{"id":"https://openalex.org/W7124422176","doi":"https://doi.org/10.1080/17517575.2026.2616679","title":"A real-time wafer lithography area scheduling approach integrating transformer with double deep Q-network","display_name":"A real-time wafer lithography area scheduling approach integrating transformer with double deep Q-network","publication_year":2026,"publication_date":"2026-01-16","ids":{"openalex":"https://openalex.org/W7124422176","doi":"https://doi.org/10.1080/17517575.2026.2616679"},"language":"en","primary_location":{"id":"doi:10.1080/17517575.2026.2616679","is_oa":false,"landing_page_url":"https://doi.org/10.1080/17517575.2026.2616679","pdf_url":null,"source":{"id":"https://openalex.org/S24861202","display_name":"Enterprise Information Systems","issn_l":"1751-7575","issn":["1751-7575","1751-7583"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310320547","host_organization_name":"Taylor & Francis","host_organization_lineage":["https://openalex.org/P4310320547"],"host_organization_lineage_names":["Taylor & Francis"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Enterprise Information Systems","raw_type":"journal-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5123249727","display_name":"Lihui Wu","orcid":null},"institutions":[{"id":"https://openalex.org/I67001856","display_name":"Shanghai Institute of Technology","ror":"https://ror.org/00fjzqj15","country_code":"CN","type":"education","lineage":["https://openalex.org/I67001856"]}],"countries":["CN"],"is_corresponding":true,"raw_author_name":"Lihui Wu","raw_affiliation_strings":["Shanghai Institute of Technology"],"affiliations":[{"raw_affiliation_string":"Shanghai Institute of Technology","institution_ids":["https://openalex.org/I67001856"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5123181414","display_name":"Keshan Jin","orcid":null},"institutions":[{"id":"https://openalex.org/I67001856","display_name":"Shanghai Institute of Technology","ror":"https://ror.org/00fjzqj15","country_code":"CN","type":"education","lineage":["https://openalex.org/I67001856"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Keshan Jin","raw_affiliation_strings":["Shanghai Institute of Technology"],"affiliations":[{"raw_affiliation_string":"Shanghai Institute of Technology","institution_ids":["https://openalex.org/I67001856"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5123181870","display_name":"Jinming Shi","orcid":null},"institutions":[{"id":"https://openalex.org/I67001856","display_name":"Shanghai Institute of Technology","ror":"https://ror.org/00fjzqj15","country_code":"CN","type":"education","lineage":["https://openalex.org/I67001856"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Jinming Shi","raw_affiliation_strings":["Shanghai Institute of Technology"],"affiliations":[{"raw_affiliation_string":"Shanghai Institute of Technology","institution_ids":["https://openalex.org/I67001856"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5123192678","display_name":"Jie Zhang","orcid":null},"institutions":[{"id":"https://openalex.org/I181326427","display_name":"Donghua University","ror":"https://ror.org/035psfh38","country_code":"CN","type":"education","lineage":["https://openalex.org/I181326427"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Jie Zhang","raw_affiliation_strings":["Donghua University"],"affiliations":[{"raw_affiliation_string":"Donghua University","institution_ids":["https://openalex.org/I181326427"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5101579686","display_name":"Junliang Wang","orcid":"https://orcid.org/0000-0002-7164-1644"},"institutions":[{"id":"https://openalex.org/I181326427","display_name":"Donghua University","ror":"https://ror.org/035psfh38","country_code":"CN","type":"education","lineage":["https://openalex.org/I181326427"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Junliang Wang","raw_affiliation_strings":["Donghua University"],"affiliations":[{"raw_affiliation_string":"Donghua University","institution_ids":["https://openalex.org/I181326427"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":5,"corresponding_author_ids":["https://openalex.org/A5123249727"],"corresponding_institution_ids":["https://openalex.org/I67001856"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.11386944,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"20","issue":"2","first_page":null,"last_page":null},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.6542999744415283,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.6542999744415283,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11522","display_name":"VLSI and FPGA Design Techniques","score":0.20350000262260437,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10829","display_name":"Interconnection Networks and Systems","score":0.016100000590085983,"subfield":{"id":"https://openalex.org/subfields/1705","display_name":"Computer Networks and Communications"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/transformer","display_name":"Transformer","score":0.522599995136261},{"id":"https://openalex.org/keywords/lithography","display_name":"Lithography","score":0.4880000054836273},{"id":"https://openalex.org/keywords/scheduling","display_name":"Scheduling (production processes)","score":0.3677000105381012},{"id":"https://openalex.org/keywords/wafer","display_name":"Wafer","score":0.3328000009059906},{"id":"https://openalex.org/keywords/integrated-circuit","display_name":"Integrated circuit","score":0.27709999680519104}],"concepts":[{"id":"https://openalex.org/C66322947","wikidata":"https://www.wikidata.org/wiki/Q11658","display_name":"Transformer","level":3,"score":0.522599995136261},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.5175999999046326},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.4880000054836273},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.4106999933719635},{"id":"https://openalex.org/C206729178","wikidata":"https://www.wikidata.org/wiki/Q2271896","display_name":"Scheduling (production processes)","level":2,"score":0.3677000105381012},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.34769999980926514},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.3353999853134155},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.33320000767707825},{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.3328000009059906},{"id":"https://openalex.org/C149635348","wikidata":"https://www.wikidata.org/wiki/Q193040","display_name":"Embedded system","level":1,"score":0.27970001101493835},{"id":"https://openalex.org/C530198007","wikidata":"https://www.wikidata.org/wiki/Q80831","display_name":"Integrated circuit","level":2,"score":0.27709999680519104},{"id":"https://openalex.org/C105487726","wikidata":"https://www.wikidata.org/wiki/Q622938","display_name":"Photolithography","level":2,"score":0.26339998841285706},{"id":"https://openalex.org/C55416958","wikidata":"https://www.wikidata.org/wiki/Q6206757","display_name":"Job shop scheduling","level":3,"score":0.2547999918460846},{"id":"https://openalex.org/C114834414","wikidata":"https://www.wikidata.org/wiki/Q15477170","display_name":"Thermal management of electronic devices and systems","level":2,"score":0.25290000438690186}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1080/17517575.2026.2616679","is_oa":false,"landing_page_url":"https://doi.org/10.1080/17517575.2026.2616679","pdf_url":null,"source":{"id":"https://openalex.org/S24861202","display_name":"Enterprise Information Systems","issn_l":"1751-7575","issn":["1751-7575","1751-7583"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310320547","host_organization_name":"Taylor & Francis","host_organization_lineage":["https://openalex.org/P4310320547"],"host_organization_lineage_names":["Taylor & Francis"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Enterprise Information Systems","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[{"display_name":"Affordable and clean energy","score":0.43478211760520935,"id":"https://metadata.un.org/sdg/7"}],"awards":[{"id":"https://openalex.org/G6215789290","display_name":null,"funder_award_id":"U170415","funder_id":"https://openalex.org/F4320321001","funder_display_name":"National Natural Science Foundation of China"},{"id":"https://openalex.org/G8280399167","display_name":null,"funder_award_id":"2022YFB3305003","funder_id":"https://openalex.org/F4320335777","funder_display_name":"National Key Research and Development Program of China"}],"funders":[{"id":"https://openalex.org/F4320321001","display_name":"National Natural Science Foundation of China","ror":"https://ror.org/01h0zpd94"},{"id":"https://openalex.org/F4320335777","display_name":"National Key Research and Development Program of China","ror":null}],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":34,"referenced_works":["https://openalex.org/W1565210221","https://openalex.org/W1983201042","https://openalex.org/W2004753507","https://openalex.org/W2014034914","https://openalex.org/W2070907972","https://openalex.org/W2101259727","https://openalex.org/W2104564858","https://openalex.org/W2111461061","https://openalex.org/W2142865665","https://openalex.org/W2147924083","https://openalex.org/W2155950174","https://openalex.org/W2727944998","https://openalex.org/W2746553466","https://openalex.org/W2751852381","https://openalex.org/W2766631706","https://openalex.org/W2888017428","https://openalex.org/W2989923024","https://openalex.org/W2995338188","https://openalex.org/W3118803533","https://openalex.org/W3129848661","https://openalex.org/W3141955773","https://openalex.org/W3154442901","https://openalex.org/W4210334187","https://openalex.org/W4213436170","https://openalex.org/W4295136156","https://openalex.org/W4312799498","https://openalex.org/W4366607179","https://openalex.org/W4385756473","https://openalex.org/W4389076727","https://openalex.org/W4390618269","https://openalex.org/W4391409206","https://openalex.org/W4401740375","https://openalex.org/W4403223329","https://openalex.org/W4406983688"],"related_works":[],"abstract_inverted_index":null,"counts_by_year":[],"updated_date":"2026-04-09T08:11:56.329763","created_date":"2026-01-17T00:00:00"}