{"id":"https://openalex.org/W2008464451","doi":"https://doi.org/10.1007/s10845-014-0893-8","title":"The preparation of organic light-emitting diode encapsulation barrier layer by low-temperature plasma-enhanced chemical vapor deposition: a study on the $$\\hbox {SiO}_\\mathrm{x}\\hbox {N}_\\mathrm{y}$$ SiO x N y film parameter optimization","display_name":"The preparation of organic light-emitting diode encapsulation barrier layer by low-temperature plasma-enhanced chemical vapor deposition: a study on the $$\\hbox {SiO}_\\mathrm{x}\\hbox {N}_\\mathrm{y}$$ SiO x N y film parameter optimization","publication_year":2014,"publication_date":"2014-03-18","ids":{"openalex":"https://openalex.org/W2008464451","doi":"https://doi.org/10.1007/s10845-014-0893-8","mag":"2008464451"},"language":"en","primary_location":{"id":"doi:10.1007/s10845-014-0893-8","is_oa":false,"landing_page_url":"https://doi.org/10.1007/s10845-014-0893-8","pdf_url":null,"source":{"id":"https://openalex.org/S161464388","display_name":"Journal of Intelligent Manufacturing","issn_l":"0956-5515","issn":["0956-5515","1572-8145"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310319900","host_organization_name":"Springer Science+Business Media","host_organization_lineage":["https://openalex.org/P4310319900","https://openalex.org/P4310319965"],"host_organization_lineage_names":["Springer Science+Business Media","Springer Nature"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Intelligent Manufacturing","raw_type":"journal-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5050698993","display_name":"Chung\u2010Feng Jeffrey Kuo","orcid":"https://orcid.org/0000-0002-9025-8755"},"institutions":[{"id":"https://openalex.org/I154864474","display_name":"National Taiwan University of Science and Technology","ror":"https://ror.org/00q09pe49","country_code":"TW","type":"education","lineage":["https://openalex.org/I154864474"]}],"countries":["TW"],"is_corresponding":true,"raw_author_name":"Chung-Feng Jeffrey Kuo","raw_affiliation_strings":["Graduate Institute of Automation and Control, National Taiwan University of Science and Technology, Taipei\u00a0, 106, Taiwan","Graduate Institute of Automation and Control, National Taiwan University of Science and Technology, Taipei, Taiwan 106"],"affiliations":[{"raw_affiliation_string":"Graduate Institute of Automation and Control, National Taiwan University of Science and Technology, Taipei\u00a0, 106, Taiwan","institution_ids":["https://openalex.org/I154864474"]},{"raw_affiliation_string":"Graduate Institute of Automation and Control, National Taiwan University of Science and Technology, Taipei, Taiwan 106","institution_ids":["https://openalex.org/I154864474"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5069229015","display_name":"Wei\u2010Lun Lan","orcid":null},"institutions":[{"id":"https://openalex.org/I154864474","display_name":"National Taiwan University of Science and Technology","ror":"https://ror.org/00q09pe49","country_code":"TW","type":"education","lineage":["https://openalex.org/I154864474"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Wei-Lun Lan","raw_affiliation_strings":["Department of Materials Science and Engineering, National Taiwan University of Science and Technology, Taipei\u00a0, 106, Taiwan","Department of Materials Science and Engineering, National Taiwan University of Science and Technology, Taipei , Taiwan 106#TAB#"],"affiliations":[{"raw_affiliation_string":"Department of Materials Science and Engineering, National Taiwan University of Science and Technology, Taipei\u00a0, 106, Taiwan","institution_ids":["https://openalex.org/I154864474"]},{"raw_affiliation_string":"Department of Materials Science and Engineering, National Taiwan University of Science and Technology, Taipei , Taiwan 106#TAB#","institution_ids":["https://openalex.org/I154864474"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5028973071","display_name":"Yu\u2010Cheng Chang","orcid":"https://orcid.org/0000-0001-5474-680X"},"institutions":[{"id":"https://openalex.org/I154864474","display_name":"National Taiwan University of Science and Technology","ror":"https://ror.org/00q09pe49","country_code":"TW","type":"education","lineage":["https://openalex.org/I154864474"]}],"countries":["TW"],"is_corresponding":false,"raw_author_name":"Yu-Cheng Chang","raw_affiliation_strings":["Graduate Institute of Automation and Control, National Taiwan University of Science and Technology, Taipei\u00a0, 106, Taiwan","Graduate Institute of Automation and Control, National Taiwan University of Science and Technology, Taipei, Taiwan 106"],"affiliations":[{"raw_affiliation_string":"Graduate Institute of Automation and Control, National Taiwan University of Science and Technology, Taipei\u00a0, 106, Taiwan","institution_ids":["https://openalex.org/I154864474"]},{"raw_affiliation_string":"Graduate Institute of Automation and Control, National Taiwan University of Science and Technology, Taipei, Taiwan 106","institution_ids":["https://openalex.org/I154864474"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5060060245","display_name":"Kun\u2010Wei Lin","orcid":"https://orcid.org/0000-0002-4469-5428"},"institutions":[{"id":"https://openalex.org/I142066694","display_name":"ITRI International","ror":"https://ror.org/04wwsbd59","country_code":"US","type":"facility","lineage":["https://openalex.org/I142066694"]},{"id":"https://openalex.org/I4210148468","display_name":"Industrial Technology Research Institute","ror":"https://ror.org/05szzwt63","country_code":"TW","type":"nonprofit","lineage":["https://openalex.org/I4210148468"]}],"countries":["TW","US"],"is_corresponding":false,"raw_author_name":"Kun-Wei Lin","raw_affiliation_strings":["Additive Manufacturing and Laser Application Center, Industrial Technology Research Institute, Tainan\u00a0, 734, Taiwan","Additive Manufacturing and Laser Application Center, Industrial Technology Research Institute, Tainan , Taiwan 734#TAB#"],"affiliations":[{"raw_affiliation_string":"Additive Manufacturing and Laser Application Center, Industrial Technology Research Institute, Tainan\u00a0, 734, Taiwan","institution_ids":["https://openalex.org/I4210148468"]},{"raw_affiliation_string":"Additive Manufacturing and Laser Application Center, Industrial Technology Research Institute, Tainan , Taiwan 734#TAB#","institution_ids":["https://openalex.org/I142066694"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":4,"corresponding_author_ids":["https://openalex.org/A5050698993"],"corresponding_institution_ids":["https://openalex.org/I154864474"],"apc_list":{"value":2390,"currency":"EUR","value_usd":2990},"apc_paid":null,"fwci":1.2862,"has_fulltext":false,"cited_by_count":8,"citation_normalized_percentile":{"value":0.7827847,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":97},"biblio":{"volume":"27","issue":"3","first_page":"581","last_page":"593"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T13049","display_name":"Surface Roughness and Optical Measurements","score":0.9606999754905701,"subfield":{"id":"https://openalex.org/subfields/2206","display_name":"Computational Mechanics"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T13049","display_name":"Surface Roughness and Optical Measurements","score":0.9606999754905701,"subfield":{"id":"https://openalex.org/subfields/2206","display_name":"Computational Mechanics"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10623","display_name":"Thin-Film Transistor Technologies","score":0.9390000104904175,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10099","display_name":"GaN-based semiconductor devices and materials","score":0.9309999942779541,"subfield":{"id":"https://openalex.org/subfields/3104","display_name":"Condensed Matter Physics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.6994920372962952},{"id":"https://openalex.org/keywords/chemical-vapor-deposition","display_name":"Chemical vapor deposition","score":0.5247300267219543},{"id":"https://openalex.org/keywords/oled","display_name":"OLED","score":0.5212153196334839},{"id":"https://openalex.org/keywords/coating","display_name":"Coating","score":0.5191420912742615},{"id":"https://openalex.org/keywords/analytical-chemistry","display_name":"Analytical Chemistry (journal)","score":0.5132787227630615},{"id":"https://openalex.org/keywords/plasma","display_name":"Plasma","score":0.414264440536499},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.2777405381202698},{"id":"https://openalex.org/keywords/layer","display_name":"Layer (electronics)","score":0.2691507339477539},{"id":"https://openalex.org/keywords/composite-material","display_name":"Composite material","score":0.24089527130126953},{"id":"https://openalex.org/keywords/chemistry","display_name":"Chemistry","score":0.1352349817752838},{"id":"https://openalex.org/keywords/chromatography","display_name":"Chromatography","score":0.10885646939277649}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6994920372962952},{"id":"https://openalex.org/C57410435","wikidata":"https://www.wikidata.org/wiki/Q505668","display_name":"Chemical vapor deposition","level":2,"score":0.5247300267219543},{"id":"https://openalex.org/C150759737","wikidata":"https://www.wikidata.org/wiki/Q209593","display_name":"OLED","level":3,"score":0.5212153196334839},{"id":"https://openalex.org/C2781448156","wikidata":"https://www.wikidata.org/wiki/Q1570182","display_name":"Coating","level":2,"score":0.5191420912742615},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.5132787227630615},{"id":"https://openalex.org/C82706917","wikidata":"https://www.wikidata.org/wiki/Q10251","display_name":"Plasma","level":2,"score":0.414264440536499},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.2777405381202698},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.2691507339477539},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.24089527130126953},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.1352349817752838},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.10885646939277649},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1007/s10845-014-0893-8","is_oa":false,"landing_page_url":"https://doi.org/10.1007/s10845-014-0893-8","pdf_url":null,"source":{"id":"https://openalex.org/S161464388","display_name":"Journal of Intelligent Manufacturing","issn_l":"0956-5515","issn":["0956-5515","1572-8145"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":"https://openalex.org/P4310319900","host_organization_name":"Springer Science+Business Media","host_organization_lineage":["https://openalex.org/P4310319900","https://openalex.org/P4310319965"],"host_organization_lineage_names":["Springer Science+Business Media","Springer Nature"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Intelligent Manufacturing","raw_type":"journal-article"},{"id":"pmh:oai:RePEc:spr:joinma:v:27:y:2016:i:3:d:10.1007_s10845-014-0893-8","is_oa":false,"landing_page_url":"http://link.springer.com/10.1007/s10845-014-0893-8","pdf_url":null,"source":{"id":"https://openalex.org/S4306401271","display_name":"RePEc: Research Papers in Economics","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"host_organization":"https://openalex.org/I77793887","host_organization_name":"Federal Reserve Bank of St. Louis","host_organization_lineage":["https://openalex.org/I77793887"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":null,"raw_type":"article"}],"best_oa_location":null,"sustainable_development_goals":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":21,"referenced_works":["https://openalex.org/W29720247","https://openalex.org/W1970824307","https://openalex.org/W1990507412","https://openalex.org/W1996712888","https://openalex.org/W2017689773","https://openalex.org/W2025019009","https://openalex.org/W2028782871","https://openalex.org/W2029452253","https://openalex.org/W2031217341","https://openalex.org/W2035094681","https://openalex.org/W2037506295","https://openalex.org/W2041311102","https://openalex.org/W2049275520","https://openalex.org/W2054509210","https://openalex.org/W2058528521","https://openalex.org/W2076647084","https://openalex.org/W2080311483","https://openalex.org/W2118704679","https://openalex.org/W2128337001","https://openalex.org/W2152087547","https://openalex.org/W3205324630"],"related_works":["https://openalex.org/W4320487970","https://openalex.org/W1123907903","https://openalex.org/W2188292807","https://openalex.org/W4320502621","https://openalex.org/W4320487846","https://openalex.org/W2288334746","https://openalex.org/W2378970241","https://openalex.org/W2167605257","https://openalex.org/W4320487912","https://openalex.org/W4250248449"],"abstract_inverted_index":null,"counts_by_year":[{"year":2024,"cited_by_count":1},{"year":2021,"cited_by_count":1},{"year":2020,"cited_by_count":1},{"year":2018,"cited_by_count":1},{"year":2016,"cited_by_count":3},{"year":2015,"cited_by_count":1}],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}