{"id":"https://openalex.org/W634052233","doi":"https://doi.org/10.1016/j.jallcom.2015.06.144","title":"Epitaxial growth and improved electronic properties of (Bi1\u2212Sb )2Te3 thin films grown on sapphire (0001) substrates: The influence of Sb content and the annealing","display_name":"Epitaxial growth and improved electronic properties of (Bi1\u2212Sb )2Te3 thin films grown on sapphire (0001) substrates: The influence of Sb content and the annealing","publication_year":2015,"publication_date":"2015-06-18","ids":{"openalex":"https://openalex.org/W634052233","doi":"https://doi.org/10.1016/j.jallcom.2015.06.144","mag":"634052233"},"language":"en","primary_location":{"id":"doi:10.1016/j.jallcom.2015.06.144","doi":"https://doi.org/10.1016/j.jallcom.2015.06.144","is_oa":true,"landing_page_url":"https://doi.org/10.1016/j.jallcom.2015.06.144","pdf_url":"https://www.sciencedirect.com/science/article/am/pii/S0925838815302607","source":{"id":"https://openalex.org/S67716761","display_name":"Journal of Alloys and Compounds","issn_l":"0925-8388","issn":["0925-8388","1873-4669"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-1","ki-jl-1","norway-1","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"acceptedVersion","is_accepted":true,"is_published":false,"raw_source_name":"Journal of Alloys and Compounds","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":true,"oa_status":"bronze","oa_url":"https://www.sciencedirect.com/science/article/am/pii/S0925838815302607","any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":null,"display_name":"Wei Liu","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I27837315","display_name":"University of Michigan","ror":"https://ror.org/00jmfr291","country_code":"US","type":"education","lineage":["https://openalex.org/I27837315"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Wei Liu","raw_affiliation_strings":["Department of Physics, University of Michigan, Ann Arbor, MI 48109, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Physics, University of Michigan, Ann Arbor, MI 48109, USA","institution_ids":["https://openalex.org/I27837315"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5060235976","display_name":"Vladimir Alexandru Stoica","orcid":"https://orcid.org/0000-0002-2734-7819","observed_orcids":["https://orcid.org/0000-0002-2734-7819"]},"institutions":[{"id":"https://openalex.org/I27837315","display_name":"University of Michigan","ror":"https://ror.org/00jmfr291","country_code":"US","type":"education","lineage":["https://openalex.org/I27837315"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Vladimir Stoica","raw_affiliation_strings":["Department of Physics, University of Michigan, Ann Arbor, MI 48109, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Physics, University of Michigan, Ann Arbor, MI 48109, USA","institution_ids":["https://openalex.org/I27837315"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5058518849","display_name":"Hang Chi","orcid":"https://orcid.org/0000-0002-1299-1150","observed_orcids":["https://orcid.org/0000-0002-1299-1150"]},"institutions":[{"id":"https://openalex.org/I27837315","display_name":"University of Michigan","ror":"https://ror.org/00jmfr291","country_code":"US","type":"education","lineage":["https://openalex.org/I27837315"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Hang Chi","raw_affiliation_strings":["Department of Physics, University of Michigan, Ann Arbor, MI 48109, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Physics, University of Michigan, Ann Arbor, MI 48109, USA","institution_ids":["https://openalex.org/I27837315"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5078314267","display_name":"Lynn Endicott","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I27837315","display_name":"University of Michigan","ror":"https://ror.org/00jmfr291","country_code":"US","type":"education","lineage":["https://openalex.org/I27837315"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Lynn Endicott","raw_affiliation_strings":["Department of Physics, University of Michigan, Ann Arbor, MI 48109, USA"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Physics, University of Michigan, Ann Arbor, MI 48109, USA","institution_ids":["https://openalex.org/I27837315"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5077559707","display_name":"Ctirad Uher","orcid":"https://orcid.org/0000-0002-3270-1464","observed_orcids":["https://orcid.org/0000-0002-3270-1464"]},"institutions":[{"id":"https://openalex.org/I27837315","display_name":"University of Michigan","ror":"https://ror.org/00jmfr291","country_code":"US","type":"education","lineage":["https://openalex.org/I27837315"]}],"countries":["US"],"is_corresponding":true,"raw_author_name":"Ctirad Uher","raw_affiliation_strings":["Department of Physics, University of Michigan, Ann Arbor, MI 48109, USA"],"raw_orcid":"https://orcid.org/0000-0002-3270-1464","affiliations":[{"raw_affiliation_string":"Department of Physics, University of Michigan, Ann Arbor, MI 48109, USA","institution_ids":["https://openalex.org/I27837315"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":["https://openalex.org/A5077559707"],"corresponding_institution_ids":["https://openalex.org/I27837315"],"apc_list":{"value":3660,"currency":"USD","value_usd":3660},"apc_paid":null,"fwci":0.4802,"has_fulltext":false,"cited_by_count":16,"citation_normalized_percentile":{"value":0.55373131,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":87,"max":97},"biblio":{"volume":"647","issue":null,"first_page":"50","last_page":"56"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10440","display_name":"Advanced Thermoelectric Materials and Devices","score":0.9984999895095825,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10440","display_name":"Advanced Thermoelectric Materials and Devices","score":0.9984999895095825,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10590","display_name":"Chalcogenide Semiconductor Thin Films","score":0.00019999999494757503,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11637","display_name":"Advanced Semiconductor Detectors and Materials","score":9.999999747378752e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/bi-sb-2te3","display_name":"(Bi,Sb)2Te3","score":0.875},{"id":"https://openalex.org/keywords/bismuth-antimony-telluride","display_name":"bismuth antimony telluride","score":0.8270000219345093},{"id":"https://openalex.org/keywords/epitaxial-films","display_name":"epitaxial thin films","score":0.8479999899864197},{"id":"https://openalex.org/keywords/sapphire-0001-substrate","display_name":"sapphire (0001) substrate","score":0.9160000085830688},{"id":"https://openalex.org/keywords/post-annealing","display_name":"post-annealing","score":0.8579999804496765},{"id":"https://openalex.org/keywords/antisite-defects","display_name":"antisite defects","score":0.9789999723434448},{"id":"https://openalex.org/keywords/charge-carrier-mobility","display_name":"carrier mobility","score":0.8980000019073486},{"id":"https://openalex.org/keywords/hole-concentration","display_name":"hole concentration","score":0.9190000295639038},{"id":"https://openalex.org/keywords/seebeck-coefficient","display_name":"Seebeck coefficient","score":0.8489999771118164},{"id":"https://openalex.org/keywords/thermoelectric-power-factor","display_name":"thermoelectric power factor","score":0.9559999704360962},{"id":"https://openalex.org/keywords/thermoelectric-properties","display_name":"thermoelectric properties","score":0.6690000295639038}],"concepts":[{"id":"https://openalex.org/C2777855556","wikidata":"https://www.wikidata.org/wiki/Q4339544","display_name":"Annealing (glass)","level":2,"score":0.6915062665939331},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6711001992225647},{"id":"https://openalex.org/C112625512","wikidata":"https://www.wikidata.org/wiki/Q1091448","display_name":"Seebeck coefficient","level":3,"score":0.6443031430244446},{"id":"https://openalex.org/C3792809","wikidata":"https://www.wikidata.org/wiki/Q898542","display_name":"Molecular beam epitaxy","level":4,"score":0.6147924661636353},{"id":"https://openalex.org/C110738630","wikidata":"https://www.wikidata.org/wiki/Q1135540","display_name":"Epitaxy","level":3,"score":0.5994887948036194},{"id":"https://openalex.org/C106782819","wikidata":"https://www.wikidata.org/wiki/Q6501076","display_name":"Electron mobility","level":2,"score":0.5001471042633057},{"id":"https://openalex.org/C69990965","wikidata":"https://www.wikidata.org/wiki/Q65402698","display_name":"Electrical resistivity and conductivity","level":2,"score":0.46728619933128357},{"id":"https://openalex.org/C57863236","wikidata":"https://www.wikidata.org/wiki/Q1130571","display_name":"Doping","level":2,"score":0.460530549287796},{"id":"https://openalex.org/C2780064504","wikidata":"https://www.wikidata.org/wiki/Q127583","display_name":"Sapphire","level":3,"score":0.4600171744823456},{"id":"https://openalex.org/C63024428","wikidata":"https://www.wikidata.org/wiki/Q552456","display_name":"Thermoelectric effect","level":2,"score":0.43602535128593445},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.4217416048049927},{"id":"https://openalex.org/C26873012","wikidata":"https://www.wikidata.org/wiki/Q214781","display_name":"Condensed matter physics","level":1,"score":0.3925994634628296},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.3356846570968628},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.23748335242271423},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.13514569401741028},{"id":"https://openalex.org/C97346530","wikidata":"https://www.wikidata.org/wiki/Q487005","display_name":"Thermal conductivity","level":2,"score":0.10655859112739563},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.08798211812973022},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.06985664367675781},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.05316448211669922},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C97355855","wikidata":"https://www.wikidata.org/wiki/Q11473","display_name":"Thermodynamics","level":1,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C520434653","wikidata":"https://www.wikidata.org/wiki/Q38867","display_name":"Laser","level":2,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1016/j.jallcom.2015.06.144","doi":"https://doi.org/10.1016/j.jallcom.2015.06.144","is_oa":true,"landing_page_url":"https://doi.org/10.1016/j.jallcom.2015.06.144","pdf_url":"https://www.sciencedirect.com/science/article/am/pii/S0925838815302607","source":{"id":"https://openalex.org/S67716761","display_name":"Journal of Alloys and Compounds","issn_l":"0925-8388","issn":["0925-8388","1873-4669"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-1","ki-jl-1","norway-1","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"acceptedVersion","is_accepted":true,"is_published":false,"raw_source_name":"Journal of Alloys and Compounds","raw_type":"journal-article"},{"id":"pmh:oai:osti.gov:1252072","doi":null,"is_oa":false,"landing_page_url":"https://www.osti.gov/biblio/1252072","pdf_url":null,"source":{"id":"https://openalex.org/S4306402487","display_name":"OSTI OAI (U.S. Department of Energy Office of Scientific and Technical Information)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I139351228","host_organization_name":"Office of Scientific and Technical Information","host_organization_lineage":["https://openalex.org/I139351228"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":null,"raw_type":null}],"best_oa_location":{"id":"doi:10.1016/j.jallcom.2015.06.144","doi":"https://doi.org/10.1016/j.jallcom.2015.06.144","is_oa":true,"landing_page_url":"https://doi.org/10.1016/j.jallcom.2015.06.144","pdf_url":"https://www.sciencedirect.com/science/article/am/pii/S0925838815302607","source":{"id":"https://openalex.org/S67716761","display_name":"Journal of Alloys and Compounds","issn_l":"0925-8388","issn":["0925-8388","1873-4669"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","dongbi-b","jufo-1","ki-jl-1","norway-1","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320990","host_organization_name":"Elsevier BV","host_organization_lineage":["https://openalex.org/P4310320990"],"host_organization_lineage_names":["Elsevier BV"],"type":"journal"},"license":null,"license_id":null,"version":"acceptedVersion","is_accepted":true,"is_published":false,"raw_source_name":"Journal of Alloys and Compounds","raw_type":"journal-article"},"sustainable_development_goals":[],"study_designs":[],"awards":[{"id":"https://openalex.org/G1187550439","display_name":null,"funder_award_id":"DE-SC-0000957","funder_id":"https://openalex.org/F4320337480","funder_display_name":"Basic Energy Sciences"}],"funders":[{"id":"https://openalex.org/F4320306084","display_name":"U.S. Department of Energy","ror":"https://ror.org/01bj3aw27"},{"id":"https://openalex.org/F4320337480","display_name":"Basic Energy Sciences","ror":"https://ror.org/05mg91w61"},{"id":"https://openalex.org/F4320338420","display_name":"Energy Frontier Research Centers","ror":null}],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":38,"referenced_works":["https://openalex.org/W294915115","https://openalex.org/W389868541","https://openalex.org/W1529633364","https://openalex.org/W1970188810","https://openalex.org/W1971065817","https://openalex.org/W1973301586","https://openalex.org/W1981630768","https://openalex.org/W1994656564","https://openalex.org/W1994656608","https://openalex.org/W2000175013","https://openalex.org/W2003380272","https://openalex.org/W2012933339","https://openalex.org/W2023612853","https://openalex.org/W2026020033","https://openalex.org/W2029002366","https://openalex.org/W2034966628","https://openalex.org/W2036938439","https://openalex.org/W2042056247","https://openalex.org/W2048420150","https://openalex.org/W2049471620","https://openalex.org/W2054250862","https://openalex.org/W2067831898","https://openalex.org/W2082093451","https://openalex.org/W2087623098","https://openalex.org/W2090991142","https://openalex.org/W2093491113","https://openalex.org/W2097548883","https://openalex.org/W2107636694","https://openalex.org/W2108059697","https://openalex.org/W2120831645","https://openalex.org/W2151592156","https://openalex.org/W2162281789","https://openalex.org/W2163517070","https://openalex.org/W2323353016","https://openalex.org/W2328315271","https://openalex.org/W2334327936","https://openalex.org/W2802044307","https://openalex.org/W2931628094"],"related_works":["https://openalex.org/W2022311315","https://openalex.org/W1529633364","https://openalex.org/W2421416735","https://openalex.org/W2072342555","https://openalex.org/W1999915490","https://openalex.org/W1986212580","https://openalex.org/W2023724157","https://openalex.org/W1998648425","https://openalex.org/W3093620379","https://openalex.org/W2019034739"],"abstract_inverted_index":null,"counts_by_year":[{"year":2026,"cited_by_count":1},{"year":2025,"cited_by_count":4},{"year":2024,"cited_by_count":1},{"year":2023,"cited_by_count":1},{"year":2022,"cited_by_count":1},{"year":2021,"cited_by_count":1},{"year":2020,"cited_by_count":1},{"year":2019,"cited_by_count":2},{"year":2018,"cited_by_count":1},{"year":2016,"cited_by_count":3}],"updated_date":"2026-11-11T12:16:26.678958","created_date":"2016-06-24T00:00:00"}