{"id":"https://openalex.org/W7224156780","doi":"https://doi.org/10.4028/p-m5tnul","title":"Enhancing Nano-Structure Stability in Sublimation Drying: Practical Insights into Solidified Film Morphology","display_name":"Enhancing Nano-Structure Stability in Sublimation Drying: Practical Insights into Solidified Film Morphology","publication_year":2026,"publication_date":"2026-10-29","ids":{"openalex":"https://openalex.org/W7224156780","doi":"https://doi.org/10.4028/p-m5tnul"},"language":"en","primary_location":{"id":"doi:10.4028/p-m5tnul","doi":"https://doi.org/10.4028/p-m5tnul","is_oa":false,"landing_page_url":"https://doi.org/10.4028/p-m5tnul","pdf_url":null,"source":{"id":"https://openalex.org/S187696258","display_name":"Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena","issn_l":"1012-0394","issn":["1012-0394","1662-9779","1662-9787"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","jufo-1","norway-1"],"host_organization":"https://openalex.org/P4322614515","host_organization_name":"Scientific.net","host_organization_lineage":["https://openalex.org/P4322614515"],"host_organization_lineage_names":["Scientific.net"],"type":"book series"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Solid State Phenomena","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5160098083","display_name":"Y. Hanawa","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210095113","display_name":"SCREEN (Japan)","ror":"https://ror.org/00p4am161","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210095113"]}],"countries":["JP"],"is_corresponding":true,"raw_author_name":"Y. Hanawa","raw_affiliation_strings":["SCREEN Holdings Co., Ltd"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"SCREEN Holdings Co., Ltd","institution_ids":["https://openalex.org/I4210095113"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5160094486","display_name":"A. Horikoshi","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210095113","display_name":"SCREEN (Japan)","ror":"https://ror.org/00p4am161","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210095113"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"A. Horikoshi","raw_affiliation_strings":["SCREEN Holdings Co., Ltd"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"SCREEN Holdings Co., Ltd","institution_ids":["https://openalex.org/I4210095113"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5160147231","display_name":"A. Onuma","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210095113","display_name":"SCREEN (Japan)","ror":"https://ror.org/00p4am161","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210095113"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"A. Onuma","raw_affiliation_strings":["SCREEN Holdings Co., Ltd"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"SCREEN Holdings Co., Ltd","institution_ids":["https://openalex.org/I4210095113"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5160101896","display_name":"S. Tokisue","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210095113","display_name":"SCREEN (Japan)","ror":"https://ror.org/00p4am161","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210095113"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"S. Tokisue","raw_affiliation_strings":["SCREEN Holdings Co., Ltd"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"SCREEN Holdings Co., Ltd","institution_ids":["https://openalex.org/I4210095113"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5160091149","display_name":"J. Zhang","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210095113","display_name":"SCREEN (Japan)","ror":"https://ror.org/00p4am161","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210095113"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"J. Zhang","raw_affiliation_strings":["SCREEN Holdings Co., Ltd"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"SCREEN Holdings Co., Ltd","institution_ids":["https://openalex.org/I4210095113"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5160104534","display_name":"M. Xu","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"M. Xu","raw_affiliation_strings":["University of Toronoto"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"University of Toronoto","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5160087487","display_name":"M. Mohit","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I5023651","display_name":"McGill University","ror":"https://ror.org/01pxwe438","country_code":"CA","type":"education","lineage":["https://openalex.org/I5023651"]}],"countries":["CA"],"is_corresponding":false,"raw_author_name":"M. Mohit","raw_affiliation_strings":["McGill University"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"McGill University","institution_ids":["https://openalex.org/I5023651"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110506487","display_name":"Yoichi Sasaki","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210095113","display_name":"SCREEN (Japan)","ror":"https://ror.org/00p4am161","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210095113"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Y. Sasaki","raw_affiliation_strings":["SCREEN Holdings Co., Ltd"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"SCREEN Holdings Co., Ltd","institution_ids":["https://openalex.org/I4210095113"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5160083194","display_name":"K. Sawada","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210095113","display_name":"SCREEN (Japan)","ror":"https://ror.org/00p4am161","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210095113"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"K. Sawada","raw_affiliation_strings":["SCREEN Holdings Co., Ltd"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"SCREEN Holdings Co., Ltd","institution_ids":["https://openalex.org/I4210095113"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5160094423","display_name":"J. Yoshida","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210095113","display_name":"SCREEN (Japan)","ror":"https://ror.org/00p4am161","country_code":"JP","type":"company","lineage":["https://openalex.org/I4210095113"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"J. Yoshida","raw_affiliation_strings":["SCREEN Holdings Co., Ltd"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"SCREEN Holdings Co., Ltd","institution_ids":["https://openalex.org/I4210095113"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5160136890","display_name":"A.P. Sasmito","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I5023651","display_name":"McGill University","ror":"https://ror.org/01pxwe438","country_code":"CA","type":"education","lineage":["https://openalex.org/I5023651"]}],"countries":["CA"],"is_corresponding":false,"raw_author_name":"A.P. Sasmito","raw_affiliation_strings":["McGill University"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"McGill University","institution_ids":["https://openalex.org/I5023651"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5160124077","display_name":"A. Sakuma","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I27429435","display_name":"Kyoto Institute of Technology","ror":"https://ror.org/00965ax52","country_code":"JP","type":"education","lineage":["https://openalex.org/I27429435"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"A. Sakuma","raw_affiliation_strings":["Kyoto Institute of Tecnology"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Kyoto Institute of Tecnology","institution_ids":["https://openalex.org/I27429435"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":3,"corresponding_author_ids":["https://openalex.org/A5160098083"],"corresponding_institution_ids":["https://openalex.org/I4210095113"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.72654497,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"395","issue":null,"first_page":"141","last_page":"147"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.4984999895095825,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.4984999895095825,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","score":0.1386999934911728,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12141","display_name":"Fluid Dynamics and Thin Films","score":0.13619999587535858,"subfield":{"id":"https://openalex.org/subfields/2206","display_name":"Computational Mechanics"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/sublimation-drying","display_name":"sublimation drying","score":0.9950000047683716},{"id":"https://openalex.org/keywords/pattern-collapse","display_name":"pattern collapse","score":0.8989999890327454},{"id":"https://openalex.org/keywords/thermoelectric-cooler","display_name":"thermoelectric cooler","score":0.7310000061988831},{"id":"https://openalex.org/keywords/solidification-time","display_name":"solidification time","score":0.6610000133514404},{"id":"https://openalex.org/keywords/film-thickness","display_name":"film thickness","score":0.5370000004768372},{"id":"https://openalex.org/keywords/semiconductor-scaling","display_name":"semiconductor scaling","score":0.625}],"concepts":[{"id":"https://openalex.org/C58437636","wikidata":"https://www.wikidata.org/wiki/Q217249","display_name":"Sublimation (psychology)","level":2,"score":0.7943000197410583},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.757099986076355},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.5263000130653381},{"id":"https://openalex.org/C499950583","wikidata":"https://www.wikidata.org/wiki/Q183252","display_name":"Morphology (biology)","level":2,"score":0.4250999987125397},{"id":"https://openalex.org/C98045186","wikidata":"https://www.wikidata.org/wiki/Q205663","display_name":"Process (computing)","level":2,"score":0.3580999970436096},{"id":"https://openalex.org/C26771246","wikidata":"https://www.wikidata.org/wiki/Q321095","display_name":"Scanning electron microscope","level":2,"score":0.29319998621940613},{"id":"https://openalex.org/C108225325","wikidata":"https://www.wikidata.org/wiki/Q11456","display_name":"Semiconductor","level":2,"score":0.2922999858856201},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.29019999504089355},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.2847000062465668},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.28220000863075256},{"id":"https://openalex.org/C2778312390","wikidata":"https://www.wikidata.org/wiki/Q4139973","display_name":"Growth rate","level":2,"score":0.2632000148296356},{"id":"https://openalex.org/C2989315489","wikidata":"https://www.wikidata.org/wiki/Q2659774","display_name":"Semiconductor materials","level":3,"score":0.2614000141620636},{"id":"https://openalex.org/C199289684","wikidata":"https://www.wikidata.org/wiki/Q83353","display_name":"Mineralogy","level":1,"score":0.25690001249313354},{"id":"https://openalex.org/C77595967","wikidata":"https://www.wikidata.org/wiki/Q3151013","display_name":"Forensic engineering","level":1,"score":0.251800000667572}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.4028/p-m5tnul","doi":"https://doi.org/10.4028/p-m5tnul","is_oa":false,"landing_page_url":"https://doi.org/10.4028/p-m5tnul","pdf_url":null,"source":{"id":"https://openalex.org/S187696258","display_name":"Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena","issn_l":"1012-0394","issn":["1012-0394","1662-9779","1662-9787"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","jufo-1","norway-1"],"host_organization":"https://openalex.org/P4322614515","host_organization_name":"Scientific.net","host_organization_lineage":["https://openalex.org/P4322614515"],"host_organization_lineage_names":["Scientific.net"],"type":"book series"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Solid State Phenomena","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":13,"referenced_works":["https://openalex.org/W1989937355","https://openalex.org/W1998060610","https://openalex.org/W2091359058","https://openalex.org/W2122289961","https://openalex.org/W2268118299","https://openalex.org/W2327331485","https://openalex.org/W2889530357","https://openalex.org/W2912567134","https://openalex.org/W3127371149","https://openalex.org/W4376651084","https://openalex.org/W4391842794","https://openalex.org/W4399070986","https://openalex.org/W4402840435"],"related_works":["https://openalex.org/W3127371149","https://openalex.org/W7131114087","https://openalex.org/W4402840435","https://openalex.org/W2889051094","https://openalex.org/W2617946444","https://openalex.org/W4406763466","https://openalex.org/W4285399952","https://openalex.org/W7110673353","https://openalex.org/W4399070986","https://openalex.org/W7224667314"],"abstract_inverted_index":{"The":[0],"purpose":[1],"of":[2,100],"this":[3],"study":[4],"is":[5,110],"to":[6,26],"clarify":[7],"the":[8,11,20,31,39,53,62,68,86,96,104,138,154],"correlation":[9,113],"between":[10],"solidification":[12,54],"film":[13,65,88,130],"formation":[14,131],"behavior":[15],"and":[16,52,58,64,67,103,107,149],"pattern":[17,28,69,101],"collapse":[18,29,70,102,105,139],"during":[19,30],"sublimation":[21],"drying":[22,32,73,148,151],"process":[23,33,55,155],"in":[24],"order":[25],"suppress":[27],"associated":[34],"with":[35,114],"semiconductor":[36],"scaling.":[37],"In":[38],"experiment,":[40],"low-molecular-weight":[41],"organic":[42],"sublimating":[43],"agent":[44],"(LOSA)":[45],"was":[46,56,74,83,135],"dropped":[47],"onto":[48],"a":[49,80,111],"Peltier":[50],"device,":[51],"photographed":[57],"analyzed":[59],"while":[60],"changing":[61],"temperature":[63],"thickness,":[66],"rate":[71],"after":[72],"evaluated":[75],"by":[76,152],"SEM":[77],"observation.":[78],"As":[79],"result,":[81],"it":[82,134],"found":[84],"that":[85,108,127,137],"solidified":[87,129],"morphology":[89],"(cloudy":[90],"film,":[91,93],"transparent":[92],"etc.)":[94,126],"determines":[95],"presence":[97],"or":[98],"absence":[99],"mode,":[106],"there":[109],"high":[112],"video":[115],"features":[116],"(solidification":[117],"time,":[118],"interface":[119],"growth":[120],"rate,":[121],"brightness,":[122],"low":[123],"frequency":[124],"component,":[125],"indicate":[128],"behavior.":[132],"Furthermore,":[133],"suggested":[136],"inhibition":[140],"effect":[141],"could":[142],"be":[143],"achieved":[144],"over":[145],"existing":[146],"IPA":[147],"SMT":[150],"optimizing":[153],"conditions.":[156]},"counts_by_year":[],"updated_date":"2026-10-31T12:09:11.096373","created_date":"2026-10-30T00:00:00"}