{"id":"https://openalex.org/W7225644474","doi":"https://doi.org/10.1021/acsami.6c17132","title":"Electrode-Templated Lateral Crystallization for Advanced Oxide Electronics","display_name":"Electrode-Templated Lateral Crystallization for Advanced Oxide Electronics","publication_year":2026,"publication_date":"2026-11-09","ids":{"openalex":"https://openalex.org/W7225644474","doi":"https://doi.org/10.1021/acsami.6c17132","pmid":"https://pubmed.ncbi.nlm.nih.gov/43002116"},"language":"en","primary_location":{"id":"doi:10.1021/acsami.6c17132","doi":"https://doi.org/10.1021/acsami.6c17132","is_oa":false,"landing_page_url":"https://doi.org/10.1021/acsami.6c17132","pdf_url":null,"source":{"id":"https://openalex.org/S164001016","display_name":"ACS Applied Materials & Interfaces","issn_l":"1944-8244","issn":["1944-8244","1944-8252"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-b","jufo-2","ki-jl-1","medline","norway-1","poland-200","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320006","host_organization_name":"American Chemical Society","host_organization_lineage":["https://openalex.org/P4310320006"],"host_organization_lineage_names":["American Chemical Society"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"ACS Applied Materials &amp; Interfaces","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref","pubmed"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5087509829","display_name":"Sang Won Chung","orcid":"https://orcid.org/0009-0008-5847-3560","observed_orcids":["https://orcid.org/0009-0008-5847-3560"]},"institutions":[{"id":"https://openalex.org/I4575257","display_name":"Hanyang University","ror":"https://ror.org/046865y68","country_code":"KR","type":"education","lineage":["https://openalex.org/I4575257"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Sang Won Chung","raw_affiliation_strings":["Hanyang University , , ,"],"raw_orcid":"https://orcid.org/0009-0008-5847-3560","affiliations":[{"raw_affiliation_string":"Hanyang University , , ,","institution_ids":["https://openalex.org/I4575257"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5063144532","display_name":"Kim Buyeon","orcid":"https://orcid.org/0009-0006-1956-3972","observed_orcids":["https://orcid.org/0009-0006-1956-3972"]},"institutions":[{"id":"https://openalex.org/I4575257","display_name":"Hanyang University","ror":"https://ror.org/046865y68","country_code":"KR","type":"education","lineage":["https://openalex.org/I4575257"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Buyeon Kim","raw_affiliation_strings":["Hanyang University , , ,"],"raw_orcid":"https://orcid.org/0009-0006-1956-3972","affiliations":[{"raw_affiliation_string":"Hanyang University , , ,","institution_ids":["https://openalex.org/I4575257"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5161345686","display_name":"Seongkyu Kang","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4575257","display_name":"Hanyang University","ror":"https://ror.org/046865y68","country_code":"KR","type":"education","lineage":["https://openalex.org/I4575257"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Seongkyu Kang","raw_affiliation_strings":["Hanyang University , , ,"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Hanyang University , , ,","institution_ids":["https://openalex.org/I4575257"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5159355642","display_name":"Joo Hee Jeong","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4575257","display_name":"Hanyang University","ror":"https://ror.org/046865y68","country_code":"KR","type":"education","lineage":["https://openalex.org/I4575257"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Joo Hee Jeong","raw_affiliation_strings":["Hanyang University , , ,"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Hanyang University , , ,","institution_ids":["https://openalex.org/I4575257"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5161310352","display_name":"Min Jae Kim","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4575257","display_name":"Hanyang University","ror":"https://ror.org/046865y68","country_code":"KR","type":"education","lineage":["https://openalex.org/I4575257"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Min Jae Kim","raw_affiliation_strings":["Hanyang University , , ,"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Hanyang University , , ,","institution_ids":["https://openalex.org/I4575257"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5036670213","display_name":"Gwang\u2010Bok Kim","orcid":"https://orcid.org/0009-0009-5432-5904","observed_orcids":["https://orcid.org/0009-0009-5432-5904"]},"institutions":[{"id":"https://openalex.org/I4575257","display_name":"Hanyang University","ror":"https://ror.org/046865y68","country_code":"KR","type":"education","lineage":["https://openalex.org/I4575257"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Gwang-Bok Kim","raw_affiliation_strings":["Hanyang University , , ,"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Hanyang University , , ,","institution_ids":["https://openalex.org/I4575257"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5103558724","display_name":"Jae Hyun Park","orcid":"https://orcid.org/0009-0005-8201-6800","observed_orcids":["https://orcid.org/0009-0005-8201-6800"]},"institutions":[{"id":"https://openalex.org/I4575257","display_name":"Hanyang University","ror":"https://ror.org/046865y68","country_code":"KR","type":"education","lineage":["https://openalex.org/I4575257"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Jae Hyun Park","raw_affiliation_strings":["Hanyang University , , ,"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Hanyang University , , ,","institution_ids":["https://openalex.org/I4575257"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5083135094","display_name":"Seung Kyu Ryoo","orcid":"https://orcid.org/0009-0002-4705-1545","observed_orcids":["https://orcid.org/0009-0002-4705-1545"]},"institutions":[{"id":"https://openalex.org/I2801935854","display_name":"SLAC National Accelerator Laboratory","ror":"https://ror.org/05gzmn429","country_code":"US","type":"facility","lineage":["https://openalex.org/I1330989302","https://openalex.org/I2801935854","https://openalex.org/I39565521","https://openalex.org/I97018004"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Seung Kyu Ryoo","raw_affiliation_strings":["SLAC National Accelerator Laboratory , , , ,"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"SLAC National Accelerator Laboratory , , , ,","institution_ids":["https://openalex.org/I2801935854"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5008117265","display_name":"Chanyoung Yoo","orcid":"https://orcid.org/0000-0002-6357-4103","observed_orcids":["https://orcid.org/0000-0002-6357-4103"]},"institutions":[{"id":"https://openalex.org/I94588446","display_name":"Hongik University","ror":"https://ror.org/00egdv862","country_code":"KR","type":"education","lineage":["https://openalex.org/I94588446"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Chanyoung Yoo","raw_affiliation_strings":["Hongik University , , ,"],"raw_orcid":"https://orcid.org/0000-0002-6357-4103","affiliations":[{"raw_affiliation_string":"Hongik University , , ,","institution_ids":["https://openalex.org/I94588446"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5056634110","display_name":"Taikyu Kim","orcid":"https://orcid.org/0000-0001-6676-1337","observed_orcids":["https://orcid.org/0000-0001-6676-1337"]},"institutions":[{"id":"https://openalex.org/I97018004","display_name":"Stanford University","ror":"https://ror.org/00f54p054","country_code":"US","type":"education","lineage":["https://openalex.org/I97018004"]}],"countries":["US"],"is_corresponding":true,"raw_author_name":"Taikyu Kim","raw_affiliation_strings":["Stanford University , , , ,"],"raw_orcid":"https://orcid.org/0000-0001-6676-1337","affiliations":[{"raw_affiliation_string":"Stanford University , , , ,","institution_ids":["https://openalex.org/I97018004"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5005183857","display_name":"Jae Kyeong Jeong","orcid":"https://orcid.org/0000-0003-3857-1039","observed_orcids":["https://orcid.org/0000-0003-3857-1039"]},"institutions":[{"id":"https://openalex.org/I4575257","display_name":"Hanyang University","ror":"https://ror.org/046865y68","country_code":"KR","type":"education","lineage":["https://openalex.org/I4575257"]}],"countries":["KR"],"is_corresponding":true,"raw_author_name":"Jae Kyeong Jeong","raw_affiliation_strings":["Hanyang University , , ,"],"raw_orcid":"https://orcid.org/0000-0003-3857-1039","affiliations":[{"raw_affiliation_string":"Hanyang University , , ,","institution_ids":["https://openalex.org/I4575257"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":4,"corresponding_author_ids":["https://openalex.org/A5005183857","https://openalex.org/A5056634110"],"corresponding_institution_ids":["https://openalex.org/I4575257","https://openalex.org/I97018004"],"apc_list":{"value":4500,"currency":"USD","value_usd":4500},"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.0,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":null,"issue":null,"first_page":null,"last_page":null},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10623","display_name":"Thin-Film Transistor Technologies","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10623","display_name":"Thin-Film Transistor Technologies","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12588","display_name":"Electronic and Structural Properties of Oxides","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10045","display_name":"Organic Electronics and Photovoltaics","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/indium-gallium-zinc-oxide","display_name":"indium gallium zinc oxide","score":0.7540000081062317},{"id":"https://openalex.org/keywords/oxide-thin-film-transistors","display_name":"oxide thin-film transistors","score":0.9210000038146973},{"id":"https://openalex.org/keywords/amorphous-oxide-semiconductors","display_name":"amorphous oxide semiconductors","score":0.8709999918937683},{"id":"https://openalex.org/keywords/lattice-matching","display_name":"lattice matching","score":0.9779999852180481},{"id":"https://openalex.org/keywords/indium-tin-oxide-electrode","display_name":"indium tin oxide electrode","score":0.9010000228881836},{"id":"https://openalex.org/keywords/low-temperature-crystallization","display_name":"low-temperature crystallization","score":0.7829999923706055},{"id":"https://openalex.org/keywords/bias-stress-stability","display_name":"bias stress stability","score":0.9430000185966492},{"id":"https://openalex.org/keywords/charge-carrier-mobility","display_name":"carrier mobility","score":0.777999997138977},{"id":"https://openalex.org/keywords/oxide-electronics","display_name":"oxide electronics","score":0.6430000066757202}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.9050999879837036},{"id":"https://openalex.org/C203036418","wikidata":"https://www.wikidata.org/wiki/Q284256","display_name":"Crystallization","level":2,"score":0.6909999847412109},{"id":"https://openalex.org/C2779851234","wikidata":"https://www.wikidata.org/wiki/Q50690","display_name":"Oxide","level":2,"score":0.6539999842643738},{"id":"https://openalex.org/C87359718","wikidata":"https://www.wikidata.org/wiki/Q1271916","display_name":"Thin-film transistor","level":3,"score":0.6182000041007996},{"id":"https://openalex.org/C56052488","wikidata":"https://www.wikidata.org/wiki/Q103382","display_name":"Amorphous solid","level":2,"score":0.5303999781608582},{"id":"https://openalex.org/C162743726","wikidata":"https://www.wikidata.org/wiki/Q7115642","display_name":"Oxide thin-film transistor","level":4,"score":0.5257999897003174},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.47780001163482666},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.4747999906539917},{"id":"https://openalex.org/C2780924660","wikidata":"https://www.wikidata.org/wiki/Q205123","display_name":"Tin oxide","level":3,"score":0.43970000743865967},{"id":"https://openalex.org/C17525397","wikidata":"https://www.wikidata.org/wiki/Q176140","display_name":"Electrode","level":2,"score":0.4318999946117401},{"id":"https://openalex.org/C137637335","wikidata":"https://www.wikidata.org/wiki/Q899604","display_name":"Crystallite","level":2,"score":0.42800000309944153},{"id":"https://openalex.org/C2776390347","wikidata":"https://www.wikidata.org/wiki/Q474163","display_name":"Amorphous silicon","level":4,"score":0.38109999895095825},{"id":"https://openalex.org/C32737372","wikidata":"https://www.wikidata.org/wiki/Q417718","display_name":"Indium tin oxide","level":3,"score":0.3723999857902527},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.3698999881744385},{"id":"https://openalex.org/C172385210","wikidata":"https://www.wikidata.org/wiki/Q5339","display_name":"Transistor","level":3,"score":0.33820000290870667},{"id":"https://openalex.org/C2780565262","wikidata":"https://www.wikidata.org/wiki/Q737038","display_name":"Polycrystalline silicon","level":4,"score":0.3190999925136566},{"id":"https://openalex.org/C108225325","wikidata":"https://www.wikidata.org/wiki/Q11456","display_name":"Semiconductor","level":2,"score":0.3172999918460846},{"id":"https://openalex.org/C543292547","wikidata":"https://www.wikidata.org/wiki/Q1094","display_name":"Indium","level":2,"score":0.3160000145435333},{"id":"https://openalex.org/C17470697","wikidata":"https://www.wikidata.org/wiki/Q2449552","display_name":"Transparent conducting film","level":3,"score":0.3147999942302704},{"id":"https://openalex.org/C2779105228","wikidata":"https://www.wikidata.org/wiki/Q2286029","display_name":"Silicon oxide","level":4,"score":0.31279999017715454},{"id":"https://openalex.org/C138331895","wikidata":"https://www.wikidata.org/wiki/Q11650","display_name":"Electronics","level":2,"score":0.3107999861240387},{"id":"https://openalex.org/C52780932","wikidata":"https://www.wikidata.org/wiki/Q994752","display_name":"Equivalent oxide thickness","level":5,"score":0.2547000050544739},{"id":"https://openalex.org/C84967400","wikidata":"https://www.wikidata.org/wiki/Q1066289","display_name":"Flexible electronics","level":2,"score":0.25209999084472656}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1021/acsami.6c17132","doi":"https://doi.org/10.1021/acsami.6c17132","is_oa":false,"landing_page_url":"https://doi.org/10.1021/acsami.6c17132","pdf_url":null,"source":{"id":"https://openalex.org/S164001016","display_name":"ACS Applied Materials & Interfaces","issn_l":"1944-8244","issn":["1944-8244","1944-8252"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-b","jufo-2","ki-jl-1","medline","norway-1","poland-200","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320006","host_organization_name":"American Chemical Society","host_organization_lineage":["https://openalex.org/P4310320006"],"host_organization_lineage_names":["American Chemical Society"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"ACS Applied Materials &amp; Interfaces","raw_type":"journal-article"},{"id":"pmid:43002116","doi":null,"is_oa":false,"landing_page_url":"https://pubmed.ncbi.nlm.nih.gov/43002116","pdf_url":null,"source":{"id":"https://openalex.org/S4306525036","display_name":"PubMed","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I1299303238","host_organization_name":"National Institutes of Health","host_organization_lineage":["https://openalex.org/I1299303238"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"ACS applied materials & interfaces","raw_type":"Journal Article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320322120","display_name":"National Research Foundation of Korea","ror":"https://ror.org/013aysd81"}],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":51,"referenced_works":["https://openalex.org/W1581456708","https://openalex.org/W1982968328","https://openalex.org/W1984543679","https://openalex.org/W1994277498","https://openalex.org/W1999589524","https://openalex.org/W2033345133","https://openalex.org/W2037978047","https://openalex.org/W2062808336","https://openalex.org/W2092426063","https://openalex.org/W2093104511","https://openalex.org/W2131716975","https://openalex.org/W2151051241","https://openalex.org/W2261035132","https://openalex.org/W2304627192","https://openalex.org/W2341466583","https://openalex.org/W2409492980","https://openalex.org/W2609632465","https://openalex.org/W2751309266","https://openalex.org/W2888778400","https://openalex.org/W2946369710","https://openalex.org/W2948915325","https://openalex.org/W2971794745","https://openalex.org/W3104030926","https://openalex.org/W3107232620","https://openalex.org/W3126527698","https://openalex.org/W3128679826","https://openalex.org/W3214737855","https://openalex.org/W4205563833","https://openalex.org/W4206723835","https://openalex.org/W4214940538","https://openalex.org/W4286489273","https://openalex.org/W4287835772","https://openalex.org/W4292938107","https://openalex.org/W4306790610","https://openalex.org/W4327593054","https://openalex.org/W4376456499","https://openalex.org/W4385664467","https://openalex.org/W4387930724","https://openalex.org/W4390031877","https://openalex.org/W4392132808","https://openalex.org/W4392863674","https://openalex.org/W4402458295","https://openalex.org/W4405190340","https://openalex.org/W4405610682","https://openalex.org/W4405851754","https://openalex.org/W4405918448","https://openalex.org/W4406669453","https://openalex.org/W4406762383","https://openalex.org/W4407692849","https://openalex.org/W4413001864","https://openalex.org/W7126230095"],"related_works":["https://openalex.org/W7077076550","https://openalex.org/W7062258923","https://openalex.org/W7117959099","https://openalex.org/W4245921882","https://openalex.org/W7224996781","https://openalex.org/W4303958917","https://openalex.org/W7140489135","https://openalex.org/W2324366996","https://openalex.org/W7130590395","https://openalex.org/W2331884259"],"abstract_inverted_index":{"Amorphous":[0],"InGaZnO":[1],"has":[2],"long":[3],"served":[4],"as":[5,137],"the":[6,13,80,119,125],"foundational":[7],"material":[8],"for":[9,16,141],"display":[10],"backplanes.":[11],"Nonetheless,":[12],"escalating":[14],"demand":[15],"ultra-high":[17],"resolution":[18],"and":[19,34,76,82,108,124],"reduced":[20],"power":[21],"consumption":[22],"necessitates":[23],"higher-performance":[24],"oxide":[25,42,56,83,122,143],"thin-film":[26],"transistors":[27],"(TFTs)":[28],"capable":[29],"of":[30,41,88,97],"replacing":[31],"polycrystalline":[32],"silicon":[33],"enabling":[35],"fully":[36],"oxide-based":[37],"TFT":[38],"architectures.":[39],"Crystallization":[40],"semiconductors":[43],"offers":[44],"a":[45,94,138],"promising":[46],"route":[47],"toward":[48],"higher":[49],"carrier":[50],"mobility,":[51],"yet":[52],"achieving":[53],"highly":[54,89],"ordered":[55],"channels":[57],"on":[58],"amorphous":[59],"substrates":[60],"remains":[61],"challenging.":[62],"Herein,":[63],"we":[64],"report":[65],"an":[66],"electrode-induced":[67],"lateral":[68],"crystallization":[69],"(EILC)":[70],"method":[71],"that":[72,115],"exploits":[73],"crystallographic":[74,116],"coherence":[75,117],"lattice":[77],"matching":[78],"between":[79,118],"electrode":[81,123],"channel":[84],"to":[85],"enable":[86],"formation":[87],"oriented,":[90],"large-grained":[91],"InGaO":[92],"at":[93],"modest":[95],"temperature":[96],"400":[98],"\u00b0C.":[99],"The":[100],"resultant":[101],"EILC":[102,136],"TFTs":[103],"exhibit":[104],"unprecedented":[105],"electrical":[106],"characteristics":[107],"exceptional":[109],"bias-stress":[110],"stability.":[111],"Structural":[112],"analyses":[113],"indicate":[114],"indium":[120],"tin":[121],"channel,":[126],"rather":[127],"than":[128],"interfacial":[129],"redox":[130],"reactions,":[131],"governs":[132],"this":[133],"process,":[134],"positioning":[135],"paradigm-shifting":[139],"strategy":[140],"next-generation":[142],"electronics.":[144]},"counts_by_year":[],"updated_date":"2026-11-11T12:16:26.678958","created_date":"2026-11-10T00:00:00"}
