{"id":"https://openalex.org/W7204457224","doi":"https://doi.org/10.1063/5.0320613","title":"Spectroscopic ellipsometry determined dielectric function from 0.74 to 9.25 eV and band-to-band transitions in zirconia thin films fabricated by electron-beam-assisted deposition","display_name":"Spectroscopic ellipsometry determined dielectric function from 0.74 to 9.25 eV and band-to-band transitions in zirconia thin films fabricated by electron-beam-assisted deposition","publication_year":2026,"publication_date":"2026-08-27","ids":{"openalex":"https://openalex.org/W7204457224","doi":"https://doi.org/10.1063/5.0320613"},"language":"en","primary_location":{"id":"doi:10.1063/5.0320613","doi":"https://doi.org/10.1063/5.0320613","is_oa":true,"landing_page_url":"https://doi.org/10.1063/5.0320613","pdf_url":"https://pubs.aip.org/aip/jap/article-pdf/doi/10.1063/5.0320613/21120710/085702_1_5.0320613.pdf","source":{"id":"https://openalex.org/S187991544","display_name":"Journal of Applied Physics","issn_l":"0021-8979","issn":["0021-8979","1089-7550","1520-8850"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-d","jufo-1","norway-1","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Applied Physics","raw_type":"journal-article"},"volume":null,"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":true,"oa_status":"hybrid","oa_url":"https://pubs.aip.org/aip/jap/article-pdf/doi/10.1063/5.0320613/21120710/085702_1_5.0320613.pdf","any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5082774415","display_name":"Ufuk K\u0131l\u0131\u00e7","orcid":"https://orcid.org/0000-0002-4235-3002","observed_orcids":["https://orcid.org/0000-0002-4235-3002"]},"institutions":[{"id":"https://openalex.org/I114395901","display_name":"University of Nebraska\u2013Lincoln","ror":"https://ror.org/043mer456","country_code":"US","type":"education","lineage":["https://openalex.org/I114395901"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Ufuk Kilic","raw_affiliation_strings":["Department of Electrical and Computer Engineering, University of Nebraska-Lincoln 1 , Lincoln, Nebraska 68588,"],"raw_orcid":"https://orcid.org/0000-0002-4235-3002","affiliations":[{"raw_affiliation_string":"Department of Electrical and Computer Engineering, University of Nebraska-Lincoln 1 , Lincoln, Nebraska 68588,","institution_ids":["https://openalex.org/I114395901"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5148469317","display_name":"Raymond Smith","orcid":"https://orcid.org/0000-0003-0415-3998","observed_orcids":["https://orcid.org/0000-0003-0415-3998"]},"institutions":[{"id":"https://openalex.org/I114395901","display_name":"University of Nebraska\u2013Lincoln","ror":"https://ror.org/043mer456","country_code":"US","type":"education","lineage":["https://openalex.org/I114395901"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Raymond Smith","raw_affiliation_strings":["Department of Electrical and Computer Engineering, University of Nebraska-Lincoln 1 , Lincoln, Nebraska 68588,"],"raw_orcid":"https://orcid.org/0000-0003-0415-3998","affiliations":[{"raw_affiliation_string":"Department of Electrical and Computer Engineering, University of Nebraska-Lincoln 1 , Lincoln, Nebraska 68588,","institution_ids":["https://openalex.org/I114395901"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5046024571","display_name":"Matthew Hilfiker","orcid":"https://orcid.org/0000-0002-7015-5484","observed_orcids":["https://orcid.org/0000-0002-7015-5484"]},"institutions":[{"id":"https://openalex.org/I114395901","display_name":"University of Nebraska\u2013Lincoln","ror":"https://ror.org/043mer456","country_code":"US","type":"education","lineage":["https://openalex.org/I114395901"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Matthew Hilfiker","raw_affiliation_strings":["Department of Electrical and Computer Engineering, University of Nebraska-Lincoln 1 , Lincoln, Nebraska 68588,"],"raw_orcid":"https://orcid.org/0000-0002-7015-5484","affiliations":[{"raw_affiliation_string":"Department of Electrical and Computer Engineering, University of Nebraska-Lincoln 1 , Lincoln, Nebraska 68588,","institution_ids":["https://openalex.org/I114395901"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5014484170","display_name":"Shawn Wimer","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I114395901","display_name":"University of Nebraska\u2013Lincoln","ror":"https://ror.org/043mer456","country_code":"US","type":"education","lineage":["https://openalex.org/I114395901"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Shawn Wimer","raw_affiliation_strings":["Department of Electrical and Computer Engineering, University of Nebraska-Lincoln 1 , Lincoln, Nebraska 68588,"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Electrical and Computer Engineering, University of Nebraska-Lincoln 1 , Lincoln, Nebraska 68588,","institution_ids":["https://openalex.org/I114395901"]}]},{"author_position":"middle","author":{"id":null,"display_name":"Eva Schubert","orcid":"https://orcid.org/0000-0003-0277-1135","observed_orcids":["https://orcid.org/0000-0003-0277-1135"]},"institutions":[{"id":"https://openalex.org/I114395901","display_name":"University of Nebraska\u2013Lincoln","ror":"https://ror.org/043mer456","country_code":"US","type":"education","lineage":["https://openalex.org/I114395901"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Eva Schubert","raw_affiliation_strings":["Department of Electrical and Computer Engineering, University of Nebraska-Lincoln 1 , Lincoln, Nebraska 68588,"],"raw_orcid":"https://orcid.org/0000-0003-0277-1135","affiliations":[{"raw_affiliation_string":"Department of Electrical and Computer Engineering, University of Nebraska-Lincoln 1 , Lincoln, Nebraska 68588,","institution_ids":["https://openalex.org/I114395901"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5031867521","display_name":"Mathias M. Schubert","orcid":"https://orcid.org/0000-0001-6238-663X","observed_orcids":["https://orcid.org/0000-0001-6238-663X"]},"institutions":[{"id":"https://openalex.org/I114395901","display_name":"University of Nebraska\u2013Lincoln","ror":"https://ror.org/043mer456","country_code":"US","type":"education","lineage":["https://openalex.org/I114395901"]},{"id":"https://openalex.org/I187531555","display_name":"Lund University","ror":"https://ror.org/012a77v79","country_code":"SE","type":"education","lineage":["https://openalex.org/I187531555"]},{"id":"https://openalex.org/I4405269036","display_name":"NanoLund","ror":"https://ror.org/02x6a8337","country_code":"SE","type":"facility","lineage":["https://openalex.org/I4405269036"]}],"countries":["SE","US"],"is_corresponding":false,"raw_author_name":"Mathias Schubert","raw_affiliation_strings":["Department of Electrical and Computer Engineering, University of Nebraska-Lincoln 1 , Lincoln, Nebraska 68588,","Terahertz Materials Analysis Center (THeMAC) and Competence Center for III-Nitride Technology, C3NiT\u2014Janz\u00e9n, NanoLund and Solid State Physics, Lund University 2 , S-22100 Lund,","Wallenberg Initiative Materials Science for Sustainability (WISE), Department of Physics, Chemistry, and Biology (IFM), Lund University 3 , S-22100 Lund,"],"raw_orcid":"https://orcid.org/0000-0001-6238-663X","affiliations":[{"raw_affiliation_string":"Department of Electrical and Computer Engineering, University of Nebraska-Lincoln 1 , Lincoln, Nebraska 68588,","institution_ids":["https://openalex.org/I114395901"]},{"raw_affiliation_string":"Terahertz Materials Analysis Center (THeMAC) and Competence Center for III-Nitride Technology, C3NiT\u2014Janz\u00e9n, NanoLund and Solid State Physics, Lund University 2 , S-22100 Lund,","institution_ids":["https://openalex.org/I187531555","https://openalex.org/I4405269036"]},{"raw_affiliation_string":"Wallenberg Initiative Materials Science for Sustainability (WISE), Department of Physics, Chemistry, and Biology (IFM), Lund University 3 , S-22100 Lund,","institution_ids":["https://openalex.org/I187531555"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":3,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":{"value":3500,"currency":"USD","value_usd":3500},"apc_paid":{"value":3500,"currency":"USD","value_usd":3500},"fwci":0.0,"has_fulltext":true,"cited_by_count":0,"citation_normalized_percentile":{"value":0.57609046,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"140","issue":"8","first_page":null,"last_page":null},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T12050","display_name":"Optical Polarization and Ellipsometry","score":0.5824999809265137,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T12050","display_name":"Optical Polarization and Ellipsometry","score":0.5824999809265137,"subfield":{"id":"https://openalex.org/subfields/2204","display_name":"Biomedical Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.10599999874830246,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11723","display_name":"Optical Coatings and Gratings","score":0.05609999969601631,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/zirconia-thin-films","display_name":"zirconia thin films","score":0.996999979019165},{"id":"https://openalex.org/keywords/dielectric-function","display_name":"dielectric function","score":0.8740000128746033},{"id":"https://openalex.org/keywords/interband-transitions","display_name":"interband transitions","score":0.9610000252723694},{"id":"https://openalex.org/keywords/spectroscopic-ellipsometry","display_name":"spectroscopic ellipsometry","score":0.7960000038146973},{"id":"https://openalex.org/keywords/surface-roughness","display_name":"surface roughness","score":0.6679999828338623},{"id":"https://openalex.org/keywords/effective-medium-theory","display_name":"effective medium theory","score":0.7799999713897705},{"id":"https://openalex.org/keywords/critical-point-model","display_name":"critical point model","score":0.6869999766349792},{"id":"https://openalex.org/keywords/optical-properties","display_name":"optical properties","score":0.4580000042915344},{"id":"https://openalex.org/keywords/film-thickness-dependence","display_name":"film thickness dependence","score":0.4620000123977661}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.8271999955177307},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.801800012588501},{"id":"https://openalex.org/C18293161","wikidata":"https://www.wikidata.org/wiki/Q898774","display_name":"Ellipsometry","level":3,"score":0.6819000244140625},{"id":"https://openalex.org/C133386390","wikidata":"https://www.wikidata.org/wiki/Q184996","display_name":"Dielectric","level":2,"score":0.671500027179718},{"id":"https://openalex.org/C107365816","wikidata":"https://www.wikidata.org/wiki/Q114817","display_name":"Surface roughness","level":2,"score":0.6621000170707703},{"id":"https://openalex.org/C123609680","wikidata":"https://www.wikidata.org/wiki/Q225666","display_name":"Cubic zirconia","level":3,"score":0.6219000220298767},{"id":"https://openalex.org/C71039073","wikidata":"https://www.wikidata.org/wiki/Q3439090","display_name":"Surface finish","level":2,"score":0.5759999752044678},{"id":"https://openalex.org/C69544855","wikidata":"https://www.wikidata.org/wiki/Q757625","display_name":"Atomic layer deposition","level":3,"score":0.5375999808311462},{"id":"https://openalex.org/C57410435","wikidata":"https://www.wikidata.org/wiki/Q505668","display_name":"Chemical vapor deposition","level":2,"score":0.45419999957084656},{"id":"https://openalex.org/C64297162","wikidata":"https://www.wikidata.org/wiki/Q1987070","display_name":"Deposition (geology)","level":3,"score":0.4408000111579895},{"id":"https://openalex.org/C51576277","wikidata":"https://www.wikidata.org/wiki/Q900134","display_name":"Physical vapor deposition","level":3,"score":0.40950000286102295},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.4081999957561493},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.3993000090122223},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.3758000135421753},{"id":"https://openalex.org/C2779851234","wikidata":"https://www.wikidata.org/wiki/Q50690","display_name":"Oxide","level":2,"score":0.35740000009536743},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.34769999980926514},{"id":"https://openalex.org/C2778182573","wikidata":"https://www.wikidata.org/wiki/Q7784286","display_name":"Thin layers","level":2,"score":0.34439998865127563},{"id":"https://openalex.org/C71597924","wikidata":"https://www.wikidata.org/wiki/Q2890543","display_name":"Optical coating","level":3,"score":0.3260999917984009},{"id":"https://openalex.org/C102951782","wikidata":"https://www.wikidata.org/wiki/Q49295","display_name":"Atomic force microscopy","level":2,"score":0.32350000739097595},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.30059999227523804},{"id":"https://openalex.org/C204323151","wikidata":"https://www.wikidata.org/wiki/Q905424","display_name":"Range (aeronautics)","level":2,"score":0.2921000123023987},{"id":"https://openalex.org/C2988029435","wikidata":"https://www.wikidata.org/wiki/Q211569","display_name":"Dielectric function","level":3,"score":0.26179999113082886}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1063/5.0320613","doi":"https://doi.org/10.1063/5.0320613","is_oa":true,"landing_page_url":"https://doi.org/10.1063/5.0320613","pdf_url":"https://pubs.aip.org/aip/jap/article-pdf/doi/10.1063/5.0320613/21120710/085702_1_5.0320613.pdf","source":{"id":"https://openalex.org/S187991544","display_name":"Journal of Applied Physics","issn_l":"0021-8979","issn":["0021-8979","1089-7550","1520-8850"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-d","jufo-1","norway-1","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Applied Physics","raw_type":"journal-article"}],"best_oa_location":{"id":"doi:10.1063/5.0320613","doi":"https://doi.org/10.1063/5.0320613","is_oa":true,"landing_page_url":"https://doi.org/10.1063/5.0320613","pdf_url":"https://pubs.aip.org/aip/jap/article-pdf/doi/10.1063/5.0320613/21120710/085702_1_5.0320613.pdf","source":{"id":"https://openalex.org/S187991544","display_name":"Journal of Applied Physics","issn_l":"0021-8979","issn":["0021-8979","1089-7550","1520-8850"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-d","jufo-1","norway-1","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320257","host_organization_name":"American Institute of Physics","host_organization_lineage":["https://openalex.org/P4310320257"],"host_organization_lineage_names":["American Institute of Physics"],"type":"journal"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Applied Physics","raw_type":"journal-article"},"sustainable_development_goals":[],"sustainable_development_goals_aurora":[],"study_designs":[],"awards":[{"id":"https://openalex.org/G1286853602","display_name":null,"funder_award_id":"OIA-2044049","funder_id":"https://openalex.org/F4320337392","funder_display_name":"Division of Electrical, Communications and Cyber Systems"},{"id":"https://openalex.org/G2011318139","display_name":null,"funder_award_id":"OIA-2044049","funder_id":"https://openalex.org/F4320338283","funder_display_name":"Office of Experimental Program to Stimulate Competitive Research"},{"id":"https://openalex.org/G2501386473","display_name":null,"funder_award_id":"ECCS 2329940","funder_id":"https://openalex.org/F4320337392","funder_display_name":"Division of Electrical, Communications and Cyber Systems"},{"id":"https://openalex.org/G2757433417","display_name":null,"funder_award_id":"FA9550-25-1- 0196","funder_id":"https://openalex.org/F4320338279","funder_display_name":"Air Force Office of Scientific Research"},{"id":"https://openalex.org/G2971774010","display_name":null,"funder_award_id":"FA9550-21-1-0259","funder_id":"https://openalex.org/F4320338279","funder_display_name":"Air Force Office of Scientific Research"},{"id":"https://openalex.org/G3033020585","display_name":null,"funder_award_id":"2211858","funder_id":"https://openalex.org/F4320337391","funder_display_name":"Division of Civil, Mechanical and Manufacturing Innovation"},{"id":"https://openalex.org/G3780816079","display_name":null,"funder_award_id":"2224456","funder_id":"https://openalex.org/F4320337367","funder_display_name":"Division of Materials Research"},{"id":"https://openalex.org/G3970368980","display_name":null,"funder_award_id":"2024.0121","funder_id":"https://openalex.org/F4320322327","funder_display_name":"Knut och Alice Wallenbergs Stiftelse"},{"id":"https://openalex.org/G441682718","display_name":null,"funder_award_id":"FA9550- 23-1-0574 DEF","funder_id":"https://openalex.org/F4320338279","funder_display_name":"Air Force Office of Scientific Research"},{"id":"https://openalex.org/G4458185301","display_name":"Semiconductor-based Terahertz Traveling Wave Amplifiers for Monolithic Integration","funder_award_id":"2329940","funder_id":"https://openalex.org/F4320306076","funder_display_name":"National Science Foundation"},{"id":"https://openalex.org/G4744044506","display_name":"Conference: 10th International Conference on Spectroscopic Ellipsometry","funder_award_id":"2423277","funder_id":"https://openalex.org/F4320306076","funder_display_name":"National Science Foundation"},{"id":"https://openalex.org/G5778157351","display_name":"Broadband and tunable enhanced chiral light-matter interactions at the visible with new ultrathin helical metamaterials","funder_award_id":"2224456","funder_id":"https://openalex.org/F4320306076","funder_display_name":"National Science Foundation"},{"id":"https://openalex.org/G6749367883","display_name":"NSF-DFG: Advances in Ion-Surface Interaction-Driven Manufacturing of One-Dimensional Metal Oxide Heterostructures","funder_award_id":"2211858","funder_id":"https://openalex.org/F4320306076","funder_display_name":"National Science Foundation"},{"id":"https://openalex.org/G6848461113","display_name":null,"funder_award_id":"2329940","funder_id":"https://openalex.org/F4320337392","funder_display_name":"Division of Electrical, Communications and Cyber Systems"},{"id":"https://openalex.org/G6893523677","display_name":"RII Track-1: Emergent Quantum Materials and Technologies (EQUATE)","funder_award_id":"2044049","funder_id":"https://openalex.org/F4320306076","funder_display_name":"National Science Foundation"}],"funders":[{"id":"https://openalex.org/F4320306076","display_name":"National Science Foundation","ror":"https://ror.org/021nxhr62"},{"id":"https://openalex.org/F4320317650","display_name":"J. A. Woollam Foundation","ror":"https://ror.org/03qj8cc33"},{"id":"https://openalex.org/F4320322327","display_name":"Knut och Alice Wallenbergs Stiftelse","ror":"https://ror.org/004hzzk67"},{"id":"https://openalex.org/F4320337367","display_name":"Division of Materials Research","ror":"https://ror.org/01pc7k308"},{"id":"https://openalex.org/F4320337391","display_name":"Division of Civil, Mechanical and Manufacturing Innovation","ror":"https://ror.org/028yd4c30"},{"id":"https://openalex.org/F4320337392","display_name":"Division of Electrical, Communications and Cyber Systems","ror":"https://ror.org/01krpsy48"},{"id":"https://openalex.org/F4320338279","display_name":"Air Force Office of Scientific Research","ror":"https://ror.org/011e9bt93"},{"id":"https://openalex.org/F4320338283","display_name":"Office of Experimental Program to Stimulate Competitive Research","ror":"https://ror.org/04k9mqs78"}],"has_content":{"grobid_xml":true,"pdf":true},"content_urls":{"pdf":"https://content.openalex.org/works/W7204457224.pdf","grobid_xml":"https://content.openalex.org/works/W7204457224.grobid-xml"},"referenced_works_count":86,"referenced_works":["https://openalex.org/W1493344046","https://openalex.org/W1561157335","https://openalex.org/W1964032585","https://openalex.org/W1966745503","https://openalex.org/W1973946121","https://openalex.org/W1974676255","https://openalex.org/W1975087949","https://openalex.org/W1978933641","https://openalex.org/W1984632406","https://openalex.org/W1986007382","https://openalex.org/W1986889741","https://openalex.org/W1996362320","https://openalex.org/W2001021762","https://openalex.org/W2015967103","https://openalex.org/W2017537323","https://openalex.org/W2018305014","https://openalex.org/W2026871968","https://openalex.org/W2032574625","https://openalex.org/W2033496867","https://openalex.org/W2034000947","https://openalex.org/W2045790568","https://openalex.org/W2047372568","https://openalex.org/W2048664699","https://openalex.org/W2062391423","https://openalex.org/W2065284282","https://openalex.org/W2065687255","https://openalex.org/W2066800586","https://openalex.org/W2067717369","https://openalex.org/W2069460499","https://openalex.org/W2070324376","https://openalex.org/W2082277018","https://openalex.org/W2095438305","https://openalex.org/W2110206578","https://openalex.org/W2156517292","https://openalex.org/W2158260131","https://openalex.org/W2184155210","https://openalex.org/W2266566558","https://openalex.org/W2321172578","https://openalex.org/W2337379851","https://openalex.org/W2515579493","https://openalex.org/W2527796803","https://openalex.org/W2552835525","https://openalex.org/W2565028139","https://openalex.org/W2772829183","https://openalex.org/W2801645171","https://openalex.org/W2922730421","https://openalex.org/W2952528949","https://openalex.org/W2956779617","https://openalex.org/W3014758924","https://openalex.org/W3028651765","https://openalex.org/W3083836162","https://openalex.org/W3106590024","https://openalex.org/W3136266414","https://openalex.org/W3145739830","https://openalex.org/W3150471708","https://openalex.org/W3164318299","https://openalex.org/W3189448440","https://openalex.org/W3200720901","https://openalex.org/W3208270418","https://openalex.org/W4220892771","https://openalex.org/W4283075954","https://openalex.org/W4292728709","https://openalex.org/W4304695286","https://openalex.org/W4311814578","https://openalex.org/W4312623046","https://openalex.org/W4323349403","https://openalex.org/W4366525649","https://openalex.org/W4379011979","https://openalex.org/W4380052954","https://openalex.org/W4385985977","https://openalex.org/W4387898039","https://openalex.org/W4391109131","https://openalex.org/W4391126900","https://openalex.org/W4391696546","https://openalex.org/W4400156735","https://openalex.org/W4402092831","https://openalex.org/W4403101356","https://openalex.org/W4403636895","https://openalex.org/W4406093628","https://openalex.org/W4406659597","https://openalex.org/W4408016844","https://openalex.org/W4410130031","https://openalex.org/W4413807074","https://openalex.org/W4414768789","https://openalex.org/W4415109583","https://openalex.org/W7163756170"],"related_works":[],"abstract_inverted_index":{"Zirconia":[0],"(ZrO2)":[1],"thin":[2,43,84,161],"films":[3,56,162],"were":[4,24],"fabricated":[5],"using":[6,104,131],"an":[7,58],"ultra-high-vacuum":[8],"electron-beam":[9],"physical":[10],"vapor":[11],"deposition":[12],"technique.":[13],"Spectroscopic":[14],"ellipsometry":[15],"(SE)":[16],"data":[17],"from":[18,122],"multiple":[19],"samples":[20],"with":[21,57,119],"different":[22],"thicknesses":[23,117],"acquired":[25],"over":[26],"a":[27,74,94,105,132,136,151,165],"broad":[28],"photon-energy":[29],"range":[30],"of":[31,41,53,78,110,134,154,158],"0.74\u20139.25":[32],"eV":[33],"to":[34,143],"determine":[35],"the":[36,51,66,70,79,111,127,155],"frequency-dependent":[37],"complex":[38],"dielectric":[39,129,156],"function":[40,157],"ZrO2":[42,83,160],"films.":[44],"Atomic":[45],"force":[46],"microscopy":[47],"(AFM)":[48],"analysis":[49,96,140],"confirms":[50],"formation":[52],"highly":[54],"uniform":[55],"average":[59],"height":[60],"variation":[61],"below":[62],"2":[63],"nm":[64],"across":[65],"scanned":[67],"areas.":[68],"In":[69],"SE-based":[71],"optical":[72,174],"analysis,":[73],"five-layer":[75],"model":[76,138],"consisting":[77],"substrate,":[80],"native":[81],"oxide,":[82],"film,":[85],"surface":[86,99],"roughness":[87,100,116],"layer,":[88],"and":[89,113,163,173],"ambient":[90],"was":[91,102,141],"employed":[92],"within":[93],"multi-sample":[95],"framework.":[97],"The":[98],"layer":[101],"modeled":[103],"50:50":[106],"effective":[107],"medium":[108],"approximation":[109],"film":[112],"ambient,":[114],"yielding":[115],"consistent":[118],"those":[120],"obtained":[121],"AFM":[123],"measurements.":[124],"By":[125],"parameterizing":[126],"intrinsic":[128],"response":[130],"set":[133],"oscillators,":[135],"critical-point":[137],"dielectric-function":[139],"applied":[142],"identify":[144],"band-to-band":[145],"transition":[146],"parameters.":[147],"These":[148],"results":[149],"provide":[150],"comprehensive":[152],"parameterization":[153],"electron-beam-deposited":[159],"establish":[164],"robust":[166],"ellipsometry-based":[167],"framework":[168],"for":[169],"correlating":[170],"thin-film":[171],"structure":[172],"properties":[175],"in":[176],"ultra-wide-bandgap":[177],"oxide":[178],"materials.":[179]},"counts_by_year":[],"updated_date":"2026-10-14T16:39:01.820549","created_date":"2026-08-28T00:00:00"}