{"id":"https://openalex.org/W78995575","doi":null,"title":"\u30d7\u30ed\u30c8\u30f3\u30d3\u30fc\u30e0\u63cf\u753b\u306b\u3088\u308b\u6ce2\u95771.5\u03bcm\u5e2f\u7528\u30b7\u30f3\u30b0\u30eb\u30e2\u30fc\u30c9PMMA\u5c0e\u6ce2\u8def(\u5149\u30d1\u30c3\u30b7\u30d6\u30b3\u30f3\u30dd\u30cd\u30f3\u30c8(\u30d5\u30a3\u30eb\u30bf\u3001\u30b3\u30cd\u30af\u30bf\u3001MEMS),\u30b7\u30ea\u30b3\u30f3\u30d5\u30a9\u30c8\u30cb\u30af\u30b9,\u5149\u30d5\u30a1\u30a4\u30d0,\u4e00\u822c)","display_name":"\u30d7\u30ed\u30c8\u30f3\u30d3\u30fc\u30e0\u63cf\u753b\u306b\u3088\u308b\u6ce2\u95771.5\u03bcm\u5e2f\u7528\u30b7\u30f3\u30b0\u30eb\u30e2\u30fc\u30c9PMMA\u5c0e\u6ce2\u8def(\u5149\u30d1\u30c3\u30b7\u30d6\u30b3\u30f3\u30dd\u30cd\u30f3\u30c8(\u30d5\u30a3\u30eb\u30bf\u3001\u30b3\u30cd\u30af\u30bf\u3001MEMS),\u30b7\u30ea\u30b3\u30f3\u30d5\u30a9\u30c8\u30cb\u30af\u30b9,\u5149\u30d5\u30a1\u30a4\u30d0,\u4e00\u822c)","publication_year":2009,"publication_date":"2009-12-11","ids":{"openalex":"https://openalex.org/W78995575","mag":"78995575"},"language":"ja","primary_location":{"id":"mag:78995575","doi":null,"is_oa":false,"landing_page_url":"http://ci.nii.ac.jp/naid/110008002293","pdf_url":null,"source":{"id":"https://openalex.org/S2764758475","display_name":"Technical report of IEICE. OPE","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"journal"},"license":null,"license_id":null,"version":null,"is_accepted":false,"is_published":false,"raw_source_name":"\u96fb\u5b50\u60c5\u5831\u901a\u4fe1\u5b66\u4f1a\u6280\u8853\u7814\u7a76\u5831\u544a. OPE, \u5149\u30a8\u30ec\u30af\u30c8\u30ed\u30cb\u30af\u30b9","raw_type":null},"volume":null,"type":"article","is_traditional":true,"indexed_in":[],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5080613045","display_name":"\u5065\u592a \u4e09\u6d66","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"\u5065\u592a \u4e09\u6d66","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5079353341","display_name":"\u88d5\u8cb4 \u753a\u7530","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"\u88d5\u8cb4 \u753a\u7530","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5063746176","display_name":"\u653f\u4eba \u4e0a\u539f","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"\u653f\u4eba \u4e0a\u539f","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5089154354","display_name":"\u4fee \u82b1\u6cc9","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"\u4fee \u82b1\u6cc9","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5064049817","display_name":"\u4fdd\u884c \u77f3\u4e95","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"\u4fdd\u884c \u77f3\u4e95","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5039605922","display_name":"\u9686\u535a \u4f50\u85e4","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"\u9686\u535a \u4f50\u85e4","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5087533528","display_name":"\u52dd\u660c \u9ad8\u91ce","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"\u52dd\u660c \u9ad8\u91ce","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":null,"display_name":"\u731b \u5927\u4e45\u4fdd","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"\u731b \u5927\u4e45\u4fdd","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5019951628","display_name":"\u660e\u7fa9 \u5c71\u5d0e","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"\u660e\u7fa9 \u5c71\u5d0e","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5069174601","display_name":"\u611b\u77e5 \u4e95\u4e0a","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"\u611b\u77e5 \u4e95\u4e0a","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5062038747","display_name":"\u660c\u5fd7 \u6c5f\u590f","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"\u660c\u5fd7 \u6c5f\u590f","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5052860667","display_name":"\u5f70\u4eba \u6a2a\u5c71","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"\u5f70\u4eba \u6a2a\u5c71","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5132234247","display_name":"\u5bcc\u88d5(\u7fa4\u99ac\u5927\u5b66) \u795e\u8c37","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"\u5bcc\u88d5 \u795e\u8c37","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5004795878","display_name":"\u62d3\u6cbb \u5c0f\u5d8b","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"\u62d3\u6cbb \u5c0f\u5d8b","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"last","author":{"id":"https://openalex.org/A5086728859","display_name":"\u5b8f\u4e4b \u897f\u5ddd","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"\u5b8f\u4e4b \u897f\u5ddd","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]}],"institutions":[],"countries_distinct_count":0,"institutions_distinct_count":0,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.00922082,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"109","issue":"353","first_page":"25","last_page":"28"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10299","display_name":"Photonic and Optical Devices","score":0.7490000128746033,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10299","display_name":"Photonic and Optical Devices","score":0.7490000128746033,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10732","display_name":"Laser Material Processing Techniques","score":0.1145000010728836,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11050","display_name":"Photorefractive and Nonlinear Optics","score":0.026399999856948853,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/single-mode-waveguides","display_name":"single-mode waveguides","score":0.7689999938011169},{"id":"https://openalex.org/keywords/pmma","display_name":"PMMA","score":0.8420000076293945},{"id":"https://openalex.org/keywords/1550-nm","display_name":"1550 nm","score":0.8730000257492065},{"id":"https://openalex.org/keywords/proton-beam-lithography","display_name":"proton beam lithography","score":0.7829999923706055},{"id":"https://openalex.org/keywords/polymer-waveguides","display_name":"polymer waveguides","score":0.6000000238418579},{"id":"https://openalex.org/keywords/passive-optical-components","display_name":"passive optical components","score":0.7670000195503235}],"concepts":[{"id":"https://openalex.org/C37977207","wikidata":"https://www.wikidata.org/wiki/Q175561","display_name":"Microelectromechanical systems","level":2,"score":0.455768883228302},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.41557180881500244},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.2633897066116333},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.11284798383712769}],"mesh":[],"locations_count":1,"locations":[{"id":"mag:78995575","doi":null,"is_oa":false,"landing_page_url":"http://ci.nii.ac.jp/naid/110008002293","pdf_url":null,"source":{"id":"https://openalex.org/S2764758475","display_name":"Technical report of IEICE. OPE","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"journal"},"license":null,"license_id":null,"version":null,"is_accepted":false,"is_published":false,"raw_source_name":"\u96fb\u5b50\u60c5\u5831\u901a\u4fe1\u5b66\u4f1a\u6280\u8853\u7814\u7a76\u5831\u544a. OPE, \u5149\u30a8\u30ec\u30af\u30c8\u30ed\u30cb\u30af\u30b9","raw_type":null}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W346650866","https://openalex.org/W2599719534","https://openalex.org/W144175699","https://openalex.org/W589520032","https://openalex.org/W599754433","https://openalex.org/W183156547","https://openalex.org/W620383194","https://openalex.org/W3147723755","https://openalex.org/W1533013626","https://openalex.org/W140775607"],"abstract_inverted_index":null,"counts_by_year":[],"updated_date":"2026-10-31T12:09:11.096373","created_date":"2016-06-24T00:00:00"}