{"id":"https://openalex.org/W4401086331","doi":"https://doi.org/10.1116/6.0003782","title":"Design of plasma strip chamber for uniform gas supply with fluid flow simulation","display_name":"Design of plasma strip chamber for uniform gas supply with fluid flow simulation","publication_year":2024,"publication_date":"2024-07-29","ids":{"openalex":"https://openalex.org/W4401086331","doi":"https://doi.org/10.1116/6.0003782"},"language":"en","primary_location":{"id":"doi:10.1116/6.0003782","doi":"https://doi.org/10.1116/6.0003782","is_oa":false,"landing_page_url":"https://doi.org/10.1116/6.0003782","pdf_url":null,"source":{"id":"https://openalex.org/S4210235835","display_name":"Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena","issn_l":"2166-2746","issn":["2166-2746","2166-2754"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","norway-1","poland-70","russia-white-list-2"],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Vacuum Science & Technology B","raw_type":"journal-article"},"parent_works":[],"lineage":["https://openalex.org/W4401086331"],"child_works_count":0,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5109754707","display_name":"Ji Won Jang","orcid":"https://orcid.org/0009-0000-8922-1165","observed_orcids":["https://orcid.org/0009-0000-8922-1165"]},"institutions":[{"id":"https://openalex.org/I89440247","display_name":"Myongji University","ror":"https://ror.org/00s9dpb54","country_code":"KR","type":"education","lineage":["https://openalex.org/I89440247"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Ji Won Jang","raw_affiliation_strings":["Department of Semiconductor Engineering, Myongji University , 116 Myongji-ro, Cheoin-gu, Yongin-si, Gyeonggi-do 17058, Republic of Korea"],"raw_orcid":"https://orcid.org/0009-0000-8922-1165","affiliations":[{"raw_affiliation_string":"Department of Semiconductor Engineering, Myongji University , 116 Myongji-ro, Cheoin-gu, Yongin-si, Gyeonggi-do 17058, Republic of Korea","institution_ids":["https://openalex.org/I89440247"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5101363016","display_name":"Se Yun Jo","orcid":"https://orcid.org/0009-0000-7200-974X","observed_orcids":["https://orcid.org/0009-0000-7200-974X"]},"institutions":[{"id":"https://openalex.org/I89440247","display_name":"Myongji University","ror":"https://ror.org/00s9dpb54","country_code":"KR","type":"education","lineage":["https://openalex.org/I89440247"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Se Yun Jo","raw_affiliation_strings":["Department of Semiconductor Engineering, Myongji University , 116 Myongji-ro, Cheoin-gu, Yongin-si, Gyeonggi-do 17058, Republic of Korea"],"raw_orcid":"https://orcid.org/0009-0000-7200-974X","affiliations":[{"raw_affiliation_string":"Department of Semiconductor Engineering, Myongji University , 116 Myongji-ro, Cheoin-gu, Yongin-si, Gyeonggi-do 17058, Republic of Korea","institution_ids":["https://openalex.org/I89440247"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5113237928","display_name":"Sang Jeen Hong","orcid":"https://orcid.org/0009-0004-4962-337X","observed_orcids":["https://orcid.org/0009-0004-4962-337X"]},"institutions":[{"id":"https://openalex.org/I89440247","display_name":"Myongji University","ror":"https://ror.org/00s9dpb54","country_code":"KR","type":"education","lineage":["https://openalex.org/I89440247"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Sang Jeen Hong","raw_affiliation_strings":["Department of Semiconductor Engineering, Myongji University , 116 Myongji-ro, Cheoin-gu, Yongin-si, Gyeonggi-do 17058, Republic of Korea"],"raw_orcid":"https://orcid.org/0009-0004-4962-337X","affiliations":[{"raw_affiliation_string":"Department of Semiconductor Engineering, Myongji University , 116 Myongji-ro, Cheoin-gu, Yongin-si, Gyeonggi-do 17058, Republic of Korea","institution_ids":["https://openalex.org/I89440247"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I89440247"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.0,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"42","issue":"5","first_page":null,"last_page":null},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10781","display_name":"Low-Pressure Plasma Processing and Diagnostics","score":0.9789999723434448,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10781","display_name":"Low-Pressure Plasma Processing and Diagnostics","score":0.9789999723434448,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12077","display_name":"Vacuum and Plasma Arcs","score":0.004699999932199717,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10642","display_name":"Atmospheric-Pressure Plasma Applications","score":0.00430000014603138,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/photoresist-stripping","display_name":"photoresist stripping","score":0.9120000004768372},{"id":"https://openalex.org/keywords/oxygen-mass-fraction","display_name":"oxygen mass fraction","score":0.7670000195503235},{"id":"https://openalex.org/keywords/flow-uniformity","display_name":"flow uniformity","score":0.6399999856948853},{"id":"https://openalex.org/keywords/streamlines","display_name":"streamlines","score":0.49799999594688416},{"id":"https://openalex.org/keywords/wafer-fabrication","display_name":"wafer fabrication","score":0.5519999861717224},{"id":"https://openalex.org/keywords/flow-simulation","display_name":"flow simulation","score":0.5879999995231628}],"concepts":[{"id":"https://openalex.org/C56200935","wikidata":"https://www.wikidata.org/wiki/Q250840","display_name":"Nozzle","level":2,"score":0.854870080947876},{"id":"https://openalex.org/C41952129","wikidata":"https://www.wikidata.org/wiki/Q7624159","display_name":"Stripping (fiber)","level":2,"score":0.68290114402771},{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.6184471845626831},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6015535593032837},{"id":"https://openalex.org/C82706917","wikidata":"https://www.wikidata.org/wiki/Q10251","display_name":"Plasma","level":2,"score":0.5581604838371277},{"id":"https://openalex.org/C105487726","wikidata":"https://www.wikidata.org/wiki/Q622938","display_name":"Photolithography","level":2,"score":0.5328500866889954},{"id":"https://openalex.org/C134406635","wikidata":"https://www.wikidata.org/wiki/Q1439684","display_name":"Photoresist","level":3,"score":0.5077637434005737},{"id":"https://openalex.org/C60439489","wikidata":"https://www.wikidata.org/wiki/Q634407","display_name":"Streamlines, streaklines, and pathlines","level":2,"score":0.4521026611328125},{"id":"https://openalex.org/C78519656","wikidata":"https://www.wikidata.org/wiki/Q101333","display_name":"Mechanical engineering","level":1,"score":0.40218114852905273},{"id":"https://openalex.org/C57879066","wikidata":"https://www.wikidata.org/wiki/Q41217","display_name":"Mechanics","level":1,"score":0.29443010687828064},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.29230737686157227},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.12819668650627136},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.11438784003257751},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.10481607913970947},{"id":"https://openalex.org/C185544564","wikidata":"https://www.wikidata.org/wiki/Q81197","display_name":"Nuclear physics","level":1,"score":0.0875704288482666},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1116/6.0003782","doi":"https://doi.org/10.1116/6.0003782","is_oa":false,"landing_page_url":"https://doi.org/10.1116/6.0003782","pdf_url":null,"source":{"id":"https://openalex.org/S4210235835","display_name":"Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena","issn_l":"2166-2746","issn":["2166-2746","2166-2754"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","jufo-1","norway-1","poland-70","russia-white-list-2"],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Vacuum Science & Technology B","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[{"id":"https://openalex.org/G7235635650","display_name":null,"funder_award_id":"K_G012002249203","funder_id":"https://openalex.org/F4320334879","funder_display_name":"Korea Evaluation Institute of Industrial Technology"},{"id":"https://openalex.org/G75951965","display_name":null,"funder_award_id":"CRC20014-000","funder_id":"https://openalex.org/F4320325370","funder_display_name":"National Research Council of Science and Technology"}],"funders":[{"id":"https://openalex.org/F4320325370","display_name":"National Research Council of Science and Technology","ror":"https://ror.org/058rymf81"},{"id":"https://openalex.org/F4320334879","display_name":"Korea Evaluation Institute of Industrial Technology","ror":"https://ror.org/03z9cwa38"}],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":31,"referenced_works":["https://openalex.org/W1556218130","https://openalex.org/W1950149442","https://openalex.org/W1974583598","https://openalex.org/W1983529343","https://openalex.org/W1993960292","https://openalex.org/W2001642452","https://openalex.org/W2019794374","https://openalex.org/W2032405426","https://openalex.org/W2072536822","https://openalex.org/W2150311476","https://openalex.org/W2201726470","https://openalex.org/W2298620061","https://openalex.org/W2509738083","https://openalex.org/W2512306015","https://openalex.org/W2599504277","https://openalex.org/W2724898829","https://openalex.org/W2743865366","https://openalex.org/W2789778501","https://openalex.org/W2889349772","https://openalex.org/W2914203488","https://openalex.org/W2914597830","https://openalex.org/W3005799696","https://openalex.org/W3091301539","https://openalex.org/W3119050478","https://openalex.org/W3151744869","https://openalex.org/W4220802597","https://openalex.org/W4307703613","https://openalex.org/W4308942514","https://openalex.org/W4321437858","https://openalex.org/W4381056992","https://openalex.org/W4385486147"],"related_works":["https://openalex.org/W2981305022","https://openalex.org/W2130649025","https://openalex.org/W7046059917","https://openalex.org/W7164140031","https://openalex.org/W4402743266","https://openalex.org/W2050768667","https://openalex.org/W2023504466","https://openalex.org/W2269912375","https://openalex.org/W1995079153","https://openalex.org/W2170067652"],"abstract_inverted_index":{"Within":[0],"the":[1,12,21,29,51,54,57,73,76,83,88,106,109,121,124,128,131,143,146,160,164,188,191,201,209,217,237],"domain":[2],"of":[3,14,24,45,53,56,75,78,92,108,123,137,145,155,204,219],"semiconductor":[4,65],"fabrication,":[5],"which":[6,60,112],"entails":[7],"progressively":[8],"complex":[9],"patterning":[10],"steps,":[11],"significance":[13],"plasma":[15,46,89,210],"stripping":[16,23,47,211,220],"processes,":[17],"particularly":[18,82],"to":[19,163],"achieve":[20],"effective":[22],"photoresist":[25],"(PR)":[26],"without":[27],"damaging":[28],"underlying":[30],"substrates":[31],"via":[32],"uniform":[33],"gas":[34,117,126],"distribution":[35,122],"across":[36,127],"300":[37],"mm":[38],"wafers,":[39],"cannot":[40],"be":[41],"overstated.":[42],"The":[43],"efficacy":[44],"is":[48,61,224],"influenced":[49],"by":[50],"design":[52,77,170,174,206],"components":[55,175,234],"process":[58,80,132,233,239],"chamber,":[59,81],"critical":[62,202],"for":[63,152,207,231],"advancing":[64],"manufacturing":[66],"technologies.":[67],"In":[68],"this":[69,214],"study,":[70],"we":[71],"elucidated":[72],"influence":[74],"a":[79,168,180],"showerhead":[84,110,138,169],"nozzle":[85,153,192],"angles,":[86],"on":[87,120],"chemical":[90],"reactions":[91],"radicals":[93],"emanating":[94],"from":[95],"conventional":[96],"PR":[97],"equipment":[98,205,221],"using":[99],"computational":[100],"fluid":[101],"dynamics":[102,229],"simulations.":[103],"We":[104],"assessed":[105],"impact":[107],"design,":[111],"incorporated":[113],"divergent":[114],"or":[115],"angled":[116],"supply":[118,125],"nozzles,":[119],"wafer":[129],"within":[130],"chamber.":[133],"Five":[134],"distinct":[135],"angles":[136,154],"nozzles":[139],"were":[140,171,176],"investigated,":[141],"and":[142,157,173,196],"uniformity":[144,166],"oxygen":[147],"mass":[148,194],"fractions":[149],"was":[150],"optimized":[151],"45\u00b0":[156],"60\u00b0.":[158],"Additionally,":[159],"factors":[161],"contributing":[162],"low":[165],"in":[167,179,183],"identified":[172],"modified,":[177],"resulting":[178],"16%":[181],"improvement":[182],"uniformity.":[184],"This":[185],"study":[186],"delineated":[187],"relationship":[189],"between":[190],"position,":[193],"fraction,":[195],"flow":[197,228],"streamlines,":[198],"thereby":[199],"establishing":[200],"role":[203],"enhancing":[208],"process.":[212],"Furthermore,":[213],"principle":[215],"transcends":[216],"realm":[218],"design;":[222],"it":[223],"anticipated":[225],"that":[226],"incorporating":[227],"simulations":[230],"designing":[232],"will":[235],"enhance":[236],"overall":[238],"performance.":[240]},"counts_by_year":[],"updated_date":"2026-09-21T07:43:02.447757","created_date":"2024-07-31T00:00:00"}