{"id":"https://openalex.org/W2140347636","doi":"https://doi.org/10.1016/0005-1098(92)90112-s","title":"Optimal control of the wafer temperatures in diffusion/LPCVD reactors","display_name":"Optimal control of the wafer temperatures in diffusion/LPCVD reactors","publication_year":1992,"publication_date":"1992-03-01","ids":{"openalex":"https://openalex.org/W2140347636","doi":"https://doi.org/10.1016/0005-1098(92)90112-s","mag":"2140347636"},"language":"en","primary_location":{"id":"doi:10.1016/0005-1098(92)90112-s","is_oa":false,"landing_page_url":"https://doi.org/10.1016/0005-1098(92)90112-s","pdf_url":null,"source":{"id":"https://openalex.org/S51360982","display_name":"Automatica","issn_l":"0005-1098","issn":["0005-1098","1873-2836"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Automatica","raw_type":"journal-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5109122245","display_name":"H. de Waard","orcid":null},"institutions":[{"id":"https://openalex.org/I927159995","display_name":"ASM International","ror":"https://ror.org/0244fmj21","country_code":"US","type":"other","lineage":["https://openalex.org/I927159995"]}],"countries":["US"],"is_corresponding":true,"raw_author_name":"H. De Waard","raw_affiliation_strings":["ASM Microelectronics Technology Centre, PO Box 100, 3720 AC Bilthoven, The Netherlands"],"affiliations":[{"raw_affiliation_string":"ASM Microelectronics Technology Centre, PO Box 100, 3720 AC Bilthoven, The Netherlands","institution_ids":["https://openalex.org/I927159995"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5111461646","display_name":"W.L. De Koning","orcid":null},"institutions":[{"id":"https://openalex.org/I98358874","display_name":"Delft University of Technology","ror":"https://ror.org/02e2c7k09","country_code":"NL","type":"education","lineage":["https://openalex.org/I98358874"]}],"countries":["NL"],"is_corresponding":false,"raw_author_name":"W.L. De Koning","raw_affiliation_strings":["Faculty of Mathematics and Informatics, Delft University of Technology, Delft, The Netherlands"],"affiliations":[{"raw_affiliation_string":"Faculty of Mathematics and Informatics, Delft University of Technology, Delft, The Netherlands","institution_ids":["https://openalex.org/I98358874"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":2,"corresponding_author_ids":["https://openalex.org/A5109122245"],"corresponding_institution_ids":["https://openalex.org/I927159995"],"apc_list":{"value":3500,"currency":"USD","value_usd":3500},"apc_paid":null,"fwci":0.843,"has_fulltext":false,"cited_by_count":13,"citation_normalized_percentile":{"value":0.76884921,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":95},"biblio":{"volume":"28","issue":"2","first_page":"243","last_page":"253"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10791","display_name":"Advanced Control Systems Optimization","score":0.9993000030517578,"subfield":{"id":"https://openalex.org/subfields/2207","display_name":"Control and Systems Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10791","display_name":"Advanced Control Systems Optimization","score":0.9993000030517578,"subfield":{"id":"https://openalex.org/subfields/2207","display_name":"Control and Systems Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10876","display_name":"Fault Detection and Control Systems","score":0.996399998664856,"subfield":{"id":"https://openalex.org/subfields/2207","display_name":"Control and Systems Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11749","display_name":"Iterative Learning Control Systems","score":0.994700014591217,"subfield":{"id":"https://openalex.org/subfields/2207","display_name":"Control and Systems Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/wafer","display_name":"Wafer","score":0.6947012543678284},{"id":"https://openalex.org/keywords/diffusion","display_name":"Diffusion","score":0.6323431134223938},{"id":"https://openalex.org/keywords/chemical-vapor-deposition","display_name":"Chemical vapor deposition","score":0.6109887361526489},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.5319540500640869},{"id":"https://openalex.org/keywords/control","display_name":"Control (management)","score":0.4821595549583435},{"id":"https://openalex.org/keywords/process-engineering","display_name":"Process engineering","score":0.38209033012390137},{"id":"https://openalex.org/keywords/control-theory","display_name":"Control theory (sociology)","score":0.35627996921539307},{"id":"https://openalex.org/keywords/engineering-physics","display_name":"Engineering physics","score":0.35405611991882324},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.3415059447288513},{"id":"https://openalex.org/keywords/environmental-science","display_name":"Environmental science","score":0.33578312397003174},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.28487586975097656},{"id":"https://openalex.org/keywords/thermodynamics","display_name":"Thermodynamics","score":0.23633357882499695},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.21575626730918884},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.14037317037582397}],"concepts":[{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.6947012543678284},{"id":"https://openalex.org/C69357855","wikidata":"https://www.wikidata.org/wiki/Q163214","display_name":"Diffusion","level":2,"score":0.6323431134223938},{"id":"https://openalex.org/C57410435","wikidata":"https://www.wikidata.org/wiki/Q505668","display_name":"Chemical vapor deposition","level":2,"score":0.6109887361526489},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5319540500640869},{"id":"https://openalex.org/C2775924081","wikidata":"https://www.wikidata.org/wiki/Q55608371","display_name":"Control (management)","level":2,"score":0.4821595549583435},{"id":"https://openalex.org/C21880701","wikidata":"https://www.wikidata.org/wiki/Q2144042","display_name":"Process engineering","level":1,"score":0.38209033012390137},{"id":"https://openalex.org/C47446073","wikidata":"https://www.wikidata.org/wiki/Q5165890","display_name":"Control theory (sociology)","level":3,"score":0.35627996921539307},{"id":"https://openalex.org/C61696701","wikidata":"https://www.wikidata.org/wiki/Q770766","display_name":"Engineering physics","level":1,"score":0.35405611991882324},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.3415059447288513},{"id":"https://openalex.org/C39432304","wikidata":"https://www.wikidata.org/wiki/Q188847","display_name":"Environmental science","level":0,"score":0.33578312397003174},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.28487586975097656},{"id":"https://openalex.org/C97355855","wikidata":"https://www.wikidata.org/wiki/Q11473","display_name":"Thermodynamics","level":1,"score":0.23633357882499695},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.21575626730918884},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.14037317037582397},{"id":"https://openalex.org/C154945302","wikidata":"https://www.wikidata.org/wiki/Q11660","display_name":"Artificial intelligence","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1016/0005-1098(92)90112-s","is_oa":false,"landing_page_url":"https://doi.org/10.1016/0005-1098(92)90112-s","pdf_url":null,"source":{"id":"https://openalex.org/S51360982","display_name":"Automatica","issn_l":"0005-1098","issn":["0005-1098","1873-2836"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Automatica","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[{"score":0.47999998927116394,"display_name":"Clean water and sanitation","id":"https://metadata.un.org/sdg/6"}],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":25,"referenced_works":["https://openalex.org/W17908150","https://openalex.org/W745199962","https://openalex.org/W1526929523","https://openalex.org/W1965640670","https://openalex.org/W1967856426","https://openalex.org/W1985295984","https://openalex.org/W2005092560","https://openalex.org/W2065366891","https://openalex.org/W2094701319","https://openalex.org/W2105934661","https://openalex.org/W2106674317","https://openalex.org/W2129488707","https://openalex.org/W2137518183","https://openalex.org/W2141989015","https://openalex.org/W2166550625","https://openalex.org/W2293807537","https://openalex.org/W2605861275","https://openalex.org/W2726725342","https://openalex.org/W3135227555","https://openalex.org/W4232810705","https://openalex.org/W4246832082","https://openalex.org/W4253380388","https://openalex.org/W6600756079","https://openalex.org/W6631432205","https://openalex.org/W6740296254"],"related_works":["https://openalex.org/W2899084033","https://openalex.org/W4254185665","https://openalex.org/W2068460603","https://openalex.org/W2098567686","https://openalex.org/W2557666381","https://openalex.org/W1983336901","https://openalex.org/W4206529606","https://openalex.org/W2129656921","https://openalex.org/W2352560521","https://openalex.org/W2015458956"],"abstract_inverted_index":null,"counts_by_year":[{"year":2025,"cited_by_count":1},{"year":2022,"cited_by_count":1},{"year":2013,"cited_by_count":1}],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}