{"id":"https://openalex.org/W4387300908","doi":"https://doi.org/10.1117/12.2677387","title":"Visible meta-optics reality: Volume production enabled by NIL","display_name":"Visible meta-optics reality: Volume production enabled by NIL","publication_year":2023,"publication_date":"2023-10-03","ids":{"openalex":"https://openalex.org/W4387300908","doi":"https://doi.org/10.1117/12.2677387"},"language":"en","primary_location":{"id":"doi:10.1117/12.2677387","doi":"https://doi.org/10.1117/12.2677387","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.2677387","pdf_url":null,"source":{"id":"https://openalex.org/S7407107874","display_name":"Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XX","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5082947116","display_name":"Bradley R. Williams","orcid":"https://orcid.org/0000-0003-1932-0250","observed_orcids":["https://orcid.org/0000-0003-1932-0250"]},"institutions":[{"id":"https://openalex.org/I4210121457","display_name":"Moxtek (United States)","ror":"https://ror.org/02sdyzy02","country_code":"US","type":"company","lineage":["https://openalex.org/I4210121457"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Bradley R. Williams","raw_affiliation_strings":["MOXTEK, Inc. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"MOXTEK, Inc. (United States)","institution_ids":["https://openalex.org/I4210121457"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5069441639","display_name":"Daniel Bacon\u2010Brown","orcid":"https://orcid.org/0000-0001-9079-4761","observed_orcids":["https://orcid.org/0000-0001-9079-4761"]},"institutions":[{"id":"https://openalex.org/I4210121457","display_name":"Moxtek (United States)","ror":"https://ror.org/02sdyzy02","country_code":"US","type":"company","lineage":["https://openalex.org/I4210121457"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Daniel Bacon-Brown","raw_affiliation_strings":["MOXTEK, Inc. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"MOXTEK, Inc. (United States)","institution_ids":["https://openalex.org/I4210121457"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5103646184","display_name":"M. C. George","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210121457","display_name":"Moxtek (United States)","ror":"https://ror.org/02sdyzy02","country_code":"US","type":"company","lineage":["https://openalex.org/I4210121457"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Matthew C. George","raw_affiliation_strings":["MOXTEK, Inc. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"MOXTEK, Inc. (United States)","institution_ids":["https://openalex.org/I4210121457"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5112901111","display_name":"Rumyana V. Petrova","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210121457","display_name":"Moxtek (United States)","ror":"https://ror.org/02sdyzy02","country_code":"US","type":"company","lineage":["https://openalex.org/I4210121457"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Rumyana V. Petrova","raw_affiliation_strings":["MOXTEK, Inc. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"MOXTEK, Inc. (United States)","institution_ids":["https://openalex.org/I4210121457"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5092992794","display_name":"Adam W. Korb","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210121457","display_name":"Moxtek (United States)","ror":"https://ror.org/02sdyzy02","country_code":"US","type":"company","lineage":["https://openalex.org/I4210121457"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Adam W. Korb","raw_affiliation_strings":["MOXTEK, Inc. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"MOXTEK, Inc. (United States)","institution_ids":["https://openalex.org/I4210121457"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5109690796","display_name":"Jamie C. Stocks","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210121457","display_name":"Moxtek (United States)","ror":"https://ror.org/02sdyzy02","country_code":"US","type":"company","lineage":["https://openalex.org/I4210121457"]}],"countries":["US"],"is_corresponding":false,"raw_author_name":"Jamie C. Stocks","raw_affiliation_strings":["MOXTEK, Inc. (United States)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"MOXTEK, Inc. (United States)","institution_ids":["https://openalex.org/I4210121457"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I4210121457"],"apc_list":null,"apc_paid":null,"fwci":0.0,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":{"value":0.0,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":null,"issue":null,"first_page":"17","last_page":"17"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10245","display_name":"Metamaterials and Metasurfaces Applications","score":0.5054000020027161,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10245","display_name":"Metamaterials and Metasurfaces Applications","score":0.5054000020027161,"subfield":{"id":"https://openalex.org/subfields/2504","display_name":"Electronic, Optical and Magnetic Materials"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","score":0.4636000096797943,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.005499999970197678,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/meta-optics","display_name":"meta-optics","score":0.9750000238418579},{"id":"https://openalex.org/keywords/nanoimprint-lithography","display_name":"nanoimprint lithography","score":0.9739999771118164},{"id":"https://openalex.org/keywords/metalens","display_name":"metalenses","score":0.6930000185966492},{"id":"https://openalex.org/keywords/visible-light","display_name":"visible light","score":0.6079999804496765},{"id":"https://openalex.org/keywords/volume-production","display_name":"volume production","score":0.7860000133514404},{"id":"https://openalex.org/keywords/deep-ultraviolet-lithography","display_name":"deep ultraviolet lithography","score":0.7710000276565552},{"id":"https://openalex.org/keywords/process-stability","display_name":"process stability","score":0.75}],"concepts":[{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.7124701738357544},{"id":"https://openalex.org/C20556612","wikidata":"https://www.wikidata.org/wiki/Q4469374","display_name":"Volume (thermodynamics)","level":2,"score":0.6126725077629089},{"id":"https://openalex.org/C2777046567","wikidata":"https://www.wikidata.org/wiki/Q1540138","display_name":"Nanoimprint lithography","level":4,"score":0.6058304309844971},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.559225857257843},{"id":"https://openalex.org/C200274948","wikidata":"https://www.wikidata.org/wiki/Q256845","display_name":"Electron-beam lithography","level":4,"score":0.517623245716095},{"id":"https://openalex.org/C94263209","wikidata":"https://www.wikidata.org/wiki/Q1076175","display_name":"Immersion lithography","level":4,"score":0.4800518751144409},{"id":"https://openalex.org/C105487726","wikidata":"https://www.wikidata.org/wiki/Q622938","display_name":"Photolithography","level":2,"score":0.47369384765625},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.4548095762729645},{"id":"https://openalex.org/C162117346","wikidata":"https://www.wikidata.org/wiki/Q1106386","display_name":"Nanolithography","level":4,"score":0.4497230350971222},{"id":"https://openalex.org/C163581340","wikidata":"https://www.wikidata.org/wiki/Q1983848","display_name":"Next-generation lithography","level":5,"score":0.4378594160079956},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.3705925941467285},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.35579872131347656},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.33979448676109314},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.14948967099189758},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.11087682843208313},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.2677387","doi":"https://doi.org/10.1117/12.2677387","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.2677387","pdf_url":null,"source":{"id":"https://openalex.org/S7407107874","display_name":"Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XX","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W4392717552","https://openalex.org/W4324327983","https://openalex.org/W4392717091","https://openalex.org/W4408724108","https://openalex.org/W4392680490","https://openalex.org/W4360610048","https://openalex.org/W4390059631","https://openalex.org/W7133548241","https://openalex.org/W3190118328","https://openalex.org/W4220959034"],"abstract_inverted_index":{"Meta-optics":[0],"have":[1],"been":[2,40,65,109],"built":[3],"in":[4,22],"lab":[5],"settings":[6],"for":[7,31,37,78,93],"years":[8],"but":[9,25],"not":[10,28,63],"on":[11],"a":[12,74],"commercially":[13],"viable":[14],"scale.":[15],"Using":[16],"electron":[17],"beam":[18],"lithography":[19,83],"works":[20],"well":[21],"the":[23,43,46,90,105],"lab,":[24],"this":[26,53,70],"is":[27,102],"an":[29],"option":[30],"volume":[32,60,75,98],"manufacturing.":[33],"Patterning":[34],"subwavelength":[35],"meta-atom":[36],"visible":[38,58,79,94],"has":[39,62,68,108],"just":[41],"beyond":[42],"capabilities":[44],"of":[45,100],"high-volume":[47],"deep":[48],"UV":[49],"lithography.":[50],"Due":[51],"to":[52,88],"patterning":[54,106],"barrier,":[55],"entry":[56],"into":[57],"meta-optic":[59],"manufacturing":[61,99],"yet":[64],"possible.":[66],"Moxtek":[67],"overcome":[69],"barrier":[71,107],"and":[72,104],"established":[73],"process":[76,91],"line":[77,92],"meta-optics":[80],"utilizing":[81],"nanoimprint":[82],"(NIL).":[84],"Process":[85],"stability":[86],"data":[87],"qualify":[89],"meta-optics,":[95],"confirms":[96],"that":[97],"metalenses":[101],"possible":[103],"removed.":[110]},"counts_by_year":[],"updated_date":"2026-10-28T10:33:24.094632","created_date":"2023-10-04T00:00:00"}