{"id":"https://openalex.org/W4389487232","doi":"https://doi.org/10.1117/1.jmm.22.4.049801","title":"Three-dimensional aerial images of periodic patterns and the depth of focus for lines-and-spaces patterns (Erratum)","display_name":"Three-dimensional aerial images of periodic patterns and the depth of focus for lines-and-spaces patterns (Erratum)","publication_year":2023,"publication_date":"2023-12-07","ids":{"openalex":"https://openalex.org/W4389487232","doi":"https://doi.org/10.1117/1.jmm.22.4.049801"},"language":"en","primary_location":{"id":"doi:10.1117/1.jmm.22.4.049801","doi":"https://doi.org/10.1117/1.jmm.22.4.049801","is_oa":true,"landing_page_url":"http://dx.doi.org/10.1117/1.jmm.22.4.049801","pdf_url":"https://www.spiedigitallibrary.org/journals/journal-of-micro-nanopatterning-materials-and-metrology/volume-22/issue-4/049801/Three-dimensional-aerial-images-of-periodic-patterns-and-the-depth/10.1117/1.JMM.22.4.049801.pdf","source":{"id":"https://openalex.org/S4210232087","display_name":"Journal of Micro/Nanopatterning Materials and Metrology","issn_l":"2708-8340","issn":["2708-8340"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","russia-white-list-2"],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Micro/Nanopatterning, Materials, and Metrology","raw_type":"journal-article"},"volume":null,"type":"erratum","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":true,"oa_status":"bronze","oa_url":"https://www.spiedigitallibrary.org/journals/journal-of-micro-nanopatterning-materials-and-metrology/volume-22/issue-4/049801/Three-dimensional-aerial-images-of-periodic-patterns-and-the-depth/10.1117/1.JMM.22.4.049801.pdf","any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5089416152","display_name":"Anthony Yen","orcid":"https://orcid.org/0009-0000-8213-0332","observed_orcids":["https://orcid.org/0009-0000-8213-0332"]},"institutions":[{"id":"https://openalex.org/I927257375","display_name":"ASML (Netherlands)","ror":"https://ror.org/01vxknj13","country_code":"NL","type":"company","lineage":["https://openalex.org/I4210092504","https://openalex.org/I927257375"]}],"countries":["NL"],"is_corresponding":true,"raw_author_name":"Anthony Yen","raw_affiliation_strings":["ASML","ASML Technology Development Center, San Jose, California, United States"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ASML","institution_ids":["https://openalex.org/I927257375"]},{"raw_affiliation_string":"ASML Technology Development Center, San Jose, California, United States","institution_ids":[]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":["https://openalex.org/A5089416152"],"corresponding_institution_ids":["https://openalex.org/I927257375"],"apc_list":null,"apc_paid":null,"fwci":null,"has_fulltext":true,"cited_by_count":0,"citation_normalized_percentile":null,"cited_by_percentile_year":null,"biblio":{"volume":"22","issue":"04","first_page":"1","last_page":"1"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10638","display_name":"Optical measurement and interference techniques","score":0.45339998602867126,"subfield":{"id":"https://openalex.org/subfields/1707","display_name":"Computer Vision and Pattern Recognition"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10638","display_name":"Optical measurement and interference techniques","score":0.45339998602867126,"subfield":{"id":"https://openalex.org/subfields/1707","display_name":"Computer Vision and Pattern Recognition"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T13114","display_name":"Image Processing Techniques and Applications","score":0.25459998846054077,"subfield":{"id":"https://openalex.org/subfields/2214","display_name":"Media Technology"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.11900000274181366,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/periodic-patterns","display_name":"periodic patterns","score":0.9259999990463257},{"id":"https://openalex.org/keywords/depth-of-focus","display_name":"depth of focus","score":0.9679999947547913},{"id":"https://openalex.org/keywords/photolithography","display_name":"photolithography","score":0.6340000033378601},{"id":"https://openalex.org/keywords/numerical-aperture","display_name":"numerical aperture","score":0.5019999742507935}],"concepts":[{"id":"https://openalex.org/C192209626","wikidata":"https://www.wikidata.org/wiki/Q190909","display_name":"Focus (optics)","level":2,"score":0.6773335337638855},{"id":"https://openalex.org/C195766429","wikidata":"https://www.wikidata.org/wiki/Q394","display_name":"Metrology","level":2,"score":0.6445760726928711},{"id":"https://openalex.org/C138331895","wikidata":"https://www.wikidata.org/wiki/Q11650","display_name":"Electronics","level":2,"score":0.49885129928588867},{"id":"https://openalex.org/C2164484","wikidata":"https://www.wikidata.org/wiki/Q5170150","display_name":"Core (optical fiber)","level":2,"score":0.4422793686389923},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.34824371337890625},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.30406731367111206},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.21967682242393494},{"id":"https://openalex.org/C76155785","wikidata":"https://www.wikidata.org/wiki/Q418","display_name":"Telecommunications","level":1,"score":0.15906298160552979},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.1410423219203949},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.11230331659317017}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/1.jmm.22.4.049801","doi":"https://doi.org/10.1117/1.jmm.22.4.049801","is_oa":true,"landing_page_url":"http://dx.doi.org/10.1117/1.jmm.22.4.049801","pdf_url":"https://www.spiedigitallibrary.org/journals/journal-of-micro-nanopatterning-materials-and-metrology/volume-22/issue-4/049801/Three-dimensional-aerial-images-of-periodic-patterns-and-the-depth/10.1117/1.JMM.22.4.049801.pdf","source":{"id":"https://openalex.org/S4210232087","display_name":"Journal of Micro/Nanopatterning Materials and Metrology","issn_l":"2708-8340","issn":["2708-8340"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","russia-white-list-2"],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Micro/Nanopatterning, Materials, and Metrology","raw_type":"journal-article"}],"best_oa_location":{"id":"doi:10.1117/1.jmm.22.4.049801","doi":"https://doi.org/10.1117/1.jmm.22.4.049801","is_oa":true,"landing_page_url":"http://dx.doi.org/10.1117/1.jmm.22.4.049801","pdf_url":"https://www.spiedigitallibrary.org/journals/journal-of-micro-nanopatterning-materials-and-metrology/volume-22/issue-4/049801/Three-dimensional-aerial-images-of-periodic-patterns-and-the-depth/10.1117/1.JMM.22.4.049801.pdf","source":{"id":"https://openalex.org/S4210232087","display_name":"Journal of Micro/Nanopatterning Materials and Metrology","issn_l":"2708-8340","issn":["2708-8340"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-c","russia-white-list-2"],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Journal of Micro/Nanopatterning, Materials, and Metrology","raw_type":"journal-article"},"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":true,"pdf":true},"content_urls":{"pdf":"https://content.openalex.org/works/W4389487232.pdf","grobid_xml":"https://content.openalex.org/works/W4389487232.grobid-xml"},"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W4377024610","https://openalex.org/W1968880778","https://openalex.org/W4254437230","https://openalex.org/W2326066603","https://openalex.org/W2466664926","https://openalex.org/W7006649015","https://openalex.org/W1980077600","https://openalex.org/W2605676231","https://openalex.org/W7152006648","https://openalex.org/W2977139374"],"abstract_inverted_index":{"Erratum":[0],"corrects":[1],"several":[2],"errors":[3],"in":[4],"mathematical":[5],"expressions.":[6]},"counts_by_year":[],"updated_date":"2026-09-25T08:18:29.962427","created_date":"2023-12-09T00:00:00"}