{"id":"https://openalex.org/W4390572339","doi":"https://doi.org/10.26577/phst.2023.v10.i2.03","title":"Influence of the RF magnetron sputtering power on the optical and electrical properties of AZO films","display_name":"Influence of the RF magnetron sputtering power on the optical and electrical properties of AZO films","publication_year":2023,"publication_date":"2023-12-01","ids":{"openalex":"https://openalex.org/W4390572339","doi":"https://doi.org/10.26577/phst.2023.v10.i2.03"},"language":"en","primary_location":{"id":"doi:10.26577/phst.2023.v10.i2.03","doi":"https://doi.org/10.26577/phst.2023.v10.i2.03","is_oa":true,"landing_page_url":"https://doi.org/10.26577/phst.2023.v10.i2.03","pdf_url":"https://phst.kaznu.kz/index.php/journal/article/download/343/266","source":{"id":"https://openalex.org/S4210175327","display_name":"Physical Sciences and Technology","issn_l":"2409-6121","issn":["2409-6121","2522-1361"],"is_oa":true,"is_in_doaj":true,"is_core":false,"listed_in":["doaj"],"host_organization":"https://openalex.org/P4310314845","host_organization_name":"Al-Farabi Kazakh National University","host_organization_lineage":["https://openalex.org/P4310314845"],"host_organization_lineage_names":["Al-Farabi Kazakh National University"],"type":"journal"},"license":"cc-by-nc","license_id":"https://openalex.org/licenses/cc-by-nc","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Physical Sciences and Technology","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref","doaj"],"open_access":{"is_oa":true,"oa_status":"diamond","oa_url":"https://phst.kaznu.kz/index.php/journal/article/download/343/266","any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5049072309","display_name":"Kair Kh. Nussupov","orcid":"https://orcid.org/0000-0001-8200-7510","observed_orcids":["https://orcid.org/0000-0001-8200-7510"]},"institutions":[{"id":"https://openalex.org/I171571821","display_name":"Kazakh-British Technical University","ror":"https://ror.org/01rn0fp76","country_code":"KZ","type":"education","lineage":["https://openalex.org/I171571821"]}],"countries":["KZ"],"is_corresponding":true,"raw_author_name":"Kair Kh Nussupov","raw_affiliation_strings":["Kazakh-British Technical University, Almaty, Kazakhstan"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Kazakh-British Technical University, Almaty, Kazakhstan","institution_ids":["https://openalex.org/I171571821"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":["https://openalex.org/A5049072309"],"corresponding_institution_ids":["https://openalex.org/I171571821"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":true,"cited_by_count":0,"citation_normalized_percentile":{"value":0.0,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"10","issue":"2","first_page":null,"last_page":null},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10090","display_name":"ZnO doping and properties","score":0.9945999979972839,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10090","display_name":"ZnO doping and properties","score":0.9945999979972839,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10623","display_name":"Thin-Film Transistor Technologies","score":0.003599999938160181,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13889","display_name":"Advanced Materials and Semiconductor Technologies","score":0.0003000000142492354,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/azo-thin-films","display_name":"AZO thin films","score":0.9369999766349792},{"id":"https://openalex.org/keywords/aluminum-doped-zinc-oxide","display_name":"Al-doped ZnO","score":0.777999997138977},{"id":"https://openalex.org/keywords/rf-magnetron-sputtering","display_name":"RF magnetron sputtering","score":0.9380000233650208},{"id":"https://openalex.org/keywords/sputtering-power","display_name":"sputtering power","score":0.996999979019165},{"id":"https://openalex.org/keywords/electrical-resistivity","display_name":"electrical resistivity","score":0.9800000190734863},{"id":"https://openalex.org/keywords/hall-mobility","display_name":"Hall mobility","score":0.7850000262260437},{"id":"https://openalex.org/keywords/carrier-concentration","display_name":"carrier concentration","score":0.7590000033378601},{"id":"https://openalex.org/keywords/optical-transmission","display_name":"optical transmission","score":0.7680000066757202},{"id":"https://openalex.org/keywords/crystallite-size","display_name":"crystallite size","score":0.968999981880188},{"id":"https://openalex.org/keywords/substrate-heating","display_name":"substrate heating","score":0.7390000224113464},{"id":"https://openalex.org/keywords/crystallinity","display_name":"crystallinity","score":0.5320000052452087},{"id":"https://openalex.org/keywords/transparent-conducting-oxides","display_name":"transparent conducting oxides","score":0.7620000243186951}],"concepts":[{"id":"https://openalex.org/C61427134","wikidata":"https://www.wikidata.org/wiki/Q847609","display_name":"Sputter deposition","level":4,"score":0.645876944065094},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6411356329917908},{"id":"https://openalex.org/C97892325","wikidata":"https://www.wikidata.org/wiki/Q1621956","display_name":"High-power impulse magnetron sputtering","level":5,"score":0.5859223008155823},{"id":"https://openalex.org/C123408415","wikidata":"https://www.wikidata.org/wiki/Q194154","display_name":"Cavity magnetron","level":4,"score":0.5734540224075317},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.5585485100746155},{"id":"https://openalex.org/C196054291","wikidata":"https://www.wikidata.org/wiki/Q7276624","display_name":"RF power amplifier","level":4,"score":0.5210720300674438},{"id":"https://openalex.org/C163258240","wikidata":"https://www.wikidata.org/wiki/Q25342","display_name":"Power (physics)","level":2,"score":0.5023753643035889},{"id":"https://openalex.org/C22423302","wikidata":"https://www.wikidata.org/wiki/Q898444","display_name":"Sputtering","level":3,"score":0.4596012234687805},{"id":"https://openalex.org/C74064498","wikidata":"https://www.wikidata.org/wiki/Q3396184","display_name":"Radio frequency","level":2,"score":0.428725004196167},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.19644886255264282},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.15460994839668274},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.15145638585090637},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.13983210921287537},{"id":"https://openalex.org/C76155785","wikidata":"https://www.wikidata.org/wiki/Q418","display_name":"Telecommunications","level":1,"score":0.10324302315711975},{"id":"https://openalex.org/C97355855","wikidata":"https://www.wikidata.org/wiki/Q11473","display_name":"Thermodynamics","level":1,"score":0.06017237901687622},{"id":"https://openalex.org/C194257627","wikidata":"https://www.wikidata.org/wiki/Q211554","display_name":"Amplifier","level":3,"score":0.0},{"id":"https://openalex.org/C46362747","wikidata":"https://www.wikidata.org/wiki/Q173431","display_name":"CMOS","level":2,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.26577/phst.2023.v10.i2.03","doi":"https://doi.org/10.26577/phst.2023.v10.i2.03","is_oa":true,"landing_page_url":"https://doi.org/10.26577/phst.2023.v10.i2.03","pdf_url":"https://phst.kaznu.kz/index.php/journal/article/download/343/266","source":{"id":"https://openalex.org/S4210175327","display_name":"Physical Sciences and Technology","issn_l":"2409-6121","issn":["2409-6121","2522-1361"],"is_oa":true,"is_in_doaj":true,"is_core":false,"listed_in":["doaj"],"host_organization":"https://openalex.org/P4310314845","host_organization_name":"Al-Farabi Kazakh National University","host_organization_lineage":["https://openalex.org/P4310314845"],"host_organization_lineage_names":["Al-Farabi Kazakh National University"],"type":"journal"},"license":"cc-by-nc","license_id":"https://openalex.org/licenses/cc-by-nc","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Physical Sciences and Technology","raw_type":"journal-article"},{"id":"pmh:oai:doaj.org/article:7b1155ab05634f39afa1920a69cd90e9","doi":null,"is_oa":false,"landing_page_url":"https://doaj.org/article/7b1155ab05634f39afa1920a69cd90e9","pdf_url":null,"source":{"id":"https://openalex.org/S4306401280","display_name":"DOAJ (DOAJ: Directory of Open Access Journals)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Physical Sciences and Technology, Vol 10, Iss 3-4 (2022)","raw_type":"article"}],"best_oa_location":{"id":"doi:10.26577/phst.2023.v10.i2.03","doi":"https://doi.org/10.26577/phst.2023.v10.i2.03","is_oa":true,"landing_page_url":"https://doi.org/10.26577/phst.2023.v10.i2.03","pdf_url":"https://phst.kaznu.kz/index.php/journal/article/download/343/266","source":{"id":"https://openalex.org/S4210175327","display_name":"Physical Sciences and Technology","issn_l":"2409-6121","issn":["2409-6121","2522-1361"],"is_oa":true,"is_in_doaj":true,"is_core":false,"listed_in":["doaj"],"host_organization":"https://openalex.org/P4310314845","host_organization_name":"Al-Farabi Kazakh National University","host_organization_lineage":["https://openalex.org/P4310314845"],"host_organization_lineage_names":["Al-Farabi Kazakh National University"],"type":"journal"},"license":"cc-by-nc","license_id":"https://openalex.org/licenses/cc-by-nc","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Physical Sciences and Technology","raw_type":"journal-article"},"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":true,"pdf":true},"content_urls":{"pdf":"https://content.openalex.org/works/W4390572339.pdf","grobid_xml":"https://content.openalex.org/works/W4390572339.grobid-xml"},"referenced_works_count":26,"referenced_works":["https://openalex.org/W1965095494","https://openalex.org/W1973436570","https://openalex.org/W2010239483","https://openalex.org/W2060429741","https://openalex.org/W2068563729","https://openalex.org/W2079823166","https://openalex.org/W2095307256","https://openalex.org/W2274484179","https://openalex.org/W2592177150","https://openalex.org/W2740321868","https://openalex.org/W2792337903","https://openalex.org/W2891222561","https://openalex.org/W2892616850","https://openalex.org/W2903243108","https://openalex.org/W2913687405","https://openalex.org/W2945792041","https://openalex.org/W3029551634","https://openalex.org/W4225103674","https://openalex.org/W4250678289","https://openalex.org/W4284958320","https://openalex.org/W4310347512","https://openalex.org/W4317914644","https://openalex.org/W4362471400","https://openalex.org/W4385782027","https://openalex.org/W6600130084","https://openalex.org/W6602811707"],"related_works":["https://openalex.org/W3029551634","https://openalex.org/W1984438616","https://openalex.org/W2997198777","https://openalex.org/W4318464509","https://openalex.org/W2766954702","https://openalex.org/W2621042221","https://openalex.org/W1807641872","https://openalex.org/W2098613777","https://openalex.org/W2469263411","https://openalex.org/W2112366903"],"abstract_inverted_index":{"Thin":[0],"AZO":[1,142],"films":[2,74,91,109,143,179,194],"were":[3,75,92,110,176],"synthesized":[4,144],"using":[5,77,100,127],"radio":[6],"frequency":[7],"magnetron":[8],"sputtering":[9,22],"method":[10,99],"on":[11],"the":[12,27,33,43,54,61,95,101,108,113,132,152,161,169,181,189,193,205,215,218,228],"surface":[13],"of":[14,29,35,53,72,89,107,148,165,173,180,192,204,217,230],"polished":[15],"silicon":[16],"samples":[17],"and":[18,60,69,86,131,155,168],"glass":[19],"slides.":[20],"The":[21,51,67,80,104,121,186],"power":[23,147,197],"was":[24,39,125,139],"varied":[25],"in":[26,112,188,214,227],"range":[28,115],"150\u2013300":[30],"W":[31,150],"with":[32,195],"step":[34],"25W;":[36],"deposition":[37,55,70],"time":[38],"adjusted":[40],"so":[41],"that":[42,141],"film":[44],"thickness":[45,68,183],"remained":[46,65],"equal":[47],"to":[48,118,211,224],"70":[49,184],"nm.":[50,120,185],"rest":[52],"parameters:":[56],"working":[57],"pressure,":[58],"temperature,":[59],"substrate":[62,206],"rotation":[63],"rate,":[64],"unchanged.":[66],"rate":[71],"thin":[73,90],"measured":[76,93,111],"X-ray":[78,128],"reflectometry.":[79],"electrical":[81,154,190],"properties":[82],"(resistivity,":[83],"Hall":[84,102],"mobility":[85,172,229],"charge":[87,171,231],"concentration)":[88],"by":[94,200],"Van":[96],"Der":[97],"Pauw":[98],"effect.":[103],"transmission":[105],"spectra":[106,130],"wavelength":[114],"from":[116],"300":[117,149],"1100":[119],"average":[122],"crystallite":[123],"size":[124],"determined":[126],"diffraction":[129],"Scherrer":[133],"equation.":[134],"As":[135],"a":[136,146,222],"result,":[137],"it":[138],"shown":[140],"at":[145],"have":[151],"best":[153],"optical":[156],"properties.":[157],"At":[158],"this":[159],"power,":[160],"lowest":[162],"resistivity":[163,191],"value":[164],"2.83\u00d710-3":[166],"\u03a9\u2219cm":[167],"maximum":[170],"9.6":[174],"cm2V-1sec-1":[175],"achieved":[177],"for":[178],"same":[182],"decrease":[187],"increasing":[196],"is":[198],"explained":[199],"more":[201],"intense":[202],"heating":[203],"during":[207],"deposition,":[208],"which":[209],"leads":[210],"an":[212,225],"improvement":[213],"crystallinity":[216],"film,":[219],"and,":[220],"as":[221],"consequence,":[223],"increase":[226],"carriers.":[232]},"counts_by_year":[],"updated_date":"2026-11-10T11:39:43.021295","created_date":"2024-01-04T00:00:00"}