{"id":"https://openalex.org/W4225278450","doi":"https://doi.org/10.1002/aisy.202200014","title":"A Fully Integrated System\u2010on\u2010Chip Design with Scalable Resistive Random\u2010Access Memory Tile Design for Analog in\u2010Memory Computing","display_name":"A Fully Integrated System\u2010on\u2010Chip Design with Scalable Resistive Random\u2010Access Memory Tile Design for Analog in\u2010Memory Computing","publication_year":2022,"publication_date":"2022-05-01","ids":{"openalex":"https://openalex.org/W4225278450","doi":"https://doi.org/10.1002/aisy.202200014"},"language":"en","primary_location":{"id":"doi:10.1002/aisy.202200014","is_oa":true,"landing_page_url":"https://doi.org/10.1002/aisy.202200014","pdf_url":"https://onlinelibrary.wiley.com/doi/pdfdirect/10.1002/aisy.202200014","source":{"id":"https://openalex.org/S4210212817","display_name":"Advanced Intelligent Systems","issn_l":"2640-4567","issn":["2640-4567"],"is_oa":true,"is_in_doaj":true,"is_core":true,"host_organization":"https://openalex.org/P4310320595","host_organization_name":"Wiley","host_organization_lineage":["https://openalex.org/P4310320595"],"host_organization_lineage_names":["Wiley"],"type":"journal"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Advanced Intelligent Systems","raw_type":"journal-article"},"type":"article","indexed_in":["crossref","doaj"],"open_access":{"is_oa":true,"oa_status":"gold","oa_url":"https://onlinelibrary.wiley.com/doi/pdfdirect/10.1002/aisy.202200014","any_repository_has_fulltext":true},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5014710582","display_name":"Fuxi Cai","orcid":"https://orcid.org/0000-0002-1945-6302"},"institutions":[{"id":"https://openalex.org/I193427800","display_name":"Applied Materials (United States)","ror":"https://ror.org/04h1q4c89","country_code":"US","type":"company","lineage":["https://openalex.org/I193427800"]}],"countries":["US"],"is_corresponding":true,"raw_author_name":"Fuxi Cai","raw_affiliation_strings":["Corporate Strategy and Development: Design Technology Applied Materials Inc.  3325 Scott Blvd. Santa Clara CA 95054 USA","Corporate Strategy and Development: Design Technology, Applied Materials Inc., 3325 Scott Blvd., Santa Clara, CA, 95054 USA"],"raw_orcid":"https://orcid.org/0000-0002-1945-6302","affiliations":[{"raw_affiliation_string":"Corporate Strategy and Development: Design Technology Applied Materials Inc.  3325 Scott Blvd. Santa Clara CA 95054 USA","institution_ids":["https://openalex.org/I193427800"]},{"raw_affiliation_string":"Corporate Strategy and Development: Design Technology, Applied Materials Inc., 3325 Scott Blvd., Santa Clara, CA, 95054 USA","institution_ids":["https://openalex.org/I193427800"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5111770820","display_name":"She-Hwa Yen","orcid":null},"institutions":[{"id":"https://openalex.org/I193427800","display_name":"Applied Materials (United States)","ror":"https://ror.org/04h1q4c89","country_code":"US","type":"company","lineage":["https://openalex.org/I193427800"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"She-Hwa Yen","raw_affiliation_strings":["Corporate Strategy and Development: Design Technology Applied Materials Inc.  3325 Scott Blvd. Santa Clara CA 95054 USA","Corporate Strategy and Development: Design Technology, Applied Materials Inc., 3325 Scott Blvd., Santa Clara, CA, 95054 USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Corporate Strategy and Development: Design Technology Applied Materials Inc.  3325 Scott Blvd. Santa Clara CA 95054 USA","institution_ids":["https://openalex.org/I193427800"]},{"raw_affiliation_string":"Corporate Strategy and Development: Design Technology, Applied Materials Inc., 3325 Scott Blvd., Santa Clara, CA, 95054 USA","institution_ids":["https://openalex.org/I193427800"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5047226809","display_name":"Apurva Uppala","orcid":null},"institutions":[{"id":"https://openalex.org/I193427800","display_name":"Applied Materials (United States)","ror":"https://ror.org/04h1q4c89","country_code":"US","type":"company","lineage":["https://openalex.org/I193427800"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Apurva Uppala","raw_affiliation_strings":["Corporate Strategy and Development: Design Technology Applied Materials Inc.  3325 Scott Blvd. Santa Clara CA 95054 USA","Corporate Strategy and Development: Design Technology, Applied Materials Inc., 3325 Scott Blvd., Santa Clara, CA, 95054 USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Corporate Strategy and Development: Design Technology Applied Materials Inc.  3325 Scott Blvd. Santa Clara CA 95054 USA","institution_ids":["https://openalex.org/I193427800"]},{"raw_affiliation_string":"Corporate Strategy and Development: Design Technology, Applied Materials Inc., 3325 Scott Blvd., Santa Clara, CA, 95054 USA","institution_ids":["https://openalex.org/I193427800"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5041611859","display_name":"Luke Thomas","orcid":null},"institutions":[{"id":"https://openalex.org/I193427800","display_name":"Applied Materials (United States)","ror":"https://ror.org/04h1q4c89","country_code":"US","type":"company","lineage":["https://openalex.org/I193427800"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Luke Thomas","raw_affiliation_strings":["Corporate Strategy and Development: Design Technology Applied Materials Inc.  3325 Scott Blvd. Santa Clara CA 95054 USA","Corporate Strategy and Development: Design Technology, Applied Materials Inc., 3325 Scott Blvd., Santa Clara, CA, 95054 USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Corporate Strategy and Development: Design Technology Applied Materials Inc.  3325 Scott Blvd. Santa Clara CA 95054 USA","institution_ids":["https://openalex.org/I193427800"]},{"raw_affiliation_string":"Corporate Strategy and Development: Design Technology, Applied Materials Inc., 3325 Scott Blvd., Santa Clara, CA, 95054 USA","institution_ids":["https://openalex.org/I193427800"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5101486718","display_name":"Tianchi Liu","orcid":"https://orcid.org/0000-0001-6733-3924"},"institutions":[{"id":"https://openalex.org/I193427800","display_name":"Applied Materials (United States)","ror":"https://ror.org/04h1q4c89","country_code":"US","type":"company","lineage":["https://openalex.org/I193427800"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Tianchi Liu","raw_affiliation_strings":["Corporate Strategy and Development: Design Technology Applied Materials Inc.  3325 Scott Blvd. Santa Clara CA 95054 USA","Corporate Strategy and Development: Design Technology, Applied Materials Inc., 3325 Scott Blvd., Santa Clara, CA, 95054 USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Corporate Strategy and Development: Design Technology Applied Materials Inc.  3325 Scott Blvd. Santa Clara CA 95054 USA","institution_ids":["https://openalex.org/I193427800"]},{"raw_affiliation_string":"Corporate Strategy and Development: Design Technology, Applied Materials Inc., 3325 Scott Blvd., Santa Clara, CA, 95054 USA","institution_ids":["https://openalex.org/I193427800"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5069374770","display_name":"Peter P. Fu","orcid":"https://orcid.org/0000-0003-1902-1189"},"institutions":[{"id":"https://openalex.org/I193427800","display_name":"Applied Materials (United States)","ror":"https://ror.org/04h1q4c89","country_code":"US","type":"company","lineage":["https://openalex.org/I193427800"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Peter Fu","raw_affiliation_strings":["Corporate Strategy and Development: Design Technology Applied Materials Inc.  3325 Scott Blvd. Santa Clara CA 95054 USA","Corporate Strategy and Development: Design Technology, Applied Materials Inc., 3325 Scott Blvd., Santa Clara, CA, 95054 USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Corporate Strategy and Development: Design Technology Applied Materials Inc.  3325 Scott Blvd. Santa Clara CA 95054 USA","institution_ids":["https://openalex.org/I193427800"]},{"raw_affiliation_string":"Corporate Strategy and Development: Design Technology, Applied Materials Inc., 3325 Scott Blvd., Santa Clara, CA, 95054 USA","institution_ids":["https://openalex.org/I193427800"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100455673","display_name":"Xiaofeng Zhang","orcid":"https://orcid.org/0000-0002-9597-3483"},"institutions":[{"id":"https://openalex.org/I193427800","display_name":"Applied Materials (United States)","ror":"https://ror.org/04h1q4c89","country_code":"US","type":"company","lineage":["https://openalex.org/I193427800"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Xiaofeng Zhang","raw_affiliation_strings":["Corporate Strategy and Development: Design Technology Applied Materials Inc.  3325 Scott Blvd. Santa Clara CA 95054 USA","Corporate Strategy and Development: Design Technology, Applied Materials Inc., 3325 Scott Blvd., Santa Clara, CA, 95054 USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Corporate Strategy and Development: Design Technology Applied Materials Inc.  3325 Scott Blvd. Santa Clara CA 95054 USA","institution_ids":["https://openalex.org/I193427800"]},{"raw_affiliation_string":"Corporate Strategy and Development: Design Technology, Applied Materials Inc., 3325 Scott Blvd., Santa Clara, CA, 95054 USA","institution_ids":["https://openalex.org/I193427800"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5051087016","display_name":"Ambrose Low","orcid":null},"institutions":[{"id":"https://openalex.org/I193427800","display_name":"Applied Materials (United States)","ror":"https://ror.org/04h1q4c89","country_code":"US","type":"company","lineage":["https://openalex.org/I193427800"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Ambrose Low","raw_affiliation_strings":["Corporate Strategy and Development: Design Technology Applied Materials Inc.  3325 Scott Blvd. Santa Clara CA 95054 USA","Corporate Strategy and Development: Design Technology, Applied Materials Inc., 3325 Scott Blvd., Santa Clara, CA, 95054 USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Corporate Strategy and Development: Design Technology Applied Materials Inc.  3325 Scott Blvd. Santa Clara CA 95054 USA","institution_ids":["https://openalex.org/I193427800"]},{"raw_affiliation_string":"Corporate Strategy and Development: Design Technology, Applied Materials Inc., 3325 Scott Blvd., Santa Clara, CA, 95054 USA","institution_ids":["https://openalex.org/I193427800"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5014594255","display_name":"Deepak Kamalanathan","orcid":null},"institutions":[{"id":"https://openalex.org/I193427800","display_name":"Applied Materials (United States)","ror":"https://ror.org/04h1q4c89","country_code":"US","type":"company","lineage":["https://openalex.org/I193427800"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Deepak Kamalanathan","raw_affiliation_strings":["Semiconductor Products Group: Speciality Devices R&D Applied Materials Inc.  3325 Scott Blvd. Santa Clara CA 95054 USA","Semiconductor Products Group: Speciality Devices R&D, Applied Materials Inc., 3325 Scott Blvd., Santa Clara, CA, 95054 USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Semiconductor Products Group: Speciality Devices R&D Applied Materials Inc.  3325 Scott Blvd. Santa Clara CA 95054 USA","institution_ids":["https://openalex.org/I193427800"]},{"raw_affiliation_string":"Semiconductor Products Group: Speciality Devices R&D, Applied Materials Inc., 3325 Scott Blvd., Santa Clara, CA, 95054 USA","institution_ids":["https://openalex.org/I193427800"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5011295627","display_name":"Joe Hsu","orcid":null},"institutions":[{"id":"https://openalex.org/I193427800","display_name":"Applied Materials (United States)","ror":"https://ror.org/04h1q4c89","country_code":"US","type":"company","lineage":["https://openalex.org/I193427800"]}],"countries":["US"],"is_corresponding":true,"raw_author_name":"Joe Hsu","raw_affiliation_strings":["Corporate Strategy and Development: Design Technology Applied Materials Inc.  3325 Scott Blvd. Santa Clara CA 95054 USA","Corporate Strategy and Development: Design Technology, Applied Materials Inc., 3325 Scott Blvd., Santa Clara, CA, 95054 USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Corporate Strategy and Development: Design Technology Applied Materials Inc.  3325 Scott Blvd. Santa Clara CA 95054 USA","institution_ids":["https://openalex.org/I193427800"]},{"raw_affiliation_string":"Corporate Strategy and Development: Design Technology, Applied Materials Inc., 3325 Scott Blvd., Santa Clara, CA, 95054 USA","institution_ids":["https://openalex.org/I193427800"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5001846498","display_name":"Buvna Ayyagari-Sangamalli","orcid":null},"institutions":[{"id":"https://openalex.org/I193427800","display_name":"Applied Materials (United States)","ror":"https://ror.org/04h1q4c89","country_code":"US","type":"company","lineage":["https://openalex.org/I193427800"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Buvna Ayyagari-Sangamalli","raw_affiliation_strings":["Corporate Strategy and Development: Design Technology Applied Materials Inc.  3325 Scott Blvd. Santa Clara CA 95054 USA","Corporate Strategy and Development: Design Technology, Applied Materials Inc., 3325 Scott Blvd., Santa Clara, CA, 95054 USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Corporate Strategy and Development: Design Technology Applied Materials Inc.  3325 Scott Blvd. Santa Clara CA 95054 USA","institution_ids":["https://openalex.org/I193427800"]},{"raw_affiliation_string":"Corporate Strategy and Development: Design Technology, Applied Materials Inc., 3325 Scott Blvd., Santa Clara, CA, 95054 USA","institution_ids":["https://openalex.org/I193427800"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":11,"corresponding_author_ids":["https://openalex.org/A5011295627","https://openalex.org/A5014710582"],"corresponding_institution_ids":["https://openalex.org/I193427800"],"apc_list":{"value":2750,"currency":"USD","value_usd":2750},"apc_paid":{"value":2750,"currency":"USD","value_usd":2750},"fwci":1.2925,"has_fulltext":true,"cited_by_count":14,"citation_normalized_percentile":{"value":0.78764774,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":90,"max":98},"biblio":{"volume":"4","issue":"8","first_page":null,"last_page":null},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10502","display_name":"Advanced Memory and Neural Computing","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10502","display_name":"Advanced Memory and Neural Computing","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12808","display_name":"Ferroelectric and Negative Capacitance Devices","score":0.9994000196456909,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11128","display_name":"Transition Metal Oxide Nanomaterials","score":0.9965999722480774,"subfield":{"id":"https://openalex.org/subfields/2507","display_name":"Polymers and Plastics"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/resistive-random-access-memory","display_name":"Resistive random-access memory","score":0.8493468761444092},{"id":"https://openalex.org/keywords/computer-science","display_name":"Computer science","score":0.7375238537788391},{"id":"https://openalex.org/keywords/scalability","display_name":"Scalability","score":0.7092708945274353},{"id":"https://openalex.org/keywords/mnist-database","display_name":"MNIST database","score":0.6434774398803711},{"id":"https://openalex.org/keywords/computer-architecture","display_name":"Computer architecture","score":0.5672856569290161},{"id":"https://openalex.org/keywords/efficient-energy-use","display_name":"Efficient energy use","score":0.5063735246658325},{"id":"https://openalex.org/keywords/random-access","display_name":"Random access","score":0.4837324917316437},{"id":"https://openalex.org/keywords/non-volatile-memory","display_name":"Non-volatile memory","score":0.47392377257347107},{"id":"https://openalex.org/keywords/in-memory-processing","display_name":"In-Memory Processing","score":0.4510360658168793},{"id":"https://openalex.org/keywords/computer-hardware","display_name":"Computer hardware","score":0.42763644456863403},{"id":"https://openalex.org/keywords/embedded-system","display_name":"Embedded system","score":0.41172075271606445},{"id":"https://openalex.org/keywords/artificial-neural-network","display_name":"Artificial neural network","score":0.3808140456676483},{"id":"https://openalex.org/keywords/computer-engineering","display_name":"Computer engineering","score":0.33022308349609375},{"id":"https://openalex.org/keywords/artificial-intelligence","display_name":"Artificial intelligence","score":0.212263286113739},{"id":"https://openalex.org/keywords/electrical-engineering","display_name":"Electrical engineering","score":0.1840650737285614},{"id":"https://openalex.org/keywords/voltage","display_name":"Voltage","score":0.17540976405143738},{"id":"https://openalex.org/keywords/engineering","display_name":"Engineering","score":0.16470080614089966},{"id":"https://openalex.org/keywords/operating-system","display_name":"Operating system","score":0.13631081581115723},{"id":"https://openalex.org/keywords/search-engine","display_name":"Search engine","score":0.10388010740280151}],"concepts":[{"id":"https://openalex.org/C182019814","wikidata":"https://www.wikidata.org/wiki/Q1143830","display_name":"Resistive random-access memory","level":3,"score":0.8493468761444092},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.7375238537788391},{"id":"https://openalex.org/C48044578","wikidata":"https://www.wikidata.org/wiki/Q727490","display_name":"Scalability","level":2,"score":0.7092708945274353},{"id":"https://openalex.org/C190502265","wikidata":"https://www.wikidata.org/wiki/Q17069496","display_name":"MNIST database","level":3,"score":0.6434774398803711},{"id":"https://openalex.org/C118524514","wikidata":"https://www.wikidata.org/wiki/Q173212","display_name":"Computer architecture","level":1,"score":0.5672856569290161},{"id":"https://openalex.org/C2742236","wikidata":"https://www.wikidata.org/wiki/Q924713","display_name":"Efficient energy use","level":2,"score":0.5063735246658325},{"id":"https://openalex.org/C101722063","wikidata":"https://www.wikidata.org/wiki/Q218825","display_name":"Random access","level":2,"score":0.4837324917316437},{"id":"https://openalex.org/C177950962","wikidata":"https://www.wikidata.org/wiki/Q10997658","display_name":"Non-volatile memory","level":2,"score":0.47392377257347107},{"id":"https://openalex.org/C123593499","wikidata":"https://www.wikidata.org/wiki/Q6008583","display_name":"In-Memory Processing","level":5,"score":0.4510360658168793},{"id":"https://openalex.org/C9390403","wikidata":"https://www.wikidata.org/wiki/Q3966","display_name":"Computer hardware","level":1,"score":0.42763644456863403},{"id":"https://openalex.org/C149635348","wikidata":"https://www.wikidata.org/wiki/Q193040","display_name":"Embedded system","level":1,"score":0.41172075271606445},{"id":"https://openalex.org/C50644808","wikidata":"https://www.wikidata.org/wiki/Q192776","display_name":"Artificial neural network","level":2,"score":0.3808140456676483},{"id":"https://openalex.org/C113775141","wikidata":"https://www.wikidata.org/wiki/Q428691","display_name":"Computer engineering","level":1,"score":0.33022308349609375},{"id":"https://openalex.org/C154945302","wikidata":"https://www.wikidata.org/wiki/Q11660","display_name":"Artificial intelligence","level":1,"score":0.212263286113739},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.1840650737285614},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.17540976405143738},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.16470080614089966},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.13631081581115723},{"id":"https://openalex.org/C97854310","wikidata":"https://www.wikidata.org/wiki/Q19541","display_name":"Search engine","level":2,"score":0.10388010740280151},{"id":"https://openalex.org/C194222762","wikidata":"https://www.wikidata.org/wiki/Q114486","display_name":"Query by Example","level":4,"score":0.0},{"id":"https://openalex.org/C164120249","wikidata":"https://www.wikidata.org/wiki/Q995982","display_name":"Web search query","level":3,"score":0.0},{"id":"https://openalex.org/C23123220","wikidata":"https://www.wikidata.org/wiki/Q816826","display_name":"Information retrieval","level":1,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1002/aisy.202200014","is_oa":true,"landing_page_url":"https://doi.org/10.1002/aisy.202200014","pdf_url":"https://onlinelibrary.wiley.com/doi/pdfdirect/10.1002/aisy.202200014","source":{"id":"https://openalex.org/S4210212817","display_name":"Advanced Intelligent Systems","issn_l":"2640-4567","issn":["2640-4567"],"is_oa":true,"is_in_doaj":true,"is_core":true,"host_organization":"https://openalex.org/P4310320595","host_organization_name":"Wiley","host_organization_lineage":["https://openalex.org/P4310320595"],"host_organization_lineage_names":["Wiley"],"type":"journal"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Advanced Intelligent Systems","raw_type":"journal-article"},{"id":"pmh:oai:doaj.org/article:7d38f5f69ff847f1aa7bda2e82d0e452","is_oa":true,"landing_page_url":"https://doaj.org/article/7d38f5f69ff847f1aa7bda2e82d0e452","pdf_url":null,"source":{"id":"https://openalex.org/S4306401280","display_name":"DOAJ (DOAJ: Directory of Open Access Journals)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"repository"},"license":"cc-by-sa","license_id":"https://openalex.org/licenses/cc-by-sa","version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Advanced Intelligent Systems, Vol 4, Iss 8, Pp n/a-n/a (2022)","raw_type":"article"}],"best_oa_location":{"id":"doi:10.1002/aisy.202200014","is_oa":true,"landing_page_url":"https://doi.org/10.1002/aisy.202200014","pdf_url":"https://onlinelibrary.wiley.com/doi/pdfdirect/10.1002/aisy.202200014","source":{"id":"https://openalex.org/S4210212817","display_name":"Advanced Intelligent Systems","issn_l":"2640-4567","issn":["2640-4567"],"is_oa":true,"is_in_doaj":true,"is_core":true,"host_organization":"https://openalex.org/P4310320595","host_organization_name":"Wiley","host_organization_lineage":["https://openalex.org/P4310320595"],"host_organization_lineage_names":["Wiley"],"type":"journal"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Advanced Intelligent Systems","raw_type":"journal-article"},"sustainable_development_goals":[{"id":"https://metadata.un.org/sdg/7","display_name":"Affordable and clean energy","score":0.8700000047683716}],"awards":[],"funders":[],"has_content":{"grobid_xml":true,"pdf":true},"content_urls":{"pdf":"https://content.openalex.org/works/W4225278450.pdf","grobid_xml":"https://content.openalex.org/works/W4225278450.grobid-xml"},"referenced_works_count":35,"referenced_works":["https://openalex.org/W1542981317","https://openalex.org/W1937359183","https://openalex.org/W2004823737","https://openalex.org/W2112796928","https://openalex.org/W2233304223","https://openalex.org/W2289252105","https://openalex.org/W2404581299","https://openalex.org/W2518281301","https://openalex.org/W2771957067","https://openalex.org/W2775771159","https://openalex.org/W2778345336","https://openalex.org/W2778935320","https://openalex.org/W2782046614","https://openalex.org/W2805362231","https://openalex.org/W2807750997","https://openalex.org/W2810068957","https://openalex.org/W2895545069","https://openalex.org/W2919115771","https://openalex.org/W2923010225","https://openalex.org/W2943313495","https://openalex.org/W2948661249","https://openalex.org/W2960778947","https://openalex.org/W2963255460","https://openalex.org/W3003821665","https://openalex.org/W3005901860","https://openalex.org/W3018945530","https://openalex.org/W3037092152","https://openalex.org/W3040302020","https://openalex.org/W3040303671","https://openalex.org/W3080976800","https://openalex.org/W3100081896","https://openalex.org/W3101272433","https://openalex.org/W3160491973","https://openalex.org/W3194056411","https://openalex.org/W4254436426"],"related_works":["https://openalex.org/W2076211355","https://openalex.org/W2007070351","https://openalex.org/W2033811947","https://openalex.org/W2183989414","https://openalex.org/W1551399929","https://openalex.org/W2038212394","https://openalex.org/W2410132916","https://openalex.org/W2104937488","https://openalex.org/W2725431849","https://openalex.org/W2014287106"],"abstract_inverted_index":{"As":[0],"the":[1,13,43,67,111,123,131],"demands":[2],"of":[3,99],"big":[4],"data":[5],"applications":[6,56],"and":[7,93,101,129,134],"deep":[8],"learning":[9],"continue":[10],"to":[11,18,36,121],"rise,":[12],"industry":[14],"is":[15,70,84,118],"increasingly":[16],"looking":[17],"artificial":[19],"intelligence":[20],"(AI)":[21],"accelerators.":[22],"Analog":[23],"in\u2010memory":[24,59],"computing":[25,60],"(AiMC)":[26],"with":[27,57,86,105],"emerging":[28],"nonvolatile":[29],"devices":[30],"enable":[31],"good":[32],"hardware":[33],"solutions,":[34],"due":[35],"its":[37],"high":[38,76],"energy":[39,77],"efficiency":[40,78],"in":[41,79,110],"accelerating":[42],"multiply\u2010and\u2010accumulation":[44],"(MAC)":[45],"operation.":[46],"Herein,":[47],"an":[48],"Applied":[49],"Materials":[50],"custom\u2010designed":[51],"system\u2010on\u2010chip":[52],"(SoC)":[53],"targeting":[54],"AI":[55,116],"analog":[58],"using":[61],"resistive":[62],"random\u2010access":[63],"memory":[64],"(ReRAM)":[65],"as":[66],"compute":[68],"element":[69],"demonstrated.":[71],"The":[72],"first":[73],"silicon":[74],"achieves":[75],"MAC":[80],"operations.":[81],"This":[82],"chip":[83],"implemented":[85],"LeNet\u20101":[87],"neural":[88],"network":[89],"on":[90],"ReRAM":[91],"tiles":[92],"demonstrated":[94],"by":[95],"Modified":[96],"National":[97],"Institute":[98],"Standards":[100],"Technology":[102],"(MNIST)":[103],"classification":[104],"accuracy":[106],"matching":[107],"that":[108],"predicted":[109],"simulations.":[112],"A":[113],"simulation":[114],"framework,":[115],"Sim,":[117],"also":[119],"developed":[120],"evaluate":[122],"system":[124],"performance":[125],"for":[126],"large\u2010scale":[127],"application":[128],"guide":[130],"bitcell":[132],"development":[133],"design":[135],"choices.":[136]},"counts_by_year":[{"year":2025,"cited_by_count":5},{"year":2024,"cited_by_count":3},{"year":2023,"cited_by_count":5},{"year":2022,"cited_by_count":1}],"updated_date":"2026-05-21T06:26:12.895304","created_date":"2025-10-10T00:00:00"}