{"id":"https://openalex.org/W2054281524","doi":"https://doi.org/10.1080/00207720802645204","title":"Implementing virtual metrology for in-line quality control in semiconductor manufacturing","display_name":"Implementing virtual metrology for in-line quality control in semiconductor manufacturing","publication_year":2009,"publication_date":"2009-05-01","ids":{"openalex":"https://openalex.org/W2054281524","doi":"https://doi.org/10.1080/00207720802645204","mag":"2054281524"},"language":"en","primary_location":{"id":"doi:10.1080/00207720802645204","is_oa":false,"landing_page_url":"https://doi.org/10.1080/00207720802645204","pdf_url":null,"source":{"id":"https://openalex.org/S129640837","display_name":"International Journal of Systems Science","issn_l":"0020-7721","issn":["0020-7721","1464-5319"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310320547","host_organization_name":"Taylor & Francis","host_organization_lineage":["https://openalex.org/P4310320547"],"host_organization_lineage_names":["Taylor & Francis"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"International Journal of Systems Science","raw_type":"journal-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5022452725","display_name":"Jason Chao-Hsien Pan","orcid":"https://orcid.org/0000-0002-3481-8703"},"institutions":[{"id":"https://openalex.org/I29742261","display_name":"Takming University of Science and Technology","ror":"https://ror.org/002xar614","country_code":"TW","type":"education","lineage":["https://openalex.org/I29742261"]}],"countries":["TW"],"is_corresponding":true,"raw_author_name":"Jason Chao-Hsien Pan","raw_affiliation_strings":["Department of Business Administration, Takming University of Science and Technology, Taiwan","Department of Business Administration , Takming University of Science and Technology , Taiwan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Business Administration, Takming University of Science and Technology, Taiwan","institution_ids":["https://openalex.org/I29742261"]},{"raw_affiliation_string":"Department of Business Administration , Takming University of Science and Technology , Taiwan","institution_ids":["https://openalex.org/I29742261"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5047272130","display_name":"Damon HE Tai","orcid":null},"institutions":[{"id":"https://openalex.org/I154864474","display_name":"National Taiwan University of Science and Technology","ror":"https://ror.org/00q09pe49","country_code":"TW","type":"education","lineage":["https://openalex.org/I154864474"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Damon HE Tai","raw_affiliation_strings":["Graduate Institute of Management, National Taiwan University of Science and Technology, Taiwan","Graduate Institute of Management, National Taiwan University of Science and Technology , Taiwan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Graduate Institute of Management, National Taiwan University of Science and Technology, Taiwan","institution_ids":["https://openalex.org/I154864474"]},{"raw_affiliation_string":"Graduate Institute of Management, National Taiwan University of Science and Technology , Taiwan","institution_ids":["https://openalex.org/I154864474"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":["https://openalex.org/A5022452725"],"corresponding_institution_ids":["https://openalex.org/I29742261"],"apc_list":null,"apc_paid":null,"fwci":1.3565,"has_fulltext":false,"cited_by_count":12,"citation_normalized_percentile":{"value":0.85565366,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":97},"biblio":{"volume":"40","issue":"5","first_page":"461","last_page":"470"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T12111","display_name":"Industrial Vision Systems and Defect Detection","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T12111","display_name":"Industrial Vision Systems and Defect Detection","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11443","display_name":"Advanced Statistical Process Monitoring","score":0.9908000230789185,"subfield":{"id":"https://openalex.org/subfields/1804","display_name":"Statistics, Probability and Uncertainty"},"field":{"id":"https://openalex.org/fields/18","display_name":"Decision Sciences"},"domain":{"id":"https://openalex.org/domains/2","display_name":"Social Sciences"}},{"id":"https://openalex.org/T10640","display_name":"Spectroscopy and Chemometric Analyses","score":0.9731000065803528,"subfield":{"id":"https://openalex.org/subfields/1602","display_name":"Analytical Chemistry"},"field":{"id":"https://openalex.org/fields/16","display_name":"Chemistry"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/semiconductor-device-fabrication","display_name":"Semiconductor device fabrication","score":0.7422538995742798},{"id":"https://openalex.org/keywords/metrology","display_name":"Metrology","score":0.6811740398406982},{"id":"https://openalex.org/keywords/statistical-process-control","display_name":"Statistical process control","score":0.6034104824066162},{"id":"https://openalex.org/keywords/production-line","display_name":"Production line","score":0.5549003481864929},{"id":"https://openalex.org/keywords/credibility","display_name":"Credibility","score":0.540510356426239},{"id":"https://openalex.org/keywords/process","display_name":"Process (computing)","score":0.5372810959815979},{"id":"https://openalex.org/keywords/reliability-engineering","display_name":"Reliability engineering","score":0.5368990898132324},{"id":"https://openalex.org/keywords/quality","display_name":"Quality (philosophy)","score":0.5184449553489685},{"id":"https://openalex.org/keywords/manufacturing-engineering","display_name":"Manufacturing engineering","score":0.5105887055397034},{"id":"https://openalex.org/keywords/process-control","display_name":"Process control","score":0.499053955078125},{"id":"https://openalex.org/keywords/wafer","display_name":"Wafer","score":0.4897305965423584},{"id":"https://openalex.org/keywords/control","display_name":"Control (management)","score":0.465831458568573},{"id":"https://openalex.org/keywords/industrial-engineering","display_name":"Industrial engineering","score":0.46309685707092285},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.46028369665145874},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.45306357741355896},{"id":"https://openalex.org/keywords/identification","display_name":"Identification (biology)","score":0.4464690089225769},{"id":"https://openalex.org/keywords/mechanical-engineering","display_name":"Mechanical engineering","score":0.20954406261444092},{"id":"https://openalex.org/keywords/artificial-intelligence","display_name":"Artificial intelligence","score":0.16054034233093262},{"id":"https://openalex.org/keywords/mathematics","display_name":"Mathematics","score":0.09591367840766907},{"id":"https://openalex.org/keywords/statistics","display_name":"Statistics","score":0.09474369883537292},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.07717150449752808}],"concepts":[{"id":"https://openalex.org/C66018809","wikidata":"https://www.wikidata.org/wiki/Q1570432","display_name":"Semiconductor device fabrication","level":3,"score":0.7422538995742798},{"id":"https://openalex.org/C195766429","wikidata":"https://www.wikidata.org/wiki/Q394","display_name":"Metrology","level":2,"score":0.6811740398406982},{"id":"https://openalex.org/C113644684","wikidata":"https://www.wikidata.org/wiki/Q1356717","display_name":"Statistical process control","level":3,"score":0.6034104824066162},{"id":"https://openalex.org/C99862985","wikidata":"https://www.wikidata.org/wiki/Q10858068","display_name":"Production line","level":2,"score":0.5549003481864929},{"id":"https://openalex.org/C2780224610","wikidata":"https://www.wikidata.org/wiki/Q1530061","display_name":"Credibility","level":2,"score":0.540510356426239},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.5372810959815979},{"id":"https://openalex.org/C200601418","wikidata":"https://www.wikidata.org/wiki/Q2193887","display_name":"Reliability engineering","level":1,"score":0.5368990898132324},{"id":"https://openalex.org/C2779530757","wikidata":"https://www.wikidata.org/wiki/Q1207505","display_name":"Quality (philosophy)","level":2,"score":0.5184449553489685},{"id":"https://openalex.org/C117671659","wikidata":"https://www.wikidata.org/wiki/Q11049265","display_name":"Manufacturing engineering","level":1,"score":0.5105887055397034},{"id":"https://openalex.org/C155386361","wikidata":"https://www.wikidata.org/wiki/Q1649571","display_name":"Process control","level":3,"score":0.499053955078125},{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.4897305965423584},{"id":"https://openalex.org/C2775924081","wikidata":"https://www.wikidata.org/wiki/Q55608371","display_name":"Control (management)","level":2,"score":0.465831458568573},{"id":"https://openalex.org/C13736549","wikidata":"https://www.wikidata.org/wiki/Q4489420","display_name":"Industrial engineering","level":1,"score":0.46309685707092285},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.46028369665145874},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.45306357741355896},{"id":"https://openalex.org/C116834253","wikidata":"https://www.wikidata.org/wiki/Q2039217","display_name":"Identification (biology)","level":2,"score":0.4464690089225769},{"id":"https://openalex.org/C78519656","wikidata":"https://www.wikidata.org/wiki/Q101333","display_name":"Mechanical engineering","level":1,"score":0.20954406261444092},{"id":"https://openalex.org/C154945302","wikidata":"https://www.wikidata.org/wiki/Q11660","display_name":"Artificial intelligence","level":1,"score":0.16054034233093262},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.09591367840766907},{"id":"https://openalex.org/C105795698","wikidata":"https://www.wikidata.org/wiki/Q12483","display_name":"Statistics","level":1,"score":0.09474369883537292},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.07717150449752808},{"id":"https://openalex.org/C59822182","wikidata":"https://www.wikidata.org/wiki/Q441","display_name":"Botany","level":1,"score":0.0},{"id":"https://openalex.org/C111472728","wikidata":"https://www.wikidata.org/wiki/Q9471","display_name":"Epistemology","level":1,"score":0.0},{"id":"https://openalex.org/C138885662","wikidata":"https://www.wikidata.org/wiki/Q5891","display_name":"Philosophy","level":0,"score":0.0},{"id":"https://openalex.org/C86803240","wikidata":"https://www.wikidata.org/wiki/Q420","display_name":"Biology","level":0,"score":0.0},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0},{"id":"https://openalex.org/C199539241","wikidata":"https://www.wikidata.org/wiki/Q7748","display_name":"Law","level":1,"score":0.0},{"id":"https://openalex.org/C17744445","wikidata":"https://www.wikidata.org/wiki/Q36442","display_name":"Political science","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1080/00207720802645204","is_oa":false,"landing_page_url":"https://doi.org/10.1080/00207720802645204","pdf_url":null,"source":{"id":"https://openalex.org/S129640837","display_name":"International Journal of Systems Science","issn_l":"0020-7721","issn":["0020-7721","1464-5319"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310320547","host_organization_name":"Taylor & Francis","host_organization_lineage":["https://openalex.org/P4310320547"],"host_organization_lineage_names":["Taylor & Francis"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"International Journal of Systems Science","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[{"display_name":"Industry, innovation and infrastructure","id":"https://metadata.un.org/sdg/9","score":0.5099999904632568}],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":27,"referenced_works":["https://openalex.org/W45362603","https://openalex.org/W196041357","https://openalex.org/W1585125368","https://openalex.org/W1788845434","https://openalex.org/W1954231020","https://openalex.org/W1985822304","https://openalex.org/W1985870217","https://openalex.org/W1998361113","https://openalex.org/W2024233657","https://openalex.org/W2065123330","https://openalex.org/W2075852334","https://openalex.org/W2106485576","https://openalex.org/W2107550485","https://openalex.org/W2115540908","https://openalex.org/W2115571336","https://openalex.org/W2136376347","https://openalex.org/W2147973445","https://openalex.org/W2154829656","https://openalex.org/W2158863190","https://openalex.org/W2162251039","https://openalex.org/W2791282478","https://openalex.org/W2797532987","https://openalex.org/W3142707146","https://openalex.org/W3145013517","https://openalex.org/W4233062534","https://openalex.org/W4248654223","https://openalex.org/W4285719527"],"related_works":["https://openalex.org/W2151505334","https://openalex.org/W2507812949","https://openalex.org/W2115540908","https://openalex.org/W4256167503","https://openalex.org/W2096403952","https://openalex.org/W2060880752","https://openalex.org/W2600422794","https://openalex.org/W1876981296","https://openalex.org/W2055715190","https://openalex.org/W2081165380"],"abstract_inverted_index":{"The":[0],"in-line":[1],"quality":[2,74],"control":[3,14,121,152],"measured":[4],"data":[5],"plays":[6],"an":[7,55,148],"increasingly":[8],"important":[9],"role":[10],"in":[11,20,28,36,160],"both":[12],"the":[13,16,21,37,64,101,108,125,128,133,138,141,151,157,165,168],"and":[15,53,91,104,135,153,163],"improvement":[17],"of":[18,24,58,68,75,111,127,137,140,156,170],"yields":[19],"production":[22,44,110],"process":[23,69,73,120],"semiconductor":[25,31,112,161],"manufacturing,":[26],"especially":[27],"300":[29],"mm":[30],"factories.":[32],"Thus,":[33],"a":[34],"breakthrough":[35],"measuring":[38],"methodology":[39],"associated":[40],"with":[41,173],"wafer":[42,76],"level":[43],"is":[45],"highly":[46],"desirable.":[47],"This":[48,114],"article":[49,115],"addresses":[50],"this":[51,79,145,171],"issue":[52],"proposes":[54,116],"extended":[56],"concept":[57],"virtual":[59],"metrology":[60],"(VM)":[61],"that":[62],"utilises":[63],"status":[65],"variables":[66],"identification":[67],"equipments":[70],"to":[71,96,117,123],"predict":[72],"level.":[77],"In":[78],"article,":[80],"we":[81],"will":[82],"discuss":[83],"two":[84,174],"modelling":[85],"techniques,":[86],"namely":[87],"multiple":[88],"linear":[89],"regression":[90],"partial":[92],"least":[93],"square":[94],"regression,":[95],"build":[97],"prediction":[98],"models":[99],"for":[100,107,150],"film":[102],"thickness":[103],"critical":[105],"dimensions":[106],"on-line":[109],"manufacturing.":[113],"use":[118],"statistical":[119],"rules":[122],"enhance":[124],"credibility":[126],"VM":[129,142,158],"applications":[130],"based":[131],"on":[132,167],"tendency":[134],"characteristics":[136],"residuals":[139],"models.":[143],"Finally,":[144],"study":[146],"presents":[147],"architecture":[149,172],"alarm":[154],"mechanism":[155],"approach":[159],"manufacturing":[162],"illustrates":[164],"results":[166],"application":[169],"real":[175],"cases":[176],"as":[177],"well.":[178]},"counts_by_year":[{"year":2025,"cited_by_count":2},{"year":2024,"cited_by_count":1},{"year":2020,"cited_by_count":1},{"year":2019,"cited_by_count":1},{"year":2017,"cited_by_count":2},{"year":2016,"cited_by_count":3},{"year":2012,"cited_by_count":1}],"updated_date":"2026-07-29T09:40:50.615796","created_date":"2025-10-10T00:00:00"}