{"id":"https://openalex.org/W7213469264","doi":"https://doi.org/10.2139/ssrn.7478149","title":"Influence of annealing on the surface structure of a magnetron sputter-deposited quinary compositionally complex alloy on the microscale","display_name":"Influence of annealing on the surface structure of a magnetron sputter-deposited quinary compositionally complex alloy on the microscale","publication_year":2026,"publication_date":"2026-01-01","ids":{"openalex":"https://openalex.org/W7213469264","doi":"https://doi.org/10.2139/ssrn.7478149"},"language":"en","primary_location":{"id":"doi:10.2139/ssrn.7478149","doi":"https://doi.org/10.2139/ssrn.7478149","is_oa":true,"landing_page_url":"https://doi.org/10.2139/ssrn.7478149","pdf_url":null,"source":{"id":"https://openalex.org/S4210172589","display_name":"SSRN Electronic Journal","issn_l":"1556-5068","issn":["1556-5068"],"is_oa":true,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I1318003438","host_organization_name":"RELX Group (Netherlands)","host_organization_lineage":["https://openalex.org/I1318003438"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"acceptedVersion","is_accepted":true,"is_published":false,"raw_source_name":null,"raw_type":"posted-content"},"volume":null,"type":"preprint","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":true,"oa_status":"green","oa_url":"https://doi.org/10.2139/ssrn.7478149","any_repository_has_fulltext":true},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5151979787","display_name":"Christian Rudnik","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Christian Rudnik","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5088223938","display_name":"Yong-He Pan","orcid":"https://orcid.org/0000-0003-3000-7783","observed_orcids":["https://orcid.org/0000-0003-3000-7783"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Yong-He Pan","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5113534778","display_name":"Niklas Osterloh","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Niklas Osterloh","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5151928108","display_name":"Alexander  S. Birkner","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Alexander  S. Birkner","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]},{"author_position":"middle","author":{"id":"https://openalex.org/A5063123925","display_name":"Alan Savan","orcid":"https://orcid.org/0000-0003-0559-3290","observed_orcids":["https://orcid.org/0000-0003-0559-3290"]},"institutions":[{"id":"https://openalex.org/I904495901","display_name":"Ruhr University Bochum","ror":"https://ror.org/04tsk2644","country_code":"DE","type":"education","lineage":["https://openalex.org/I904495901"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"A. Savan","raw_affiliation_strings":["Ruhr University of Bochum - Institute of Materials"],"raw_orcid":"https://orcid.org/0000-0003-0559-3290","affiliations":[{"raw_affiliation_string":"Ruhr University of Bochum - Institute of Materials","institution_ids":["https://openalex.org/I904495901"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5048192399","display_name":"Alfred Ludwig","orcid":"https://orcid.org/0000-0003-2802-6774","observed_orcids":["https://orcid.org/0000-0003-2802-6774"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"A. Ludwig","raw_affiliation_strings":[],"raw_orcid":"https://orcid.org/0000-0003-2802-6774","affiliations":[]},{"author_position":"last","author":{"id":"https://openalex.org/A5088456882","display_name":"Karina Morgenstern","orcid":"https://orcid.org/0000-0002-6660-5286","observed_orcids":["https://orcid.org/0000-0002-6660-5286"]},"institutions":[],"countries":[],"is_corresponding":true,"raw_author_name":"Karina Morgenstern","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":["https://openalex.org/A5088456882"],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":null,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":null,"cited_by_percentile_year":null,"biblio":{"volume":null,"issue":null,"first_page":null,"last_page":null},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T12141","display_name":"Fluid Dynamics and Thin Films","score":0.5473999977111816,"subfield":{"id":"https://openalex.org/subfields/2206","display_name":"Computational Mechanics"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T12141","display_name":"Fluid Dynamics and Thin Films","score":0.5473999977111816,"subfield":{"id":"https://openalex.org/subfields/2206","display_name":"Computational Mechanics"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10377","display_name":"Metal and Thin Film Mechanics","score":0.09309999644756317,"subfield":{"id":"https://openalex.org/subfields/2211","display_name":"Mechanics of Materials"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13531","display_name":"Surface and Thin Film Phenomena","score":0.053199999034404755,"subfield":{"id":"https://openalex.org/subfields/3104","display_name":"Condensed Matter Physics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/annealing","display_name":"annealing","score":0.9449999928474426},{"id":"https://openalex.org/keywords/surface-microstructure","display_name":"surface microstructure","score":0.7480000257492065},{"id":"https://openalex.org/keywords/quinary-alloys","display_name":"quinary alloys","score":0.7229999899864197},{"id":"https://openalex.org/keywords/alloy-thin-films","display_name":"thin film alloys","score":0.6769999861717224},{"id":"https://openalex.org/keywords/noble-metals","display_name":"noble metals","score":0.7250000238418579},{"id":"https://openalex.org/keywords/palladium","display_name":"palladium","score":0.6890000104904175},{"id":"https://openalex.org/keywords/platinum","display_name":"platinum","score":0.9819999933242798},{"id":"https://openalex.org/keywords/silver","display_name":"silver","score":0.9229999780654907},{"id":"https://openalex.org/keywords/gold","display_name":"gold","score":0.9990000128746033},{"id":"https://openalex.org/keywords/copper","display_name":"copper","score":0.9990000128746033},{"id":"https://openalex.org/keywords/dewetting","display_name":"dewetting","score":0.8299999833106995},{"id":"https://openalex.org/keywords/grain-size","display_name":"grain size","score":0.859000027179718},{"id":"https://openalex.org/keywords/surface-roughness","display_name":"surface roughness","score":0.9440000057220459},{"id":"https://openalex.org/keywords/film-thickness","display_name":"film thickness","score":0.8050000071525574},{"id":"https://openalex.org/keywords/film-quality","display_name":"film quality","score":0.5099999904632568}],"concepts":[{"id":"https://openalex.org/C2781139463","wikidata":"https://www.wikidata.org/wiki/Q263994","display_name":"Quinary","level":3,"score":0.9197999835014343},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.839900016784668},{"id":"https://openalex.org/C2777855556","wikidata":"https://www.wikidata.org/wiki/Q4339544","display_name":"Annealing (glass)","level":2,"score":0.7605000138282776},{"id":"https://openalex.org/C87976508","wikidata":"https://www.wikidata.org/wiki/Q1498213","display_name":"Microstructure","level":2,"score":0.6807000041007996},{"id":"https://openalex.org/C2780026712","wikidata":"https://www.wikidata.org/wiki/Q37756","display_name":"Alloy","level":2,"score":0.5710999965667725},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.5116999745368958},{"id":"https://openalex.org/C179428855","wikidata":"https://www.wikidata.org/wiki/Q1069216","display_name":"Microscale chemistry","level":2,"score":0.5073000192642212},{"id":"https://openalex.org/C107365816","wikidata":"https://www.wikidata.org/wiki/Q114817","display_name":"Surface roughness","level":2,"score":0.5037000179290771},{"id":"https://openalex.org/C192191005","wikidata":"https://www.wikidata.org/wiki/Q466491","display_name":"Grain size","level":2,"score":0.49129998683929443},{"id":"https://openalex.org/C87525152","wikidata":"https://www.wikidata.org/wiki/Q5268149","display_name":"Dewetting","level":3,"score":0.48730000853538513},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.4702000021934509},{"id":"https://openalex.org/C26771246","wikidata":"https://www.wikidata.org/wiki/Q321095","display_name":"Scanning electron microscope","level":2,"score":0.4462999999523163},{"id":"https://openalex.org/C71039073","wikidata":"https://www.wikidata.org/wiki/Q3439090","display_name":"Surface finish","level":2,"score":0.4065000116825104},{"id":"https://openalex.org/C61427134","wikidata":"https://www.wikidata.org/wiki/Q847609","display_name":"Sputter deposition","level":4,"score":0.37040001153945923},{"id":"https://openalex.org/C2781038479","wikidata":"https://www.wikidata.org/wiki/Q114675","display_name":"Mica","level":2,"score":0.3614000082015991},{"id":"https://openalex.org/C47908070","wikidata":"https://www.wikidata.org/wiki/Q900515","display_name":"Grain boundary","level":3,"score":0.3546999990940094},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.34220001101493835},{"id":"https://openalex.org/C147438087","wikidata":"https://www.wikidata.org/wiki/Q386334","display_name":"Energy-dispersive X-ray spectroscopy","level":3,"score":0.3370000123977661},{"id":"https://openalex.org/C138113353","wikidata":"https://www.wikidata.org/wiki/Q611639","display_name":"Polishing","level":2,"score":0.32670000195503235},{"id":"https://openalex.org/C195839","wikidata":"https://www.wikidata.org/wiki/Q901959","display_name":"Surface energy","level":2,"score":0.3237000107765198},{"id":"https://openalex.org/C123408415","wikidata":"https://www.wikidata.org/wiki/Q194154","display_name":"Cavity magnetron","level":4,"score":0.3066999912261963},{"id":"https://openalex.org/C171635847","wikidata":"https://www.wikidata.org/wiki/Q406983","display_name":"Micrometer","level":2,"score":0.2770000100135803},{"id":"https://openalex.org/C32891209","wikidata":"https://www.wikidata.org/wiki/Q483666","display_name":"Spectroscopy","level":2,"score":0.2624000012874603}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.2139/ssrn.7478149","doi":"https://doi.org/10.2139/ssrn.7478149","is_oa":true,"landing_page_url":"https://doi.org/10.2139/ssrn.7478149","pdf_url":null,"source":{"id":"https://openalex.org/S4210172589","display_name":"SSRN Electronic Journal","issn_l":"1556-5068","issn":["1556-5068"],"is_oa":true,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I1318003438","host_organization_name":"RELX Group (Netherlands)","host_organization_lineage":["https://openalex.org/I1318003438"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"acceptedVersion","is_accepted":true,"is_published":false,"raw_source_name":null,"raw_type":"posted-content"}],"best_oa_location":{"id":"doi:10.2139/ssrn.7478149","doi":"https://doi.org/10.2139/ssrn.7478149","is_oa":true,"landing_page_url":"https://doi.org/10.2139/ssrn.7478149","pdf_url":null,"source":{"id":"https://openalex.org/S4210172589","display_name":"SSRN Electronic Journal","issn_l":"1556-5068","issn":["1556-5068"],"is_oa":true,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I1318003438","host_organization_name":"RELX Group (Netherlands)","host_organization_lineage":["https://openalex.org/I1318003438"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"acceptedVersion","is_accepted":true,"is_published":false,"raw_source_name":null,"raw_type":"posted-content"},"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":33,"referenced_works":["https://openalex.org/W1007717187","https://openalex.org/W2003975937","https://openalex.org/W2004374644","https://openalex.org/W2014584003","https://openalex.org/W2021595982","https://openalex.org/W2047205370","https://openalex.org/W2051890785","https://openalex.org/W2052148099","https://openalex.org/W2058085399","https://openalex.org/W2061832930","https://openalex.org/W2086601797","https://openalex.org/W2139378461","https://openalex.org/W2229927562","https://openalex.org/W2262215104","https://openalex.org/W2744522279","https://openalex.org/W2781898123","https://openalex.org/W2795185600","https://openalex.org/W2804903599","https://openalex.org/W2883326306","https://openalex.org/W2909236073","https://openalex.org/W2914573344","https://openalex.org/W2999482379","https://openalex.org/W3008031353","https://openalex.org/W3020822014","https://openalex.org/W3035965352","https://openalex.org/W3038354327","https://openalex.org/W3087021020","https://openalex.org/W3087505564","https://openalex.org/W3169856942","https://openalex.org/W3188673588","https://openalex.org/W3196126979","https://openalex.org/W4205125871","https://openalex.org/W7160768850"],"related_works":["https://openalex.org/W2154742420","https://openalex.org/W2887970407","https://openalex.org/W2086742484","https://openalex.org/W2247961389","https://openalex.org/W2402531770","https://openalex.org/W4412978740","https://openalex.org/W3161088753","https://openalex.org/W2613860761","https://openalex.org/W4386309684","https://openalex.org/W2583360978"],"abstract_inverted_index":null,"counts_by_year":[],"updated_date":"2026-10-28T10:33:24.094632","created_date":"2026-09-17T00:00:00"}