{"id":"https://openalex.org/W875565159","doi":"https://doi.org/10.1016/j.apsusc.2015.07.060","title":"Improved Si/SiOx interface passivation by ultra-thin tunneling oxide layers prepared by rapid thermal oxidation","display_name":"Improved Si/SiOx interface passivation by ultra-thin tunneling oxide layers prepared by rapid thermal oxidation","publication_year":2015,"publication_date":"2015-07-15","ids":{"openalex":"https://openalex.org/W875565159","doi":"https://doi.org/10.1016/j.apsusc.2015.07.060","mag":"875565159"},"language":"en","primary_location":{"id":"doi:10.1016/j.apsusc.2015.07.060","doi":"https://doi.org/10.1016/j.apsusc.2015.07.060","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.apsusc.2015.07.060","pdf_url":null,"source":{"id":"https://openalex.org/S42323631","display_name":"Applied Surface Science","issn_l":"0169-4332","issn":["0169-4332","1873-5584"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-a","jufo-2","ki-jl-1","norway-1","poland-140","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Applied Surface Science","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5059511601","display_name":"Karim M. Gad","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I161046081","display_name":"University of Freiburg","ror":"https://ror.org/0245cg223","country_code":"DE","type":"education","lineage":["https://openalex.org/I161046081"]}],"countries":["DE"],"is_corresponding":true,"raw_author_name":"Karim M. Gad","raw_affiliation_strings":["University of Freiburg, Department of Microsystems Engineering \u2013 (IMTEK), 79110, Freiburg, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"University of Freiburg, Department of Microsystems Engineering \u2013 (IMTEK), 79110, Freiburg, Germany","institution_ids":["https://openalex.org/I161046081"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5063629890","display_name":"Daniel V\u00f6ssing","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I161046081","display_name":"University of Freiburg","ror":"https://ror.org/0245cg223","country_code":"DE","type":"education","lineage":["https://openalex.org/I161046081"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Daniel V\u00f6ssing","raw_affiliation_strings":["University of Freiburg, Department of Microsystems Engineering \u2013 (IMTEK), 79110, Freiburg, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"University of Freiburg, Department of Microsystems Engineering \u2013 (IMTEK), 79110, Freiburg, Germany","institution_ids":["https://openalex.org/I161046081"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5068588350","display_name":"Patrice Balamou","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I122228004","display_name":"HTW Berlin - University of Applied Sciences","ror":"https://ror.org/01xzwj424","country_code":"DE","type":"education","lineage":["https://openalex.org/I122228004"]},{"id":"https://openalex.org/I2800795503","display_name":"Helmholtz-Zentrum Berlin f\u00fcr Materialien und Energie","ror":"https://ror.org/02aj13c28","country_code":"DE","type":"facility","lineage":["https://openalex.org/I1305996414","https://openalex.org/I2800795503"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Patrice Balamou","raw_affiliation_strings":["HTW Berlin - University of Applied Sciences, Wilhelminenhofstr. 75 a, 12459, Berlin, Germany","Helmholtz-Zentrum Berlin f\u00fcr Materialien und Energie (HZB), Institute for Photovoltaics, Berlin, Kekul\u00e9str. 5, 12489, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"HTW Berlin - University of Applied Sciences, Wilhelminenhofstr. 75 a, 12459, Berlin, Germany","institution_ids":["https://openalex.org/I122228004"]},{"raw_affiliation_string":"Helmholtz-Zentrum Berlin f\u00fcr Materialien und Energie (HZB), Institute for Photovoltaics, Berlin, Kekul\u00e9str. 5, 12489, Germany","institution_ids":["https://openalex.org/I2800795503"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5064358991","display_name":"Daniel Hiller","orcid":"https://orcid.org/0000-0001-8774-4069","observed_orcids":["https://orcid.org/0000-0001-8774-4069"]},"institutions":[{"id":"https://openalex.org/I161046081","display_name":"University of Freiburg","ror":"https://ror.org/0245cg223","country_code":"DE","type":"education","lineage":["https://openalex.org/I161046081"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Daniel Hiller","raw_affiliation_strings":["University of Freiburg, Department of Microsystems Engineering \u2013 (IMTEK), 79110, Freiburg, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"University of Freiburg, Department of Microsystems Engineering \u2013 (IMTEK), 79110, Freiburg, Germany","institution_ids":["https://openalex.org/I161046081"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5007426095","display_name":"Bert Stegemann","orcid":"https://orcid.org/0000-0001-9837-1448","observed_orcids":["https://orcid.org/0000-0001-9837-1448"]},"institutions":[{"id":"https://openalex.org/I122228004","display_name":"HTW Berlin - University of Applied Sciences","ror":"https://ror.org/01xzwj424","country_code":"DE","type":"education","lineage":["https://openalex.org/I122228004"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Bert Stegemann","raw_affiliation_strings":["HTW Berlin - University of Applied Sciences, Wilhelminenhofstr. 75 a, 12459, Berlin, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"HTW Berlin - University of Applied Sciences, Wilhelminenhofstr. 75 a, 12459, Berlin, Germany","institution_ids":["https://openalex.org/I122228004"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5090309733","display_name":"Heike Angermann","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I2800795503","display_name":"Helmholtz-Zentrum Berlin f\u00fcr Materialien und Energie","ror":"https://ror.org/02aj13c28","country_code":"DE","type":"facility","lineage":["https://openalex.org/I1305996414","https://openalex.org/I2800795503"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Heike Angermann","raw_affiliation_strings":["Helmholtz-Zentrum Berlin f\u00fcr Materialien und Energie (HZB), Institute for Photovoltaics, Berlin, Kekul\u00e9str. 5, 12489, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Helmholtz-Zentrum Berlin f\u00fcr Materialien und Energie (HZB), Institute for Photovoltaics, Berlin, Kekul\u00e9str. 5, 12489, Germany","institution_ids":["https://openalex.org/I2800795503"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5065864023","display_name":"Martin K\u00e4semann","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I161046081","display_name":"University of Freiburg","ror":"https://ror.org/0245cg223","country_code":"DE","type":"education","lineage":["https://openalex.org/I161046081"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Martin Kasemann","raw_affiliation_strings":["University of Freiburg, Department of Microsystems Engineering \u2013 (IMTEK), 79110, Freiburg, Germany"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"University of Freiburg, Department of Microsystems Engineering \u2013 (IMTEK), 79110, Freiburg, Germany","institution_ids":["https://openalex.org/I161046081"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":3,"corresponding_author_ids":["https://openalex.org/A5059511601"],"corresponding_institution_ids":["https://openalex.org/I161046081"],"apc_list":{"value":3930,"currency":"USD","value_usd":3930},"apc_paid":null,"fwci":1.5534,"has_fulltext":false,"cited_by_count":20,"citation_normalized_percentile":{"value":0.83047866,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":97},"biblio":{"volume":"353","issue":null,"first_page":"1269","last_page":"1276"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10624","display_name":"Silicon and Solar Cell Technologies","score":0.8119999766349792,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10624","display_name":"Silicon and Solar Cell Technologies","score":0.8119999766349792,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.1688999980688095,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.004900000058114529,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/rapid-thermal-oxidation","display_name":"rapid thermal oxidation","score":0.8309999704360962},{"id":"https://openalex.org/keywords/interface-state-density","display_name":"interface state density","score":0.7599999904632568},{"id":"https://openalex.org/keywords/defect-density","display_name":"defect density","score":0.625},{"id":"https://openalex.org/keywords/photoconductance","display_name":"photoconductance","score":0.7680000066757202},{"id":"https://openalex.org/keywords/forming-gas-annealing","display_name":"forming gas annealing","score":0.8769999742507935},{"id":"https://openalex.org/keywords/wet-chemical-oxidation","display_name":"wet chemical oxidation","score":0.8360000252723694},{"id":"https://openalex.org/keywords/plasma-oxidation","display_name":"plasma oxidation","score":1.0},{"id":"https://openalex.org/keywords/hydrogenated-amorphous-silicon-nitride","display_name":"hydrogenated amorphous silicon nitride","score":0.8610000014305115},{"id":"https://openalex.org/keywords/crystalline-silicon-wafers","display_name":"crystalline silicon wafers","score":0.8560000061988831}],"concepts":[{"id":"https://openalex.org/C33574316","wikidata":"https://www.wikidata.org/wiki/Q917260","display_name":"Passivation","level":3,"score":0.9322940111160278},{"id":"https://openalex.org/C2779281663","wikidata":"https://www.wikidata.org/wiki/Q1549368","display_name":"Thermal oxidation","level":3,"score":0.7828126549720764},{"id":"https://openalex.org/C2779851234","wikidata":"https://www.wikidata.org/wiki/Q50690","display_name":"Oxide","level":2,"score":0.7789154648780823},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7708069682121277},{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.7666691541671753},{"id":"https://openalex.org/C2777855556","wikidata":"https://www.wikidata.org/wiki/Q4339544","display_name":"Annealing (glass)","level":2,"score":0.6931748390197754},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.6786814332008362},{"id":"https://openalex.org/C2779105228","wikidata":"https://www.wikidata.org/wiki/Q2286029","display_name":"Silicon oxide","level":4,"score":0.4750133454799652},{"id":"https://openalex.org/C42360764","wikidata":"https://www.wikidata.org/wiki/Q83588","display_name":"Chemical engineering","level":1,"score":0.46147748827934265},{"id":"https://openalex.org/C36003996","wikidata":"https://www.wikidata.org/wiki/Q664848","display_name":"Forming gas","level":3,"score":0.46062320470809937},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.44599276781082153},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.44333162903785706},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.43424081802368164},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.37977951765060425},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.351154625415802},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.17846724390983582},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.13487032055854797},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.09906396269798279},{"id":"https://openalex.org/C2777431650","wikidata":"https://www.wikidata.org/wiki/Q413828","display_name":"Silicon nitride","level":3,"score":0.06622493267059326},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C43617362","wikidata":"https://www.wikidata.org/wiki/Q170050","display_name":"Chromatography","level":1,"score":0.0}],"mesh":[],"locations_count":3,"locations":[{"id":"doi:10.1016/j.apsusc.2015.07.060","doi":"https://doi.org/10.1016/j.apsusc.2015.07.060","is_oa":false,"landing_page_url":"https://doi.org/10.1016/j.apsusc.2015.07.060","pdf_url":null,"source":{"id":"https://openalex.org/S42323631","display_name":"Applied Surface Science","issn_l":"0169-4332","issn":["0169-4332","1873-5584"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-a","jufo-2","ki-jl-1","norway-1","poland-140","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Applied Surface Science","raw_type":"journal-article"},{"id":"pmh:oai:freidok.uni-freiburg.de:133622","doi":null,"is_oa":false,"landing_page_url":"https://freidok.uni-freiburg.de/data/133622","pdf_url":null,"source":{"id":"https://openalex.org/S4306401057","display_name":"FreiDok plus (Universit\u00e4tsbibliothek Freiburg)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I161046081","host_organization_name":"University of Freiburg","host_organization_lineage":["https://openalex.org/I161046081"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Applied surface science. - 353 (2015) , 1269-1276, ISSN: 0169-4332","raw_type":"article"},{"id":"pmh:oai:helmholtz.HZB:86353","doi":null,"is_oa":false,"landing_page_url":"https://www.helmholtz-berlin.de/pubbin/oai_publication?VT=1&ID=86353","pdf_url":null,"source":{"id":"https://openalex.org/S4306402598","display_name":"HZB Repository (Helmholtz-Zentrum Berlin f\u00fcr Materialien und Energie GmbH (HZB))","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I3018134672","host_organization_name":"Helmholtz Munich","host_organization_lineage":["https://openalex.org/I3018134672"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Applied Surface Science 353 2015 , p. 1269 1276","raw_type":"info:eu-repo/semantics/article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":62,"referenced_works":["https://openalex.org/W190629144","https://openalex.org/W1570878024","https://openalex.org/W1965455680","https://openalex.org/W1968693960","https://openalex.org/W1970977987","https://openalex.org/W1972223082","https://openalex.org/W1972925055","https://openalex.org/W1976706964","https://openalex.org/W1979424228","https://openalex.org/W1985261292","https://openalex.org/W1987978423","https://openalex.org/W1989251175","https://openalex.org/W1989695457","https://openalex.org/W1991253997","https://openalex.org/W1997298258","https://openalex.org/W2003030267","https://openalex.org/W2005198145","https://openalex.org/W2007577497","https://openalex.org/W2007805375","https://openalex.org/W2012589102","https://openalex.org/W2012818399","https://openalex.org/W2016708164","https://openalex.org/W2018709236","https://openalex.org/W2027698825","https://openalex.org/W2038297369","https://openalex.org/W2039540131","https://openalex.org/W2040502021","https://openalex.org/W2042881898","https://openalex.org/W2042891692","https://openalex.org/W2048299534","https://openalex.org/W2053617098","https://openalex.org/W2054341531","https://openalex.org/W2062917358","https://openalex.org/W2065922811","https://openalex.org/W2066932487","https://openalex.org/W2067287230","https://openalex.org/W2069785595","https://openalex.org/W2069856219","https://openalex.org/W2075828677","https://openalex.org/W2081037320","https://openalex.org/W2082351369","https://openalex.org/W2084218702","https://openalex.org/W2085684201","https://openalex.org/W2085819089","https://openalex.org/W2092434562","https://openalex.org/W2092691631","https://openalex.org/W2123095429","https://openalex.org/W2128468290","https://openalex.org/W2134354044","https://openalex.org/W2151371903","https://openalex.org/W2152993477","https://openalex.org/W2162616151","https://openalex.org/W2166564590","https://openalex.org/W2273886880","https://openalex.org/W2310418687","https://openalex.org/W2482135133","https://openalex.org/W4211233062","https://openalex.org/W4235594453","https://openalex.org/W4240229167","https://openalex.org/W4255313735","https://openalex.org/W4285719527","https://openalex.org/W6652146275"],"related_works":["https://openalex.org/W2081037320","https://openalex.org/W2210034867","https://openalex.org/W2438906014","https://openalex.org/W2092078319","https://openalex.org/W2078759152","https://openalex.org/W2048299534","https://openalex.org/W3188438840","https://openalex.org/W2333489781","https://openalex.org/W2902962644","https://openalex.org/W2093335350"],"abstract_inverted_index":null,"counts_by_year":[{"year":2025,"cited_by_count":2},{"year":2024,"cited_by_count":1},{"year":2022,"cited_by_count":2},{"year":2020,"cited_by_count":4},{"year":2019,"cited_by_count":1},{"year":2018,"cited_by_count":3},{"year":2017,"cited_by_count":3},{"year":2016,"cited_by_count":3},{"year":2015,"cited_by_count":1}],"updated_date":"2026-11-04T10:54:05.112534","created_date":"2016-06-24T00:00:00"}