{"id":"https://openalex.org/W2084190530","doi":"https://doi.org/10.1016/s0026-2692(03)00241-6","title":"High-performance polycrystalline silicon thin-film transistor technology using low-temperature metal-induced unilateral crystallization","display_name":"High-performance polycrystalline silicon thin-film transistor technology using low-temperature metal-induced unilateral crystallization","publication_year":2003,"publication_date":"2003-09-12","ids":{"openalex":"https://openalex.org/W2084190530","doi":"https://doi.org/10.1016/s0026-2692(03)00241-6","mag":"2084190530"},"language":"en","primary_location":{"id":"doi:10.1016/s0026-2692(03)00241-6","is_oa":false,"landing_page_url":"https://doi.org/10.1016/s0026-2692(03)00241-6","pdf_url":null,"source":{"id":"https://openalex.org/S98831239","display_name":"Microelectronics Journal","issn_l":"1879-2391","issn":["1879-2391"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Microelectronics Journal","raw_type":"journal-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5028123645","display_name":"Man Wong","orcid":"https://orcid.org/0000-0002-2837-6646"},"institutions":[{"id":"https://openalex.org/I200769079","display_name":"Hong Kong University of Science and Technology","ror":"https://ror.org/00q4vv597","country_code":"HK","type":"education","lineage":["https://openalex.org/I200769079"]}],"countries":["HK"],"is_corresponding":true,"raw_author_name":"Man Wong","raw_affiliation_strings":["Department of Electrical and Electronic Engineering, The Hong Kong University of Science and Technology, Clear Water Bay, Kowloon, Hong Kong","Department of Electrical and Electronic Engineering,#N#The Hong Kong University of Science and Technology, Clear Water Bay,#N#Kowloon, Hong Kong"],"affiliations":[{"raw_affiliation_string":"Department of Electrical and Electronic Engineering, The Hong Kong University of Science and Technology, Clear Water Bay, Kowloon, Hong Kong","institution_ids":["https://openalex.org/I200769079"]},{"raw_affiliation_string":"Department of Electrical and Electronic Engineering,#N#The Hong Kong University of Science and Technology, Clear Water Bay,#N#Kowloon, Hong Kong","institution_ids":["https://openalex.org/I200769079"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5060532769","display_name":"Hoi Sing Kwok","orcid":"https://orcid.org/0000-0002-2820-9530"},"institutions":[{"id":"https://openalex.org/I200769079","display_name":"Hong Kong University of Science and Technology","ror":"https://ror.org/00q4vv597","country_code":"HK","type":"education","lineage":["https://openalex.org/I200769079"]}],"countries":["HK"],"is_corresponding":false,"raw_author_name":"Hoi S. Kwok","raw_affiliation_strings":["Department of Electrical and Electronic Engineering, The Hong Kong University of Science and Technology, Clear Water Bay, Kowloon, Hong Kong","Department of Electrical and Electronic Engineering,#N#The Hong Kong University of Science and Technology, Clear Water Bay,#N#Kowloon, Hong Kong"],"affiliations":[{"raw_affiliation_string":"Department of Electrical and Electronic Engineering, The Hong Kong University of Science and Technology, Clear Water Bay, Kowloon, Hong Kong","institution_ids":["https://openalex.org/I200769079"]},{"raw_affiliation_string":"Department of Electrical and Electronic Engineering,#N#The Hong Kong University of Science and Technology, Clear Water Bay,#N#Kowloon, Hong Kong","institution_ids":["https://openalex.org/I200769079"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":["https://openalex.org/A5028123645"],"corresponding_institution_ids":["https://openalex.org/I200769079"],"apc_list":{"value":2370,"currency":"USD","value_usd":2370},"apc_paid":null,"fwci":1.0625,"has_fulltext":false,"cited_by_count":13,"citation_normalized_percentile":{"value":0.78302354,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":94},"biblio":{"volume":"35","issue":"4","first_page":"337","last_page":"341"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10623","display_name":"Thin-Film Transistor Technologies","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10623","display_name":"Thin-Film Transistor Technologies","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11169","display_name":"Silicon Nanostructures and Photoluminescence","score":0.9865999817848206,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11272","display_name":"Nanowire Synthesis and Applications","score":0.983299970626831,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.853592038154602},{"id":"https://openalex.org/keywords/polycrystalline-silicon","display_name":"Polycrystalline silicon","score":0.8166191577911377},{"id":"https://openalex.org/keywords/thin-film-transistor","display_name":"Thin-film transistor","score":0.8078026175498962},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.6878501176834106},{"id":"https://openalex.org/keywords/diode","display_name":"Diode","score":0.6616349220275879},{"id":"https://openalex.org/keywords/silicon","display_name":"Silicon","score":0.6039708256721497},{"id":"https://openalex.org/keywords/crystallization","display_name":"Crystallization","score":0.5474177598953247},{"id":"https://openalex.org/keywords/transistor","display_name":"Transistor","score":0.5304186940193176},{"id":"https://openalex.org/keywords/leakage","display_name":"Leakage (economics)","score":0.48084983229637146},{"id":"https://openalex.org/keywords/liquid-crystal-display","display_name":"Liquid-crystal display","score":0.4392131268978119},{"id":"https://openalex.org/keywords/crystallite","display_name":"Crystallite","score":0.42619240283966064},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.2878456115722656},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.17209002375602722},{"id":"https://openalex.org/keywords/metallurgy","display_name":"Metallurgy","score":0.16943645477294922},{"id":"https://openalex.org/keywords/voltage","display_name":"Voltage","score":0.09026575088500977},{"id":"https://openalex.org/keywords/layer","display_name":"Layer (electronics)","score":0.07665947079658508}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.853592038154602},{"id":"https://openalex.org/C2780565262","wikidata":"https://www.wikidata.org/wiki/Q737038","display_name":"Polycrystalline silicon","level":4,"score":0.8166191577911377},{"id":"https://openalex.org/C87359718","wikidata":"https://www.wikidata.org/wiki/Q1271916","display_name":"Thin-film transistor","level":3,"score":0.8078026175498962},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.6878501176834106},{"id":"https://openalex.org/C78434282","wikidata":"https://www.wikidata.org/wiki/Q11656","display_name":"Diode","level":2,"score":0.6616349220275879},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.6039708256721497},{"id":"https://openalex.org/C203036418","wikidata":"https://www.wikidata.org/wiki/Q284256","display_name":"Crystallization","level":2,"score":0.5474177598953247},{"id":"https://openalex.org/C172385210","wikidata":"https://www.wikidata.org/wiki/Q5339","display_name":"Transistor","level":3,"score":0.5304186940193176},{"id":"https://openalex.org/C2777042071","wikidata":"https://www.wikidata.org/wiki/Q6509304","display_name":"Leakage (economics)","level":2,"score":0.48084983229637146},{"id":"https://openalex.org/C128019096","wikidata":"https://www.wikidata.org/wiki/Q83341","display_name":"Liquid-crystal display","level":2,"score":0.4392131268978119},{"id":"https://openalex.org/C137637335","wikidata":"https://www.wikidata.org/wiki/Q899604","display_name":"Crystallite","level":2,"score":0.42619240283966064},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.2878456115722656},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.17209002375602722},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.16943645477294922},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.09026575088500977},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.07665947079658508},{"id":"https://openalex.org/C162324750","wikidata":"https://www.wikidata.org/wiki/Q8134","display_name":"Economics","level":0,"score":0.0},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C139719470","wikidata":"https://www.wikidata.org/wiki/Q39680","display_name":"Macroeconomics","level":1,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1016/s0026-2692(03)00241-6","is_oa":false,"landing_page_url":"https://doi.org/10.1016/s0026-2692(03)00241-6","pdf_url":null,"source":{"id":"https://openalex.org/S98831239","display_name":"Microelectronics Journal","issn_l":"1879-2391","issn":["1879-2391"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Microelectronics Journal","raw_type":"journal-article"},{"id":"pmh:oai:repository.hkust.edu.hk:1783.1-47638","is_oa":false,"landing_page_url":"http://repository.hkust.edu.hk/ir/Record/1783.1-47638","pdf_url":null,"source":{"id":"https://openalex.org/S4306401796","display_name":"Rare & Special e-Zone (The Hong Kong University of Science and Technology)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"host_organization":"https://openalex.org/I200769079","host_organization_name":"Hong Kong University of Science and Technology","host_organization_lineage":["https://openalex.org/I200769079"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":null,"raw_type":"Article"}],"best_oa_location":null,"sustainable_development_goals":[{"score":0.7200000286102295,"id":"https://metadata.un.org/sdg/7","display_name":"Affordable and clean energy"}],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":4,"referenced_works":["https://openalex.org/W2048883452","https://openalex.org/W2151997546","https://openalex.org/W2318373247","https://openalex.org/W4220666134"],"related_works":["https://openalex.org/W1976630228","https://openalex.org/W2168051707","https://openalex.org/W2141796872","https://openalex.org/W2083881355","https://openalex.org/W1995584621","https://openalex.org/W2353338342","https://openalex.org/W2036852092","https://openalex.org/W2349084057","https://openalex.org/W2012364154","https://openalex.org/W2102089219"],"abstract_inverted_index":null,"counts_by_year":[{"year":2022,"cited_by_count":1},{"year":2015,"cited_by_count":1},{"year":2013,"cited_by_count":1},{"year":2012,"cited_by_count":1}],"updated_date":"2026-04-15T08:11:43.952461","created_date":"2025-10-10T00:00:00"}