{"id":"https://openalex.org/W4408016462","doi":"https://doi.org/10.1007/s10845-025-02584-7","title":"Optimizing chamber systems for deposition processes in the semiconductor industry with deep learning framework: tackling small simulation datasets","display_name":"Optimizing chamber systems for deposition processes in the semiconductor industry with deep learning framework: tackling small simulation datasets","publication_year":2025,"publication_date":"2025-02-27","ids":{"openalex":"https://openalex.org/W4408016462","doi":"https://doi.org/10.1007/s10845-025-02584-7"},"language":"en","primary_location":{"id":"doi:10.1007/s10845-025-02584-7","is_oa":false,"landing_page_url":"https://doi.org/10.1007/s10845-025-02584-7","pdf_url":null,"source":{"id":"https://openalex.org/S161464388","display_name":"Journal of Intelligent Manufacturing","issn_l":"0956-5515","issn":["0956-5515","1572-8145"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310319900","host_organization_name":"Springer Science+Business Media","host_organization_lineage":["https://openalex.org/P4310319900","https://openalex.org/P4310319965"],"host_organization_lineage_names":["Springer Science+Business Media","Springer Nature"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Intelligent Manufacturing","raw_type":"journal-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5066108216","display_name":"Donggeun Park","orcid":"https://orcid.org/0000-0002-6524-2858"},"institutions":[{"id":"https://openalex.org/I157485424","display_name":"Korea Advanced Institute of Science and Technology","ror":"https://ror.org/05apxxy63","country_code":"KR","type":"education","lineage":["https://openalex.org/I157485424"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Donggeun Park","raw_affiliation_strings":["Department of Mechanical Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 34141, Republic of Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Mechanical Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 34141, Republic of Korea","institution_ids":["https://openalex.org/I157485424"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5075618947","display_name":"Hanbin Cho","orcid":null},"institutions":[{"id":"https://openalex.org/I157485424","display_name":"Korea Advanced Institute of Science and Technology","ror":"https://ror.org/05apxxy63","country_code":"KR","type":"education","lineage":["https://openalex.org/I157485424"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Hanbin Cho","raw_affiliation_strings":["Department of Mechanical Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 34141, Republic of Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Mechanical Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 34141, Republic of Korea","institution_ids":["https://openalex.org/I157485424"]}]},{"author_position":"middle","author":{"id":null,"display_name":"Changseob Kwon","orcid":null},"institutions":[{"id":"https://openalex.org/I119060216","display_name":"Hankyong National University","ror":"https://ror.org/0031nsg68","country_code":"KR","type":"education","lineage":["https://openalex.org/I119060216"]},{"id":"https://openalex.org/I4210162967","display_name":"Hansol Chemical (South Korea)","ror":"https://ror.org/05d5mtz58","country_code":"KR","type":"company","lineage":["https://openalex.org/I4210162967"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Changseob Kwon","raw_affiliation_strings":["Hansol IONES, Anseong-si, 2061, Republic of Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Hansol IONES, Anseong-si, 2061, Republic of Korea","institution_ids":["https://openalex.org/I119060216","https://openalex.org/I4210162967"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5044110469","display_name":"Young-Yeon Ji","orcid":null},"institutions":[{"id":"https://openalex.org/I119060216","display_name":"Hankyong National University","ror":"https://ror.org/0031nsg68","country_code":"KR","type":"education","lineage":["https://openalex.org/I119060216"]},{"id":"https://openalex.org/I4210162967","display_name":"Hansol Chemical (South Korea)","ror":"https://ror.org/05d5mtz58","country_code":"KR","type":"company","lineage":["https://openalex.org/I4210162967"]}],"countries":["KR"],"is_corresponding":true,"raw_author_name":"Youngyeon Ji","raw_affiliation_strings":["Hansol IONES, Anseong-si, 2061, Republic of Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Hansol IONES, Anseong-si, 2061, Republic of Korea","institution_ids":["https://openalex.org/I119060216","https://openalex.org/I4210162967"]}]},{"author_position":"last","author":{"id":null,"display_name":"Seunghwa Ryu","orcid":"https://orcid.org/0000-0001-9516-5809"},"institutions":[{"id":"https://openalex.org/I157485424","display_name":"Korea Advanced Institute of Science and Technology","ror":"https://ror.org/05apxxy63","country_code":"KR","type":"education","lineage":["https://openalex.org/I157485424"]}],"countries":["KR"],"is_corresponding":true,"raw_author_name":"Seunghwa Ryu","raw_affiliation_strings":["Department of Mechanical Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 34141, Republic of Korea"],"raw_orcid":"https://orcid.org/0000-0001-9516-5809","affiliations":[{"raw_affiliation_string":"Department of Mechanical Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 34141, Republic of Korea","institution_ids":["https://openalex.org/I157485424"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":3,"corresponding_author_ids":["https://openalex.org/A5044110469"],"corresponding_institution_ids":["https://openalex.org/I119060216","https://openalex.org/I157485424","https://openalex.org/I4210162967"],"apc_list":{"value":2990,"currency":"USD","value_usd":2990},"apc_paid":null,"fwci":3.5984,"has_fulltext":false,"cited_by_count":6,"citation_normalized_percentile":{"value":0.92244292,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":96,"max":99},"biblio":{"volume":"37","issue":"3","first_page":"1075","last_page":"1091"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T12111","display_name":"Industrial Vision Systems and Defect Detection","score":0.983299970626831,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T12111","display_name":"Industrial Vision Systems and Defect Detection","score":0.983299970626831,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9789999723434448,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12039","display_name":"Electron and X-Ray Spectroscopy Techniques","score":0.9781000018119812,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/deposition","display_name":"Deposition (geology)","score":0.6666078567504883},{"id":"https://openalex.org/keywords/process-engineering","display_name":"Process engineering","score":0.46082603931427},{"id":"https://openalex.org/keywords/semiconductor","display_name":"Semiconductor","score":0.4379281997680664},{"id":"https://openalex.org/keywords/semiconductor-industry","display_name":"Semiconductor industry","score":0.4134986698627472},{"id":"https://openalex.org/keywords/manufacturing-engineering","display_name":"Manufacturing engineering","score":0.37819331884384155},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.3749840259552002},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.3668076992034912},{"id":"https://openalex.org/keywords/engineering-physics","display_name":"Engineering physics","score":0.3457081615924835},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.34325724840164185},{"id":"https://openalex.org/keywords/industrial-engineering","display_name":"Industrial engineering","score":0.32073384523391724},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.1733303964138031},{"id":"https://openalex.org/keywords/geology","display_name":"Geology","score":0.11876744031906128}],"concepts":[{"id":"https://openalex.org/C64297162","wikidata":"https://www.wikidata.org/wiki/Q1987070","display_name":"Deposition (geology)","level":3,"score":0.6666078567504883},{"id":"https://openalex.org/C21880701","wikidata":"https://www.wikidata.org/wiki/Q2144042","display_name":"Process engineering","level":1,"score":0.46082603931427},{"id":"https://openalex.org/C108225325","wikidata":"https://www.wikidata.org/wiki/Q11456","display_name":"Semiconductor","level":2,"score":0.4379281997680664},{"id":"https://openalex.org/C2987888538","wikidata":"https://www.wikidata.org/wiki/Q2986369","display_name":"Semiconductor industry","level":2,"score":0.4134986698627472},{"id":"https://openalex.org/C117671659","wikidata":"https://www.wikidata.org/wiki/Q11049265","display_name":"Manufacturing engineering","level":1,"score":0.37819331884384155},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.3749840259552002},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.3668076992034912},{"id":"https://openalex.org/C61696701","wikidata":"https://www.wikidata.org/wiki/Q770766","display_name":"Engineering physics","level":1,"score":0.3457081615924835},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.34325724840164185},{"id":"https://openalex.org/C13736549","wikidata":"https://www.wikidata.org/wiki/Q4489420","display_name":"Industrial engineering","level":1,"score":0.32073384523391724},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.1733303964138031},{"id":"https://openalex.org/C127313418","wikidata":"https://www.wikidata.org/wiki/Q1069","display_name":"Geology","level":0,"score":0.11876744031906128},{"id":"https://openalex.org/C2816523","wikidata":"https://www.wikidata.org/wiki/Q180184","display_name":"Sediment","level":2,"score":0.0},{"id":"https://openalex.org/C151730666","wikidata":"https://www.wikidata.org/wiki/Q7205","display_name":"Paleontology","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1007/s10845-025-02584-7","is_oa":false,"landing_page_url":"https://doi.org/10.1007/s10845-025-02584-7","pdf_url":null,"source":{"id":"https://openalex.org/S161464388","display_name":"Journal of Intelligent Manufacturing","issn_l":"0956-5515","issn":["0956-5515","1572-8145"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310319900","host_organization_name":"Springer Science+Business Media","host_organization_lineage":["https://openalex.org/P4310319900","https://openalex.org/P4310319965"],"host_organization_lineage_names":["Springer Science+Business Media","Springer Nature"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Intelligent Manufacturing","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[{"display_name":"Industry, innovation and infrastructure","score":0.6200000047683716,"id":"https://metadata.un.org/sdg/9"}],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":29,"referenced_works":["https://openalex.org/W1576825000","https://openalex.org/W1996020380","https://openalex.org/W2063586711","https://openalex.org/W2091934641","https://openalex.org/W2095705004","https://openalex.org/W2097643818","https://openalex.org/W2124972241","https://openalex.org/W2125755323","https://openalex.org/W2467926172","https://openalex.org/W2735748309","https://openalex.org/W2800216132","https://openalex.org/W2922073769","https://openalex.org/W2941296407","https://openalex.org/W2945439698","https://openalex.org/W2994675471","https://openalex.org/W3000929445","https://openalex.org/W3195221712","https://openalex.org/W3198848420","https://openalex.org/W3208954537","https://openalex.org/W3213822864","https://openalex.org/W4205129187","https://openalex.org/W4226411361","https://openalex.org/W4226463366","https://openalex.org/W4294884465","https://openalex.org/W4313478509","https://openalex.org/W4321437858","https://openalex.org/W4385586807","https://openalex.org/W4398768831","https://openalex.org/W4399258752"],"related_works":["https://openalex.org/W2393651404","https://openalex.org/W2124062602","https://openalex.org/W2385938651","https://openalex.org/W2381023193","https://openalex.org/W2063057261","https://openalex.org/W2035160889","https://openalex.org/W2068247391","https://openalex.org/W4233807266","https://openalex.org/W4210889743","https://openalex.org/W2337755673"],"abstract_inverted_index":null,"counts_by_year":[{"year":2026,"cited_by_count":3},{"year":2025,"cited_by_count":3}],"updated_date":"2026-07-23T08:03:31.855105","created_date":"2025-10-10T00:00:00"}