{"id":"https://openalex.org/W4394602245","doi":"https://doi.org/10.1117/12.3012410","title":"Exploring EUV scanner design options enabled by free electron laser sources","display_name":"Exploring EUV scanner design options enabled by free electron laser sources","publication_year":2024,"publication_date":"2024-04-09","ids":{"openalex":"https://openalex.org/W4394602245","doi":"https://doi.org/10.1117/12.3012410"},"language":"en","primary_location":{"id":"doi:10.1117/12.3012410","doi":"https://doi.org/10.1117/12.3012410","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.3012410","pdf_url":null,"source":{"id":"https://openalex.org/S7407106495","display_name":"SPIE Optical and EUV Nanolithography","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Optical and EUV Nanolithography XXXVII","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5053727858","display_name":"Thomas V. Pistor","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":true,"raw_author_name":"Thomas V. Pistor","raw_affiliation_strings":["Panoramic Technology Inc. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Panoramic Technology Inc. (United States)","institution_ids":[]}]}],"institutions":[],"countries_distinct_count":0,"institutions_distinct_count":0,"corresponding_author_ids":["https://openalex.org/A5053727858"],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":4.0841,"has_fulltext":false,"cited_by_count":6,"citation_normalized_percentile":{"value":0.94549114,"is_in_top_1_percent":false,"is_in_top_10_percent":true},"cited_by_percentile_year":{"min":95,"max":97},"biblio":{"volume":null,"issue":null,"first_page":"42","last_page":"42"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9984999895095825,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9984999895095825,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11183","display_name":"Advanced X-ray Imaging Techniques","score":0.00019999999494757503,"subfield":{"id":"https://openalex.org/subfields/3108","display_name":"Radiation"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","score":0.00019999999494757503,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/euv-lithography","display_name":"EUV lithography","score":0.7559999823570251},{"id":"https://openalex.org/keywords/free-electron-laser","display_name":"free-electron laser","score":0.8320000171661377},{"id":"https://openalex.org/keywords/polarization","display_name":"polarization","score":0.5220000147819519},{"id":"https://openalex.org/keywords/laser-produced-plasma","display_name":"laser-produced plasma","score":0.7379999756813049},{"id":"https://openalex.org/keywords/optical-proximity-correction","display_name":"optical proximity correction","score":0.9639999866485596},{"id":"https://openalex.org/keywords/source-optimization","display_name":"source optimization","score":0.8889999985694885},{"id":"https://openalex.org/keywords/process-window","display_name":"process window","score":0.6129999756813049},{"id":"https://openalex.org/keywords/line-and-space-patterns","display_name":"line/space patterning","score":0.6510000228881836},{"id":"https://openalex.org/keywords/high-numerical-aperture","display_name":"high numerical aperture","score":0.49000000953674316}],"concepts":[{"id":"https://openalex.org/C162996421","wikidata":"https://www.wikidata.org/wiki/Q371965","display_name":"Extreme ultraviolet lithography","level":2,"score":0.9184880256652832},{"id":"https://openalex.org/C2775876984","wikidata":"https://www.wikidata.org/wiki/Q586386","display_name":"Free-electron laser","level":3,"score":0.6316277980804443},{"id":"https://openalex.org/C520434653","wikidata":"https://www.wikidata.org/wiki/Q38867","display_name":"Laser","level":2,"score":0.5894004106521606},{"id":"https://openalex.org/C2779751349","wikidata":"https://www.wikidata.org/wiki/Q1474480","display_name":"Scanner","level":2,"score":0.5349869132041931},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.4730735719203949},{"id":"https://openalex.org/C141349535","wikidata":"https://www.wikidata.org/wiki/Q1361664","display_name":"Laser scanning","level":3,"score":0.43945956230163574},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.40544137358665466},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.3334704041481018},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.2560645639896393}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.3012410","doi":"https://doi.org/10.1117/12.3012410","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.3012410","pdf_url":null,"source":{"id":"https://openalex.org/S7407106495","display_name":"SPIE Optical and EUV Nanolithography","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Optical and EUV Nanolithography XXXVII","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":7,"referenced_works":["https://openalex.org/W2023368292","https://openalex.org/W2116442482","https://openalex.org/W3183449053","https://openalex.org/W4283448503","https://openalex.org/W4367307934","https://openalex.org/W4388655282","https://openalex.org/W6657388518"],"related_works":["https://openalex.org/W4386860937","https://openalex.org/W4401877279","https://openalex.org/W6906458709","https://openalex.org/W4323305926","https://openalex.org/W7153108223","https://openalex.org/W2765650184","https://openalex.org/W4394598221","https://openalex.org/W2603468217","https://openalex.org/W3156848126","https://openalex.org/W2765886523"],"abstract_inverted_index":{"An":[0],"accelerator-based":[1],"free":[2],"electron":[3],"laser":[4],"(FEL)":[5],"source":[6,54,58,66],"of":[7,34,74,116],"13.5nm":[8],"light":[9,18,31,47,119],"can,":[10],"among":[11],"other":[12],"benefits,":[13],"provide":[14,91],"more":[15],"power,":[16,29],"polarized":[17,30],"and":[19,32,55,65,78,83,93],"no":[20],"out-of-band":[21,35],"radiation.":[22],"This":[23],"paper":[24],"explores":[25],"how":[26],"the":[27,72,114],"extra":[28],"lack":[33],"radiation":[36],"could":[37],"be":[38],"used":[39,69],"in":[40],"future":[41],"scanner":[42,105],"designs.":[43],"The":[44],"differences":[45],"between":[46],"generated":[48],"from":[49],"a":[50,110],"laser-produced":[51],"plasma":[52],"(LPP)":[53],"an":[56],"FEL":[57],"are":[59,68],"discussed.":[60],"Rigorous":[61],"mask":[62],"simulation,":[63],"OPC":[64],"optimization":[67],"to":[70,90],"assess":[71],"impacts":[73],"polarization":[75],"on":[76],"contrast":[77,92],"process":[79,94],"window":[80,95],"for":[81],"lines/spaces":[82],"multiple":[84],"2D":[85],"patterns.":[86],"Polarization":[87],"is":[88,107],"shown":[89],"benefits":[96,115],"at":[97],"half-pitches":[98],"below":[99],"8nm.":[100],"A":[101],"full-field,":[102],"isomorphic,":[103],"0.55NA":[104],"design":[106],"considered":[108],"as":[109],"case":[111],"study":[112],"showcasing":[113],"FEL-based":[117],"EUV":[118],"sources.":[120]},"counts_by_year":[{"year":2026,"cited_by_count":3},{"year":2025,"cited_by_count":3}],"updated_date":"2026-11-07T11:25:07.637180","created_date":"2024-04-10T00:00:00"}