4.978,"has_fulltext":false,"cited_by_count":4,"citation_normalized_percentile":{"value":0.94741904,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":91,"max":100},"biblio":{"volume":"13","issue":null,"first_page":"84409","last_page":"84423"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T12111","display_name":"Industrial Vision Systems and Defect Detection","score":0.9977999925613403,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T12111","display_name":"Industrial Vision Systems and Defect Detection","score":0.9977999925613403,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10624","display_name":"Silicon and Solar Cell Technologies","score":0.9442999958992004,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/photovoltaic-system","display_name":"Photovoltaic system","score":0.7612447738647461},{"id":"https://openalex.org/keywords/electroluminescence","display_name":"Electroluminescence","score":0.7337181568145752},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.5453044176101685},{"id":"https://openalex.org/keywords/scale","display_name":"Scale (ratio)","score":0.49811697006225586},{"id":"https://openalex.org/keywords/adversarial-system","display_name":"Adversarial system","score":0.4845351576805115},{"id":"https://openalex.org/keywords/artificial-intelligence","display_name":"Artificial intelligence","score":0.4820626378059387},{"id":"https://openalex.org/keywords/generative-adversarial-network","display_name":"Generative adversarial network","score":0.4595135748386383},{"id":"https://openalex.org/keywords/solar-cell","display_name":"Solar cell","score":0.4390602111816406},{"id":"https://openalex.org/keywords/computer-vision","display_name":"Computer vision","score":0.40487784147262573},{"id":"https://openalex.org/keywords/pattern-recognition","display_name":"Pattern recognition (psychology)","score":0.33685725927352905},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.32499271631240845},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.3099306523799896},{"id":"https://openalex.org/keywords/image","display_name":"Image (mathematics)","score":0.19196325540542603},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.19065043330192566},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.10703656077384949},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.09119126200675964},{"id":"https://openalex.org/keywords/cartography","display_name":"Cartography","score":0.06990841031074524}],"concepts":[{"id":"https://openalex.org/C41291067","wikidata":"https://www.wikidata.org/wiki/Q1897785","display_name":"Photovoltaic system","level":2,"score":0.7612447738647461},{"id":"https://openalex.org/C31625292","wikidata":"https://www.wikidata.org/wiki/Q215803","display_name":"Electroluminescence","level":3,"score":0.7337181568145752},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.5453044176101685},{"id":"https://openalex.org/C2778755073","wikidata":"https://www.wikidata.org/wiki/Q10858537","display_name":"Scale (ratio)","level":2,"score":0.49811697006225586},{"id":"https://openalex.org/C37736160","wikidata":"https://www.wikidata.org/wiki/Q1801315","display_name":"Adversarial system","level":2,"score":0.4845351576805115},{"id":"https://openalex.org/C154945302","wikidata":"https://www.wikidata.org/wiki/Q11660","display_name":"Artificial intelligence","level":1,"score":0.4820626378059387},{"id":"https://openalex.org/C2988773926","wikidata":"https://www.wikidata.org/wiki/Q25104379","display_name":"Generative adversarial network","level":3,"score":0.4595135748386383},{"id":"https://openalex.org/C2780824857","wikidata":"https://www.wikidata.org/wiki/Q58803","display_name":"Solar cell","level":2,"score":0.4390602111816406},{"id":"https://openalex.org/C31972630","wikidata":"https://www.wikidata.org/wiki/Q844240","display_name":"Computer vision","level":1,"score":0.40487784147262573},{"id":"https://openalex.org/C153180895","wikidata":"https://www.wikidata.org/wiki/Q7148389","display_name":"Pattern recognition (psychology)","level":2,"score":0.33685725927352905},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.32499271631240845},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.3099306523799896},{"id":"https://openalex.org/C115961682","wikidata":"https://www.wikidata.org/wiki/Q860623","display_name":"Image (mathematics)","level":2,"score":0.19196325540542603},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.19065043330192566},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.10703656077384949},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.09119126200675964},{"id":"https://openalex.org/C58640448","wikidata":"https://www.wikidata.org/wiki/Q42515","display_name":"Cartography","level":1,"score":0.06990841031074524},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C205649164","wikidata":"https://www.wikidata.org/wiki/Q1071","display_name":"Geography","level":0,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1109/access.2025.3565002","is_oa":true,"landing_page_url":"https://doi.org/10.1109/access.2025.3565002","pdf_url":null,"source":{"id":"https://openalex.org/S2485537415","display_name":"IEEE Access","issn_l":"2169-3536","issn":["2169-3536"],"is_oa":true,"is_in_doaj":true,"is_core":true,"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"journal"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEEE Access","raw_type":"journal-article"},{"id":"pmh:oai:doaj.org/article:6cf97b0faa524af2ae83b7a8ed8a5288","is_oa":true,"landing_page_url":"https://doaj.org/article/6cf97b0faa524af2ae83b7a8ed8a5288","pdf_url":null,"source":{"id":"https://openalex.org/S112646816","display_name":"SHILAP Revista de lepidopterolog\u00eda","issn_l":"0300-5267","issn":["0300-5267","2340-4078"],"is_oa":true,"is_in_doaj":true,"is_core":false,"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"journal"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"IEEE Access, Vol 13, Pp 84409-84423 (2025)","raw_type":"article"}],"best_oa_location":{"id":"doi:10.1109/access.2025.3565002","is_oa":true,"landing_page_url":"https://doi.org/10.1109/access.2025.3565002","pdf_url":null,"source":{"id":"https://openalex.org/S2485537415","display_name":"IEEE Access","issn_l":"2169-3536","issn":["2169-3536"],"is_oa":true,"is_in_doaj":true,"is_core":true,"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"journal"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEEE Access","raw_type":"journal-article"},"sustainable_development_goals":[{"id":"https://metadata.un.org/sdg/7","display_name":"Affordable and clean energy","score":0.6299999952316284}],"awards":[{"id":"https://openalex.org/G8315272109","display_name":null,"funder_award_id":"21QB1405700","funder_id":"https://openalex.org/F4320327803","funder_display_name":"Shanghai Rising-Star Program"}],"funders":[{"id":"https://openalex.org/F4320327803","display_name":"Shanghai Rising-Star Program","ror":null}],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":51,"referenced_works":["https://openalex.org/W2071448691","https://openalex.org/W2073967810","https://openalex.org/W2112796928","https://openalex.org/W2168063894","https://openalex.org/W2183341477","https://openalex.org/W2267186426","https://openalex.org/W2379354547","https://openalex.org/W2507112645","https://openalex.org/W2537458122","https://openalex.org/W2618530766","https://openalex.org/W2622064152","https://openalex.org/W2784855686","https://openalex.org/W2825063406","https://openalex.org/W2884585870","https://openalex.org/W2902792509","https://openalex.org/W2903179760","https://openalex.org/W2911976798","https://openalex.org/W2938075888","https://openalex.org/W2962770929","https://openalex.org/W2962793481","https://openalex.org/W2963073614","https://openalex.org/W2963470893","https://openalex.org/W2964024144","https://openalex.org/W2964216930","https://openalex.org/W2980326480","https://openalex.org/W2986227107","https://openalex.org/W3008653537","https://openalex.org/W3040739812","https://openalex.org/W3125741799","https://openalex.org/W3162418282","https://openalex.org/W3176636832","https://openalex.org/W3177052299","https://openalex.org/W3197038975","https://openalex.org/W4223943717","https://openalex.org/W4285604868","https://openalex.org/W4290725607","https://openalex.org/W4377143297","https://openalex.org/W4386994537","https://openalex.org/W4391051783","https://openalex.org/W4398198026","https://openalex.org/W6685352114","https://openalex.org/W6729482032","https://openalex.org/W6735913928","https://openalex.org/W6745560452","https://openalex.org/W6746638498","https://openalex.org/W6748582592","https://openalex.org/W6748655329","https://openalex.org/W6763113603","https://openalex.org/W6765779288","https://openalex.org/W6779823529","https://openalex.org/W6779841522"],"related_works":["https://openalex.org/W2150038201","https://openalex.org/W2502115930","https://openalex.org/W940975362","https://openalex.org/W1976110942","https://openalex.org/W2038762453","https://openalex.org/W2482350142","https://openalex.org/W4246396837","https://openalex.org/W3126451824","https://openalex.org/W4205934534","https://openalex.org/W2382302308"],"abstract_inverted_index":{"In":[0],"the":[1,18,78,94,139,142,169,191,221,285],"pursuit":[2],"of":[3,20,55,80,98,107,116,134,141,205,224,231,236,258],"promoting":[4],"green":[5],"energy,":[6],"efficient":[7],"defect":[8,31,83,129,251,282],"inspection":[9,32,283],"in":[10,16,33,42,77,138,173,250,275,284],"solar":[11,21,81,276],"cell":[12,36,82,277],"manufacturing":[13],"is":[14,208],"crucial":[15],"enhancing":[17],"reliability":[19],"energy":[22],"systems.":[23],"However,":[24],"traditional":[25],"deep":[26,215],"learning":[27,121,216],"models":[28,244],"for":[29,74,103,118],"automatic":[30],"photovoltaic":[34],"(PV)":[35],"electroluminescence":[37],"(EL)":[38],"images":[39,117],"encounter":[40],"challenges":[41],"industrial":[43,286],"settings":[44],"due":[45],"to":[46,111,266],"difficulties":[47],"associated":[48],"with":[49,87,196],"data":[50,75,247,268],"acquisition,":[51],"imbalance,":[52],"and":[53,96,126,148,163,233,245],"variability":[54],"defects.":[56],"This":[57,270],"paper":[58],"presents":[59],"a":[60,113,197,227,263],"novel":[61],"Multi-Scale":[62],"Attention":[63,146,152],"Generative":[64],"Adversarial":[65],"Network":[66],"(MAGAN),":[67],"an":[68,254],"innovative":[69],"GAN-based":[70],"framework":[71],"specifically":[72],"designed":[73],"augmentation":[76],"context":[79],"detection.":[84,252],"When":[85],"integrated":[86],"automated":[88],"detection":[89,256],"techniques,":[90],"MAGAN":[91],"markedly":[92],"improves":[93],"accuracy":[95,257],"efficiency":[97],"current":[99],"models.":[100,217],"A":[101],"method":[102,271],"augmenting":[104],"image":[105],"datasets":[106],"EL":[108,240],"was":[109],"developed":[110],"generate":[112],"sufficient":[114],"quantity":[115],"training":[119],"machine":[120],"models,":[122],"addressing":[123],"sample":[124],"scarcity":[125],"bolstering":[127],"CNN-based":[128],"classification":[130],"accuracy.":[131],"The":[132,177,203,218],"core":[133],"this":[135,206,260],"approach":[136,207],"lies":[137],"application":[140],"MCA":[143,178],"(Multi-channel":[144],"Spatial":[145,151],"Mechanism)":[147,153],"GLSA":[149,192],"(Gate-like":[150],"modules,":[154],"which":[155],"enhance":[156],"feature":[157],"extraction":[158],"by":[159,210],"leveraging":[160],"channel":[161],"attention":[162,174,188],"spatial":[164,194],"attention,":[165],"respectively,":[166],"thereby":[167],"reflecting":[168],"most":[170],"recent":[171],"advancements":[172],"mechanism":[175],"technology.":[176],"dissects":[179],"channels":[180],"into":[181],"sub-features":[182],"across":[183],"various":[184],"scales,":[185],"ensuring":[186],"detailed":[187],"mapping,":[189],"whereas":[190],"refines":[193],"cues":[195],"gating":[198],"mechanism,":[199],"shedding":[200],"computational":[201],"inefficiencies.":[202],"effectiveness":[204],"validated":[209],"comprehensive":[211],"experiments":[212,219],"against":[213],"state-of-the-art":[214],"demonstrate":[220],"exceptional":[222],"performance":[223],"MAGAN,":[225],"achieving":[226],"low":[228],"FID":[229],"score":[230,235],"141.98":[232],"KID":[234],"0.106":[237],"on":[238],"complex":[239],"images,":[241],"surpassing":[242],"previous":[243],"emphasizing":[246],"augmentation\u2019s":[248],"importance":[249],"With":[253],"industry-leading":[255],"87.3%,":[259],"study":[261],"makes":[262],"substantial":[264],"contribution":[265],"mitigating":[267],"imbalance.":[269],"enhances":[272],"quality":[273],"control":[274],"manufacturing.":[278],"Additionally,":[279],"it":[280],"advances":[281],"semiconductor":[287],"sector.":[288]},"counts_by_year":[{"year":2026,"cited_by_count":3},{"year":2025,"cited_by_count":1}],"updated_date":"2026-03-27T05:58:40.876381","created_date":"2025-10-10T00:00:00"}
