{"id":"https://openalex.org/W4396753485","doi":"https://doi.org/10.1109/access.2024.3397923","title":"Design and Analysis of a New Excitation Structure for Magnetron Sputtering","display_name":"Design and Analysis of a New Excitation Structure for Magnetron Sputtering","publication_year":2024,"publication_date":"2024-01-01","ids":{"openalex":"https://openalex.org/W4396753485","doi":"https://doi.org/10.1109/access.2024.3397923"},"language":"en","primary_location":{"id":"doi:10.1109/access.2024.3397923","is_oa":true,"landing_page_url":"http://dx.doi.org/10.1109/access.2024.3397923","pdf_url":"https://ieeexplore.ieee.org/ielx7/6287639/6514899/10526228.pdf","source":{"id":"https://openalex.org/S2485537415","display_name":"IEEE Access","issn_l":"2169-3536","issn":["2169-3536"],"is_oa":true,"is_in_doaj":true,"is_core":true,"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEEE Access","raw_type":"journal-article"},"type":"article","indexed_in":["crossref","doaj"],"open_access":{"is_oa":true,"oa_status":"gold","oa_url":"https://ieeexplore.ieee.org/ielx7/6287639/6514899/10526228.pdf","any_repository_has_fulltext":true},"authorships":[{"author_position":"first","author":{"id":null,"display_name":"Ze-da Su","orcid":"https://orcid.org/0009-0006-5271-930X"},"institutions":[{"id":"https://openalex.org/I157507598","display_name":"Shenyang University of Technology","ror":"https://ror.org/00d7f8730","country_code":"CN","type":"education","lineage":["https://openalex.org/I157507598"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Ze-da Su","raw_affiliation_strings":["School of Electrical Engineering, Shenyang University of Technology, Shenyang, China"],"raw_orcid":"https://orcid.org/0009-0006-5271-930X","affiliations":[{"raw_affiliation_string":"School of Electrical Engineering, Shenyang University of Technology, Shenyang, China","institution_ids":["https://openalex.org/I157507598"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100294155","display_name":"Yuejun An","orcid":null},"institutions":[{"id":"https://openalex.org/I157507598","display_name":"Shenyang University of Technology","ror":"https://ror.org/00d7f8730","country_code":"CN","type":"education","lineage":["https://openalex.org/I157507598"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Yue-Jun An","raw_affiliation_strings":["School of Electrical Engineering, Shenyang University of Technology, Shenyang, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"School of Electrical Engineering, Shenyang University of Technology, Shenyang, China","institution_ids":["https://openalex.org/I157507598"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5102210255","display_name":"Hui An","orcid":null},"institutions":[{"id":"https://openalex.org/I157507598","display_name":"Shenyang University of Technology","ror":"https://ror.org/00d7f8730","country_code":"CN","type":"education","lineage":["https://openalex.org/I157507598"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Hui An","raw_affiliation_strings":["School of Electrical Engineering, Shenyang University of Technology, Shenyang, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"School of Electrical Engineering, Shenyang University of Technology, Shenyang, China","institution_ids":["https://openalex.org/I157507598"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5101350528","display_name":"Yanjun Lu","orcid":null},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Yan-Jun Lu","raw_affiliation_strings":["Shenyang KINGSEMI Company Ltd., Shenyang, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Shenyang KINGSEMI Company Ltd., Shenyang, China","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5020705435","display_name":"Wenyu Deng","orcid":"https://orcid.org/0000-0003-0986-801X"},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Wen-Yu Deng","raw_affiliation_strings":["Shenyang China North Vacuum Equipment Company Ltd., Shenyang, China"],"raw_orcid":"https://orcid.org/0000-0003-0986-801X","affiliations":[{"raw_affiliation_string":"Shenyang China North Vacuum Equipment Company Ltd., Shenyang, China","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5001710209","display_name":"Lijun Qi","orcid":"https://orcid.org/0000-0001-5223-1757"},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Li-Jun Qi","raw_affiliation_strings":["Shenyang China North Vacuum Equipment Company Ltd., Shenyang, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Shenyang China North Vacuum Equipment Company Ltd., Shenyang, China","institution_ids":[]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5101487471","display_name":"Ming Li","orcid":"https://orcid.org/0000-0002-2170-5865"},"institutions":[{"id":"https://openalex.org/I157507598","display_name":"Shenyang University of Technology","ror":"https://ror.org/00d7f8730","country_code":"CN","type":"education","lineage":["https://openalex.org/I157507598"]},{"id":"https://openalex.org/I97009856","display_name":"Bohai University","ror":"https://ror.org/01kdzej58","country_code":"CN","type":"education","lineage":["https://openalex.org/I97009856"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Ming Li","raw_affiliation_strings":["College of Control Science and Engineering, Bohai University, Jinzhou, China","College of control science and Engineering, Bohai University, Jinzhou, China","School of Electrical Engineering, Shenyang University of Technology, Shenyang, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"College of Control Science and Engineering, Bohai University, Jinzhou, China","institution_ids":["https://openalex.org/I97009856"]},{"raw_affiliation_string":"College of control science and Engineering, Bohai University, Jinzhou, China","institution_ids":["https://openalex.org/I97009856"]},{"raw_affiliation_string":"School of Electrical Engineering, Shenyang University of Technology, Shenyang, China","institution_ids":["https://openalex.org/I157507598"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":{"value":1850,"currency":"USD","value_usd":1850},"apc_paid":{"value":1850,"currency":"USD","value_usd":1850},"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.06064495,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"12","issue":null,"first_page":"70792","last_page":"70809"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10377","display_name":"Metal and Thin Film Mechanics","score":0.9998000264167786,"subfield":{"id":"https://openalex.org/subfields/2211","display_name":"Mechanics of Materials"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10377","display_name":"Metal and Thin Film Mechanics","score":0.9998000264167786,"subfield":{"id":"https://openalex.org/subfields/2211","display_name":"Mechanics of Materials"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10781","display_name":"Plasma Diagnostics and Applications","score":0.9998000264167786,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11603","display_name":"Dust and Plasma Wave Phenomena","score":0.998199999332428,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/sputter-deposition","display_name":"Sputter deposition","score":0.7231691479682922},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.6973708868026733},{"id":"https://openalex.org/keywords/excitation","display_name":"Excitation","score":0.6498223543167114},{"id":"https://openalex.org/keywords/sputtering","display_name":"Sputtering","score":0.6468324065208435},{"id":"https://openalex.org/keywords/magnetic-field","display_name":"Magnetic field","score":0.6237748861312866},{"id":"https://openalex.org/keywords/cavity-magnetron","display_name":"Cavity magnetron","score":0.575415849685669},{"id":"https://openalex.org/keywords/solenoid","display_name":"Solenoid","score":0.5359784960746765},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.4243602752685547},{"id":"https://openalex.org/keywords/computational-physics","display_name":"Computational physics","score":0.3670923709869385},{"id":"https://openalex.org/keywords/electronic-engineering","display_name":"Electronic engineering","score":0.3657442331314087},{"id":"https://openalex.org/keywords/nuclear-magnetic-resonance","display_name":"Nuclear magnetic resonance","score":0.34225887060165405},{"id":"https://openalex.org/keywords/mechanical-engineering","display_name":"Mechanical engineering","score":0.29151004552841187},{"id":"https://openalex.org/keywords/thin-film","display_name":"Thin film","score":0.2252727746963501},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.18007227778434753},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.15924957394599915},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.15174338221549988},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.1324889063835144}],"concepts":[{"id":"https://openalex.org/C61427134","wikidata":"https://www.wikidata.org/wiki/Q847609","display_name":"Sputter deposition","level":4,"score":0.7231691479682922},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6973708868026733},{"id":"https://openalex.org/C83581075","wikidata":"https://www.wikidata.org/wiki/Q1361503","display_name":"Excitation","level":2,"score":0.6498223543167114},{"id":"https://openalex.org/C22423302","wikidata":"https://www.wikidata.org/wiki/Q898444","display_name":"Sputtering","level":3,"score":0.6468324065208435},{"id":"https://openalex.org/C115260700","wikidata":"https://www.wikidata.org/wiki/Q11408","display_name":"Magnetic field","level":2,"score":0.6237748861312866},{"id":"https://openalex.org/C123408415","wikidata":"https://www.wikidata.org/wiki/Q194154","display_name":"Cavity magnetron","level":4,"score":0.575415849685669},{"id":"https://openalex.org/C192144188","wikidata":"https://www.wikidata.org/wiki/Q245739","display_name":"Solenoid","level":2,"score":0.5359784960746765},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.4243602752685547},{"id":"https://openalex.org/C30475298","wikidata":"https://www.wikidata.org/wiki/Q909554","display_name":"Computational physics","level":1,"score":0.3670923709869385},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.3657442331314087},{"id":"https://openalex.org/C46141821","wikidata":"https://www.wikidata.org/wiki/Q209402","display_name":"Nuclear magnetic resonance","level":1,"score":0.34225887060165405},{"id":"https://openalex.org/C78519656","wikidata":"https://www.wikidata.org/wiki/Q101333","display_name":"Mechanical engineering","level":1,"score":0.29151004552841187},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.2252727746963501},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.18007227778434753},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.15924957394599915},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.15174338221549988},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.1324889063835144},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1109/access.2024.3397923","is_oa":true,"landing_page_url":"http://dx.doi.org/10.1109/access.2024.3397923","pdf_url":"https://ieeexplore.ieee.org/ielx7/6287639/6514899/10526228.pdf","source":{"id":"https://openalex.org/S2485537415","display_name":"IEEE Access","issn_l":"2169-3536","issn":["2169-3536"],"is_oa":true,"is_in_doaj":true,"is_core":true,"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEEE Access","raw_type":"journal-article"},{"id":"pmh:oai:doaj.org/article:112df6ea100d42a1a8de28c13fd44f8f","is_oa":true,"landing_page_url":"https://doaj.org/article/112df6ea100d42a1a8de28c13fd44f8f","pdf_url":null,"source":{"id":"https://openalex.org/S4306401280","display_name":"DOAJ (DOAJ: Directory of Open Access Journals)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"repository"},"license":"cc-by-sa","license_id":"https://openalex.org/licenses/cc-by-sa","version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"IEEE Access, Vol 12, Pp 70792-70809 (2024)","raw_type":"article"}],"best_oa_location":{"id":"doi:10.1109/access.2024.3397923","is_oa":true,"landing_page_url":"http://dx.doi.org/10.1109/access.2024.3397923","pdf_url":"https://ieeexplore.ieee.org/ielx7/6287639/6514899/10526228.pdf","source":{"id":"https://openalex.org/S2485537415","display_name":"IEEE Access","issn_l":"2169-3536","issn":["2169-3536"],"is_oa":true,"is_in_doaj":true,"is_core":true,"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEEE Access","raw_type":"journal-article"},"sustainable_development_goals":[{"score":0.5299999713897705,"display_name":"Industry, innovation and infrastructure","id":"https://metadata.un.org/sdg/9"}],"awards":[{"id":"https://openalex.org/G4550296922","display_name":null,"funder_award_id":"2023JH1/11100010","funder_id":"https://openalex.org/F4320322872","funder_display_name":"University of Science and Technology Liaoning"}],"funders":[{"id":"https://openalex.org/F4320322872","display_name":"University of Science and Technology Liaoning","ror":"https://ror.org/03grx7119"}],"has_content":{"pdf":true,"grobid_xml":false},"content_urls":{"pdf":"https://content.openalex.org/works/W4396753485.pdf"},"referenced_works_count":29,"referenced_works":["https://openalex.org/W1744144345","https://openalex.org/W1992159767","https://openalex.org/W2002351889","https://openalex.org/W2020853633","https://openalex.org/W2056516748","https://openalex.org/W2078881785","https://openalex.org/W2127907255","https://openalex.org/W2146529379","https://openalex.org/W2297598342","https://openalex.org/W2320040623","https://openalex.org/W2470453259","https://openalex.org/W2508207961","https://openalex.org/W2512643668","https://openalex.org/W2768060323","https://openalex.org/W2791512413","https://openalex.org/W2887270813","https://openalex.org/W2913807794","https://openalex.org/W2914364078","https://openalex.org/W3013918313","https://openalex.org/W3085849249","https://openalex.org/W3095183165","https://openalex.org/W3152237168","https://openalex.org/W4206535306","https://openalex.org/W4313318091","https://openalex.org/W4321189473","https://openalex.org/W4321332411","https://openalex.org/W4362560173","https://openalex.org/W4367164518","https://openalex.org/W4386536237"],"related_works":["https://openalex.org/W2092364266","https://openalex.org/W3139358434","https://openalex.org/W2088091229","https://openalex.org/W2029460333","https://openalex.org/W2009023799","https://openalex.org/W4254148944","https://openalex.org/W3193980021","https://openalex.org/W3116458923","https://openalex.org/W2944705329","https://openalex.org/W1969786090"],"abstract_inverted_index":{"Magnetron":[0],"sputtering":[1,46,59,74,219],"systems":[2],"are":[3,61,76,110],"widely":[4],"used":[5],"for":[6,71,215],"depositing":[7],"industrially":[8],"important":[9],"coatings.":[10],"Research":[11],"has":[12],"been":[13],"conducted":[14],"to":[15,21,199],"optimize":[16],"and":[17,25,63,68,78,105,112,123,128,182,195,205],"improve":[18],"these":[19],"structures":[20,109],"increase":[22],"coating":[23],"effectiveness":[24,129],"target":[26,36,165,202],"utilization.":[27],"The":[28,48,80,94,114,133,167,187,209],"paper":[29],"investigates":[30],"the":[31,51,91,126,131,164,171,174,178,184,190,201],"engineering":[32],"problem":[33],"of":[34,50,90,130,149,157,163,173,177,192],"uneven":[35,41],"etching":[37],"caused":[38],"by":[39,57,87,100],"an":[40,101,146],"magnetic":[42,53,82,96,142,150,179,185],"field":[43,54,83,97],"in":[44],"magnetron":[45,58,73,218],"equipment.":[47,220],"characteristics":[49],"desired":[52],"distribution":[55,172,194],"required":[56],"equipment":[60,75],"analyzed,":[62],"a":[64,140,154,213],"corresponding":[65],"excitation":[66,92,108,134],"structure":[67],"analytical":[69,88,115,168],"model":[70,169,188],"cylindrical":[72],"proposed":[77],"calculated.":[79],"uniform":[81,141],"design":[84],"is":[85,137],"realized":[86],"modeling":[89],"structure.":[93],"axial":[95,147,175],"distributions":[98],"produced":[99],"axisymmetric":[102],"solenoid":[103],"system":[104],"several":[106],"similar":[107],"analyzed":[111],"compared.":[113],"results":[116],"were":[117],"verified":[118],"through":[119],"finite":[120],"element":[121],"simulations":[122],"experiments,":[124],"demonstrating":[125],"accuracy":[127],"method.":[132],"structure,":[135],"which":[136],"designed":[138],"with":[139,153],"field,":[143],"can":[144],"produce":[145],"component":[148,176],"flux":[151,180],"density":[152,181],"uniformity":[155],"deviation":[156],"less":[158],"than":[159],"4.3%":[160],"across":[161],"73%":[162],"surface.":[166],"describes":[170],"optimizes":[183],"field.":[186],"enables":[189],"simulation":[191],"plasma":[193],"film":[196],"growth,":[197],"aiming":[198],"enhance":[200],"utilization":[203],"rate":[204],"substrate":[206],"deposition":[207],"rate.":[208],"conclusions":[210],"serve":[211],"as":[212],"reference":[214],"designing":[216],"high-performance":[217]},"counts_by_year":[],"updated_date":"2026-03-27T05:58:40.876381","created_date":"2025-10-10T00:00:00"}