{"id":"https://openalex.org/W7224081176","doi":"https://doi.org/10.1021/acs.langmuir.6c05114","title":"Controllable Residual Stress Modulation of Diamond through High-Pressure and High-Temperature Annealing","display_name":"Controllable Residual Stress Modulation of Diamond through High-Pressure and High-Temperature Annealing","publication_year":2026,"publication_date":"2026-10-28","ids":{"openalex":"https://openalex.org/W7224081176","doi":"https://doi.org/10.1021/acs.langmuir.6c05114"},"language":"en","primary_location":{"id":"doi:10.1021/acs.langmuir.6c05114","doi":"https://doi.org/10.1021/acs.langmuir.6c05114","is_oa":false,"landing_page_url":"https://doi.org/10.1021/acs.langmuir.6c05114","pdf_url":null,"source":{"id":"https://openalex.org/S75741262","display_name":"Langmuir","issn_l":"0743-7463","issn":["0743-7463","1520-5827"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-d","doyens","jufo-2","ki-jl-1","medline","norway-1","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320006","host_organization_name":"American Chemical Society","host_organization_lineage":["https://openalex.org/P4310320006"],"host_organization_lineage_names":["American Chemical Society"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Langmuir","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5095061369","display_name":"Jiaqi Xia","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"government","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210135349","display_name":"Shanghai Institute of Optics and Fine Mechanics","ror":"https://ror.org/03g897070","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210135349"]},{"id":"https://openalex.org/I4210165038","display_name":"University of Chinese Academy of Sciences","ror":"https://ror.org/05qbk4x57","country_code":"CN","type":"education","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210165038"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Jiaqi Xia","raw_affiliation_strings":["Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences , , ,","University of Chinese Academy of Sciences , , ,"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences , , ,","institution_ids":["https://openalex.org/I19820366","https://openalex.org/I4210135349"]},{"raw_affiliation_string":"University of Chinese Academy of Sciences , , ,","institution_ids":["https://openalex.org/I4210165038"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5101440661","display_name":"Shulong Zhang","orcid":"https://orcid.org/0000-0001-6793-3209","observed_orcids":["https://orcid.org/0000-0001-6793-3209"]},"institutions":[{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"government","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210135349","display_name":"Shanghai Institute of Optics and Fine Mechanics","ror":"https://ror.org/03g897070","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210135349"]}],"countries":["CN"],"is_corresponding":true,"raw_author_name":"Shulong Zhang","raw_affiliation_strings":["Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences , , ,"],"raw_orcid":"https://orcid.org/0000-0001-6793-3209","affiliations":[{"raw_affiliation_string":"Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences , , ,","institution_ids":["https://openalex.org/I19820366","https://openalex.org/I4210135349"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5160045030","display_name":"Zhonghao Ye","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Zhonghao Ye","raw_affiliation_strings":["Zhejiang Wuxianzuan Technology Development Co., Ltd , ,"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Zhejiang Wuxianzuan Technology Development Co., Ltd , ,","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5018252743","display_name":"Ying Zhu","orcid":"https://orcid.org/0000-0002-7946-7898","observed_orcids":["https://orcid.org/0000-0002-7946-7898","https://orcid.org/0000-0002-8689-0897"]},"institutions":[{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"government","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210135349","display_name":"Shanghai Institute of Optics and Fine Mechanics","ror":"https://ror.org/03g897070","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210135349"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Ying Zhu","raw_affiliation_strings":["Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences , , ,"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences , , ,","institution_ids":["https://openalex.org/I19820366","https://openalex.org/I4210135349"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5159926752","display_name":"Man Ye","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Man Ye","raw_affiliation_strings":["Zhejiang Wuxianzuan Technology Development Co., Ltd , ,"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Zhejiang Wuxianzuan Technology Development Co., Ltd , ,","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5160032276","display_name":"Shuang Ye","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Shuang Ye","raw_affiliation_strings":["Zhejiang Wuxianzuan Technology Development Co., Ltd , ,"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Zhejiang Wuxianzuan Technology Development Co., Ltd , ,","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5159991911","display_name":"Mingzhu He","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"government","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210135349","display_name":"Shanghai Institute of Optics and Fine Mechanics","ror":"https://ror.org/03g897070","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210135349"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Mingzhu He","raw_affiliation_strings":["Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences , , ,"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences , , ,","institution_ids":["https://openalex.org/I19820366","https://openalex.org/I4210135349"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5102779735","display_name":"Shuang Cai","orcid":"https://orcid.org/0000-0003-4050-1224","observed_orcids":["https://orcid.org/0000-0003-4050-1224"]},"institutions":[{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"government","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210135349","display_name":"Shanghai Institute of Optics and Fine Mechanics","ror":"https://ror.org/03g897070","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210135349"]}],"countries":["CN"],"is_corresponding":false,"raw_author_name":"Shuang Cai","raw_affiliation_strings":["Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences , , ,"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences , , ,","institution_ids":["https://openalex.org/I19820366","https://openalex.org/I4210135349"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5157844453","display_name":"Chengchun Zhao","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"government","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210135349","display_name":"Shanghai Institute of Optics and Fine Mechanics","ror":"https://ror.org/03g897070","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210135349"]},{"id":"https://openalex.org/I4210165038","display_name":"University of Chinese Academy of Sciences","ror":"https://ror.org/05qbk4x57","country_code":"CN","type":"education","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210165038"]}],"countries":["CN"],"is_corresponding":true,"raw_author_name":"Chengchun Zhao","raw_affiliation_strings":["Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences , , ,","University of Chinese Academy of Sciences , , ,"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences , , ,","institution_ids":["https://openalex.org/I19820366","https://openalex.org/I4210135349"]},{"raw_affiliation_string":"University of Chinese Academy of Sciences , , ,","institution_ids":["https://openalex.org/I4210165038"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5101133238","display_name":"Yin Hang","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I19820366","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35","country_code":"CN","type":"government","lineage":["https://openalex.org/I19820366"]},{"id":"https://openalex.org/I4210135349","display_name":"Shanghai Institute of Optics and Fine Mechanics","ror":"https://ror.org/03g897070","country_code":"CN","type":"facility","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210135349"]},{"id":"https://openalex.org/I4210165038","display_name":"University of Chinese Academy of Sciences","ror":"https://ror.org/05qbk4x57","country_code":"CN","type":"education","lineage":["https://openalex.org/I19820366","https://openalex.org/I4210165038"]}],"countries":["CN"],"is_corresponding":true,"raw_author_name":"Yin Hang","raw_affiliation_strings":["Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences , , ,","University of Chinese Academy of Sciences , , ,"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences , , ,","institution_ids":["https://openalex.org/I19820366","https://openalex.org/I4210135349"]},{"raw_affiliation_string":"University of Chinese Academy of Sciences , , ,","institution_ids":["https://openalex.org/I4210165038"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":3,"corresponding_author_ids":["https://openalex.org/A5101133238","https://openalex.org/A5101440661","https://openalex.org/A5157844453"],"corresponding_institution_ids":["https://openalex.org/I19820366","https://openalex.org/I4210135349","https://openalex.org/I4210165038"],"apc_list":{"value":4500,"currency":"USD","value_usd":4500},"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.65932305,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":null,"issue":null,"first_page":null,"last_page":null},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10478","display_name":"Diamond and Carbon-based Materials Research","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10478","display_name":"Diamond and Carbon-based Materials Research","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11301","display_name":"Advanced Surface Polishing Techniques","score":9.999999747378752e-05,"subfield":{"id":"https://openalex.org/subfields/2209","display_name":"Industrial and Manufacturing Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10413","display_name":"High-pressure geophysics and materials","score":9.999999747378752e-05,"subfield":{"id":"https://openalex.org/subfields/1908","display_name":"Geophysics"},"field":{"id":"https://openalex.org/fields/19","display_name":"Earth and Planetary Sciences"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/diamond","display_name":"diamond","score":0.8529999852180481},{"id":"https://openalex.org/keywords/residual-stress","display_name":"residual stress","score":0.9509999752044678},{"id":"https://openalex.org/keywords/dislocation-glide","display_name":"dislocation slip","score":0.8539999723434448},{"id":"https://openalex.org/keywords/uniaxial-stress","display_name":"uniaxial stress","score":0.8190000057220459},{"id":"https://openalex.org/keywords/stress-induced-birefringence","display_name":"stress-induced birefringence","score":0.9100000262260437},{"id":"https://openalex.org/keywords/schmid-factor","display_name":"Schmid factor","score":0.6420000195503235},{"id":"https://openalex.org/keywords/critical-resolved-shear-stress","display_name":"critical resolved shear stress","score":0.9800000190734863},{"id":"https://openalex.org/keywords/point-defects","display_name":"point defects","score":0.6949999928474426},{"id":"https://openalex.org/keywords/110-surface","display_name":"(110) surface","score":0.6389999985694885},{"id":"https://openalex.org/keywords/plastic-deformation","display_name":"plastic deformation","score":0.44699999690055847}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7925000190734863},{"id":"https://openalex.org/C2776921476","wikidata":"https://www.wikidata.org/wiki/Q5283","display_name":"Diamond","level":2,"score":0.7472000122070312},{"id":"https://openalex.org/C37292000","wikidata":"https://www.wikidata.org/wiki/Q1257918","display_name":"Residual stress","level":2,"score":0.6923999786376953},{"id":"https://openalex.org/C2777855556","wikidata":"https://www.wikidata.org/wiki/Q4339544","display_name":"Annealing (glass)","level":2,"score":0.6388000249862671},{"id":"https://openalex.org/C195268267","wikidata":"https://www.wikidata.org/wiki/Q1928883","display_name":"Slip (aerodynamics)","level":2,"score":0.5710999965667725},{"id":"https://openalex.org/C159122135","wikidata":"https://www.wikidata.org/wiki/Q737571","display_name":"Dislocation","level":2,"score":0.5184999704360962},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.476500004529953},{"id":"https://openalex.org/C66882249","wikidata":"https://www.wikidata.org/wiki/Q169336","display_name":"Homogeneous","level":2,"score":0.4235000014305115},{"id":"https://openalex.org/C21141959","wikidata":"https://www.wikidata.org/wiki/Q657936","display_name":"Shear stress","level":2,"score":0.40779998898506165},{"id":"https://openalex.org/C21036866","wikidata":"https://www.wikidata.org/wiki/Q181767","display_name":"Stress (linguistics)","level":2,"score":0.3889000117778778},{"id":"https://openalex.org/C125743686","wikidata":"https://www.wikidata.org/wiki/Q108779","display_name":"Birefringence","level":2,"score":0.3790999948978424},{"id":"https://openalex.org/C77017923","wikidata":"https://www.wikidata.org/wiki/Q912313","display_name":"Optical microscope","level":3,"score":0.3765000104904175},{"id":"https://openalex.org/C202974441","wikidata":"https://www.wikidata.org/wiki/Q2576844","display_name":"Stress relaxation","level":3,"score":0.35190001130104065},{"id":"https://openalex.org/C2776074547","wikidata":"https://www.wikidata.org/wiki/Q5270982","display_name":"Diamond turning","level":3,"score":0.34290000796318054},{"id":"https://openalex.org/C30445746","wikidata":"https://www.wikidata.org/wiki/Q1558328","display_name":"Critical resolved shear stress","level":4,"score":0.3294999897480011},{"id":"https://openalex.org/C79186407","wikidata":"https://www.wikidata.org/wiki/Q472074","display_name":"Plasticity","level":2,"score":0.322299987077713},{"id":"https://openalex.org/C205539056","wikidata":"https://www.wikidata.org/wiki/Q5251699","display_name":"Deformation mechanism","level":3,"score":0.3156000077724457},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.30889999866485596},{"id":"https://openalex.org/C164675345","wikidata":"https://www.wikidata.org/wiki/Q898226","display_name":"Crystallographic defect","level":2,"score":0.3068000078201294},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.29019999504089355},{"id":"https://openalex.org/C123079801","wikidata":"https://www.wikidata.org/wiki/Q750240","display_name":"Modulation (music)","level":2,"score":0.29019999504089355},{"id":"https://openalex.org/C107816215","wikidata":"https://www.wikidata.org/wiki/Q647887","display_name":"Terahertz radiation","level":2,"score":0.2858000099658966},{"id":"https://openalex.org/C204366326","wikidata":"https://www.wikidata.org/wiki/Q3027650","display_name":"Deformation (meteorology)","level":2,"score":0.2824999988079071},{"id":"https://openalex.org/C40003534","wikidata":"https://www.wikidata.org/wiki/Q862228","display_name":"Raman spectroscopy","level":2,"score":0.27140000462532043},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.26080000400543213},{"id":"https://openalex.org/C153015087","wikidata":"https://www.wikidata.org/wiki/Q905169","display_name":"Diamond cubic","level":3,"score":0.25380000472068787},{"id":"https://openalex.org/C138113353","wikidata":"https://www.wikidata.org/wiki/Q611639","display_name":"Polishing","level":2,"score":0.25099998712539673}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1021/acs.langmuir.6c05114","doi":"https://doi.org/10.1021/acs.langmuir.6c05114","is_oa":false,"landing_page_url":"https://doi.org/10.1021/acs.langmuir.6c05114","pdf_url":null,"source":{"id":"https://openalex.org/S75741262","display_name":"Langmuir","issn_l":"0743-7463","issn":["0743-7463","1520-5827"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-d","doyens","jufo-2","ki-jl-1","medline","norway-1","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320006","host_organization_name":"American Chemical Society","host_organization_lineage":["https://openalex.org/P4310320006"],"host_organization_lineage_names":["American Chemical Society"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Langmuir","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320321001","display_name":"National Natural Science Foundation of China","ror":"https://ror.org/01h0zpd94"},{"id":"https://openalex.org/F4320321133","display_name":"Chinese Academy of Sciences","ror":"https://ror.org/034t30j35"}],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":53,"referenced_works":["https://openalex.org/W884032577","https://openalex.org/W1144704660","https://openalex.org/W1535211234","https://openalex.org/W1971540314","https://openalex.org/W1981965941","https://openalex.org/W1987044561","https://openalex.org/W1993596398","https://openalex.org/W1993666221","https://openalex.org/W2023451388","https://openalex.org/W2029240487","https://openalex.org/W2035482115","https://openalex.org/W2047551288","https://openalex.org/W2048357981","https://openalex.org/W2050477330","https://openalex.org/W2052964118","https://openalex.org/W2053407055","https://openalex.org/W2055851356","https://openalex.org/W2060794080","https://openalex.org/W2075549560","https://openalex.org/W2080734737","https://openalex.org/W2127133123","https://openalex.org/W2222158649","https://openalex.org/W2265446216","https://openalex.org/W2296093653","https://openalex.org/W2331750360","https://openalex.org/W2735993260","https://openalex.org/W2794668067","https://openalex.org/W2883499417","https://openalex.org/W2894125989","https://openalex.org/W2944161727","https://openalex.org/W3010983480","https://openalex.org/W3011357762","https://openalex.org/W3094372829","https://openalex.org/W3101501135","https://openalex.org/W3194820677","https://openalex.org/W3207552894","https://openalex.org/W4296126467","https://openalex.org/W4318981203","https://openalex.org/W4321350266","https://openalex.org/W4379883351","https://openalex.org/W4383216426","https://openalex.org/W4389429922","https://openalex.org/W4395071219","https://openalex.org/W4401399715","https://openalex.org/W4404657194","https://openalex.org/W4406071185","https://openalex.org/W4407135813","https://openalex.org/W4409371736","https://openalex.org/W7077155911","https://openalex.org/W7124166012","https://openalex.org/W7143918973","https://openalex.org/W7153063399","https://openalex.org/W7163198420"],"related_works":["https://openalex.org/W4401399715","https://openalex.org/W7204222845","https://openalex.org/W2357626745","https://openalex.org/W2358267114","https://openalex.org/W2106330234","https://openalex.org/W2020606367","https://openalex.org/W4376274407","https://openalex.org/W2028521177","https://openalex.org/W4309875119","https://openalex.org/W2071643953"],"abstract_inverted_index":{"Abstract":[0],"Diamond":[1],"features":[2],"superior":[3],"optical,":[4],"thermal,":[5],"and":[6,64,102,113,165],"mechanical":[7,49],"properties,":[8],"yet":[9],"dislocation-induced":[10],"uneven":[11],"residual":[12,111,160,184],"stress":[13,22,32,39,47,70,86,100,128,139,161,185,196],"severely":[14],"impairs":[15],"optoelectronic":[16],"device":[17],"performance.":[18],"Meanwhile,":[19],"controllable":[20],"uniaxial":[21,57],"is":[23],"required":[24],"for":[25,35,151,179,195],"applications":[26],"like":[27],"terahertz":[28],"generators,":[29],"making":[30],"precise":[31],"regulation":[33],"vital":[34],"diamond":[36,69,88,200],"application.":[37],"Current":[38],"modulation":[40],"techniques":[41],"mainly":[42],"generate":[43],"limited":[44],"inhomogeneous":[45],"compressive":[46],"via":[48],"loading,":[50],"lacking":[51],"feasible":[52],"approaches":[53],"to":[54,83],"introduce":[55],"homogeneous":[56,183],"stress.":[58],"Previous":[59],"studies":[60],"found":[61],"that":[62,134],"high-pressure":[63],"high-temperature":[65],"(HPHT)":[66],"annealing":[67,136,172],"reshapes":[68],"distribution,":[71],"but":[72],"the":[73,85,123],"dislocation":[74,117,152],"slip":[75,118,149],"mechanism":[76],"lacks":[77],"systematic":[78],"investigation.":[79],"This":[80,189],"study":[81],"aims":[82],"regulate":[84],"of":[87,108,142,198],"through":[89],"HPHT":[90],"annealing.":[91],"By":[92],"combining":[93],"indirect":[94],"optical":[95,109],"properties\u2019":[96],"characterization,":[97],"such":[98],"as":[99],"birefringence":[101],"Raman":[103],"spectroscopy,":[104],"systematically":[105],"analyzed":[106],"evolutions":[107],"homogeneity,":[110],"stress,":[112,170],"point":[114],"defects,":[115],"with":[116],"activation":[119],"further":[120],"interpreted":[121],"by":[122,145],"Schmid":[124],"critical":[125],"resolved":[126],"shear":[127],"(CRSS)":[129],"criterion.":[130],"The":[131],"results":[132],"demonstrate":[133],"increasing":[135],"temperature":[137],"optimizes":[138],"distribution":[140],"uniformity":[141],"(110)":[143,163],"planes":[144],"activating":[146],"dominant":[147],"{111}\u27e8110\u27e9":[148],"systems":[150],"glide.":[153],"Dislocation-driven":[154],"plastic":[155],"deformation":[156],"homogenizes":[157],"native,":[158],"irregular":[159],"on":[162],"surfaces":[164],"introduces":[166],"extra":[167],"uniform":[168],"internal":[169],"while":[171],"at":[173],"2000":[174],"\u00b0C":[175],"under":[176],"5":[177],"GPa":[178],"120":[180],"min":[181],"produces":[182],"over":[186],"1.2":[187],"GPa.":[188],"work":[190],"offers":[191],"a":[192],"practical":[193],"pathway":[194],"engineering":[197],"high-performance":[199],"optics.":[201]},"counts_by_year":[],"updated_date":"2026-10-30T12:39:25.321706","created_date":"2026-10-29T00:00:00"}