{"id":"https://openalex.org/W3173930258","doi":"https://doi.org/10.1109/access.2021.3090468","title":"A Characterization Method of Thin Film Parameters Based on Adaptive Differential Evolution Algorithm","display_name":"A Characterization Method of Thin Film Parameters Based on Adaptive Differential Evolution Algorithm","publication_year":2021,"publication_date":"2021-01-01","ids":{"openalex":"https://openalex.org/W3173930258","doi":"https://doi.org/10.1109/access.2021.3090468","mag":"3173930258"},"language":"en","primary_location":{"id":"doi:10.1109/access.2021.3090468","is_oa":true,"landing_page_url":"https://doi.org/10.1109/access.2021.3090468","pdf_url":"https://ieeexplore.ieee.org/ielx7/6287639/9312710/09459694.pdf","source":{"id":"https://openalex.org/S2485537415","display_name":"IEEE Access","issn_l":"2169-3536","issn":["2169-3536"],"is_oa":true,"is_in_doaj":true,"is_core":true,"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"journal"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEEE Access","raw_type":"journal-article"},"type":"article","indexed_in":["crossref","doaj"],"open_access":{"is_oa":true,"oa_status":"gold","oa_url":"https://ieeexplore.ieee.org/ielx7/6287639/9312710/09459694.pdf","any_repository_has_fulltext":true},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5102913016","display_name":"Lihua Lei","orcid":"https://orcid.org/0000-0002-9289-603X"},"institutions":[{"id":"https://openalex.org/I4210105460","display_name":"Shanghai Institute of Measurement and Testing Technology","ror":"https://ror.org/00zcefp03","country_code":"CN","type":"nonprofit","lineage":["https://openalex.org/I4210105460"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Lihua Lei","raw_affiliation_strings":["Shanghai Institute of Measurement and Testing Technology, Shanghai, China","Shanghai Key Laboratory of Online Test and Control Technology, Shanghai, China"],"raw_orcid":"https://orcid.org/0000-0002-9289-603X","affiliations":[{"raw_affiliation_string":"Shanghai Institute of Measurement and Testing Technology, Shanghai, China","institution_ids":["https://openalex.org/I4210105460"]},{"raw_affiliation_string":"Shanghai Key Laboratory of Online Test and Control Technology, Shanghai, China","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5081469537","display_name":"Yuqing Guan","orcid":null},"institutions":[{"id":"https://openalex.org/I4210105460","display_name":"Shanghai Institute of Measurement and Testing Technology","ror":"https://ror.org/00zcefp03","country_code":"CN","type":"nonprofit","lineage":["https://openalex.org/I4210105460"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Yuqing Guan","raw_affiliation_strings":["Shanghai Institute of Measurement and Testing Technology, Shanghai, China","Shanghai Key Laboratory of Online Test and Control Technology, Shanghai, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Shanghai Institute of Measurement and Testing Technology, Shanghai, China","institution_ids":["https://openalex.org/I4210105460"]},{"raw_affiliation_string":"Shanghai Key Laboratory of Online Test and Control Technology, Shanghai, China","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5103825442","display_name":"Yanhua Zeng","orcid":null},"institutions":[{"id":"https://openalex.org/I4210105460","display_name":"Shanghai Institute of Measurement and Testing Technology","ror":"https://ror.org/00zcefp03","country_code":"CN","type":"nonprofit","lineage":["https://openalex.org/I4210105460"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Yanhua Zeng","raw_affiliation_strings":["Shanghai Institute of Measurement and Testing Technology, Shanghai, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Shanghai Institute of Measurement and Testing Technology, Shanghai, China","institution_ids":["https://openalex.org/I4210105460"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5045396189","display_name":"Lin Zhao","orcid":"https://orcid.org/0000-0003-2111-6611"},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Lin Zhao","raw_affiliation_strings":["The 13th Institute of CETC, Shijiazhuang, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"The 13th Institute of CETC, Shijiazhuang, China","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5088801748","display_name":"Zhangning Xie","orcid":"https://orcid.org/0000-0002-5318-4363"},"institutions":[{"id":"https://openalex.org/I4210105460","display_name":"Shanghai Institute of Measurement and Testing Technology","ror":"https://ror.org/00zcefp03","country_code":"CN","type":"nonprofit","lineage":["https://openalex.org/I4210105460"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Zhangning Xie","raw_affiliation_strings":["Shanghai Institute of Measurement and Testing Technology, Shanghai, China","Shanghai Key Laboratory of Online Test and Control Technology, Shanghai, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Shanghai Institute of Measurement and Testing Technology, Shanghai, China","institution_ids":["https://openalex.org/I4210105460"]},{"raw_affiliation_string":"Shanghai Key Laboratory of Online Test and Control Technology, Shanghai, China","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5047332038","display_name":"Zhiguo Han","orcid":"https://orcid.org/0000-0002-7146-2937"},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Zhiguo Han","raw_affiliation_strings":["The 13th Institute of CETC, Shijiazhuang, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"The 13th Institute of CETC, Shijiazhuang, China","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5076077788","display_name":"Chengming Cao","orcid":null},"institutions":[{"id":"https://openalex.org/I4210105460","display_name":"Shanghai Institute of Measurement and Testing Technology","ror":"https://ror.org/00zcefp03","country_code":"CN","type":"nonprofit","lineage":["https://openalex.org/I4210105460"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Chengming Cao","raw_affiliation_strings":["Shanghai Institute of Measurement and Testing Technology, Shanghai, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Shanghai Institute of Measurement and Testing Technology, Shanghai, China","institution_ids":["https://openalex.org/I4210105460"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5030159527","display_name":"Yunxia Fu","orcid":"https://orcid.org/0000-0001-9618-864X"},"institutions":[{"id":"https://openalex.org/I4210105460","display_name":"Shanghai Institute of Measurement and Testing Technology","ror":"https://ror.org/00zcefp03","country_code":"CN","type":"nonprofit","lineage":["https://openalex.org/I4210105460"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Yunxia Fu","raw_affiliation_strings":["Shanghai Institute of Measurement and Testing Technology, Shanghai, China","Shanghai Key Laboratory of Online Test and Control Technology, Shanghai, China"],"raw_orcid":"https://orcid.org/0000-0001-9618-864X","affiliations":[{"raw_affiliation_string":"Shanghai Institute of Measurement and Testing Technology, Shanghai, China","institution_ids":["https://openalex.org/I4210105460"]},{"raw_affiliation_string":"Shanghai Key Laboratory of Online Test and Control Technology, Shanghai, China","institution_ids":[]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":{"value":1850,"currency":"USD","value_usd":1850},"apc_paid":{"value":1850,"currency":"USD","value_usd":1850},"fwci":0.0772,"has_fulltext":true,"cited_by_count":3,"citation_normalized_percentile":{"value":0.31783068,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":90,"max":96},"biblio":{"volume":"9","issue":null,"first_page":"90231","last_page":"90243"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11723","display_name":"Optical Coatings and Gratings","score":0.9866999983787537,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11723","display_name":"Optical Coatings and Gratings","score":0.9866999983787537,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10623","display_name":"Thin-Film Transistor Technologies","score":0.9793999791145325,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12141","display_name":"Fluid Dynamics and Thin Films","score":0.9782999753952026,"subfield":{"id":"https://openalex.org/subfields/2206","display_name":"Computational Mechanics"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/characterization","display_name":"Characterization (materials science)","score":0.6711858510971069},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.6056632995605469},{"id":"https://openalex.org/keywords/algorithm","display_name":"Algorithm","score":0.5142404437065125},{"id":"https://openalex.org/keywords/differential","display_name":"Differential (mechanical device)","score":0.4464676082134247},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.21693450212478638},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.11367526650428772},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.06949940323829651}],"concepts":[{"id":"https://openalex.org/C2780841128","wikidata":"https://www.wikidata.org/wiki/Q5073781","display_name":"Characterization (materials science)","level":2,"score":0.6711858510971069},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.6056632995605469},{"id":"https://openalex.org/C11413529","wikidata":"https://www.wikidata.org/wiki/Q8366","display_name":"Algorithm","level":1,"score":0.5142404437065125},{"id":"https://openalex.org/C93226319","wikidata":"https://www.wikidata.org/wiki/Q193137","display_name":"Differential (mechanical device)","level":2,"score":0.4464676082134247},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.21693450212478638},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.11367526650428772},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.06949940323829651},{"id":"https://openalex.org/C97355855","wikidata":"https://www.wikidata.org/wiki/Q11473","display_name":"Thermodynamics","level":1,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1109/access.2021.3090468","is_oa":true,"landing_page_url":"https://doi.org/10.1109/access.2021.3090468","pdf_url":"https://ieeexplore.ieee.org/ielx7/6287639/9312710/09459694.pdf","source":{"id":"https://openalex.org/S2485537415","display_name":"IEEE Access","issn_l":"2169-3536","issn":["2169-3536"],"is_oa":true,"is_in_doaj":true,"is_core":true,"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"journal"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEEE Access","raw_type":"journal-article"},{"id":"pmh:oai:doaj.org/article:c6e3991696fe417fb5c55cb1c01ea8fd","is_oa":true,"landing_page_url":"https://doaj.org/article/c6e3991696fe417fb5c55cb1c01ea8fd","pdf_url":null,"source":{"id":"https://openalex.org/S4306401280","display_name":"DOAJ (DOAJ: Directory of Open Access Journals)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"repository"},"license":"cc-by-sa","license_id":"https://openalex.org/licenses/cc-by-sa","version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"IEEE Access, Vol 9, Pp 90231-90243 (2021)","raw_type":"article"}],"best_oa_location":{"id":"doi:10.1109/access.2021.3090468","is_oa":true,"landing_page_url":"https://doi.org/10.1109/access.2021.3090468","pdf_url":"https://ieeexplore.ieee.org/ielx7/6287639/9312710/09459694.pdf","source":{"id":"https://openalex.org/S2485537415","display_name":"IEEE Access","issn_l":"2169-3536","issn":["2169-3536"],"is_oa":true,"is_in_doaj":true,"is_core":true,"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"journal"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEEE Access","raw_type":"journal-article"},"sustainable_development_goals":[],"awards":[{"id":"https://openalex.org/G802175945","display_name":"\u57fa\u4e8e\u5149\u5b66\u504f\u6298\u6280\u672f\u7684\u591a\u81ea\u7531\u5149\u5b66\u66f2\u9762\u540c\u6b65\u68c0\u6d4b\u65b9\u6cd5\u7814\u7a76","funder_award_id":"21ZR1483100","funder_id":"https://openalex.org/F4320309612","funder_display_name":"Natural Science Foundation of Shanghai"},{"id":"https://openalex.org/G8035010164","display_name":null,"funder_award_id":"2019YFB2005503","funder_id":"https://openalex.org/F4320335777","funder_display_name":"National Key Research and Development Program of China"}],"funders":[{"id":"https://openalex.org/F4320309612","display_name":"Natural Science Foundation of Shanghai","ror":null},{"id":"https://openalex.org/F4320335777","display_name":"National Key Research and Development Program of China","ror":null}],"has_content":{"grobid_xml":true,"pdf":true},"content_urls":{"pdf":"https://content.openalex.org/works/W3173930258.pdf","grobid_xml":"https://content.openalex.org/works/W3173930258.grobid-xml"},"referenced_works_count":22,"referenced_works":["https://openalex.org/W341879454","https://openalex.org/W1979159029","https://openalex.org/W1980769671","https://openalex.org/W1997441062","https://openalex.org/W1998365611","https://openalex.org/W2006544565","https://openalex.org/W2007308970","https://openalex.org/W2011962437","https://openalex.org/W2017000514","https://openalex.org/W2027904145","https://openalex.org/W2064207694","https://openalex.org/W2070466289","https://openalex.org/W2107587098","https://openalex.org/W2163348294","https://openalex.org/W2165198307","https://openalex.org/W2541451878","https://openalex.org/W2944413817","https://openalex.org/W3006458681","https://openalex.org/W3019989518","https://openalex.org/W3020254599","https://openalex.org/W4246559506","https://openalex.org/W6776674263"],"related_works":["https://openalex.org/W4391375266","https://openalex.org/W2899084033","https://openalex.org/W2748952813","https://openalex.org/W3107994849","https://openalex.org/W2051487156","https://openalex.org/W2073681303","https://openalex.org/W4247143848","https://openalex.org/W2009883749","https://openalex.org/W2735573198","https://openalex.org/W2390279801"],"abstract_inverted_index":{"According":[0],"to":[1,46,54,123,141],"the":[2,15,35,40,47,51,57,60,67,71,86,93,128,133,137,142,160,170],"transmission":[3],"mode":[4],"of":[5,20,39,50,59,104,120,132,136,145,172],"polarized":[6],"light":[7,42,134],"in":[8],"Mueller":[9,48,61,72],"ellipsometry,":[10],"a":[11],"characterization":[12],"method":[13],"for":[14],"thickness":[16,88,152],"and":[17,70,85,107,112,125,147,156,159,177],"optical":[18],"constants":[19],"isotropic":[21],"nano":[22],"films":[23],"based":[24],"on":[25],"Self-Adaptive":[26],"Differential":[27],"Evolution":[28],"algorithm":[29],"(SADE)":[30],"is":[31,78,89],"proposed.":[32],"By":[33],"establishing":[34],"least":[36],"square":[37,130],"model":[38],"output":[41],"intensity":[43,135],"with":[44,80,101],"respect":[45],"matrix":[49,62],"standard":[52,99],"sample":[53],"be":[55],"measured,":[56],"elements":[58],"are":[63,110,154,163],"solved":[64],"by":[65,76,83,91],"using":[66,92],"Sade":[68],"algorithm,":[69],"spectral":[73],"curve":[74],"obtained":[75],"fitting":[77],"compared":[79],"that":[81],"measured":[82],"DRC-MME,":[84],"film":[87,151],"calculated":[90,150],"transfer":[94],"matrix.":[95],"The":[96,114,149],"SiO2/":[97],"Si":[98],"samples":[100],"calibration":[102],"values":[103,144,153],"100.4":[105],"nm":[106,109],"121.56":[108],"simulated":[111],"calculated.":[113],"experiment":[115],"shows":[116],"that:":[117],"when":[118],"numbers":[119],"iterations":[121],"accumulated":[122],"65":[124],"80":[126],"respectively,":[127,158],"residual":[129],"sum":[131],"objective":[138],"function":[139],"converges":[140],"minimum":[143],"1.24":[146],"1.02.":[148],"101.25nm":[155],"120.53nm":[157],"relative":[161],"errors":[162],"both":[164],"less":[165],"than":[166],"1%.":[167],"It":[168],"proves":[169],"characteristics":[171],"simple":[173],"calculation,":[174],"fast":[175],"convergence":[176],"accurate":[178],"global":[179],"optimal":[180],"solution.":[181]},"counts_by_year":[{"year":2025,"cited_by_count":2},{"year":2024,"cited_by_count":1}],"updated_date":"2026-07-29T09:40:50.615796","created_date":"2025-10-10T00:00:00"}