{"id":"https://openalex.org/W4401016835","doi":"https://doi.org/10.1109/tsm.2024.3434489","title":"Plasma Etching Endpoint Detection in the Presence of Chamber Variations Through Nonlinear Manifold Learning and Density-Based Clustering","display_name":"Plasma Etching Endpoint Detection in the Presence of Chamber Variations Through Nonlinear Manifold Learning and Density-Based Clustering","publication_year":2024,"publication_date":"2024-07-26","ids":{"openalex":"https://openalex.org/W4401016835","doi":"https://doi.org/10.1109/tsm.2024.3434489"},"language":"en","primary_location":{"id":"doi:10.1109/tsm.2024.3434489","doi":"https://doi.org/10.1109/tsm.2024.3434489","is_oa":false,"landing_page_url":"https://doi.org/10.1109/tsm.2024.3434489","pdf_url":null,"source":{"id":"https://openalex.org/S14676311","display_name":"IEEE Transactions on Semiconductor Manufacturing","issn_l":"0894-6507","issn":["0894-6507","1558-2345"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-b","jufo-1","norway-1","poland-70","russia-white-list-1"],"host_organization":"https://openalex.org/P4310320439","host_organization_name":"IEEE Computer Society","host_organization_lineage":["https://openalex.org/P4310320439","https://openalex.org/P4310319808"],"host_organization_lineage_names":["IEEE Computer Society","Institute of Electrical and Electronics Engineers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEEE Transactions on Semiconductor Manufacturing","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5075474731","display_name":"Chae Sun Kim","orcid":"https://orcid.org/0009-0001-2192-6799","observed_orcids":["https://orcid.org/0009-0001-2192-6799"]},"institutions":[{"id":"https://openalex.org/I139264467","display_name":"Seoul National University","ror":"https://ror.org/04h9pn542","country_code":"KR","type":"education","lineage":["https://openalex.org/I139264467"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Chae Sun Kim","raw_affiliation_strings":["School of Chemical and Biological Engineering, Seoul National University, Seoul, Republic of Korea"],"raw_orcid":"https://orcid.org/0009-0001-2192-6799","affiliations":[{"raw_affiliation_string":"School of Chemical and Biological Engineering, Seoul National University, Seoul, Republic of Korea","institution_ids":["https://openalex.org/I139264467"]}]},{"author_position":"middle","author":{"id":null,"display_name":"Hae Rang Roh","orcid":"https://orcid.org/0009-0002-7909-4777","observed_orcids":["https://orcid.org/0009-0002-7909-4777"]},"institutions":[{"id":"https://openalex.org/I139264467","display_name":"Seoul National University","ror":"https://ror.org/04h9pn542","country_code":"KR","type":"education","lineage":["https://openalex.org/I139264467"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Hae Rang Roh","raw_affiliation_strings":["School of Chemical and Biological Engineering, Seoul National University, Seoul, Republic of Korea"],"raw_orcid":"https://orcid.org/0009-0002-7909-4777","affiliations":[{"raw_affiliation_string":"School of Chemical and Biological Engineering, Seoul National University, Seoul, Republic of Korea","institution_ids":["https://openalex.org/I139264467"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5101428269","display_name":"Yongseok Lee","orcid":"https://orcid.org/0009-0009-1510-3575","observed_orcids":["https://orcid.org/0009-0009-1510-3575"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Yongseok Lee","raw_affiliation_strings":["Memory Process Development Team, SEC, Pyeongtaek, Gyeonggi, Republic of Korea"],"raw_orcid":"https://orcid.org/0009-0009-1510-3575","affiliations":[{"raw_affiliation_string":"Memory Process Development Team, SEC, Pyeongtaek, Gyeonggi, Republic of Korea","institution_ids":[]}]},{"author_position":"middle","author":{"id":null,"display_name":"Taekyoon Park","orcid":"https://orcid.org/0000-0002-8273-6817","observed_orcids":["https://orcid.org/0000-0002-8273-6817"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Taekyoon Park","raw_affiliation_strings":["Memory Process Development Team, SEC, Pyeongtaek, Gyeonggi, Republic of Korea"],"raw_orcid":"https://orcid.org/0000-0002-8273-6817","affiliations":[{"raw_affiliation_string":"Memory Process Development Team, SEC, Pyeongtaek, Gyeonggi, Republic of Korea","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5054717637","display_name":"Chanmin Lee","orcid":"https://orcid.org/0000-0003-3606-2943","observed_orcids":["https://orcid.org/0000-0003-3606-2943"]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Chanmin Lee","raw_affiliation_strings":["Memory Process Development Team, SEC, Pyeongtaek, Gyeonggi, Republic of Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Memory Process Development Team, SEC, Pyeongtaek, Gyeonggi, Republic of Korea","institution_ids":[]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5100382860","display_name":"Jong Min Lee","orcid":"https://orcid.org/0000-0001-5395-0067","observed_orcids":["https://orcid.org/0000-0001-5395-0067"]},"institutions":[{"id":"https://openalex.org/I139264467","display_name":"Seoul National University","ror":"https://ror.org/04h9pn542","country_code":"KR","type":"education","lineage":["https://openalex.org/I139264467"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Jong Min Lee","raw_affiliation_strings":["School of Chemical and Biological Engineering, Seoul National University, Seoul, Republic of Korea"],"raw_orcid":"https://orcid.org/0000-0001-5395-0067","affiliations":[{"raw_affiliation_string":"School of Chemical and Biological Engineering, Seoul National University, Seoul, Republic of Korea","institution_ids":["https://openalex.org/I139264467"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":{"value":2495,"currency":"USD","value_usd":2495},"apc_paid":null,"fwci":0.6663,"has_fulltext":false,"cited_by_count":7,"citation_normalized_percentile":{"value":0.59483959,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":96,"max":97},"biblio":{"volume":"37","issue":"4","first_page":"553","last_page":"566"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10781","display_name":"Low-Pressure Plasma Processing and Diagnostics","score":0.9560999870300293,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10781","display_name":"Low-Pressure Plasma Processing and Diagnostics","score":0.9560999870300293,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10876","display_name":"Fault Detection and Control Systems","score":0.014800000004470348,"subfield":{"id":"https://openalex.org/subfields/2207","display_name":"Control and Systems Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11854","display_name":"Laser-induced spectroscopy and plasma","score":0.006200000178068876,"subfield":{"id":"https://openalex.org/subfields/1607","display_name":"Spectroscopy"},"field":{"id":"https://openalex.org/fields/16","display_name":"Chemistry"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/plasma-etching","display_name":"plasma etching","score":0.8289999961853027},{"id":"https://openalex.org/keywords/endpoint-detection","display_name":"endpoint detection","score":0.9909999966621399},{"id":"https://openalex.org/keywords/optical-emission-spectroscopy","display_name":"optical emission spectroscopy","score":0.9259999990463257},{"id":"https://openalex.org/keywords/nonlinear-manifold-learning","display_name":"nonlinear manifold learning","score":0.9399999976158142},{"id":"https://openalex.org/keywords/density-based-clustering","display_name":"density-based clustering","score":0.9660000205039978},{"id":"https://openalex.org/keywords/time-series-clustering","display_name":"time series clustering","score":0.7609999775886536},{"id":"https://openalex.org/keywords/latent-variable-extraction","display_name":"latent variable extraction","score":0.7049999833106995},{"id":"https://openalex.org/keywords/low-signal-to-noise-ratio","display_name":"low signal-to-noise ratio","score":0.7450000047683716},{"id":"https://openalex.org/keywords/wafer-fabrication","display_name":"wafer fabrication","score":0.4779999852180481}],"concepts":[{"id":"https://openalex.org/C73555534","wikidata":"https://www.wikidata.org/wiki/Q622825","display_name":"Cluster analysis","level":2,"score":0.6493341326713562},{"id":"https://openalex.org/C100460472","wikidata":"https://www.wikidata.org/wiki/Q2368605","display_name":"Etching (microfabrication)","level":3,"score":0.5927305817604065},{"id":"https://openalex.org/C158622935","wikidata":"https://www.wikidata.org/wiki/Q660848","display_name":"Nonlinear system","level":2,"score":0.5824281573295593},{"id":"https://openalex.org/C107187091","wikidata":"https://www.wikidata.org/wiki/Q2392011","display_name":"Plasma etching","level":4,"score":0.5484106540679932},{"id":"https://openalex.org/C82706917","wikidata":"https://www.wikidata.org/wiki/Q10251","display_name":"Plasma","level":2,"score":0.49542391300201416},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.45367854833602905},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.3663322329521179},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.3663265109062195},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.3064771890640259},{"id":"https://openalex.org/C154945302","wikidata":"https://www.wikidata.org/wiki/Q11660","display_name":"Artificial intelligence","level":1,"score":0.29624611139297485},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.25179535150527954},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.13173168897628784},{"id":"https://openalex.org/C185544564","wikidata":"https://www.wikidata.org/wiki/Q81197","display_name":"Nuclear physics","level":1,"score":0.11660605669021606},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.10681870579719543}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1109/tsm.2024.3434489","doi":"https://doi.org/10.1109/tsm.2024.3434489","is_oa":false,"landing_page_url":"https://doi.org/10.1109/tsm.2024.3434489","pdf_url":null,"source":{"id":"https://openalex.org/S14676311","display_name":"IEEE Transactions on Semiconductor Manufacturing","issn_l":"0894-6507","issn":["0894-6507","1558-2345"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-b","jufo-1","norway-1","poland-70","russia-white-list-1"],"host_organization":"https://openalex.org/P4310320439","host_organization_name":"IEEE Computer Society","host_organization_lineage":["https://openalex.org/P4310320439","https://openalex.org/P4310319808"],"host_organization_lineage_names":["IEEE Computer Society","Institute of Electrical and Electronics Engineers"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"IEEE Transactions on Semiconductor Manufacturing","raw_type":"journal-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320332195","display_name":"Samsung","ror":"https://ror.org/04w3jy968"}],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":31,"referenced_works":["https://openalex.org/W1514578016","https://openalex.org/W1554467055","https://openalex.org/W1559761469","https://openalex.org/W1592019636","https://openalex.org/W1673310716","https://openalex.org/W1727847349","https://openalex.org/W1969852806","https://openalex.org/W1975154087","https://openalex.org/W1978725199","https://openalex.org/W2001141328","https://openalex.org/W2010138237","https://openalex.org/W2030139870","https://openalex.org/W2034832508","https://openalex.org/W2079663909","https://openalex.org/W2113597159","https://openalex.org/W2150697970","https://openalex.org/W2307523853","https://openalex.org/W2322230926","https://openalex.org/W2324908298","https://openalex.org/W2330200752","https://openalex.org/W2334179567","https://openalex.org/W2517333941","https://openalex.org/W2532642557","https://openalex.org/W2573623157","https://openalex.org/W2786672974","https://openalex.org/W2970706158","https://openalex.org/W3006059575","https://openalex.org/W3022604663","https://openalex.org/W4360618554","https://openalex.org/W4384284052","https://openalex.org/W4387338919"],"related_works":["https://openalex.org/W4415961221","https://openalex.org/W4384284052","https://openalex.org/W2322230926","https://openalex.org/W2330200752","https://openalex.org/W2334179567","https://openalex.org/W2011632413","https://openalex.org/W1978725199","https://openalex.org/W1514578016","https://openalex.org/W4412444762","https://openalex.org/W2032137128"],"abstract_inverted_index":{"The":[0,72,104],"consistent":[1],"decrease":[2],"in":[3,24],"the":[4,76,89,92,117,120,128,141,156,168,192,195],"open":[5],"ratio":[6],"of":[7,40,119,127,171,194],"wafers":[8],"has":[9],"spurred":[10],"a":[11,33,60,67],"demand":[12],"for":[13,122,178,184],"advanced":[14],"endpoint":[15,41],"detection":[16,39,189],"(EPD)":[17],"techniques":[18],"to":[19,78,94,96],"ensure":[20],"accurate":[21],"plasma":[22,47,112,169],"etching":[23],"nonlinear":[25,61,85],"optical":[26],"emission":[27],"spectroscopy":[28],"(OES)":[29],"data":[30,135],"characterized":[31],"by":[32,44],"low":[34],"signal-to-noise":[35],"ratio.":[36],"Additionally,":[37],"precise":[38],"is":[42],"hindered":[43],"variations":[45,164],"between":[46],"chambers":[48],"arising":[49],"from":[50,83,136],"diverse":[51,151,185],"issues.":[52],"To":[53],"address":[54],"these":[55],"issues,":[56],"this":[57],"study":[58],"proposes":[59],"manifold":[62],"learning-based":[63],"EPD":[64,73,142,176],"model":[65,74,90,143],"and":[66,165],"chamber":[68,105,157,196],"condition":[69,106,158,163,170,197],"identification":[70,107,159,198],"framework.":[71],"demonstrates":[75],"capability":[77],"extract":[79],"endpoint-related":[80],"latent":[81],"variables":[82],"complex":[84],"OES":[86,134],"data.":[87,173],"Moreover,":[88,174],"exhibits":[91],"ability":[93],"generalize":[95],"larger":[97],"datasets":[98],"through":[99],"density-based":[100],"time":[101],"series":[102],"clustering.":[103],"framework":[108],"not":[109],"only":[110],"classifies":[111],"conditions":[113,121,180,186],"but":[114],"also":[115],"automates":[116],"determination":[118],"incoming":[123],"new":[124,172],"wafers.":[125],"Evaluation":[126],"proposed":[129],"approach,":[130],"conducted":[131],"using":[132],"actual":[133],"multiple":[137],"chambers,":[138],"demonstrated":[139,187],"that":[140],"outperformed":[144],"other":[145],"models":[146],"which":[147],"are":[148],"based":[149],"on":[150],"dimensionality":[152],"reduction":[153],"approaches.":[154],"Furthermore,":[155],"process":[160],"successfully":[161],"identified":[162],"accurately":[166],"determined":[167],"conducting":[175],"modeling":[177],"separate":[179],"rather":[181],"than":[182],"collectively":[183],"superior":[188],"results,":[190],"underscoring":[191],"importance":[193],"process.":[199]},"counts_by_year":[{"year":2026,"cited_by_count":3},{"year":2025,"cited_by_count":4}],"updated_date":"2026-11-04T10:54:05.112534","created_date":"2024-07-27T00:00:00"}