{"id":"https://openalex.org/W3139531532","doi":"https://doi.org/10.1007/s10845-021-01755-6","title":"Novel method for detection of mixed-type defect patterns in wafer maps based on a single shot detector algorithm","display_name":"Novel method for detection of mixed-type defect patterns in wafer maps based on a single shot detector algorithm","publication_year":2021,"publication_date":"2021-03-18","ids":{"openalex":"https://openalex.org/W3139531532","doi":"https://doi.org/10.1007/s10845-021-01755-6","mag":"3139531532"},"language":"en","primary_location":{"id":"doi:10.1007/s10845-021-01755-6","is_oa":false,"landing_page_url":"https://doi.org/10.1007/s10845-021-01755-6","pdf_url":null,"source":{"id":"https://openalex.org/S161464388","display_name":"Journal of Intelligent Manufacturing","issn_l":"0956-5515","issn":["0956-5515","1572-8145"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310319900","host_organization_name":"Springer Science+Business Media","host_organization_lineage":["https://openalex.org/P4310319900","https://openalex.org/P4310319965"],"host_organization_lineage_names":["Springer Science+Business Media","Springer Nature"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Intelligent Manufacturing","raw_type":"journal-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5015631940","display_name":"Tae San Kim","orcid":null},"institutions":[{"id":"https://openalex.org/I193775966","display_name":"Yonsei University","ror":"https://ror.org/01wjejq96","country_code":"KR","type":"education","lineage":["https://openalex.org/I193775966"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Tae San Kim","raw_affiliation_strings":["Department of Industrial Engineering, Yonsei University, 134 Shinchon-dong, Seoul, 120-749, Republic of Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Industrial Engineering, Yonsei University, 134 Shinchon-dong, Seoul, 120-749, Republic of Korea","institution_ids":["https://openalex.org/I193775966"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5101983408","display_name":"Jong Wook Lee","orcid":"https://orcid.org/0000-0002-3364-9960"},"institutions":[{"id":"https://openalex.org/I193775966","display_name":"Yonsei University","ror":"https://ror.org/01wjejq96","country_code":"KR","type":"education","lineage":["https://openalex.org/I193775966"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Jong Wook Lee","raw_affiliation_strings":["Department of Industrial Engineering, Yonsei University, 134 Shinchon-dong, Seoul, 120-749, Republic of Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Industrial Engineering, Yonsei University, 134 Shinchon-dong, Seoul, 120-749, Republic of Korea","institution_ids":["https://openalex.org/I193775966"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5102892484","display_name":"Won Kyung Lee","orcid":"https://orcid.org/0000-0003-3465-6094"},"institutions":[{"id":"https://openalex.org/I193775966","display_name":"Yonsei University","ror":"https://ror.org/01wjejq96","country_code":"KR","type":"education","lineage":["https://openalex.org/I193775966"]}],"countries":["KR"],"is_corresponding":true,"raw_author_name":"Won Kyung Lee","raw_affiliation_strings":["Department of Industrial Engineering, Yonsei University, 134 Shinchon-dong, Seoul, 120-749, Republic of Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Industrial Engineering, Yonsei University, 134 Shinchon-dong, Seoul, 120-749, Republic of Korea","institution_ids":["https://openalex.org/I193775966"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5043258197","display_name":"So Young Sohn","orcid":"https://orcid.org/0000-0002-3958-2269"},"institutions":[{"id":"https://openalex.org/I193775966","display_name":"Yonsei University","ror":"https://ror.org/01wjejq96","country_code":"KR","type":"education","lineage":["https://openalex.org/I193775966"]}],"countries":["KR"],"is_corresponding":true,"raw_author_name":"So Young Sohn","raw_affiliation_strings":["Department of Industrial Engineering, Yonsei University, 134 Shinchon-dong, Seoul, 120-749, Republic of Korea"],"raw_orcid":"https://orcid.org/0000-0002-3958-2269","affiliations":[{"raw_affiliation_string":"Department of Industrial Engineering, Yonsei University, 134 Shinchon-dong, Seoul, 120-749, Republic of Korea","institution_ids":["https://openalex.org/I193775966"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":4,"corresponding_author_ids":["https://openalex.org/A5043258197","https://openalex.org/A5102892484"],"corresponding_institution_ids":["https://openalex.org/I193775966"],"apc_list":{"value":2390,"currency":"EUR","value_usd":2990},"apc_paid":null,"fwci":3.7785,"has_fulltext":false,"cited_by_count":34,"citation_normalized_percentile":{"value":0.93568793,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":89,"max":99},"biblio":{"volume":"33","issue":"6","first_page":"1715","last_page":"1724"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T12111","display_name":"Industrial Vision Systems and Defect Detection","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T12111","display_name":"Industrial Vision Systems and Defect Detection","score":0.9998999834060669,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T14117","display_name":"Integrated Circuits and Semiconductor Failure Analysis","score":0.9994000196456909,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9959999918937683,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/single-shot","display_name":"Single shot","score":0.5849165916442871},{"id":"https://openalex.org/keywords/wafer","display_name":"Wafer","score":0.5837987661361694},{"id":"https://openalex.org/keywords/semiconductor-device-fabrication","display_name":"Semiconductor device fabrication","score":0.5207162499427795},{"id":"https://openalex.org/keywords/detector","display_name":"Detector","score":0.5071408748626709},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.5056414604187012},{"id":"https://openalex.org/keywords/pattern-recognition","display_name":"Pattern recognition (psychology)","score":0.4541444778442383},{"id":"https://openalex.org/keywords/process","display_name":"Process (computing)","score":0.45004212856292725},{"id":"https://openalex.org/keywords/convolutional-neural-network","display_name":"Convolutional neural network","score":0.4452105760574341},{"id":"https://openalex.org/keywords/integrated-circuit","display_name":"Integrated circuit","score":0.4444020688533783},{"id":"https://openalex.org/keywords/data-mining","display_name":"Data mining","score":0.3796112835407257},{"id":"https://openalex.org/keywords/artificial-intelligence","display_name":"Artificial intelligence","score":0.35751914978027344},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.24434274435043335}],"concepts":[{"id":"https://openalex.org/C3019835501","wikidata":"https://www.wikidata.org/wiki/Q1310130","display_name":"Single shot","level":2,"score":0.5849165916442871},{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.5837987661361694},{"id":"https://openalex.org/C66018809","wikidata":"https://www.wikidata.org/wiki/Q1570432","display_name":"Semiconductor device fabrication","level":3,"score":0.5207162499427795},{"id":"https://openalex.org/C94915269","wikidata":"https://www.wikidata.org/wiki/Q1834857","display_name":"Detector","level":2,"score":0.5071408748626709},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.5056414604187012},{"id":"https://openalex.org/C153180895","wikidata":"https://www.wikidata.org/wiki/Q7148389","display_name":"Pattern recognition (psychology)","level":2,"score":0.4541444778442383},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.45004212856292725},{"id":"https://openalex.org/C81363708","wikidata":"https://www.wikidata.org/wiki/Q17084460","display_name":"Convolutional neural network","level":2,"score":0.4452105760574341},{"id":"https://openalex.org/C530198007","wikidata":"https://www.wikidata.org/wiki/Q80831","display_name":"Integrated circuit","level":2,"score":0.4444020688533783},{"id":"https://openalex.org/C124101348","wikidata":"https://www.wikidata.org/wiki/Q172491","display_name":"Data mining","level":1,"score":0.3796112835407257},{"id":"https://openalex.org/C154945302","wikidata":"https://www.wikidata.org/wiki/Q11660","display_name":"Artificial intelligence","level":1,"score":0.35751914978027344},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.24434274435043335},{"id":"https://openalex.org/C76155785","wikidata":"https://www.wikidata.org/wiki/Q418","display_name":"Telecommunications","level":1,"score":0.0},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1007/s10845-021-01755-6","is_oa":false,"landing_page_url":"https://doi.org/10.1007/s10845-021-01755-6","pdf_url":null,"source":{"id":"https://openalex.org/S161464388","display_name":"Journal of Intelligent Manufacturing","issn_l":"0956-5515","issn":["0956-5515","1572-8145"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310319900","host_organization_name":"Springer Science+Business Media","host_organization_lineage":["https://openalex.org/P4310319900","https://openalex.org/P4310319965"],"host_organization_lineage_names":["Springer Science+Business Media","Springer Nature"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Intelligent Manufacturing","raw_type":"journal-article"},{"id":"pmh:oai:RePEc:spr:joinma:v:33:y:2022:i:6:d:10.1007_s10845-021-01755-6","is_oa":false,"landing_page_url":"http://link.springer.com/10.1007/s10845-021-01755-6","pdf_url":null,"source":{"id":"https://openalex.org/S4306401271","display_name":"RePEc: Research Papers in Economics","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"host_organization":"https://openalex.org/I77793887","host_organization_name":"Federal Reserve Bank of St. Louis","host_organization_lineage":["https://openalex.org/I77793887"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":null,"raw_type":"article"}],"best_oa_location":null,"sustainable_development_goals":[{"id":"https://metadata.un.org/sdg/9","display_name":"Industry, innovation and infrastructure","score":0.49000000953674316}],"awards":[{"id":"https://openalex.org/G8718975127","display_name":null,"funder_award_id":"2020R1A2C2005026","funder_id":"https://openalex.org/F4320322120","funder_display_name":"National Research Foundation of Korea"}],"funders":[{"id":"https://openalex.org/F4320322120","display_name":"National Research Foundation of Korea","ror":"https://ror.org/013aysd81"}],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":33,"referenced_works":["https://openalex.org/W1536680647","https://openalex.org/W1677182931","https://openalex.org/W1973972741","https://openalex.org/W1975617480","https://openalex.org/W1982448633","https://openalex.org/W2020286945","https://openalex.org/W2044342579","https://openalex.org/W2048163104","https://openalex.org/W2066956616","https://openalex.org/W2087649159","https://openalex.org/W2104441235","https://openalex.org/W2114315281","https://openalex.org/W2163605009","https://openalex.org/W2193145675","https://openalex.org/W2418691539","https://openalex.org/W2509074878","https://openalex.org/W2613718673","https://openalex.org/W2764262416","https://openalex.org/W2790607928","https://openalex.org/W2792944472","https://openalex.org/W2805484002","https://openalex.org/W2884367402","https://openalex.org/W2904870462","https://openalex.org/W2920311927","https://openalex.org/W2945987769","https://openalex.org/W2953106684","https://openalex.org/W2963037989","https://openalex.org/W2963150697","https://openalex.org/W3035862677","https://openalex.org/W3044911604","https://openalex.org/W3099620610","https://openalex.org/W3106250896","https://openalex.org/W4205590754"],"related_works":["https://openalex.org/W1998662473","https://openalex.org/W1988252515","https://openalex.org/W2075391483","https://openalex.org/W2742348144","https://openalex.org/W2038820605","https://openalex.org/W2992897358","https://openalex.org/W2631724279","https://openalex.org/W4293226391","https://openalex.org/W1849713424","https://openalex.org/W4386021186"],"abstract_inverted_index":null,"counts_by_year":[{"year":2026,"cited_by_count":4},{"year":2025,"cited_by_count":5},{"year":2024,"cited_by_count":5},{"year":2023,"cited_by_count":11},{"year":2022,"cited_by_count":8},{"year":2021,"cited_by_count":1}],"updated_date":"2026-06-19T15:47:20.252518","created_date":"2025-10-10T00:00:00"}