{"id":"https://openalex.org/W1978395924","doi":"https://doi.org/10.1016/0010-4485(94)90074-4","title":"Fitting a woven-cloth model to a curved surface: mapping algorithms","display_name":"Fitting a woven-cloth model to a curved surface: mapping algorithms","publication_year":1994,"publication_date":"1994-04-01","ids":{"openalex":"https://openalex.org/W1978395924","doi":"https://doi.org/10.1016/0010-4485(94)90074-4","mag":"1978395924"},"language":"en","primary_location":{"id":"doi:10.1016/0010-4485(94)90074-4","is_oa":false,"landing_page_url":"https://doi.org/10.1016/0010-4485(94)90074-4","pdf_url":null,"source":{"id":"https://openalex.org/S4210171473","display_name":"Computer-Aided Design","issn_l":"0010-4485","issn":["0010-4485","1879-2685"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Computer-Aided Design","raw_type":"journal-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5022595726","display_name":"Masaki Aono","orcid":"https://orcid.org/0000-0003-1383-1076"},"institutions":[{"id":"https://openalex.org/I165799507","display_name":"Rensselaer Polytechnic Institute","ror":"https://ror.org/01rtyzb94","country_code":"US","type":"education","lineage":["https://openalex.org/I165799507"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"M. Aono","raw_affiliation_strings":["Design and Manufacturing Institute, Rensselaer Polytechnic Institute, Troy, NY 12180-3590, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Design and Manufacturing Institute, Rensselaer Polytechnic Institute, Troy, NY 12180-3590, USA","institution_ids":["https://openalex.org/I165799507"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5061644705","display_name":"David E. Breen","orcid":"https://orcid.org/0000-0002-1376-5008"},"institutions":[{"id":"https://openalex.org/I4210166625","display_name":"Huawei German Research Center","ror":"https://ror.org/00z59w514","country_code":"DE","type":"facility","lineage":["https://openalex.org/I2250955327","https://openalex.org/I4210129353","https://openalex.org/I4210166625"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"D.E. Breen","raw_affiliation_strings":["Currently at the European Computer Industry Research Center, Arabellastrase 17, D-81925 Munich, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Currently at the European Computer Industry Research Center, Arabellastrase 17, D-81925 Munich, Germany","institution_ids":["https://openalex.org/I4210166625"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5077332735","display_name":"M. J. Wozny","orcid":"https://orcid.org/0009-0004-7860-0396"},"institutions":[{"id":"https://openalex.org/I165799507","display_name":"Rensselaer Polytechnic Institute","ror":"https://ror.org/01rtyzb94","country_code":"US","type":"education","lineage":["https://openalex.org/I165799507"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"M.J. Wozny","raw_affiliation_strings":["Design and Manufacturing Institute, Rensselaer Polytechnic Institute, Troy, NY 12180-3590, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Design and Manufacturing Institute, Rensselaer Polytechnic Institute, Troy, NY 12180-3590, USA","institution_ids":["https://openalex.org/I165799507"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":{"value":3390,"currency":"USD","value_usd":3390},"apc_paid":null,"fwci":1.5952,"has_fulltext":false,"cited_by_count":61,"citation_normalized_percentile":{"value":0.78560051,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":97},"biblio":{"volume":"26","issue":"4","first_page":"278","last_page":"292"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11595","display_name":"Textile materials and evaluations","score":0.9997000098228455,"subfield":{"id":"https://openalex.org/subfields/2507","display_name":"Polymers and Plastics"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11595","display_name":"Textile materials and evaluations","score":0.9997000098228455,"subfield":{"id":"https://openalex.org/subfields/2507","display_name":"Polymers and Plastics"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10719","display_name":"3D Shape Modeling and Analysis","score":0.9961000084877014,"subfield":{"id":"https://openalex.org/subfields/2206","display_name":"Computational Mechanics"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10481","display_name":"Computer Graphics and Visualization Techniques","score":0.989300012588501,"subfield":{"id":"https://openalex.org/subfields/1704","display_name":"Computer Graphics and Computer-Aided Design"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/surface","display_name":"Surface (topology)","score":0.7618026733398438},{"id":"https://openalex.org/keywords/surface-fitting","display_name":"Surface fitting","score":0.7082569003105164},{"id":"https://openalex.org/keywords/range","display_name":"Range (aeronautics)","score":0.6007388234138489},{"id":"https://openalex.org/keywords/algorithm","display_name":"Algorithm","score":0.5228446125984192},{"id":"https://openalex.org/keywords/curve-fitting","display_name":"Curve fitting","score":0.4743049144744873},{"id":"https://openalex.org/keywords/geometry","display_name":"Geometry","score":0.45226070284843445},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.4031514525413513},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.35753732919692993},{"id":"https://openalex.org/keywords/mathematics","display_name":"Mathematics","score":0.31898486614227295},{"id":"https://openalex.org/keywords/composite-material","display_name":"Composite material","score":0.16476696729660034}],"concepts":[{"id":"https://openalex.org/C2776799497","wikidata":"https://www.wikidata.org/wiki/Q484298","display_name":"Surface (topology)","level":2,"score":0.7618026733398438},{"id":"https://openalex.org/C2984999661","wikidata":"https://www.wikidata.org/wiki/Q603159","display_name":"Surface fitting","level":3,"score":0.7082569003105164},{"id":"https://openalex.org/C204323151","wikidata":"https://www.wikidata.org/wiki/Q905424","display_name":"Range (aeronautics)","level":2,"score":0.6007388234138489},{"id":"https://openalex.org/C11413529","wikidata":"https://www.wikidata.org/wiki/Q8366","display_name":"Algorithm","level":1,"score":0.5228446125984192},{"id":"https://openalex.org/C184389593","wikidata":"https://www.wikidata.org/wiki/Q603159","display_name":"Curve fitting","level":2,"score":0.4743049144744873},{"id":"https://openalex.org/C2524010","wikidata":"https://www.wikidata.org/wiki/Q8087","display_name":"Geometry","level":1,"score":0.45226070284843445},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.4031514525413513},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.35753732919692993},{"id":"https://openalex.org/C33923547","wikidata":"https://www.wikidata.org/wiki/Q395","display_name":"Mathematics","level":0,"score":0.31898486614227295},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.16476696729660034},{"id":"https://openalex.org/C119857082","wikidata":"https://www.wikidata.org/wiki/Q2539","display_name":"Machine learning","level":1,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1016/0010-4485(94)90074-4","is_oa":false,"landing_page_url":"https://doi.org/10.1016/0010-4485(94)90074-4","pdf_url":null,"source":{"id":"https://openalex.org/S4210171473","display_name":"Computer-Aided Design","issn_l":"0010-4485","issn":["0010-4485","1879-2685"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Computer-Aided Design","raw_type":"journal-article"},{"id":"pmh:oai:CiteSeerX.psu:10.1.1.45.7493","is_oa":false,"landing_page_url":"http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.45.7493","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"ftp://ftp.gg.caltech.edu/pub/david/cad94.ps.Z","raw_type":"text"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":22,"referenced_works":["https://openalex.org/W165171152","https://openalex.org/W413279190","https://openalex.org/W1527717849","https://openalex.org/W1551207461","https://openalex.org/W1566179750","https://openalex.org/W1573281334","https://openalex.org/W1608751692","https://openalex.org/W1976109300","https://openalex.org/W1986730711","https://openalex.org/W2059293274","https://openalex.org/W2064906289","https://openalex.org/W2093465085","https://openalex.org/W2109157915","https://openalex.org/W2151034352","https://openalex.org/W2331385834","https://openalex.org/W2591181672","https://openalex.org/W2898916015","https://openalex.org/W2923935037","https://openalex.org/W3145942193","https://openalex.org/W4206616830","https://openalex.org/W6606761123","https://openalex.org/W6631529165"],"related_works":["https://openalex.org/W2075124641","https://openalex.org/W2356803104","https://openalex.org/W2065843430","https://openalex.org/W2357329045","https://openalex.org/W4362709210","https://openalex.org/W2372265507","https://openalex.org/W2361151704","https://openalex.org/W2392650684","https://openalex.org/W2388353711","https://openalex.org/W2136311490"],"abstract_inverted_index":null,"counts_by_year":[{"year":2026,"cited_by_count":1},{"year":2025,"cited_by_count":1},{"year":2024,"cited_by_count":2},{"year":2023,"cited_by_count":1},{"year":2022,"cited_by_count":1},{"year":2021,"cited_by_count":4},{"year":2020,"cited_by_count":4},{"year":2018,"cited_by_count":1},{"year":2016,"cited_by_count":1},{"year":2015,"cited_by_count":1},{"year":2014,"cited_by_count":2},{"year":2013,"cited_by_count":2},{"year":2012,"cited_by_count":1}],"updated_date":"2026-07-23T08:03:31.855105","created_date":"2025-10-10T00:00:00"}