{"id":"https://openalex.org/W4404622073","doi":"https://doi.org/10.9734/bpi/srnta/v7/3042","title":"Optical and Electrophysical Properties of the Germanium Oxynitride Dielectric Films","display_name":"Optical and Electrophysical Properties of the Germanium Oxynitride Dielectric Films","publication_year":2024,"publication_date":"2024-11-21","ids":{"openalex":"https://openalex.org/W4404622073","doi":"https://doi.org/10.9734/bpi/srnta/v7/3042"},"language":"en","primary_location":{"id":"doi:10.9734/bpi/srnta/v7/3042","doi":"https://doi.org/10.9734/bpi/srnta/v7/3042","is_oa":false,"landing_page_url":"http://dx.doi.org/10.9734/bpi/srnta/v7/3042","pdf_url":null,"source":{"id":"https://openalex.org/S4306486234","display_name":"Book Publisher International (a part of SCIENCEDOMAIN International)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"ebook platform"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Scientific Research, New Technologies and Applications Vol. 7","raw_type":"book-chapter"},"volume":{"id":"https://openalex.org/W4404622084","display_name":"Scientific Research, New Technologies and Applications Vol. 7"},"type":"book-chapter","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5015235073","display_name":"Irakli Nakhutsrishvili","orcid":"https://orcid.org/0000-0002-7961-3437","observed_orcids":["https://orcid.org/0000-0002-7961-3437"]},"institutions":[{"id":"https://openalex.org/I131762061","display_name":"Georgian Technical University","ror":"https://ror.org/00aamz256","country_code":"GE","type":"education","lineage":["https://openalex.org/I131762061"]}],"countries":["GE"],"is_corresponding":false,"raw_author_name":"Irakli Nakhutsrishvili","raw_affiliation_strings":["Institute of Cybernetics of Georgian Technical University, Tbilisi, Georgia","Institute of Cybernetics of Georgian Technical University, Tbilisi, Georgia. (Georgia)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute of Cybernetics of Georgian Technical University, Tbilisi, Georgia","institution_ids":["https://openalex.org/I131762061"]},{"raw_affiliation_string":"Institute of Cybernetics of Georgian Technical University, Tbilisi, Georgia. (Georgia)","institution_ids":["https://openalex.org/I131762061"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5016800054","display_name":"Revaz Kokhreidze","orcid":"https://orcid.org/0000-0001-6960-5436","observed_orcids":["https://orcid.org/0000-0001-6960-5436"]},"institutions":[{"id":"https://openalex.org/I131762061","display_name":"Georgian Technical University","ror":"https://ror.org/00aamz256","country_code":"GE","type":"education","lineage":["https://openalex.org/I131762061"]}],"countries":["GE"],"is_corresponding":false,"raw_author_name":"Revaz Kokhreidze","raw_affiliation_strings":["Institute of Cybernetics of Georgian Technical University, Tbilisi, Georgia","Institute of Cybernetics of Georgian Technical University, Tbilisi, Georgia. (Georgia)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute of Cybernetics of Georgian Technical University, Tbilisi, Georgia","institution_ids":["https://openalex.org/I131762061"]},{"raw_affiliation_string":"Institute of Cybernetics of Georgian Technical University, Tbilisi, Georgia. (Georgia)","institution_ids":["https://openalex.org/I131762061"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5093841152","display_name":"Zurab Adamia","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I131762061","display_name":"Georgian Technical University","ror":"https://ror.org/00aamz256","country_code":"GE","type":"education","lineage":["https://openalex.org/I131762061"]}],"countries":["GE"],"is_corresponding":false,"raw_author_name":"Zurab Adamia","raw_affiliation_strings":["Institute of Cybernetics of Georgian Technical University, Tbilisi, Georgia","Institute of Cybernetics of Georgian Technical University, Tbilisi, Georgia. (Georgia)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute of Cybernetics of Georgian Technical University, Tbilisi, Georgia","institution_ids":["https://openalex.org/I131762061"]},{"raw_affiliation_string":"Institute of Cybernetics of Georgian Technical University, Tbilisi, Georgia. (Georgia)","institution_ids":["https://openalex.org/I131762061"]}]},{"author_position":"last","author":{"id":null,"display_name":"Lasha Loria","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I131762061","display_name":"Georgian Technical University","ror":"https://ror.org/00aamz256","country_code":"GE","type":"education","lineage":["https://openalex.org/I131762061"]}],"countries":["GE"],"is_corresponding":false,"raw_author_name":"Lasha Loria","raw_affiliation_strings":["Institute of Cybernetics of Georgian Technical University, Tbilisi, Georgia","Institute of Cybernetics of Georgian Technical University, Tbilisi, Georgia. (Georgia)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute of Cybernetics of Georgian Technical University, Tbilisi, Georgia","institution_ids":["https://openalex.org/I131762061"]},{"raw_affiliation_string":"Institute of Cybernetics of Georgian Technical University, Tbilisi, Georgia. (Georgia)","institution_ids":["https://openalex.org/I131762061"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I131762061"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.0,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":null,"issue":null,"first_page":"105","last_page":"115"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9916999936103821,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.9916999936103821,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.006200000178068876,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13889","display_name":"Advanced Materials and Semiconductor Technologies","score":0.00039999998989515007,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/dielectric-films","display_name":"dielectric films","score":0.8759999871253967},{"id":"https://openalex.org/keywords/optical-properties","display_name":"optical properties","score":0.6959999799728394},{"id":"https://openalex.org/keywords/electrophysical-properties","display_name":"electrophysical properties","score":0.9700000286102295},{"id":"https://openalex.org/keywords/ammonia-vapor","display_name":"ammonia vapor","score":0.7129999995231628},{"id":"https://openalex.org/keywords/capacitance-voltage-hysteresis","display_name":"capacitance-voltage hysteresis","score":0.9559999704360962},{"id":"https://openalex.org/keywords/charge-storage","display_name":"charge storage","score":0.6620000004768372},{"id":"https://openalex.org/keywords/mis-devices","display_name":"MIS devices","score":0.7599999904632568},{"id":"https://openalex.org/keywords/low-frequency-dispersion","display_name":"low-frequency dispersion","score":0.7870000004768372}],"concepts":[{"id":"https://openalex.org/C550623735","wikidata":"https://www.wikidata.org/wiki/Q867","display_name":"Germanium","level":3,"score":0.7299621105194092},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6840292811393738},{"id":"https://openalex.org/C133386390","wikidata":"https://www.wikidata.org/wiki/Q184996","display_name":"Dielectric","level":2,"score":0.6713131666183472},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.5035142302513123},{"id":"https://openalex.org/C61696701","wikidata":"https://www.wikidata.org/wiki/Q770766","display_name":"Engineering physics","level":1,"score":0.40899142622947693},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.10733652114868164},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.9734/bpi/srnta/v7/3042","doi":"https://doi.org/10.9734/bpi/srnta/v7/3042","is_oa":false,"landing_page_url":"http://dx.doi.org/10.9734/bpi/srnta/v7/3042","pdf_url":null,"source":{"id":"https://openalex.org/S4306486234","display_name":"Book Publisher International (a part of SCIENCEDOMAIN International)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"ebook platform"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Scientific Research, New Technologies and Applications Vol. 7","raw_type":"book-chapter"},{"id":"pmh:oai:HAL:hal-05110481v1","doi":null,"is_oa":false,"landing_page_url":"https://hal.science/hal-05110481","pdf_url":null,"source":{"id":"https://openalex.org/S4306402512","display_name":"HAL","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I4405252976","host_organization_name":"Centre pour la Communication Scientifique Directe","host_organization_lineage":["https://openalex.org/I4405252976"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Scientific Research, New Technologies and Applications Vol. 7, BP International, pp.105-115, 2024, ⟨10.9734/bpi/srnta/v7/3042⟩","raw_type":"info:eu-repo/semantics/bookPart"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W7216724833","https://openalex.org/W2103160775","https://openalex.org/W1999297545","https://openalex.org/W2044259052","https://openalex.org/W2125074739","https://openalex.org/W68520145","https://openalex.org/W2033640534","https://openalex.org/W2016738984","https://openalex.org/W2042449018","https://openalex.org/W2090836535"],"abstract_inverted_index":{"The":[0,34,103],"work":[1,41],"studied":[2],"the":[3,81,85,107,113,128,132],"optical":[4],"and":[5,26,53,68,138],"electrophysical":[6],"characteristics":[7,83,105],"of":[8,11,17,28,84,106,116,130],"dielectric":[9],"films":[10,46],"germanium":[12,19],"oxynitride":[13,45],"obtained":[14],"by":[15],"nitridation":[16],"single-crystalline":[18],"with":[20,51],"humid":[21],"ammonia":[22],"or":[23],"hydrazine":[24],"vapors":[25],"deposition":[27],"reaction":[29],"products":[30],"on":[31,65],"semiconductor":[32],"substrates.":[33],"technological":[35],"method":[36],"described":[37],"in":[38,100,112],"our":[39],"previous":[40],"was":[42,71,78],"used.":[43],"Germanium":[44],"create":[47],"a":[48],"high-quality":[49],"interface":[50],"silicon":[52],"indium":[54],"phosphide.":[55],"In":[56],"recent":[57],"years,":[58],"very":[59,123],"few":[60],"works":[61],"have":[62,90,122],"been":[63],"published":[64],"this":[66,75],"topic":[67],"an":[69],"attempt":[70],"made":[72],"to":[73,97],"fill":[74],"gap.":[76],"It":[77],"shown":[79],"that":[80],"capacitance-voltage":[82],"GexOyNz":[86,108],"\u2013":[87,109,119],"Si":[88],"structure":[89,111,133],"hysteresis.":[91],"These":[92],"structures":[93],"can":[94],"be":[95],"used":[96],"store":[98],"charge":[99],"memory":[101],"elements.":[102],"C-U":[104],"InP":[110],"frequency":[114],"range":[115],"20":[117,120],"Hz":[118],"MHz":[121],"low-frequency":[124],"dispersion.":[125],"This":[126],"defines":[127],"prospect":[129],"using":[131],"for":[134],"creating":[135],"MIS":[136],"devices":[137],"integrated":[139],"circuits.":[140]},"counts_by_year":[],"updated_date":"2026-10-25T09:29:13.331239","created_date":"2024-11-23T00:00:00"}