{"id":"https://openalex.org/W4414101411","doi":"https://doi.org/10.1007/s11090-025-10597-6","title":"AlN Plasma Emission Behavior in Argon Atmosphere","display_name":"AlN Plasma Emission Behavior in Argon Atmosphere","publication_year":2025,"publication_date":"2025-09-10","ids":{"openalex":"https://openalex.org/W4414101411","doi":"https://doi.org/10.1007/s11090-025-10597-6"},"language":"en","primary_location":{"id":"doi:10.1007/s11090-025-10597-6","doi":"https://doi.org/10.1007/s11090-025-10597-6","is_oa":false,"landing_page_url":"https://doi.org/10.1007/s11090-025-10597-6","pdf_url":null,"source":{"id":"https://openalex.org/S1244823","display_name":"Plasma Chemistry and Plasma Processing","issn_l":"0272-4324","issn":["0272-4324","1572-8986"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-b","jufo-1","norway-1","poland-100","russia-white-list-2"],"host_organization":"https://openalex.org/P4310319900","host_organization_name":"Springer Science+Business Media","host_organization_lineage":["https://openalex.org/P4310319900","https://openalex.org/P4310319965"],"host_organization_lineage_names":["Springer Science+Business Media","Springer Nature"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Plasma Chemistry and Plasma Processing","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5092767491","display_name":"Adel Tekili","orcid":"https://orcid.org/0009-0005-2135-8786","observed_orcids":["https://orcid.org/0009-0005-2135-8786"]},"institutions":[{"id":"https://openalex.org/I157169809","display_name":"University of Sciences and Technology Houari Boumediene","ror":"https://ror.org/02kb89c09","country_code":"DZ","type":"education","lineage":["https://openalex.org/I157169809"]},{"id":"https://openalex.org/I4210102186","display_name":"Centre de D\u00e9veloppement des Technologies Avanc\u00e9es","ror":"https://ror.org/01ay87255","country_code":"DZ","type":"facility","lineage":["https://openalex.org/I4210102186"]}],"countries":["DZ"],"is_corresponding":true,"raw_author_name":"Adel Tekili","raw_affiliation_strings":["Division Milieux Ionis\u00e9s et lasers, Centre de D\u00e9veloppement des Technologies Avanc\u00e9es (CDTA), Cit\u00e9 du 20 ao\u00fbt 1956 BP 17, Baba Hassen, Algiers, Algeria","Faculty of Chemistry, University of Sciences and Technology, Houari Boumediene (USTHB), BP 32 EL Alia, 16111, Bab Ezzouar Algiers, Algeria"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Division Milieux Ionis\u00e9s et lasers, Centre de D\u00e9veloppement des Technologies Avanc\u00e9es (CDTA), Cit\u00e9 du 20 ao\u00fbt 1956 BP 17, Baba Hassen, Algiers, Algeria","institution_ids":["https://openalex.org/I4210102186"]},{"raw_affiliation_string":"Faculty of Chemistry, University of Sciences and Technology, Houari Boumediene (USTHB), BP 32 EL Alia, 16111, Bab Ezzouar Algiers, Algeria","institution_ids":["https://openalex.org/I157169809"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":["https://openalex.org/A5092767491"],"corresponding_institution_ids":["https://openalex.org/I157169809","https://openalex.org/I4210102186"],"apc_list":{"value":3790,"currency":"USD","value_usd":3790},"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.11168926,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"45","issue":"6","first_page":"2015","last_page":"2030"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10781","display_name":"Low-Pressure Plasma Processing and Diagnostics","score":0.5663999915122986,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10781","display_name":"Low-Pressure Plasma Processing and Diagnostics","score":0.5663999915122986,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11854","display_name":"Laser-induced spectroscopy and plasma","score":0.2029999941587448,"subfield":{"id":"https://openalex.org/subfields/1607","display_name":"Spectroscopy"},"field":{"id":"https://openalex.org/fields/16","display_name":"Chemistry"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12077","display_name":"Vacuum and Plasma Arcs","score":0.1111999973654747,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/argon-atmosphere","display_name":"argon atmosphere","score":0.9520000219345093},{"id":"https://openalex.org/keywords/plasma-emission","display_name":"plasma emission","score":0.7639999985694885},{"id":"https://openalex.org/keywords/electron-density","display_name":"electron density","score":0.8320000171661377},{"id":"https://openalex.org/keywords/argon-pressure","display_name":"argon pressure","score":0.7269999980926514},{"id":"https://openalex.org/keywords/plasma-composition","display_name":"plasma composition","score":0.39500001072883606},{"id":"https://openalex.org/keywords/time-resolved-emission-spectroscopy","display_name":"time-resolved emission spectroscopy","score":0.7549999952316284},{"id":"https://openalex.org/keywords/time-of-flight-measurement","display_name":"time-of-flight measurement","score":0.828000009059906},{"id":"https://openalex.org/keywords/plasma-kinetics","display_name":"plasma kinetics","score":0.6179999709129333},{"id":"https://openalex.org/keywords/ambient-gas-effects","display_name":"ambient gas effects","score":0.5440000295639038}],"concepts":[{"id":"https://openalex.org/C547737533","wikidata":"https://www.wikidata.org/wiki/Q696","display_name":"Argon","level":2,"score":0.8899000287055969},{"id":"https://openalex.org/C82706917","wikidata":"https://www.wikidata.org/wiki/Q10251","display_name":"Plasma","level":2,"score":0.7314000129699707},{"id":"https://openalex.org/C51141536","wikidata":"https://www.wikidata.org/wiki/Q838801","display_name":"Nanosecond","level":3,"score":0.6643000245094299},{"id":"https://openalex.org/C198291218","wikidata":"https://www.wikidata.org/wiki/Q190382","display_name":"Ionization","level":3,"score":0.5317000150680542},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.5094000101089478},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.45080000162124634},{"id":"https://openalex.org/C65440619","wikidata":"https://www.wikidata.org/wiki/Q177974","display_name":"Atmosphere (unit)","level":2,"score":0.44920000433921814},{"id":"https://openalex.org/C184779094","wikidata":"https://www.wikidata.org/wiki/Q26383","display_name":"Atomic physics","level":1,"score":0.4043999910354614},{"id":"https://openalex.org/C158355884","wikidata":"https://www.wikidata.org/wiki/Q11388","display_name":"Infrared","level":2,"score":0.4041000008583069},{"id":"https://openalex.org/C96141758","wikidata":"https://www.wikidata.org/wiki/Q216817","display_name":"Emission spectrum","level":3,"score":0.4036000072956085},{"id":"https://openalex.org/C43503373","wikidata":"https://www.wikidata.org/wiki/Q7201771","display_name":"Plasma diagnostics","level":3,"score":0.3944000005722046},{"id":"https://openalex.org/C192039680","wikidata":"https://www.wikidata.org/wiki/Q7201785","display_name":"Plasma parameters","level":3,"score":0.3634999990463257},{"id":"https://openalex.org/C200239111","wikidata":"https://www.wikidata.org/wiki/Q81809","display_name":"Atmospheric pressure","level":2,"score":0.3578000068664551},{"id":"https://openalex.org/C32891209","wikidata":"https://www.wikidata.org/wiki/Q483666","display_name":"Spectroscopy","level":2,"score":0.3515999913215637},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.35109999775886536},{"id":"https://openalex.org/C22175881","wikidata":"https://www.wikidata.org/wiki/Q7201785","display_name":"Electron temperature","level":3,"score":0.31630000472068787},{"id":"https://openalex.org/C148898269","wikidata":"https://www.wikidata.org/wiki/Q1108792","display_name":"Kinetics","level":2,"score":0.3156000077724457},{"id":"https://openalex.org/C147120987","wikidata":"https://www.wikidata.org/wiki/Q2225","display_name":"Electron","level":2,"score":0.3151000142097473},{"id":"https://openalex.org/C520434653","wikidata":"https://www.wikidata.org/wiki/Q38867","display_name":"Laser","level":2,"score":0.2904999852180481},{"id":"https://openalex.org/C60581705","wikidata":"https://www.wikidata.org/wiki/Q7201768","display_name":"Plasma cleaning","level":3,"score":0.2890999913215637},{"id":"https://openalex.org/C85344455","wikidata":"https://www.wikidata.org/wiki/Q757518","display_name":"Atmospheric-pressure plasma","level":3,"score":0.28790000081062317},{"id":"https://openalex.org/C153642686","wikidata":"https://www.wikidata.org/wiki/Q70906","display_name":"Infrared spectroscopy","level":2,"score":0.25949999690055847}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1007/s11090-025-10597-6","doi":"https://doi.org/10.1007/s11090-025-10597-6","is_oa":false,"landing_page_url":"https://doi.org/10.1007/s11090-025-10597-6","pdf_url":null,"source":{"id":"https://openalex.org/S1244823","display_name":"Plasma Chemistry and Plasma Processing","issn_l":"0272-4324","issn":["0272-4324","1572-8986"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-b","jufo-1","norway-1","poland-100","russia-white-list-2"],"host_organization":"https://openalex.org/P4310319900","host_organization_name":"Springer Science+Business Media","host_organization_lineage":["https://openalex.org/P4310319900","https://openalex.org/P4310319965"],"host_organization_lineage_names":["Springer Science+Business Media","Springer Nature"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Plasma Chemistry and Plasma Processing","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320335007","display_name":"Direction G\u00e9n\u00e9rale de la Recherche Scientifique et du D\u00e9veloppement Technologique","ror":"https://ror.org/04jpfrv51"}],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":29,"referenced_works":["https://openalex.org/W1965676405","https://openalex.org/W1966305012","https://openalex.org/W1971969481","https://openalex.org/W1977150211","https://openalex.org/W1977957560","https://openalex.org/W1980486847","https://openalex.org/W1986906287","https://openalex.org/W1989807115","https://openalex.org/W1991778833","https://openalex.org/W1995062428","https://openalex.org/W2009687090","https://openalex.org/W2059423486","https://openalex.org/W2065971012","https://openalex.org/W2079860262","https://openalex.org/W2100875891","https://openalex.org/W2600335250","https://openalex.org/W2791860706","https://openalex.org/W2891951055","https://openalex.org/W4226011767","https://openalex.org/W4296772622","https://openalex.org/W4317040380","https://openalex.org/W4385494473","https://openalex.org/W4386276139","https://openalex.org/W4386500154","https://openalex.org/W4386937317","https://openalex.org/W4388628377","https://openalex.org/W4392807623","https://openalex.org/W4392876874","https://openalex.org/W4406647383"],"related_works":["https://openalex.org/W1986906287","https://openalex.org/W2175794134","https://openalex.org/W4226011767","https://openalex.org/W2152569819","https://openalex.org/W4386500154","https://openalex.org/W2376040883","https://openalex.org/W4297622435","https://openalex.org/W2180837850","https://openalex.org/W1871176287","https://openalex.org/W2015568281"],"abstract_inverted_index":null,"counts_by_year":[],"updated_date":"2026-08-21T09:56:20.448147","created_date":"2025-10-10T00:00:00"}