{"id":"https://openalex.org/W2098075415","doi":"https://doi.org/10.1002/ett.4460010211","title":"Modeling of electron beam scattering in high resolution lithography for the fabrication of X\u2010Ray masks","display_name":"Modeling of electron beam scattering in high resolution lithography for the fabrication of X\u2010Ray masks","publication_year":1990,"publication_date":"1990-03-01","ids":{"openalex":"https://openalex.org/W2098075415","doi":"https://doi.org/10.1002/ett.4460010211","mag":"2098075415"},"language":"en","primary_location":{"id":"doi:10.1002/ett.4460010211","is_oa":false,"landing_page_url":"https://doi.org/10.1002/ett.4460010211","pdf_url":null,"source":{"id":"https://openalex.org/S4393917101","display_name":"European Transactions on Telecommunications","issn_l":"1124-318X","issn":["1124-318X","1541-8251"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"European Transactions on Telecommunications","raw_type":"journal-article"},"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5035797503","display_name":"M. Gentili","orcid":null},"institutions":[{"id":"https://openalex.org/I4210166800","display_name":"Intelligence for Environment and Security (Italy)","ror":"https://ror.org/05ve3t520","country_code":"IT","type":"company","lineage":["https://openalex.org/I4210166800"]}],"countries":["IT"],"is_corresponding":true,"raw_author_name":"M. Gentili","raw_affiliation_strings":["Istituto IESS-CNR - Via Cineto Romano, 42 - 00156 Roma - Italy","Istituto IESS\u2010CNR \u2010 Via Cineto Romano, 42 \u2010 00156 Roma \u2010 Italy"],"affiliations":[{"raw_affiliation_string":"Istituto IESS-CNR - Via Cineto Romano, 42 - 00156 Roma - Italy","institution_ids":["https://openalex.org/I4210166800"]},{"raw_affiliation_string":"Istituto IESS\u2010CNR \u2010 Via Cineto Romano, 42 \u2010 00156 Roma \u2010 Italy","institution_ids":["https://openalex.org/I4210166800"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5002140898","display_name":"A. Lucchesini","orcid":"https://orcid.org/0000-0002-8075-1722"},"institutions":[{"id":"https://openalex.org/I4210166800","display_name":"Intelligence for Environment and Security (Italy)","ror":"https://ror.org/05ve3t520","country_code":"IT","type":"company","lineage":["https://openalex.org/I4210166800"]}],"countries":["IT"],"is_corresponding":false,"raw_author_name":"A. Lucchesini","raw_affiliation_strings":["Istituto IESS-CNR - Via Cineto Romano, 42 - 00156 Roma - Italy","Istituto IESS\u2010CNR \u2010 Via Cineto Romano, 42 \u2010 00156 Roma \u2010 Italy"],"affiliations":[{"raw_affiliation_string":"Istituto IESS-CNR - Via Cineto Romano, 42 - 00156 Roma - Italy","institution_ids":["https://openalex.org/I4210166800"]},{"raw_affiliation_string":"Istituto IESS\u2010CNR \u2010 Via Cineto Romano, 42 \u2010 00156 Roma \u2010 Italy","institution_ids":["https://openalex.org/I4210166800"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5016453468","display_name":"L. Scopa","orcid":null},"institutions":[{"id":"https://openalex.org/I4210166800","display_name":"Intelligence for Environment and Security (Italy)","ror":"https://ror.org/05ve3t520","country_code":"IT","type":"company","lineage":["https://openalex.org/I4210166800"]}],"countries":["IT"],"is_corresponding":false,"raw_author_name":"L. Scopa","raw_affiliation_strings":["Istituto IESS-CNR - Via Cineto Romano, 42 - 00156 Roma - Italy","Istituto IESS\u2010CNR \u2010 Via Cineto Romano, 42 \u2010 00156 Roma \u2010 Italy"],"affiliations":[{"raw_affiliation_string":"Istituto IESS-CNR - Via Cineto Romano, 42 - 00156 Roma - Italy","institution_ids":["https://openalex.org/I4210166800"]},{"raw_affiliation_string":"Istituto IESS\u2010CNR \u2010 Via Cineto Romano, 42 \u2010 00156 Roma \u2010 Italy","institution_ids":["https://openalex.org/I4210166800"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5072981900","display_name":"Paolo Lugli","orcid":"https://orcid.org/0000-0002-2511-5643"},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"P. Lugli","raw_affiliation_strings":["Dipartimento di Ingegneria Meccanica, II Universita\u0301 di Roma Via O. Raimondo, 8 - 00173 Roma - Italy","Dipartimento di Ingegneria Meccanica, II Universit\u00e1 di Roma Via O. Raimondo, 8 \u2010 00173 Roma \u2010 Italy"],"affiliations":[{"raw_affiliation_string":"Dipartimento di Ingegneria Meccanica, II Universita\u0301 di Roma Via O. Raimondo, 8 - 00173 Roma - Italy","institution_ids":[]},{"raw_affiliation_string":"Dipartimento di Ingegneria Meccanica, II Universit\u00e1 di Roma Via O. Raimondo, 8 \u2010 00173 Roma \u2010 Italy","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5072541343","display_name":"A. Paoletti","orcid":"https://orcid.org/0000-0002-2948-6310"},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"A. Paoletti","raw_affiliation_strings":["Dipartimento di Ingegneria Meccanica, II Universita\u0301 di Roma Via O. Raimondo, 8 - 00173 Roma - Italy","Dipartimento di Ingegneria Meccanica, II Universit\u00e1 di Roma Via O. Raimondo, 8 \u2010 00173 Roma \u2010 Italy"],"affiliations":[{"raw_affiliation_string":"Dipartimento di Ingegneria Meccanica, II Universita\u0301 di Roma Via O. Raimondo, 8 - 00173 Roma - Italy","institution_ids":[]},{"raw_affiliation_string":"Dipartimento di Ingegneria Meccanica, II Universit\u00e1 di Roma Via O. Raimondo, 8 \u2010 00173 Roma \u2010 Italy","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5033861350","display_name":"Gabriele Messina","orcid":"https://orcid.org/0000-0002-2409-4369"},"institutions":[{"id":"https://openalex.org/I59725666","display_name":"University of Reggio Calabria","ror":"https://ror.org/041sz8d87","country_code":"IT","type":"education","lineage":["https://openalex.org/I59725666"]}],"countries":["IT"],"is_corresponding":false,"raw_author_name":"G. Messina","raw_affiliation_strings":["Facolta\u0301 di Ingegneria dell'Universita\u0301 Via E. Cuzzocrea, 48 - 89128 Reggio Calabria - Italy","Facolt\u00e1 di Ingegneria dell'Universit\u00e1 Via E. Cuzzocrea, 48 \u2010 89128 Reggio Calabria \u2010 Italy"],"affiliations":[{"raw_affiliation_string":"Facolta\u0301 di Ingegneria dell'Universita\u0301 Via E. Cuzzocrea, 48 - 89128 Reggio Calabria - Italy","institution_ids":["https://openalex.org/I59725666"]},{"raw_affiliation_string":"Facolt\u00e1 di Ingegneria dell'Universit\u00e1 Via E. Cuzzocrea, 48 \u2010 89128 Reggio Calabria \u2010 Italy","institution_ids":["https://openalex.org/I59725666"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5048299135","display_name":"S. Santangelo","orcid":"https://orcid.org/0000-0003-1732-248X"},"institutions":[{"id":"https://openalex.org/I59725666","display_name":"University of Reggio Calabria","ror":"https://ror.org/041sz8d87","country_code":"IT","type":"education","lineage":["https://openalex.org/I59725666"]}],"countries":["IT"],"is_corresponding":false,"raw_author_name":"S. Santangelo","raw_affiliation_strings":["Facolta\u0301 di Ingegneria dell'Universita\u0301 Via E. Cuzzocrea, 48 - 89128 Reggio Calabria - Italy","Facolt\u00e1 di Ingegneria dell'Universit\u00e1 Via E. Cuzzocrea, 48 \u2010 89128 Reggio Calabria \u2010 Italy"],"affiliations":[{"raw_affiliation_string":"Facolta\u0301 di Ingegneria dell'Universita\u0301 Via E. Cuzzocrea, 48 - 89128 Reggio Calabria - Italy","institution_ids":["https://openalex.org/I59725666"]},{"raw_affiliation_string":"Facolt\u00e1 di Ingegneria dell'Universit\u00e1 Via E. Cuzzocrea, 48 \u2010 89128 Reggio Calabria \u2010 Italy","institution_ids":["https://openalex.org/I59725666"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5008181300","display_name":"A. Tucciarone","orcid":null},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"A. Tucciarone","raw_affiliation_strings":["Istituto IESS-CNR - Via Cineto Romano, 42 - 00156 Roma - Italy e Facolta\u0301 di Ingegneria dell'Universita\u0301 Via E. Cuzzocrea, 48 - 89128 Reggio Calabria - Italy","Istituto IESS\u2010CNR \u2010 Via Cineto Romano, 42 \u2010 00156 Roma \u2010 Italy e Facolt\u00e1 di Ingegneria dell'Universit\u00e1 Via E. Cuzzocrea, 48 \u2010 89128 Reggio Calabria \u2010 Italy"],"affiliations":[{"raw_affiliation_string":"Istituto IESS-CNR - Via Cineto Romano, 42 - 00156 Roma - Italy e Facolta\u0301 di Ingegneria dell'Universita\u0301 Via E. Cuzzocrea, 48 - 89128 Reggio Calabria - Italy","institution_ids":[]},{"raw_affiliation_string":"Istituto IESS\u2010CNR \u2010 Via Cineto Romano, 42 \u2010 00156 Roma \u2010 Italy e Facolt\u00e1 di Ingegneria dell'Universit\u00e1 Via E. Cuzzocrea, 48 \u2010 89128 Reggio Calabria \u2010 Italy","institution_ids":[]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":8,"corresponding_author_ids":["https://openalex.org/A5035797503"],"corresponding_institution_ids":["https://openalex.org/I4210166800"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.20572896,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"1","issue":"2","first_page":"143","last_page":"147"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12039","display_name":"Electron and X-Ray Spectroscopy Techniques","score":0.9969000220298767,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11301","display_name":"Advanced Surface Polishing Techniques","score":0.9947999715805054,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/electron-beam-lithography","display_name":"Electron-beam lithography","score":0.7565973997116089},{"id":"https://openalex.org/keywords/resist","display_name":"Resist","score":0.743999719619751},{"id":"https://openalex.org/keywords/fabrication","display_name":"Fabrication","score":0.7126803398132324},{"id":"https://openalex.org/keywords/materials-science","display_name":"Materials science","score":0.6668275594711304},{"id":"https://openalex.org/keywords/scattering","display_name":"Scattering","score":0.6232472062110901},{"id":"https://openalex.org/keywords/lithography","display_name":"Lithography","score":0.6035731434822083},{"id":"https://openalex.org/keywords/x-ray-lithography","display_name":"X-ray lithography","score":0.5667523145675659},{"id":"https://openalex.org/keywords/optics","display_name":"Optics","score":0.5326430797576904},{"id":"https://openalex.org/keywords/beam","display_name":"Beam (structure)","score":0.5088277459144592},{"id":"https://openalex.org/keywords/boron-nitride","display_name":"Boron nitride","score":0.4361695647239685},{"id":"https://openalex.org/keywords/layer","display_name":"Layer (electronics)","score":0.42445695400238037},{"id":"https://openalex.org/keywords/cathode-ray","display_name":"Cathode ray","score":0.41761958599090576},{"id":"https://openalex.org/keywords/optoelectronics","display_name":"Optoelectronics","score":0.35935187339782715},{"id":"https://openalex.org/keywords/electron","display_name":"Electron","score":0.26983487606048584},{"id":"https://openalex.org/keywords/nanotechnology","display_name":"Nanotechnology","score":0.18434438109397888},{"id":"https://openalex.org/keywords/physics","display_name":"Physics","score":0.15267786383628845}],"concepts":[{"id":"https://openalex.org/C200274948","wikidata":"https://www.wikidata.org/wiki/Q256845","display_name":"Electron-beam lithography","level":4,"score":0.7565973997116089},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.743999719619751},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.7126803398132324},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6668275594711304},{"id":"https://openalex.org/C191486275","wikidata":"https://www.wikidata.org/wiki/Q210028","display_name":"Scattering","level":2,"score":0.6232472062110901},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.6035731434822083},{"id":"https://openalex.org/C41794268","wikidata":"https://www.wikidata.org/wiki/Q1408939","display_name":"X-ray lithography","level":4,"score":0.5667523145675659},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.5326430797576904},{"id":"https://openalex.org/C168834538","wikidata":"https://www.wikidata.org/wiki/Q3705329","display_name":"Beam (structure)","level":2,"score":0.5088277459144592},{"id":"https://openalex.org/C2780243435","wikidata":"https://www.wikidata.org/wiki/Q410193","display_name":"Boron nitride","level":2,"score":0.4361695647239685},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.42445695400238037},{"id":"https://openalex.org/C95312477","wikidata":"https://www.wikidata.org/wiki/Q207340","display_name":"Cathode ray","level":3,"score":0.41761958599090576},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.35935187339782715},{"id":"https://openalex.org/C147120987","wikidata":"https://www.wikidata.org/wiki/Q2225","display_name":"Electron","level":2,"score":0.26983487606048584},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.18434438109397888},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.15267786383628845},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1002/ett.4460010211","is_oa":false,"landing_page_url":"https://doi.org/10.1002/ett.4460010211","pdf_url":null,"source":{"id":"https://openalex.org/S4393917101","display_name":"European Transactions on Telecommunications","issn_l":"1124-318X","issn":["1124-318X","1541-8251"],"is_oa":false,"is_in_doaj":false,"is_core":true,"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"European Transactions on Telecommunications","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[{"score":0.6800000071525574,"display_name":"Affordable and clean energy","id":"https://metadata.un.org/sdg/7"}],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":1,"referenced_works":["https://openalex.org/W2488048505"],"related_works":["https://openalex.org/W4307818291","https://openalex.org/W2792297505","https://openalex.org/W2022535683","https://openalex.org/W806091262","https://openalex.org/W2478487396","https://openalex.org/W2135099569","https://openalex.org/W2103536379","https://openalex.org/W4375810091","https://openalex.org/W2011415744","https://openalex.org/W2145411830"],"abstract_inverted_index":{"Abstract":[0],"A":[1],"single\u2010layer":[2],"resist":[3],"process":[4,23],"for":[5,114],"X\u2010ray":[6],"master":[7],"mask":[8,21],"fabrication":[9,22],"by":[10,35,102,120,128],"electron":[11],"beam":[12,44],"lithography":[13],"is":[14,72,92,100,125,136],"theoretically":[15],"and":[16,29,61,79,87,148],"experimentally":[17,57],"investigated.":[18],"In":[19],"the":[20,69,82,103,111,132],"boron":[24],"nitride":[25],"membranes":[26],"are":[27,33,59],"utilized":[28,58],"final":[30],"absorber":[31],"structures":[32],"obtained":[34],"Au":[36],"electroplating":[37],"after":[38],"e\u2010beam":[39,55,133],"patterning":[40],"at":[41,75],"different":[42],"primary":[43],"energies,":[45],"on":[46],"a":[47],"single":[48],"PMMA":[49],"layer":[50,106],"of":[51,68,98,131],"10000":[52],"A.":[53],"The":[54],"energies":[56],"20":[60],"30":[62,78],"keV.":[63],"Detailed":[64],"Monte":[65],"Carlo":[66],"analysis":[67],"rnultilayer":[70],"structure":[71],"carried":[73],"out":[74],"10,":[76],"20,":[77],"40":[80],"keV,":[81],"corresponding":[83],"proximity":[84],"function":[85],"calculated":[86],"compared":[88],"to":[89,117,138,144],"experiment.":[90],"It":[91],"found":[93],"that":[94,127],"an":[95],"important":[96],"source":[97],"backscattering":[99],"constituted":[101],"thin":[104],"metal":[105],"as":[107],"plating":[108],"base,":[109],"while":[110],"ultimate":[112],"limit":[113],"resolution":[115],"seems":[116],"be":[118],"determined":[119],"forward":[121],"scattering.":[122],"Finally,":[123],"it":[124,135],"demonstrated":[126],"proper":[129],"selection":[130],"energy":[134],"possible":[137],"obtain":[139],"high":[140],"contrast":[141],"absorbers":[142],"down":[143],"0.3":[145],"\u03bcm":[146],"lines":[147],"spaces.":[149]},"counts_by_year":[],"updated_date":"2025-11-06T03:46:38.306776","created_date":"2025-10-10T00:00:00"}