{"id":"https://openalex.org/W2340798346","doi":"https://doi.org/10.1080/0951192x.2016.1145798","title":"Approach for self-optimising assembly of optical systems","display_name":"Approach for self-optimising assembly of optical systems","publication_year":2016,"publication_date":"2016-02-19","ids":{"openalex":"https://openalex.org/W2340798346","doi":"https://doi.org/10.1080/0951192x.2016.1145798","mag":"2340798346"},"language":"en","primary_location":{"id":"doi:10.1080/0951192x.2016.1145798","is_oa":false,"landing_page_url":"https://doi.org/10.1080/0951192x.2016.1145798","pdf_url":null,"source":{"id":"https://openalex.org/S57062392","display_name":"International Journal of Computer Integrated Manufacturing","issn_l":"0951-192X","issn":["0951-192X","1362-3052"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310320547","host_organization_name":"Taylor & Francis","host_organization_lineage":["https://openalex.org/P4310320547"],"host_organization_lineage_names":["Taylor & Francis"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"International Journal of Computer Integrated Manufacturing","raw_type":"journal-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5005064579","display_name":"Martin Holters","orcid":"https://orcid.org/0000-0001-9950-4062"},"institutions":[{"id":"https://openalex.org/I887968799","display_name":"RWTH Aachen University","ror":"https://ror.org/04xfq0f34","country_code":"DE","type":"education","lineage":["https://openalex.org/I887968799"]}],"countries":["DE"],"is_corresponding":true,"raw_author_name":"Martin Holters","raw_affiliation_strings":["Chair for Technology of Optical Systems, RWTH Aachen University, Aachen, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Chair for Technology of Optical Systems, RWTH Aachen University, Aachen, Germany","institution_ids":["https://openalex.org/I887968799"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5043566702","display_name":"Alexander Gatej","orcid":null},"institutions":[{"id":"https://openalex.org/I887968799","display_name":"RWTH Aachen University","ror":"https://ror.org/04xfq0f34","country_code":"DE","type":"education","lineage":["https://openalex.org/I887968799"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Alexander Gatej","raw_affiliation_strings":["Chair for Technology of Optical Systems, RWTH Aachen University, Aachen, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Chair for Technology of Optical Systems, RWTH Aachen University, Aachen, Germany","institution_ids":["https://openalex.org/I887968799"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110558535","display_name":"Sebastian Haag","orcid":null},"institutions":[{"id":"https://openalex.org/I4210096398","display_name":"Fraunhofer Institute for Production Technology IPT","ror":"https://ror.org/00t0rcy29","country_code":"DE","type":"facility","lineage":["https://openalex.org/I4210096398","https://openalex.org/I4923324"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Sebastian Haag","raw_affiliation_strings":["Fraunhofer Institute for Production Technology IPT, Aachen, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Fraunhofer Institute for Production Technology IPT, Aachen, Germany","institution_ids":["https://openalex.org/I4210096398"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100768457","display_name":"Tobias M\u00fcller","orcid":null},"institutions":[{"id":"https://openalex.org/I4210096398","display_name":"Fraunhofer Institute for Production Technology IPT","ror":"https://ror.org/00t0rcy29","country_code":"DE","type":"facility","lineage":["https://openalex.org/I4210096398","https://openalex.org/I4923324"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Tobias M\u00fcller","raw_affiliation_strings":["Fraunhofer Institute for Production Technology IPT, Aachen, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Fraunhofer Institute for Production Technology IPT, Aachen, Germany","institution_ids":["https://openalex.org/I4210096398"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5033406750","display_name":"Peter Loosen","orcid":null},"institutions":[{"id":"https://openalex.org/I4210132567","display_name":"Fraunhofer Institute for Laser Technology","ror":"https://ror.org/03ebbfh95","country_code":"DE","type":"facility","lineage":["https://openalex.org/I4210132567","https://openalex.org/I4923324"]},{"id":"https://openalex.org/I887968799","display_name":"RWTH Aachen University","ror":"https://ror.org/04xfq0f34","country_code":"DE","type":"education","lineage":["https://openalex.org/I887968799"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Peter Loosen","raw_affiliation_strings":["Chair for Technology of Optical Systems, RWTH Aachen University, Aachen, Germany; Fraunhofer-Institute for Laser Technology ILT, Aachen, Germany","Chair for Technology of Optical Systems, RWTH Aachen University, Aachen, Germany","Fraunhofer-Institute for Laser Technology ILT, Aachen, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Chair for Technology of Optical Systems, RWTH Aachen University, Aachen, Germany; Fraunhofer-Institute for Laser Technology ILT, Aachen, Germany","institution_ids":["https://openalex.org/I4210132567"]},{"raw_affiliation_string":"Chair for Technology of Optical Systems, RWTH Aachen University, Aachen, Germany","institution_ids":["https://openalex.org/I887968799"]},{"raw_affiliation_string":"Fraunhofer-Institute for Laser Technology ILT, Aachen, Germany","institution_ids":["https://openalex.org/I4210132567"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5067996292","display_name":"Christian Brecher","orcid":"https://orcid.org/0000-0002-8049-3364"},"institutions":[{"id":"https://openalex.org/I4210096398","display_name":"Fraunhofer Institute for Production Technology IPT","ror":"https://ror.org/00t0rcy29","country_code":"DE","type":"facility","lineage":["https://openalex.org/I4210096398","https://openalex.org/I4923324"]},{"id":"https://openalex.org/I887968799","display_name":"RWTH Aachen University","ror":"https://ror.org/04xfq0f34","country_code":"DE","type":"education","lineage":["https://openalex.org/I887968799"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Christian Brecher","raw_affiliation_strings":["Fraunhofer Institute for Production Technology IPT, Aachen, Germany; Chair for Machine Tools at the Laboratory for Machine Tools and Production Engineering WZL, RWTH Aachen University, Aachen, Germany","Chair for Machine Tools at the Laboratory for Machine Tools and Production Engineering WZL, RWTH Aachen University, Aachen, Germany","Fraunhofer Institute for Production Technology IPT, Aachen, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Fraunhofer Institute for Production Technology IPT, Aachen, Germany; Chair for Machine Tools at the Laboratory for Machine Tools and Production Engineering WZL, RWTH Aachen University, Aachen, Germany","institution_ids":["https://openalex.org/I4210096398"]},{"raw_affiliation_string":"Chair for Machine Tools at the Laboratory for Machine Tools and Production Engineering WZL, RWTH Aachen University, Aachen, Germany","institution_ids":["https://openalex.org/I887968799"]},{"raw_affiliation_string":"Fraunhofer Institute for Production Technology IPT, Aachen, Germany","institution_ids":["https://openalex.org/I4210096398"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":3,"corresponding_author_ids":["https://openalex.org/A5005064579"],"corresponding_institution_ids":["https://openalex.org/I887968799"],"apc_list":null,"apc_paid":null,"fwci":0.1503,"has_fulltext":false,"cited_by_count":5,"citation_normalized_percentile":{"value":0.53512298,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":97},"biblio":{"volume":"29","issue":"11","first_page":"1227","last_page":"1237"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11301","display_name":"Advanced Surface Polishing Techniques","score":0.998199999332428,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11301","display_name":"Advanced Surface Polishing Techniques","score":0.998199999332428,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11583","display_name":"Advanced Measurement and Metrology Techniques","score":0.9926999807357788,"subfield":{"id":"https://openalex.org/subfields/2210","display_name":"Mechanical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13114","display_name":"Image Processing Techniques and Applications","score":0.9868000149726868,"subfield":{"id":"https://openalex.org/subfields/2214","display_name":"Media Technology"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/ray-tracing","display_name":"Ray tracing (physics)","score":0.6448349356651306},{"id":"https://openalex.org/keywords/metrology","display_name":"Metrology","score":0.6228173971176147},{"id":"https://openalex.org/keywords/tracing","display_name":"Tracing","score":0.6026180386543274},{"id":"https://openalex.org/keywords/software","display_name":"Software","score":0.5875005722045898},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.5792118906974792},{"id":"https://openalex.org/keywords/compensation","display_name":"Compensation (psychology)","score":0.5740671753883362},{"id":"https://openalex.org/keywords/process","display_name":"Process (computing)","score":0.49918103218078613},{"id":"https://openalex.org/keywords/laser","display_name":"Laser","score":0.45114821195602417},{"id":"https://openalex.org/keywords/systems-engineering","display_name":"Systems engineering","score":0.3375062644481659},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.3070172667503357},{"id":"https://openalex.org/keywords/optics","display_name":"Optics","score":0.2533033788204193}],"concepts":[{"id":"https://openalex.org/C121483023","wikidata":"https://www.wikidata.org/wiki/Q7298343","display_name":"Ray tracing (physics)","level":2,"score":0.6448349356651306},{"id":"https://openalex.org/C195766429","wikidata":"https://www.wikidata.org/wiki/Q394","display_name":"Metrology","level":2,"score":0.6228173971176147},{"id":"https://openalex.org/C138673069","wikidata":"https://www.wikidata.org/wiki/Q322229","display_name":"Tracing","level":2,"score":0.6026180386543274},{"id":"https://openalex.org/C2777904410","wikidata":"https://www.wikidata.org/wiki/Q7397","display_name":"Software","level":2,"score":0.5875005722045898},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.5792118906974792},{"id":"https://openalex.org/C2780023022","wikidata":"https://www.wikidata.org/wiki/Q1338171","display_name":"Compensation (psychology)","level":2,"score":0.5740671753883362},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.49918103218078613},{"id":"https://openalex.org/C520434653","wikidata":"https://www.wikidata.org/wiki/Q38867","display_name":"Laser","level":2,"score":0.45114821195602417},{"id":"https://openalex.org/C201995342","wikidata":"https://www.wikidata.org/wiki/Q682496","display_name":"Systems engineering","level":1,"score":0.3375062644481659},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.3070172667503357},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.2533033788204193},{"id":"https://openalex.org/C15744967","wikidata":"https://www.wikidata.org/wiki/Q9418","display_name":"Psychology","level":0,"score":0.0},{"id":"https://openalex.org/C11171543","wikidata":"https://www.wikidata.org/wiki/Q41630","display_name":"Psychoanalysis","level":1,"score":0.0},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0},{"id":"https://openalex.org/C199360897","wikidata":"https://www.wikidata.org/wiki/Q9143","display_name":"Programming language","level":1,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0}],"mesh":[],"locations_count":3,"locations":[{"id":"doi:10.1080/0951192x.2016.1145798","is_oa":false,"landing_page_url":"https://doi.org/10.1080/0951192x.2016.1145798","pdf_url":null,"source":{"id":"https://openalex.org/S57062392","display_name":"International Journal of Computer Integrated Manufacturing","issn_l":"0951-192X","issn":["0951-192X","1362-3052"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310320547","host_organization_name":"Taylor & Francis","host_organization_lineage":["https://openalex.org/P4310320547"],"host_organization_lineage_names":["Taylor & Francis"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"International Journal of Computer Integrated Manufacturing","raw_type":"journal-article"},{"id":"pmh:oai:publica.fraunhofer.de:publica/243420","is_oa":false,"landing_page_url":"https://publica.fraunhofer.de/handle/publica/243420","pdf_url":null,"source":{"id":"https://openalex.org/S4306400318","display_name":"Fraunhofer-Publica (Fraunhofer-Gesellschaft)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"host_organization":"https://openalex.org/I4923324","host_organization_name":"Fraunhofer-Gesellschaft","host_organization_lineage":["https://openalex.org/I4923324"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":null,"raw_type":"journal article"},{"id":"pmh:oai:publications.rwth-aachen.de:572460","is_oa":false,"landing_page_url":"https://publications.rwth-aachen.de/record/572460","pdf_url":null,"source":{"id":"https://openalex.org/S4306401362","display_name":"RWTH Publications (RWTH Aachen)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"host_organization":"https://openalex.org/I887968799","host_organization_name":"RWTH Aachen University","host_organization_lineage":["https://openalex.org/I887968799"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"International journal of computer integrated manufacturing 29(11), 1227-1237 (2016). doi:10.1080/0951192X.2016.1145798","raw_type":"info:eu-repo/semantics/article"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320320879","display_name":"Deutsche Forschungsgemeinschaft","ror":"https://ror.org/018mejw64"}],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":20,"referenced_works":["https://openalex.org/W1567903304","https://openalex.org/W1581163326","https://openalex.org/W1625001589","https://openalex.org/W1649645444","https://openalex.org/W1982652804","https://openalex.org/W1998721167","https://openalex.org/W2001957594","https://openalex.org/W2004885810","https://openalex.org/W2037730084","https://openalex.org/W2042921921","https://openalex.org/W2051456289","https://openalex.org/W2066247001","https://openalex.org/W2075831622","https://openalex.org/W2127402951","https://openalex.org/W2128418853","https://openalex.org/W2333302965","https://openalex.org/W2599927328","https://openalex.org/W4235796286","https://openalex.org/W4238691064","https://openalex.org/W4312621435"],"related_works":["https://openalex.org/W1998546186","https://openalex.org/W2061967405","https://openalex.org/W2392646414","https://openalex.org/W2174860717","https://openalex.org/W2590542424","https://openalex.org/W2110528520","https://openalex.org/W2734799811","https://openalex.org/W2888673113","https://openalex.org/W2043557177","https://openalex.org/W2349351862"],"abstract_inverted_index":{"The":[0,72,107,126],"alignment":[1,57,63,127],"of":[2,42,58,109,135],"optical":[3,102,138],"components":[4,122],"is":[5,68,75,90],"challenging.":[6],"This":[7,88],"paper":[8],"proposes":[9],"self-optimisation":[10],"as":[11,111,113],"a":[12,78,100,136],"means":[13],"for":[14,35,81,141],"reducing":[15],"planning":[16],"efforts":[17],"and":[18,26,70,120,145],"increasing":[19],"the":[20,51,56,62,65,93,114,133],"system\u2019s":[21],"autonomy.":[22],"Hence,":[23],"reduced":[24],"costs":[25],"production":[27],"times":[28],"can":[29],"be":[30,124,130],"achieved.":[31],"Moreover,":[32],"self-optimising":[33],"approaches":[34],"laser":[36,66,142],"optics":[37,59],"assembly":[38,52,94],"enabling":[39],"autonomous":[40],"compensation":[41],"manufacturing":[43],"tolerances":[44],"are":[45],"presented.":[46],"Based":[47],"on":[48,84],"ray-tracing":[49,73],"simulation,":[50],"system":[53,95,139],"carries":[54],"out":[55],"automatically.":[60],"During":[61],"process":[64],"beam":[67,143],"monitored":[69],"analysed.":[71],"simulation":[74],"updated":[76],"in":[77,96],"closed-loop":[79],"manner":[80],"gaining":[82],"information":[83,89],"required":[85],"correction":[86],"movements.":[87],"passed":[91],"to":[92,98],"order":[97],"achieve":[99],"valid":[101],"function":[103],"using":[104,132],"tolerance-affected":[105],"components.":[106],"choice":[108],"metrology":[110],"well":[112],"interfaces":[115],"between":[116],"different":[117],"software":[118],"packages":[119],"hardware":[121],"will":[123,129],"discussed.":[125],"procedure":[128],"described":[131],"example":[134],"miniaturised":[137],"suitable":[140],"guiding":[144],"shaping.":[146]},"counts_by_year":[{"year":2026,"cited_by_count":1},{"year":2025,"cited_by_count":1},{"year":2023,"cited_by_count":1},{"year":2022,"cited_by_count":1},{"year":2018,"cited_by_count":1}],"updated_date":"2026-08-06T08:24:18.245995","created_date":"2025-10-10T00:00:00"}