{"id":"https://openalex.org/W2100183064","doi":"https://doi.org/10.1109/acc.2013.6580661","title":"Applications of control systems and optimization in the design of semiconductor capital equipment","display_name":"Applications of control systems and optimization in the design of semiconductor capital equipment","publication_year":2013,"publication_date":"2013-06-01","ids":{"openalex":"https://openalex.org/W2100183064","doi":"https://doi.org/10.1109/acc.2013.6580661","mag":"2100183064"},"language":"en","primary_location":{"id":"doi:10.1109/acc.2013.6580661","is_oa":false,"landing_page_url":"https://doi.org/10.1109/acc.2013.6580661","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2013 American Control Conference","raw_type":"proceedings-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5064380610","display_name":"Upendra Ummethala","orcid":null},"institutions":[{"id":"https://openalex.org/I70745867","display_name":"KLA (United States)","ror":"https://ror.org/02rqhpa98","country_code":"US","type":"company","lineage":["https://openalex.org/I70745867"]}],"countries":["US"],"is_corresponding":true,"raw_author_name":"Upendra Ummethala","raw_affiliation_strings":["KLA-Tencor Corporation, Milpitas, CA, USA","KLA-Tencor Corp., Milpitas, CA, USA"],"affiliations":[{"raw_affiliation_string":"KLA-Tencor Corporation, Milpitas, CA, USA","institution_ids":["https://openalex.org/I70745867"]},{"raw_affiliation_string":"KLA-Tencor Corp., Milpitas, CA, USA","institution_ids":["https://openalex.org/I70745867"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5043324332","display_name":"J.J. Hench","orcid":null},"institutions":[{"id":"https://openalex.org/I70745867","display_name":"KLA (United States)","ror":"https://ror.org/02rqhpa98","country_code":"US","type":"company","lineage":["https://openalex.org/I70745867"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"John J. Hench","raw_affiliation_strings":["KLA-Tencor Corporation, Milpitas, CA, USA","KLA-Tencor Corp., Milpitas, CA, USA"],"affiliations":[{"raw_affiliation_string":"KLA-Tencor Corporation, Milpitas, CA, USA","institution_ids":["https://openalex.org/I70745867"]},{"raw_affiliation_string":"KLA-Tencor Corp., Milpitas, CA, USA","institution_ids":["https://openalex.org/I70745867"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5069489466","display_name":"Anne van Lievenoogen","orcid":null},"institutions":[{"id":"https://openalex.org/I1329325741","display_name":"Philips (Finland)","ror":"https://ror.org/01g4jev56","country_code":"FI","type":"company","lineage":["https://openalex.org/I1329325741","https://openalex.org/I4210122849"]},{"id":"https://openalex.org/I4210122849","display_name":"Philips (Netherlands)","ror":"https://ror.org/02p2bgp27","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210122849"]}],"countries":["FI","NL"],"is_corresponding":false,"raw_author_name":"Anne van Lievenoogen","raw_affiliation_strings":["Philips Innovation Services, Eindhoven, Netherlands","[Philips Innovation Services, Eindhoven, Netherlands]"],"affiliations":[{"raw_affiliation_string":"Philips Innovation Services, Eindhoven, Netherlands","institution_ids":["https://openalex.org/I4210122849"]},{"raw_affiliation_string":"[Philips Innovation Services, Eindhoven, Netherlands]","institution_ids":["https://openalex.org/I1329325741"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5017627492","display_name":"Pradeep Subrahmanyan","orcid":null},"institutions":[{"id":"https://openalex.org/I70745867","display_name":"KLA (United States)","ror":"https://ror.org/02rqhpa98","country_code":"US","type":"company","lineage":["https://openalex.org/I70745867"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Pradeep Subrahmanyan","raw_affiliation_strings":["KLA-Tencor Corporation, Milpitas, CA, USA","KLA-Tencor Corp., Milpitas, CA, USA"],"affiliations":[{"raw_affiliation_string":"KLA-Tencor Corporation, Milpitas, CA, USA","institution_ids":["https://openalex.org/I70745867"]},{"raw_affiliation_string":"KLA-Tencor Corp., Milpitas, CA, USA","institution_ids":["https://openalex.org/I70745867"]}]}],"institutions":[],"countries_distinct_count":3,"institutions_distinct_count":4,"corresponding_author_ids":["https://openalex.org/A5064380610"],"corresponding_institution_ids":["https://openalex.org/I70745867"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.14570549,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":null,"issue":null,"first_page":"5282","last_page":"5285"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.907800018787384,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.907800018787384,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/capital-equipment","display_name":"Capital equipment","score":0.7517049312591553},{"id":"https://openalex.org/keywords/lithography","display_name":"Lithography","score":0.6709384918212891},{"id":"https://openalex.org/keywords/semiconductor-industry","display_name":"Semiconductor industry","score":0.6286035776138306},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.5552750825881958},{"id":"https://openalex.org/keywords/control","display_name":"Control (management)","score":0.5212829113006592},{"id":"https://openalex.org/keywords/manufacturing-engineering","display_name":"Manufacturing engineering","score":0.5110422372817993},{"id":"https://openalex.org/keywords/semiconductor-device-fabrication","display_name":"Semiconductor device fabrication","score":0.4713168740272522},{"id":"https://openalex.org/keywords/semiconductor","display_name":"Semiconductor","score":0.46615538001060486},{"id":"https://openalex.org/keywords/semiconductor-device","display_name":"Semiconductor device","score":0.42371881008148193},{"id":"https://openalex.org/keywords/systems-engineering","display_name":"Systems engineering","score":0.4160149395465851},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.3522450923919678},{"id":"https://openalex.org/keywords/electronic-engineering","display_name":"Electronic engineering","score":0.34752458333969116},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.2446628212928772},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.14698773622512817},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.11701738834381104},{"id":"https://openalex.org/keywords/artificial-intelligence","display_name":"Artificial intelligence","score":0.09844055771827698},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.08296006917953491}],"concepts":[{"id":"https://openalex.org/C2992893776","wikidata":"https://www.wikidata.org/wiki/Q955421","display_name":"Capital equipment","level":2,"score":0.7517049312591553},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.6709384918212891},{"id":"https://openalex.org/C2987888538","wikidata":"https://www.wikidata.org/wiki/Q2986369","display_name":"Semiconductor industry","level":2,"score":0.6286035776138306},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.5552750825881958},{"id":"https://openalex.org/C2775924081","wikidata":"https://www.wikidata.org/wiki/Q55608371","display_name":"Control (management)","level":2,"score":0.5212829113006592},{"id":"https://openalex.org/C117671659","wikidata":"https://www.wikidata.org/wiki/Q11049265","display_name":"Manufacturing engineering","level":1,"score":0.5110422372817993},{"id":"https://openalex.org/C66018809","wikidata":"https://www.wikidata.org/wiki/Q1570432","display_name":"Semiconductor device fabrication","level":3,"score":0.4713168740272522},{"id":"https://openalex.org/C108225325","wikidata":"https://www.wikidata.org/wiki/Q11456","display_name":"Semiconductor","level":2,"score":0.46615538001060486},{"id":"https://openalex.org/C79635011","wikidata":"https://www.wikidata.org/wiki/Q175805","display_name":"Semiconductor device","level":3,"score":0.42371881008148193},{"id":"https://openalex.org/C201995342","wikidata":"https://www.wikidata.org/wiki/Q682496","display_name":"Systems engineering","level":1,"score":0.4160149395465851},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.3522450923919678},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.34752458333969116},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.2446628212928772},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.14698773622512817},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.11701738834381104},{"id":"https://openalex.org/C154945302","wikidata":"https://www.wikidata.org/wiki/Q11660","display_name":"Artificial intelligence","level":1,"score":0.09844055771827698},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.08296006917953491},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/acc.2013.6580661","is_oa":false,"landing_page_url":"https://doi.org/10.1109/acc.2013.6580661","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"2013 American Control Conference","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[{"display_name":"Industry, innovation and infrastructure","id":"https://metadata.un.org/sdg/9","score":0.6499999761581421}],"awards":[],"funders":[{"id":"https://openalex.org/F4320306078","display_name":"U.S. Department of Defense","ror":"https://ror.org/0447fe631"},{"id":"https://openalex.org/F4320332180","display_name":"Defense Advanced Research Projects Agency","ror":"https://ror.org/02caytj08"}],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W1979703647","https://openalex.org/W2796831252","https://openalex.org/W2917828100","https://openalex.org/W2146075642","https://openalex.org/W2361830001","https://openalex.org/W1529487987","https://openalex.org/W1483525138","https://openalex.org/W2093118422","https://openalex.org/W2359225346","https://openalex.org/W2052833104"],"abstract_inverted_index":{"This":[0],"tutorial":[1],"presents":[2],"several":[3],"examples":[4],"of":[5],"high":[6],"performance":[7],"control":[8],"systems":[9],"in":[10,19],"the":[11],"Semiconductor":[12],"equipment":[13],"industry.":[14],"Examples":[15],"include":[16],"technologies":[17],"used":[18],"lithography":[20],"and":[21],"mask":[22],"inspection.":[23]},"counts_by_year":[],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}