{"id":"https://openalex.org/W4406789618","doi":"https://doi.org/10.2494/photopolymer.37.591","title":"Spatial Distribution Analysis of Functional Groups in Resist Thin Film Using Reflection-Mode Resonant Soft X-ray Scattering","display_name":"Spatial Distribution Analysis of Functional Groups in Resist Thin Film Using Reflection-Mode Resonant Soft X-ray Scattering","publication_year":2024,"publication_date":"2024-12-25","ids":{"openalex":"https://openalex.org/W4406789618","doi":"https://doi.org/10.2494/photopolymer.37.591"},"language":"en","primary_location":{"id":"doi:10.2494/photopolymer.37.591","doi":"https://doi.org/10.2494/photopolymer.37.591","is_oa":true,"landing_page_url":"https://doi.org/10.2494/photopolymer.37.591","pdf_url":"https://www.jstage.jst.go.jp/article/photopolymer/37/6/37_591/_pdf","source":{"id":"https://openalex.org/S26060816","display_name":"Journal of Photopolymer Science and Technology","issn_l":"0914-9244","issn":["0914-9244","1349-6336"],"is_oa":true,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","jufo-1","norway-1"],"host_organization":"https://openalex.org/P4323288777","host_organization_name":"The Society of Photopolymer Science and Technology (SPST)","host_organization_lineage":["https://openalex.org/P4323288777"],"host_organization_lineage_names":["The Society of Photopolymer Science and Technology (SPST)"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Photopolymer Science and Technology","raw_type":"journal-article"},"volume":null,"type":"article","indexed_in":["crossref"],"open_access":{"is_oa":true,"oa_status":"diamond","oa_url":"https://www.jstage.jst.go.jp/article/photopolymer/37/6/37_591/_pdf","any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5116018271","display_name":"Yuri Ebuchi","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I180941496","display_name":"University of Hyogo","ror":"https://ror.org/0151bmh98","country_code":"JP","type":"education","lineage":["https://openalex.org/I180941496"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Yuri Ebuchi","raw_affiliation_strings":["Center for EUV Lithography, Laboratory of Advanced Science and Technology for Industry, University of Hyogo"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Center for EUV Lithography, Laboratory of Advanced Science and Technology for Industry, University of Hyogo","institution_ids":["https://openalex.org/I180941496"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5082076798","display_name":"Shinji Yamakawa","orcid":"https://orcid.org/0000-0002-6650-4012","observed_orcids":["https://orcid.org/0000-0002-6650-4012"]},"institutions":[{"id":"https://openalex.org/I180941496","display_name":"University of Hyogo","ror":"https://ror.org/0151bmh98","country_code":"JP","type":"education","lineage":["https://openalex.org/I180941496"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Shinji Yamakawa","raw_affiliation_strings":["Center for EUV Lithography, Laboratory of Advanced Science and Technology for Industry, University of Hyogo"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Center for EUV Lithography, Laboratory of Advanced Science and Technology for Industry, University of Hyogo","institution_ids":["https://openalex.org/I180941496"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5083543360","display_name":"Tetsuo Harada","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I180941496","display_name":"University of Hyogo","ror":"https://ror.org/0151bmh98","country_code":"JP","type":"education","lineage":["https://openalex.org/I180941496"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Tetsuo Harada","raw_affiliation_strings":["Center for EUV Lithography, Laboratory of Advanced Science and Technology for Industry, University of Hyogo"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Center for EUV Lithography, Laboratory of Advanced Science and Technology for Industry, University of Hyogo","institution_ids":["https://openalex.org/I180941496"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5102018588","display_name":"Takeo Watanabe","orcid":"https://orcid.org/0000-0003-1202-0431","observed_orcids":["https://orcid.org/0000-0003-1202-0431"]},"institutions":[{"id":"https://openalex.org/I180941496","display_name":"University of Hyogo","ror":"https://ror.org/0151bmh98","country_code":"JP","type":"education","lineage":["https://openalex.org/I180941496"]}],"countries":["JP"],"is_corresponding":false,"raw_author_name":"Takeo Watanabe","raw_affiliation_strings":["Center for EUV Lithography, Laboratory of Advanced Science and Technology for Industry, University of Hyogo"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Center for EUV Lithography, Laboratory of Advanced Science and Technology for Industry, University of Hyogo","institution_ids":["https://openalex.org/I180941496"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I180941496"],"apc_list":null,"apc_paid":null,"fwci":0.3122,"has_fulltext":true,"cited_by_count":3,"citation_normalized_percentile":{"value":0.48728373,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":93,"max":96},"biblio":{"volume":"37","issue":"6","first_page":"591","last_page":"595"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9829000234603882,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9829000234603882,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11183","display_name":"Advanced X-ray Imaging Techniques","score":0.007300000172108412,"subfield":{"id":"https://openalex.org/subfields/3108","display_name":"Radiation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12039","display_name":"Electron and X-Ray Spectroscopy Techniques","score":0.0012000000569969416,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/euv-resist","display_name":"EUV resist","score":0.921999990940094},{"id":"https://openalex.org/keywords/functional-group-distribution","display_name":"functional group distribution","score":0.7710000276565552},{"id":"https://openalex.org/keywords/spatial-distribution","display_name":"spatial distribution","score":0.777999997138977},{"id":"https://openalex.org/keywords/line-width-roughness","display_name":"line width roughness","score":0.8920000195503235}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.823951244354248},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.6621739864349365},{"id":"https://openalex.org/C191486275","wikidata":"https://www.wikidata.org/wiki/Q210028","display_name":"Scattering","level":2,"score":0.6371035575866699},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.5948337316513062},{"id":"https://openalex.org/C65682993","wikidata":"https://www.wikidata.org/wiki/Q1056451","display_name":"Reflection (computer programming)","level":2,"score":0.567005455493927},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.5213428735733032},{"id":"https://openalex.org/C2779328170","wikidata":"https://www.wikidata.org/wiki/Q34777","display_name":"X-ray","level":2,"score":0.5127645134925842},{"id":"https://openalex.org/C48677424","wikidata":"https://www.wikidata.org/wiki/Q6888088","display_name":"Mode (computer interface)","level":2,"score":0.48020657896995544},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.1999916136264801},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.17076346278190613},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.09539535641670227},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.062228620052337646},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C199360897","wikidata":"https://www.wikidata.org/wiki/Q9143","display_name":"Programming language","level":1,"score":0.0},{"id":"https://openalex.org/C111919701","wikidata":"https://www.wikidata.org/wiki/Q9135","display_name":"Operating system","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.2494/photopolymer.37.591","doi":"https://doi.org/10.2494/photopolymer.37.591","is_oa":true,"landing_page_url":"https://doi.org/10.2494/photopolymer.37.591","pdf_url":"https://www.jstage.jst.go.jp/article/photopolymer/37/6/37_591/_pdf","source":{"id":"https://openalex.org/S26060816","display_name":"Journal of Photopolymer Science and Technology","issn_l":"0914-9244","issn":["0914-9244","1349-6336"],"is_oa":true,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","jufo-1","norway-1"],"host_organization":"https://openalex.org/P4323288777","host_organization_name":"The Society of Photopolymer Science and Technology (SPST)","host_organization_lineage":["https://openalex.org/P4323288777"],"host_organization_lineage_names":["The Society of Photopolymer Science and Technology (SPST)"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Photopolymer Science and Technology","raw_type":"journal-article"}],"best_oa_location":{"id":"doi:10.2494/photopolymer.37.591","doi":"https://doi.org/10.2494/photopolymer.37.591","is_oa":true,"landing_page_url":"https://doi.org/10.2494/photopolymer.37.591","pdf_url":"https://www.jstage.jst.go.jp/article/photopolymer/37/6/37_591/_pdf","source":{"id":"https://openalex.org/S26060816","display_name":"Journal of Photopolymer Science and Technology","issn_l":"0914-9244","issn":["0914-9244","1349-6336"],"is_oa":true,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","jufo-1","norway-1"],"host_organization":"https://openalex.org/P4323288777","host_organization_name":"The Society of Photopolymer Science and Technology (SPST)","host_organization_lineage":["https://openalex.org/P4323288777"],"host_organization_lineage_names":["The Society of Photopolymer Science and Technology (SPST)"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Photopolymer Science and Technology","raw_type":"journal-article"},"sustainable_development_goals":[],"sustainable_development_goals_aurora":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":true,"grobid_xml":true},"content_urls":{"pdf":"https://content.openalex.org/works/W4406789618.pdf","grobid_xml":"https://content.openalex.org/works/W4406789618.grobid-xml"},"referenced_works_count":18,"referenced_works":["https://openalex.org/W1451542892","https://openalex.org/W1970601924","https://openalex.org/W2038948035","https://openalex.org/W2048871970","https://openalex.org/W2313440089","https://openalex.org/W2324960778","https://openalex.org/W2334959714","https://openalex.org/W2341359710","https://openalex.org/W2402190129","https://openalex.org/W2742191182","https://openalex.org/W2959819385","https://openalex.org/W2986952525","https://openalex.org/W2990074955","https://openalex.org/W3039568652","https://openalex.org/W3163585219","https://openalex.org/W4232319396","https://openalex.org/W4324118091","https://openalex.org/W4394950028"],"related_works":["https://openalex.org/W2081152130","https://openalex.org/W2022466623","https://openalex.org/W1974253895","https://openalex.org/W1979914558","https://openalex.org/W2647262206","https://openalex.org/W2012889606","https://openalex.org/W2097868149","https://openalex.org/W2074528267","https://openalex.org/W4386552230","https://openalex.org/W2054615219"],"abstract_inverted_index":{"An":[0],"important":[1],"issue":[2],"in":[3],"EUV":[4],"resist":[5,46,55],"is":[6,23,38],"the":[7,18,27,34,41,48,51,59],"development":[8,42],"of":[9,17,30,43,50,54],"low":[10,44],"line":[11],"width":[12],"roughness":[13],"(LWR)":[14],"resists.":[15],"One":[16],"factors":[19],"that":[20,47],"worsen":[21],"LWR":[22,45],"hypothesized":[24],"to":[25],"be":[26],"non-uniform":[28],"distribution":[29,53],"functional":[31],"groups":[32],"within":[33],"resist.":[35],"Therefore,":[36],"it":[37],"required":[39],"for":[40],"controlling":[49],"spatial":[52],"component":[56],"materials":[57],"on":[58],"nanometer":[60],"scale.":[61]},"counts_by_year":[{"year":2026,"cited_by_count":1},{"year":2025,"cited_by_count":2}],"updated_date":"2026-09-06T09:10:53.072986","created_date":"2025-10-10T00:00:00"}