{"id":"https://openalex.org/W7212313237","doi":"https://doi.org/10.48550/arxiv.2609.10741","title":"Quantitative Fabrication-Error Reduction in Optomechanical Crystal using Proximity Error Correction","display_name":"Quantitative Fabrication-Error Reduction in Optomechanical Crystal using Proximity Error Correction","publication_year":2026,"publication_date":"2026-09-09","ids":{"openalex":"https://openalex.org/W7212313237","doi":"https://doi.org/10.48550/arxiv.2609.10741"},"language":"en","primary_location":{"id":"pmh:oai:arXiv.org:2609.10741","doi":null,"is_oa":true,"landing_page_url":"https://arxiv.org/abs/2609.10741","pdf_url":"https://arxiv.org/pdf/2609.10741","source":{"id":"https://openalex.org/S4306400194","display_name":"arXiv (Cornell University)","issn_l":"2331-8422","issn":["2331-8422"],"is_oa":true,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I205783295","host_organization_name":"Cornell University","host_organization_lineage":["https://openalex.org/I205783295"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":null,"raw_type":"text"},"volume":null,"type":"preprint","is_traditional":true,"indexed_in":["arxiv","datacite"],"open_access":{"is_oa":true,"oa_status":"green","oa_url":"https://arxiv.org/pdf/2609.10741","any_repository_has_fulltext":true},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5020408479","display_name":"Pratip Ghosh","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I59270414","display_name":"Indian Institute of Science Bangalore","ror":"https://ror.org/04dese585","country_code":"IN","type":"education","lineage":["https://openalex.org/I59270414"]}],"countries":["IN"],"is_corresponding":false,"raw_author_name":"Ghosh, Pratip","raw_affiliation_strings":["Centre for Nano Science and Engineering , Indian Institute of Science , Bangalore- 560012 , India"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Centre for Nano Science and Engineering , Indian Institute of Science , Bangalore- 560012 , India","institution_ids":["https://openalex.org/I59270414"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5049501880","display_name":"Anohita Mallick","orcid":"https://orcid.org/0000-0002-4282-605X","observed_orcids":["https://orcid.org/0000-0002-4282-605X"]},"institutions":[{"id":"https://openalex.org/I11947397","display_name":"Tata Institute of Fundamental Research","ror":"https://ror.org/03ht1xw27","country_code":"IN","type":"education","lineage":["https://openalex.org/I11947397","https://openalex.org/I2799351866","https://openalex.org/I3149292468"]}],"countries":["IN"],"is_corresponding":false,"raw_author_name":"Mallick, Anohita","raw_affiliation_strings":["Department of Astronomy and Astrophysics , Tata Institute of Fundamental Research , Mumbai- 400005 , India"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Astronomy and Astrophysics , Tata Institute of Fundamental Research , Mumbai- 400005 , India","institution_ids":["https://openalex.org/I11947397"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5134441284","display_name":"Akshay K. Naik","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I59270414","display_name":"Indian Institute of Science Bangalore","ror":"https://ror.org/04dese585","country_code":"IN","type":"education","lineage":["https://openalex.org/I59270414"]}],"countries":["IN"],"is_corresponding":false,"raw_author_name":"Naik, Akshay K.","raw_affiliation_strings":["Centre for Nano Science and Engineering , Indian Institute of Science , Bangalore- 560012 , India"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Centre for Nano Science and Engineering , Indian Institute of Science , Bangalore- 560012 , India","institution_ids":["https://openalex.org/I59270414"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":null,"has_fulltext":true,"cited_by_count":0,"citation_normalized_percentile":null,"cited_by_percentile_year":null,"biblio":{"volume":null,"issue":null,"first_page":null,"last_page":null},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9980000257492065,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9980000257492065,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10666","display_name":"Photonic Crystals and Applications","score":0.0006000000284984708,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","score":0.0003000000142492354,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/optomechanical-crystals","display_name":"optomechanical crystals","score":0.9459999799728394},{"id":"https://openalex.org/keywords/photonic-crystal-cavities","display_name":"photonic crystal cavities","score":0.7609999775886536},{"id":"https://openalex.org/keywords/proximity-effect-correction","display_name":"proximity effect correction","score":0.9470000267028809},{"id":"https://openalex.org/keywords/electron-beam-lithography","display_name":"electron beam lithography","score":0.9729999899864197},{"id":"https://openalex.org/keywords/dose-adjustment","display_name":"dose adjustment","score":0.8080000281333923},{"id":"https://openalex.org/keywords/electron-scattering","display_name":"electron scattering","score":0.656000018119812},{"id":"https://openalex.org/keywords/edge-roughness","display_name":"edge roughness","score":0.8579999804496765},{"id":"https://openalex.org/keywords/quality-factor","display_name":"quality factor","score":0.7289999723434448},{"id":"https://openalex.org/keywords/dimensional-deviation","display_name":"dimensional deviation","score":0.32199999690055847}],"concepts":[{"id":"https://openalex.org/C200274948","wikidata":"https://www.wikidata.org/wiki/Q256845","display_name":"Electron-beam lithography","level":4,"score":0.7150999903678894},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.6940000057220459},{"id":"https://openalex.org/C19499675","wikidata":"https://www.wikidata.org/wiki/Q232207","display_name":"Monte Carlo method","level":2,"score":0.6636999845504761},{"id":"https://openalex.org/C75302062","wikidata":"https://www.wikidata.org/wiki/Q900150","display_name":"Photonic crystal","level":2,"score":0.5831999778747559},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5601999759674072},{"id":"https://openalex.org/C191486275","wikidata":"https://www.wikidata.org/wiki/Q210028","display_name":"Scattering","level":2,"score":0.5221999883651733},{"id":"https://openalex.org/C78371743","wikidata":"https://www.wikidata.org/wiki/Q1672829","display_name":"Optical proximity correction","level":3,"score":0.51910001039505},{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.5055000185966492},{"id":"https://openalex.org/C2781285689","wikidata":"https://www.wikidata.org/wiki/Q21921428","display_name":"Crystal (programming language)","level":2,"score":0.48899999260902405},{"id":"https://openalex.org/C162307627","wikidata":"https://www.wikidata.org/wiki/Q204833","display_name":"Enhanced Data Rates for GSM Evolution","level":2,"score":0.4569000005722046},{"id":"https://openalex.org/C111335779","wikidata":"https://www.wikidata.org/wiki/Q3454686","display_name":"Reduction (mathematics)","level":2,"score":0.44339999556541443},{"id":"https://openalex.org/C107365816","wikidata":"https://www.wikidata.org/wiki/Q114817","display_name":"Surface roughness","level":2,"score":0.42829999327659607},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.4009000062942505},{"id":"https://openalex.org/C55020928","wikidata":"https://www.wikidata.org/wiki/Q3813865","display_name":"Image quality","level":3,"score":0.39480000734329224},{"id":"https://openalex.org/C168834538","wikidata":"https://www.wikidata.org/wiki/Q3705329","display_name":"Beam (structure)","level":2,"score":0.3937000036239624},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.39329999685287476},{"id":"https://openalex.org/C2777953097","wikidata":"https://www.wikidata.org/wiki/Q7252868","display_name":"Proximity effect (electron beam lithography)","level":5,"score":0.3919000029563904},{"id":"https://openalex.org/C95312477","wikidata":"https://www.wikidata.org/wiki/Q207340","display_name":"Cathode ray","level":3,"score":0.36660000681877136},{"id":"https://openalex.org/C186370098","wikidata":"https://www.wikidata.org/wiki/Q442787","display_name":"Energy (signal processing)","level":2,"score":0.3610000014305115},{"id":"https://openalex.org/C71039073","wikidata":"https://www.wikidata.org/wiki/Q3439090","display_name":"Surface finish","level":2,"score":0.3529999852180481},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.3443000018596649},{"id":"https://openalex.org/C64297162","wikidata":"https://www.wikidata.org/wiki/Q1987070","display_name":"Deposition (geology)","level":3,"score":0.3416000008583069},{"id":"https://openalex.org/C20788544","wikidata":"https://www.wikidata.org/wiki/Q467054","display_name":"Photonics","level":2,"score":0.30720001459121704},{"id":"https://openalex.org/C30475298","wikidata":"https://www.wikidata.org/wiki/Q909554","display_name":"Computational physics","level":1,"score":0.29159998893737793},{"id":"https://openalex.org/C2779530757","wikidata":"https://www.wikidata.org/wiki/Q1207505","display_name":"Quality (philosophy)","level":2,"score":0.29100000858306885},{"id":"https://openalex.org/C41794268","wikidata":"https://www.wikidata.org/wiki/Q1408939","display_name":"X-ray lithography","level":4,"score":0.27250000834465027},{"id":"https://openalex.org/C93038891","wikidata":"https://www.wikidata.org/wiki/Q1061524","display_name":"Intensity (physics)","level":2,"score":0.27140000462532043},{"id":"https://openalex.org/C2776459999","wikidata":"https://www.wikidata.org/wiki/Q2119376","display_name":"Fidelity","level":2,"score":0.2689000070095062},{"id":"https://openalex.org/C105487726","wikidata":"https://www.wikidata.org/wiki/Q622938","display_name":"Photolithography","level":2,"score":0.25699999928474426},{"id":"https://openalex.org/C14036430","wikidata":"https://www.wikidata.org/wiki/Q3736076","display_name":"Function (biology)","level":2,"score":0.2506999969482422}],"mesh":[],"locations_count":2,"locations":[{"id":"pmh:oai:arXiv.org:2609.10741","doi":null,"is_oa":true,"landing_page_url":"https://arxiv.org/abs/2609.10741","pdf_url":"https://arxiv.org/pdf/2609.10741","source":{"id":"https://openalex.org/S4306400194","display_name":"arXiv (Cornell University)","issn_l":"2331-8422","issn":["2331-8422"],"is_oa":true,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I205783295","host_organization_name":"Cornell University","host_organization_lineage":["https://openalex.org/I205783295"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":null,"raw_type":"text"},{"id":"doi:10.48550/arxiv.2609.10741","doi":"https://doi.org/10.48550/arxiv.2609.10741","is_oa":true,"landing_page_url":"https://doi.org/10.48550/arxiv.2609.10741","pdf_url":null,"source":{"id":"https://openalex.org/S4306400194","display_name":"arXiv (Cornell University)","issn_l":"2331-8422","issn":["2331-8422"],"is_oa":true,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I205783295","host_organization_name":"Cornell University","host_organization_lineage":["https://openalex.org/I205783295"],"host_organization_lineage_names":[],"type":"repository"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":null,"is_accepted":false,"is_published":false,"raw_source_name":null,"raw_type":"Preprint"}],"best_oa_location":{"id":"pmh:oai:arXiv.org:2609.10741","doi":null,"is_oa":true,"landing_page_url":"https://arxiv.org/abs/2609.10741","pdf_url":"https://arxiv.org/pdf/2609.10741","source":{"id":"https://openalex.org/S4306400194","display_name":"arXiv (Cornell University)","issn_l":"2331-8422","issn":["2331-8422"],"is_oa":true,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I205783295","host_organization_name":"Cornell University","host_organization_lineage":["https://openalex.org/I205783295"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":null,"raw_type":"text"},"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320320719","display_name":"Department of Science and Technology, Ministry of Science and Technology, India","ror":"https://ror.org/0101xrq71"}],"has_content":{"grobid_xml":true,"pdf":true},"content_urls":{"pdf":"https://content.openalex.org/works/W7212313237.pdf","grobid_xml":"https://content.openalex.org/works/W7212313237.grobid-xml"},"referenced_works_count":34,"referenced_works":["https://openalex.org/W148185925","https://openalex.org/W1964361937","https://openalex.org/W1966693303","https://openalex.org/W1972412144","https://openalex.org/W1973206835","https://openalex.org/W1978908111","https://openalex.org/W1984919318","https://openalex.org/W1989273598","https://openalex.org/W1996088551","https://openalex.org/W1996900454","https://openalex.org/W1997977307","https://openalex.org/W2019890371","https://openalex.org/W2029867592","https://openalex.org/W2060086787","https://openalex.org/W2064636810","https://openalex.org/W2066497697","https://openalex.org/W2074383155","https://openalex.org/W2104196496","https://openalex.org/W2117274978","https://openalex.org/W2140124269","https://openalex.org/W2144681108","https://openalex.org/W2153896731","https://openalex.org/W2164843570","https://openalex.org/W2194478127","https://openalex.org/W2246713749","https://openalex.org/W2536614252","https://openalex.org/W2980980200","https://openalex.org/W3022051615","https://openalex.org/W3037264102","https://openalex.org/W4211100070","https://openalex.org/W4243493583","https://openalex.org/W4243963388","https://openalex.org/W4246621048","https://openalex.org/W4250637700"],"related_works":["https://openalex.org/W2140124269","https://openalex.org/W4241257765","https://openalex.org/W1997678766","https://openalex.org/W1994435029","https://openalex.org/W2019920628","https://openalex.org/W2144681108","https://openalex.org/W2246713749","https://openalex.org/W6893656826","https://openalex.org/W2062106218","https://openalex.org/W7132550949"],"abstract_inverted_index":{"We":[0],"demonstrate":[1],"the":[2,16,35,39,84,102,116],"use":[3],"of":[4,19,38],"proximity":[5,36],"effect":[6],"correction":[7],"(PEC)":[8],"in":[9,101,108,115],"electron":[10,31],"beam":[11],"lithography":[12],"(EBL)":[13],"to":[14,29,51,66],"improve":[15],"fabrication":[17],"fidelity":[18],"dense":[20],"photonic":[21,118],"crystal":[22,119],"structures.":[23,104],"Monte":[24],"Carlo":[25],"simulations":[26],"were":[27],"employed":[28],"model":[30],"scattering":[32],"and":[33,76,97],"determine":[34],"function":[37],"resist-substrate":[40],"system.":[41],"Based":[42],"on":[43],"this,":[44],"a":[45,109],"computational":[46],"dose-modification":[47],"scheme":[48],"was":[49,64],"implemented":[50],"compensate":[52],"for":[53],"nonuniform":[54],"energy":[55],"deposition":[56],"during":[57],"exposure.":[58],"In":[59],"addition,":[60],"SEM-based":[61],"image":[62],"analysis":[63,89],"performed":[65],"quantitatively":[67],"assess":[68],"structural":[69],"differences":[70],"among":[71],"uniformly":[72],"exposed,":[73],"manually":[74],"dose-modified,":[75],"PEC-fabricated":[77],"devices":[78],"by":[79],"comparing":[80],"extracted":[81],"geometries":[82],"with":[83],"reference":[85],"GDS":[86],"design.":[87],"The":[88],"revealed":[90],"reduced":[91],"dimensional":[92],"deviation,":[93],"improved":[94],"spatial":[95],"uniformity,":[96],"lower":[98],"edge":[99],"roughness":[100],"PEC-corrected":[103],"These":[105],"improvements":[106],"resulted":[107],"significantly":[110],"enhanced":[111],"optical":[112],"quality":[113],"factor":[114],"fabricated":[117],"cavities.":[120]},"counts_by_year":[],"updated_date":"2026-11-07T11:25:07.637180","created_date":"2026-09-12T00:00:00"}