{"id":"https://openalex.org/W2939088600","doi":"https://doi.org/10.1109/access.2019.2911710","title":"Structure Optimization of Fast Discharge Resistor System for Quench Protection System","display_name":"Structure Optimization of Fast Discharge Resistor System for Quench Protection System","publication_year":2019,"publication_date":"2019-01-01","ids":{"openalex":"https://openalex.org/W2939088600","doi":"https://doi.org/10.1109/access.2019.2911710","mag":"2939088600"},"language":"en","primary_location":{"id":"doi:10.1109/access.2019.2911710","is_oa":true,"landing_page_url":"https://doi.org/10.1109/access.2019.2911710","pdf_url":"https://ieeexplore.ieee.org/ielx7/6287639/8600701/08693675.pdf","source":{"id":"https://openalex.org/S2485537415","display_name":"IEEE Access","issn_l":"2169-3536","issn":["2169-3536"],"is_oa":true,"is_in_doaj":true,"is_core":true,"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEEE Access","raw_type":"journal-article"},"type":"article","indexed_in":["crossref","doaj"],"open_access":{"is_oa":true,"oa_status":"gold","oa_url":"https://ieeexplore.ieee.org/ielx7/6287639/8600701/08693675.pdf","any_repository_has_fulltext":true},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5100366723","display_name":"Kun Wang","orcid":"https://orcid.org/0000-0003-2984-8833"},"institutions":[{"id":"https://openalex.org/I126520041","display_name":"University of Science and Technology of China","ror":"https://ror.org/04c4dkn09","country_code":"CN","type":"education","lineage":["https://openalex.org/I126520041","https://openalex.org/I19820366"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Kun Wang","raw_affiliation_strings":["Science Island Branch, University of Science and Technology of China, Hefei, China"],"raw_orcid":"https://orcid.org/0000-0003-2984-8833","affiliations":[{"raw_affiliation_string":"Science Island Branch, University of Science and Technology of China, Hefei, China","institution_ids":["https://openalex.org/I126520041"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5041705595","display_name":"Zhiquan Song","orcid":"https://orcid.org/0000-0002-9804-1411"},"institutions":[{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"government","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210114698","display_name":"Institute of Plasma Physics","ror":"https://ror.org/033cbzv42","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I2802624667","https://openalex.org/I4210114698"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Zhiquan Song","raw_affiliation_strings":["Chinese Academy of Sciences, Institute of Plasma Physics, Hefei, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Chinese Academy of Sciences, Institute of Plasma Physics, Hefei, China","institution_ids":["https://openalex.org/I4210114698","https://openalex.org/I19820366"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5101670873","display_name":"Peng Fu","orcid":"https://orcid.org/0000-0003-0430-5621"},"institutions":[{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"government","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210114698","display_name":"Institute of Plasma Physics","ror":"https://ror.org/033cbzv42","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I2802624667","https://openalex.org/I4210114698"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Peng Fu","raw_affiliation_strings":["Chinese Academy of Sciences, Institute of Plasma Physics, Hefei, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Chinese Academy of Sciences, Institute of Plasma Physics, Hefei, China","institution_ids":["https://openalex.org/I4210114698","https://openalex.org/I19820366"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5004980983","display_name":"Wei Tong","orcid":"https://orcid.org/0000-0002-3157-4774"},"institutions":[{"id":"https://openalex.org/I126520041","display_name":"University of Science and Technology of China","ror":"https://ror.org/04c4dkn09","country_code":"CN","type":"education","lineage":["https://openalex.org/I126520041","https://openalex.org/I19820366"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Wei Tong","raw_affiliation_strings":["Science Island Branch, University of Science and Technology of China, Hefei, China"],"raw_orcid":"https://orcid.org/0000-0002-3157-4774","affiliations":[{"raw_affiliation_string":"Science Island Branch, University of Science and Technology of China, Hefei, China","institution_ids":["https://openalex.org/I126520041"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5039569230","display_name":"Hua Li","orcid":"https://orcid.org/0000-0002-8221-8518"},"institutions":[{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"government","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210114698","display_name":"Institute of Plasma Physics","ror":"https://ror.org/033cbzv42","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I2802624667","https://openalex.org/I4210114698"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Hua Li","raw_affiliation_strings":["Chinese Academy of Sciences, Institute of Plasma Physics, Hefei, China"],"raw_orcid":"https://orcid.org/0000-0002-8221-8518","affiliations":[{"raw_affiliation_string":"Chinese Academy of Sciences, Institute of Plasma Physics, Hefei, China","institution_ids":["https://openalex.org/I4210114698","https://openalex.org/I19820366"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5024767151","display_name":"Xiuqing Zhang","orcid":"https://orcid.org/0000-0002-3416-501X"},"institutions":[{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"government","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210114698","display_name":"Institute of Plasma Physics","ror":"https://ror.org/033cbzv42","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I2802624667","https://openalex.org/I4210114698"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Xiuqing Zhang","raw_affiliation_strings":["Chinese Academy of Sciences, Institute of Plasma Physics, Hefei, China"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Chinese Academy of Sciences, Institute of Plasma Physics, Hefei, China","institution_ids":["https://openalex.org/I4210114698","https://openalex.org/I19820366"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":6,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":{"value":1850,"currency":"USD","value_usd":1850},"apc_paid":{"value":1850,"currency":"USD","value_usd":1850},"fwci":1.1964,"has_fulltext":true,"cited_by_count":20,"citation_normalized_percentile":{"value":0.76777392,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":98},"biblio":{"volume":"7","issue":null,"first_page":"52122","last_page":"52131"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11808","display_name":"Superconducting Materials and Applications","score":0.9998000264167786,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11808","display_name":"Superconducting Materials and Applications","score":0.9998000264167786,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12699","display_name":"Electromagnetic Launch and Propulsion Technology","score":0.994700014591217,"subfield":{"id":"https://openalex.org/subfields/2202","display_name":"Aerospace Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10346","display_name":"Magnetic confinement fusion research","score":0.9905999898910522,"subfield":{"id":"https://openalex.org/subfields/3106","display_name":"Nuclear and High Energy Physics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/resistor","display_name":"Resistor","score":0.8260728716850281},{"id":"https://openalex.org/keywords/inductance","display_name":"Inductance","score":0.7114670872688293},{"id":"https://openalex.org/keywords/reliability","display_name":"Reliability (semiconductor)","score":0.5157537460327148},{"id":"https://openalex.org/keywords/process","display_name":"Process (computing)","score":0.4319473206996918},{"id":"https://openalex.org/keywords/electric-power-system","display_name":"Electric power system","score":0.4313523769378662},{"id":"https://openalex.org/keywords/power","display_name":"Power (physics)","score":0.429551362991333},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.4033306837081909},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.3583109676837921},{"id":"https://openalex.org/keywords/nuclear-engineering","display_name":"Nuclear engineering","score":0.3395296633243561},{"id":"https://openalex.org/keywords/electronic-engineering","display_name":"Electronic engineering","score":0.3350788354873657},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.32929545640945435},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.31830552220344543},{"id":"https://openalex.org/keywords/voltage","display_name":"Voltage","score":0.29479238390922546},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.16338008642196655}],"concepts":[{"id":"https://openalex.org/C137488568","wikidata":"https://www.wikidata.org/wiki/Q5321","display_name":"Resistor","level":3,"score":0.8260728716850281},{"id":"https://openalex.org/C29210110","wikidata":"https://www.wikidata.org/wiki/Q177897","display_name":"Inductance","level":3,"score":0.7114670872688293},{"id":"https://openalex.org/C43214815","wikidata":"https://www.wikidata.org/wiki/Q7310987","display_name":"Reliability (semiconductor)","level":3,"score":0.5157537460327148},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.4319473206996918},{"id":"https://openalex.org/C89227174","wikidata":"https://www.wikidata.org/wiki/Q2388981","display_name":"Electric power system","level":3,"score":0.4313523769378662},{"id":"https://openalex.org/C163258240","wikidata":"https://www.wikidata.org/wiki/Q25342","display_name":"Power (physics)","level":2,"score":0.429551362991333},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.4033306837081909},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.3583109676837921},{"id":"https://openalex.org/C116915560","wikidata":"https://www.wikidata.org/wiki/Q83504","display_name":"Nuclear engineering","level":1,"score":0.3395296633243561},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.3350788354873657},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.32929545640945435},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.31830552220344543},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.29479238390922546},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.16338008642196655},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1109/access.2019.2911710","is_oa":true,"landing_page_url":"https://doi.org/10.1109/access.2019.2911710","pdf_url":"https://ieeexplore.ieee.org/ielx7/6287639/8600701/08693675.pdf","source":{"id":"https://openalex.org/S2485537415","display_name":"IEEE Access","issn_l":"2169-3536","issn":["2169-3536"],"is_oa":true,"is_in_doaj":true,"is_core":true,"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEEE Access","raw_type":"journal-article"},{"id":"pmh:oai:doaj.org/article:365e0ffe38554ca0a9effa4203513fc6","is_oa":true,"landing_page_url":"https://doaj.org/article/365e0ffe38554ca0a9effa4203513fc6","pdf_url":null,"source":{"id":"https://openalex.org/S4306401280","display_name":"DOAJ (DOAJ: Directory of Open Access Journals)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"repository"},"license":"cc-by-sa","license_id":"https://openalex.org/licenses/cc-by-sa","version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"IEEE Access, Vol 7, Pp 52122-52131 (2019)","raw_type":"article"}],"best_oa_location":{"id":"doi:10.1109/access.2019.2911710","is_oa":true,"landing_page_url":"https://doi.org/10.1109/access.2019.2911710","pdf_url":"https://ieeexplore.ieee.org/ielx7/6287639/8600701/08693675.pdf","source":{"id":"https://openalex.org/S2485537415","display_name":"IEEE Access","issn_l":"2169-3536","issn":["2169-3536"],"is_oa":true,"is_in_doaj":true,"is_core":true,"host_organization":"https://openalex.org/P4310319808","host_organization_name":"Institute of Electrical and Electronics Engineers","host_organization_lineage":["https://openalex.org/P4310319808"],"host_organization_lineage_names":["Institute of Electrical and Electronics Engineers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEEE Access","raw_type":"journal-article"},"sustainable_development_goals":[{"display_name":"Affordable and clean energy","score":0.8799999952316284,"id":"https://metadata.un.org/sdg/7"}],"awards":[{"id":"https://openalex.org/G5688820909","display_name":null,"funder_award_id":"WK6030000130","funder_id":"https://openalex.org/F4320335787","funder_display_name":"Fundamental Research Funds for the Central Universities"}],"funders":[{"id":"https://openalex.org/F4320321133","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35"},{"id":"https://openalex.org/F4320335787","display_name":"Fundamental Research Funds for the Central Universities","ror":null},{"id":"https://openalex.org/F4320338094","display_name":"Institute of Plasma Physics, Chinese Academy of Sciences","ror":"https://ror.org/033cbzv42"}],"has_content":{"pdf":true,"grobid_xml":true},"content_urls":{"pdf":"https://content.openalex.org/works/W2939088600.pdf","grobid_xml":"https://content.openalex.org/works/W2939088600.grobid-xml"},"referenced_works_count":18,"referenced_works":["https://openalex.org/W1964667606","https://openalex.org/W1995779247","https://openalex.org/W2003279996","https://openalex.org/W2023294096","https://openalex.org/W2023584463","https://openalex.org/W2038436958","https://openalex.org/W2045765865","https://openalex.org/W2073546971","https://openalex.org/W2100158361","https://openalex.org/W2129184638","https://openalex.org/W2154448546","https://openalex.org/W2168380534","https://openalex.org/W2331295330","https://openalex.org/W2345139675","https://openalex.org/W2384509258","https://openalex.org/W4249130772","https://openalex.org/W6675039708","https://openalex.org/W6702221727"],"related_works":["https://openalex.org/W3200817179","https://openalex.org/W1960166976","https://openalex.org/W2380067098","https://openalex.org/W1992708211","https://openalex.org/W2543503210","https://openalex.org/W1548152478","https://openalex.org/W2137172615","https://openalex.org/W2112564789","https://openalex.org/W2106247205","https://openalex.org/W2531567634"],"abstract_inverted_index":{"In":[0,35],"the":[1,10,24,31,38,42,47,55,71,84,94,99,105,109],"quench":[2],"protection":[3],"(QP)":[4],"process":[5,45,74],"of":[6,15,23,41,83,108],"superconducting":[7],"fusion":[8],"devices,":[9],"operating":[11,44],"reliability":[12],"and":[13,46,70,87],"efficiency":[14],"power":[16,49],"components":[17],"are":[18,61,75,90,102],"affected":[19,65],"by":[20,104],"stray":[21,33,79,95],"parameters":[22],"fast":[25],"discharge":[26],"resistor":[27,85],"(FDR)":[28],"system,":[29],"especially":[30],"system":[32,51],"inductance.":[34],"this":[36],"paper,":[37],"fundamental":[39],"condition":[40],"QP":[43],"large":[48],"FDR":[50],"structure":[52,88],"layout":[53],"for":[54],"Large-scale":[56],"Superconductor":[57],"Test":[58],"Facility":[59],"(LSTF)":[60],"presented.":[62],"The":[63,78],"negative":[64],"VCB,":[66],"CPC":[67],"circuit":[68],"action,":[69],"energy":[72],"discharging":[73],"further":[76],"analyzed.":[77],"inductance":[80,96],"optimization":[81,100],"method":[82],"module":[86,107],"connections":[89],"proposed":[91],"to":[92],"reduce":[93],"value.":[97],"Finally,":[98],"results":[101],"presented":[103],"Q3D":[106],"FEA":[110],"software.":[111]},"counts_by_year":[{"year":2025,"cited_by_count":4},{"year":2024,"cited_by_count":1},{"year":2023,"cited_by_count":3},{"year":2022,"cited_by_count":4},{"year":2021,"cited_by_count":1},{"year":2020,"cited_by_count":6},{"year":2019,"cited_by_count":1}],"updated_date":"2026-06-11T09:08:48.828518","created_date":"2025-10-10T00:00:00"}