{"id":"https://openalex.org/W2767608854","doi":"https://doi.org/10.1007/s11432-017-9239-5","title":"Total ionizing dose effects and annealing behaviors of HfO2-based MOS capacitor","display_name":"Total ionizing dose effects and annealing behaviors of HfO2-based MOS capacitor","publication_year":2017,"publication_date":"2017-11-06","ids":{"openalex":"https://openalex.org/W2767608854","doi":"https://doi.org/10.1007/s11432-017-9239-5","mag":"2767608854"},"language":"en","primary_location":{"id":"doi:10.1007/s11432-017-9239-5","is_oa":false,"landing_page_url":"https://doi.org/10.1007/s11432-017-9239-5","pdf_url":null,"source":{"id":"https://openalex.org/S4210218743","display_name":"Science China Information Sciences","issn_l":"1674-733X","issn":["1674-733X","1869-1919"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310319965","host_organization_name":"Springer Nature","host_organization_lineage":["https://openalex.org/P4310319965"],"host_organization_lineage_names":["Springer Nature"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Science China Information Sciences","raw_type":"journal-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5055046631","display_name":"Yannan Xu","orcid":"https://orcid.org/0000-0002-0445-9543"},"institutions":[{"id":"https://openalex.org/I4210165038","display_name":"University of Chinese Academy of Sciences","ror":"https://ror.org/05qbk4x57","country_code":"CN","type":"education","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210165038"]},{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"funder","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]}],"countries":["CN"],"is_corresponding":true,"raw_author_name":"Yannan Xu","raw_affiliation_strings":["Institute of Microelectronics, Chinese Academy of Sciences, Beijing, 100029, China","University of Chinese Academy of Sciences, Beijing, 100049, China"],"affiliations":[{"raw_affiliation_string":"Institute of Microelectronics, Chinese Academy of Sciences, Beijing, 100029, China","institution_ids":["https://openalex.org/I4210119392","https://openalex.org/I19820366"]},{"raw_affiliation_string":"University of Chinese Academy of Sciences, Beijing, 100049, China","institution_ids":["https://openalex.org/I4210165038"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5069723560","display_name":"Jinshun Bi","orcid":"https://orcid.org/0000-0003-0114-0040"},"institutions":[{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"funder","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Jinshun Bi","raw_affiliation_strings":["Institute of Microelectronics, Chinese Academy of Sciences, Beijing, 100029, China"],"affiliations":[{"raw_affiliation_string":"Institute of Microelectronics, Chinese Academy of Sciences, Beijing, 100029, China","institution_ids":["https://openalex.org/I4210119392","https://openalex.org/I19820366"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5072583150","display_name":"Gaobo Xu","orcid":"https://orcid.org/0000-0002-4278-251X"},"institutions":[{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"funder","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Gaobo Xu","raw_affiliation_strings":["Institute of Microelectronics, Chinese Academy of Sciences, Beijing, 100029, China"],"affiliations":[{"raw_affiliation_string":"Institute of Microelectronics, Chinese Academy of Sciences, Beijing, 100029, China","institution_ids":["https://openalex.org/I4210119392","https://openalex.org/I19820366"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5076713293","display_name":"Kai Xi","orcid":"https://orcid.org/0000-0002-3092-906X"},"institutions":[{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"funder","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Kai Xi","raw_affiliation_strings":["Institute of Microelectronics, Chinese Academy of Sciences, Beijing, 100029, China"],"affiliations":[{"raw_affiliation_string":"Institute of Microelectronics, Chinese Academy of Sciences, Beijing, 100029, China","institution_ids":["https://openalex.org/I4210119392","https://openalex.org/I19820366"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5023885825","display_name":"Bo Li","orcid":"https://orcid.org/0000-0003-4905-2744"},"institutions":[{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]},{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"funder","lineage":["https://openalex.org/I19820366"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Bo Li","raw_affiliation_strings":["Institute of Microelectronics, Chinese Academy of Sciences, Beijing, 100029, China"],"affiliations":[{"raw_affiliation_string":"Institute of Microelectronics, Chinese Academy of Sciences, Beijing, 100029, China","institution_ids":["https://openalex.org/I4210119392","https://openalex.org/I19820366"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5100642558","display_name":"Ming Liu","orcid":"https://orcid.org/0000-0001-9849-1845"},"institutions":[{"id":"https://openalex.org/I4210119392","display_name":"Institute of Microelectronics","ror":"https://ror.org/02s6gs133","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210119392"]},{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"funder","lineage":["https://openalex.org/I19820366"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Ming Liu","raw_affiliation_strings":["Institute of Microelectronics, Chinese Academy of Sciences, Beijing, 100029, China"],"affiliations":[{"raw_affiliation_string":"Institute of Microelectronics, Chinese Academy of Sciences, Beijing, 100029, China","institution_ids":["https://openalex.org/I4210119392","https://openalex.org/I19820366"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":6,"corresponding_author_ids":["https://openalex.org/A5055046631"],"corresponding_institution_ids":["https://openalex.org/I19820366","https://openalex.org/I4210119392","https://openalex.org/I4210165038"],"apc_list":{"value":2390,"currency":"EUR","value_usd":2990},"apc_paid":null,"fwci":2.0068,"has_fulltext":false,"cited_by_count":21,"citation_normalized_percentile":{"value":0.87716122,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":93,"max":98},"biblio":{"volume":"60","issue":"12","first_page":null,"last_page":null},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10502","display_name":"Advanced Memory and Neural Computing","score":0.9995999932289124,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10558","display_name":"Advancements in Semiconductor Devices and Circuit Design","score":0.9995999932289124,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/ionizing-radiation","display_name":"Ionizing radiation","score":0.7477100491523743},{"id":"https://openalex.org/keywords/annealing","display_name":"Annealing (glass)","score":0.6525037288665771},{"id":"https://openalex.org/keywords/capacitor","display_name":"Capacitor","score":0.6198468208312988},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.5866276025772095},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.4982907772064209},{"id":"https://openalex.org/keywords/radiochemistry","display_name":"Radiochemistry","score":0.3962940275669098},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.23904702067375183},{"id":"https://openalex.org/keywords/irradiation","display_name":"Irradiation","score":0.22143766283988953},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.21771439909934998},{"id":"https://openalex.org/keywords/chemistry","display_name":"Chemistry","score":0.21705037355422974},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.1473993957042694},{"id":"https://openalex.org/keywords/composite-material","display_name":"Composite material","score":0.1409917175769806},{"id":"https://openalex.org/keywords/nuclear-physics","display_name":"Nuclear physics","score":0.12370756268501282},{"id":"https://openalex.org/keywords/voltage","display_name":"Voltage","score":0.08920741081237793}],"concepts":[{"id":"https://openalex.org/C18231593","wikidata":"https://www.wikidata.org/wiki/Q186161","display_name":"Ionizing radiation","level":3,"score":0.7477100491523743},{"id":"https://openalex.org/C2777855556","wikidata":"https://www.wikidata.org/wiki/Q4339544","display_name":"Annealing (glass)","level":2,"score":0.6525037288665771},{"id":"https://openalex.org/C52192207","wikidata":"https://www.wikidata.org/wiki/Q5322","display_name":"Capacitor","level":3,"score":0.6198468208312988},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5866276025772095},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.4982907772064209},{"id":"https://openalex.org/C177322064","wikidata":"https://www.wikidata.org/wiki/Q750955","display_name":"Radiochemistry","level":1,"score":0.3962940275669098},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.23904702067375183},{"id":"https://openalex.org/C111337013","wikidata":"https://www.wikidata.org/wiki/Q2737837","display_name":"Irradiation","level":2,"score":0.22143766283988953},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.21771439909934998},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.21705037355422974},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.1473993957042694},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.1409917175769806},{"id":"https://openalex.org/C185544564","wikidata":"https://www.wikidata.org/wiki/Q81197","display_name":"Nuclear physics","level":1,"score":0.12370756268501282},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.08920741081237793}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1007/s11432-017-9239-5","is_oa":false,"landing_page_url":"https://doi.org/10.1007/s11432-017-9239-5","pdf_url":null,"source":{"id":"https://openalex.org/S4210218743","display_name":"Science China Information Sciences","issn_l":"1674-733X","issn":["1674-733X","1869-1919"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310319965","host_organization_name":"Springer Nature","host_organization_lineage":["https://openalex.org/P4310319965"],"host_organization_lineage_names":["Springer Nature"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Science China Information Sciences","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[{"score":0.4099999964237213,"id":"https://metadata.un.org/sdg/6","display_name":"Clean water and sanitation"}],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":6,"referenced_works":["https://openalex.org/W1968504352","https://openalex.org/W1978508348","https://openalex.org/W2053338534","https://openalex.org/W2097397808","https://openalex.org/W2291718111","https://openalex.org/W2542294571"],"related_works":["https://openalex.org/W2798735802","https://openalex.org/W2911908587","https://openalex.org/W4206147900","https://openalex.org/W4206616768","https://openalex.org/W2501493637","https://openalex.org/W4248584036","https://openalex.org/W2393727419","https://openalex.org/W2410053714","https://openalex.org/W2517584471","https://openalex.org/W2044997699"],"abstract_inverted_index":null,"counts_by_year":[{"year":2025,"cited_by_count":3},{"year":2022,"cited_by_count":2},{"year":2021,"cited_by_count":2},{"year":2020,"cited_by_count":6},{"year":2019,"cited_by_count":5},{"year":2018,"cited_by_count":3}],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}