{"id":"https://openalex.org/W98016074","doi":"https://doi.org/10.1016/b978-008045263-0/50049-0","title":"An ultrathick SU-8 UV lithographic process and sidewall characterization","display_name":"An ultrathick SU-8 UV lithographic process and sidewall characterization","publication_year":2006,"publication_date":"2006-01-01","ids":{"openalex":"https://openalex.org/W98016074","doi":"https://doi.org/10.1016/b978-008045263-0/50049-0","mag":"98016074"},"language":"en","primary_location":{"id":"doi:10.1016/b978-008045263-0/50049-0","doi":"https://doi.org/10.1016/b978-008045263-0/50049-0","is_oa":false,"landing_page_url":"https://doi.org/10.1016/b978-008045263-0/50049-0","pdf_url":null,"source":{"id":"https://openalex.org/S4306463230","display_name":"Elsevier eBooks","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"ebook platform"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"4M 2006 - Second International Conference on Multi-Material Micro Manufacture","raw_type":"book-chapter"},"volume":{"id":"https://openalex.org/W4241667368","display_name":"4M 2006 - Second International Conference on Multi-Material Micro Manufacture"},"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5102807983","display_name":"Kyle S. Jiang","orcid":"https://orcid.org/0000-0001-9591-534X","observed_orcids":["https://orcid.org/0000-0001-9591-534X"]},"institutions":[{"id":"https://openalex.org/I79619799","display_name":"University of Birmingham","ror":"https://ror.org/03angcq70","country_code":"GB","type":"education","lineage":["https://openalex.org/I79619799"]}],"countries":["GB"],"is_corresponding":true,"raw_author_name":"K. Jiang","raw_affiliation_strings":["Centre for MicroEnigineering and NanoTechnology, The University of Birmingham, Birmingham, U.K. B15 2TT"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Centre for MicroEnigineering and NanoTechnology, The University of Birmingham, Birmingham, U.K. B15 2TT","institution_ids":["https://openalex.org/I79619799"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5054924669","display_name":"C.H. Lee","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I79619799","display_name":"University of Birmingham","ror":"https://ror.org/03angcq70","country_code":"GB","type":"education","lineage":["https://openalex.org/I79619799"]}],"countries":["GB"],"is_corresponding":false,"raw_author_name":"C.-H. Lee","raw_affiliation_strings":["Centre for MicroEnigineering and NanoTechnology, The University of Birmingham, Birmingham, U.K. B15 2TT"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Centre for MicroEnigineering and NanoTechnology, The University of Birmingham, Birmingham, U.K. B15 2TT","institution_ids":["https://openalex.org/I79619799"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5101663194","display_name":"Peng Jin","orcid":"https://orcid.org/0000-0002-3537-231X","observed_orcids":["https://orcid.org/0000-0002-3537-231X","https://orcid.org/0000-0002-4440-5240"]},"institutions":[{"id":"https://openalex.org/I79619799","display_name":"University of Birmingham","ror":"https://ror.org/03angcq70","country_code":"GB","type":"education","lineage":["https://openalex.org/I79619799"]}],"countries":["GB"],"is_corresponding":false,"raw_author_name":"P. Jin","raw_affiliation_strings":["Centre for MicroEnigineering and NanoTechnology, The University of Birmingham, Birmingham, U.K. B15 2TT"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Centre for MicroEnigineering and NanoTechnology, The University of Birmingham, Birmingham, U.K. B15 2TT","institution_ids":["https://openalex.org/I79619799"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":["https://openalex.org/A5102807983"],"corresponding_institution_ids":["https://openalex.org/I79619799"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":4,"citation_normalized_percentile":{"value":0.00212766,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":89,"max":95},"biblio":{"volume":null,"issue":null,"first_page":"211","last_page":"216"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.986299991607666,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.986299991607666,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10412","display_name":"Microfluidic and Capillary Electrophoresis Applications","score":0.0052999998442828655,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10369","display_name":"Advanced MEMS and NEMS Technologies","score":0.002099999925121665,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/su-8","display_name":"SU-8","score":0.8999999761581421},{"id":"https://openalex.org/keywords/uv-lithography","display_name":"UV lithography","score":0.9739999771118164},{"id":"https://openalex.org/keywords/microstructure","display_name":"microstructure","score":0.5260000228881836},{"id":"https://openalex.org/keywords/aspect-ratio","display_name":"aspect ratio","score":0.6930000185966492},{"id":"https://openalex.org/keywords/uv-exposure-time","display_name":"UV exposure time","score":0.9549999833106995},{"id":"https://openalex.org/keywords/surface-topography","display_name":"surface topography","score":0.7950000166893005},{"id":"https://openalex.org/keywords/microfluidics","display_name":"microfluidics","score":0.9129999876022339},{"id":"https://openalex.org/keywords/biomaterials","display_name":"biomaterials","score":0.6520000100135803},{"id":"https://openalex.org/keywords/capillarity","display_name":"capillarity","score":0.7139999866485596},{"id":"https://openalex.org/keywords/surface-tension","display_name":"surface tension","score":0.7319999933242798}],"concepts":[{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.7335338592529297},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7310250401496887},{"id":"https://openalex.org/C63662833","wikidata":"https://www.wikidata.org/wiki/Q6839341","display_name":"Microchannel","level":2,"score":0.7251651883125305},{"id":"https://openalex.org/C107365816","wikidata":"https://www.wikidata.org/wiki/Q114817","display_name":"Surface roughness","level":2,"score":0.6756686568260193},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.6486189365386963},{"id":"https://openalex.org/C8892853","wikidata":"https://www.wikidata.org/wiki/Q170749","display_name":"Surface tension","level":2,"score":0.6229045391082764},{"id":"https://openalex.org/C71039073","wikidata":"https://www.wikidata.org/wiki/Q3439090","display_name":"Surface finish","level":2,"score":0.5859861969947815},{"id":"https://openalex.org/C2780841128","wikidata":"https://www.wikidata.org/wiki/Q5073781","display_name":"Characterization (materials science)","level":2,"score":0.5736940503120422},{"id":"https://openalex.org/C196806460","wikidata":"https://www.wikidata.org/wiki/Q188603","display_name":"Capillary action","level":2,"score":0.5006184577941895},{"id":"https://openalex.org/C8673954","wikidata":"https://www.wikidata.org/wiki/Q138845","display_name":"Microfluidics","level":2,"score":0.46386709809303284},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.4563520550727844},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.43069586157798767},{"id":"https://openalex.org/C134406635","wikidata":"https://www.wikidata.org/wiki/Q1439684","display_name":"Photoresist","level":3,"score":0.4291917383670807},{"id":"https://openalex.org/C82558694","wikidata":"https://www.wikidata.org/wiki/Q1545619","display_name":"Aspect ratio (aeronautics)","level":2,"score":0.4121879041194916},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.34940242767333984},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.29670143127441406},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.09188860654830933},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.08736163377761841},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1016/b978-008045263-0/50049-0","doi":"https://doi.org/10.1016/b978-008045263-0/50049-0","is_oa":false,"landing_page_url":"https://doi.org/10.1016/b978-008045263-0/50049-0","pdf_url":null,"source":{"id":"https://openalex.org/S4306463230","display_name":"Elsevier eBooks","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"ebook platform"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"4M 2006 - Second International Conference on Multi-Material Micro Manufacture","raw_type":"book-chapter"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":20,"referenced_works":["https://openalex.org/W130472597","https://openalex.org/W1981056760","https://openalex.org/W1983309023","https://openalex.org/W1988090103","https://openalex.org/W2000186646","https://openalex.org/W2012750479","https://openalex.org/W2013010457","https://openalex.org/W2026532645","https://openalex.org/W2028130805","https://openalex.org/W2036098998","https://openalex.org/W2041414479","https://openalex.org/W2042232015","https://openalex.org/W2055962001","https://openalex.org/W2069057670","https://openalex.org/W2069985558","https://openalex.org/W2080393159","https://openalex.org/W2112566677","https://openalex.org/W2125906494","https://openalex.org/W2142303686","https://openalex.org/W2143914153"],"related_works":["https://openalex.org/W3148570036","https://openalex.org/W2494741945","https://openalex.org/W2359067074","https://openalex.org/W2142303686","https://openalex.org/W1981056760","https://openalex.org/W2356404053","https://openalex.org/W2045302986","https://openalex.org/W2011297957","https://openalex.org/W193986735","https://openalex.org/W1982642650"],"abstract_inverted_index":null,"counts_by_year":[{"year":2025,"cited_by_count":2},{"year":2017,"cited_by_count":1}],"updated_date":"2026-11-04T10:54:05.112534","created_date":"2016-06-24T00:00:00"}