{"id":"https://openalex.org/W4377096428","doi":"https://doi.org/10.1149/11101.0041ecst","title":"Aluminum Josephson Junction Formation on 200mm Wafers Using Different Oxidation Techniques","display_name":"Aluminum Josephson Junction Formation on 200mm Wafers Using Different Oxidation Techniques","publication_year":2023,"publication_date":"2023-05-19","ids":{"openalex":"https://openalex.org/W4377096428","doi":"https://doi.org/10.1149/11101.0041ecst"},"language":"en","primary_location":{"id":"doi:10.1149/11101.0041ecst","doi":"https://doi.org/10.1149/11101.0041ecst","is_oa":false,"landing_page_url":"https://doi.org/10.1149/11101.0041ecst","pdf_url":null,"source":{"id":"https://openalex.org/S4210205149","display_name":"ECS Transactions","issn_l":"1938-5862","issn":["1938-5862","1938-6737","2151-2051"],"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":["norway-1","poland-20"],"host_organization":"https://openalex.org/P4310311669","host_organization_name":"Institute of Physics","host_organization_lineage":["https://openalex.org/P4310311669"],"host_organization_lineage_names":["Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"ECS Transactions","raw_type":"journal-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":true,"oa_status":"green","oa_url":"https://publica.fraunhofer.de/handle/publica/452449","any_repository_has_fulltext":true},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5101514643","display_name":"Simon Lang","orcid":"https://orcid.org/0000-0003-4371-0654","observed_orcids":["https://orcid.org/0000-0003-4371-0654"]},"institutions":[{"id":"https://openalex.org/I4210128143","display_name":"Fraunhofer Research Institution for Microsystems and Solid State Technologies","ror":"https://ror.org/02hm5m482","country_code":"DE","type":"facility","lineage":["https://openalex.org/I4210128143","https://openalex.org/I4923324"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Simon Lang","raw_affiliation_strings":["FhG EMFT"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"FhG EMFT","institution_ids":["https://openalex.org/I4210128143"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5091980614","display_name":"Alexandra Schewski","orcid":"https://orcid.org/0009-0009-2681-118X","observed_orcids":["https://orcid.org/0009-0009-2681-118X"]},"institutions":[{"id":"https://openalex.org/I4210128143","display_name":"Fraunhofer Research Institution for Microsystems and Solid State Technologies","ror":"https://ror.org/02hm5m482","country_code":"DE","type":"facility","lineage":["https://openalex.org/I4210128143","https://openalex.org/I4923324"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Alexandra Schewski","raw_affiliation_strings":["FhG EMFT"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"FhG EMFT","institution_ids":["https://openalex.org/I4210128143"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5001167141","display_name":"I. Eisele","orcid":"https://orcid.org/0009-0002-9432-6097","observed_orcids":["https://orcid.org/0009-0002-9432-6097"]},"institutions":[{"id":"https://openalex.org/I4210128143","display_name":"Fraunhofer Research Institution for Microsystems and Solid State Technologies","ror":"https://ror.org/02hm5m482","country_code":"DE","type":"facility","lineage":["https://openalex.org/I4210128143","https://openalex.org/I4923324"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Ignaz Eisele","raw_affiliation_strings":["FhG EMFT"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"FhG EMFT","institution_ids":["https://openalex.org/I4210128143"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5004211018","display_name":"Christoph Kutter","orcid":"https://orcid.org/0000-0002-9605-1878","observed_orcids":["https://orcid.org/0000-0002-9605-1878"]},"institutions":[{"id":"https://openalex.org/I4210128143","display_name":"Fraunhofer Research Institution for Microsystems and Solid State Technologies","ror":"https://ror.org/02hm5m482","country_code":"DE","type":"facility","lineage":["https://openalex.org/I4210128143","https://openalex.org/I4923324"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Christoph Kutter","raw_affiliation_strings":["FhG EMFT"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"FhG EMFT","institution_ids":["https://openalex.org/I4210128143"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5109225422","display_name":"Wilfried Lerch","orcid":"https://orcid.org/0009-0009-9739-1469","observed_orcids":["https://orcid.org/0009-0009-9739-1469"]},"institutions":[{"id":"https://openalex.org/I4210128143","display_name":"Fraunhofer Research Institution for Microsystems and Solid State Technologies","ror":"https://ror.org/02hm5m482","country_code":"DE","type":"facility","lineage":["https://openalex.org/I4210128143","https://openalex.org/I4923324"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Wilfried Lerch","raw_affiliation_strings":["FhG EMFT"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"FhG EMFT","institution_ids":["https://openalex.org/I4210128143"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":1,"corresponding_author_ids":[],"corresponding_institution_ids":["https://openalex.org/I4210128143"],"apc_list":null,"apc_paid":null,"fwci":2.2595,"has_fulltext":false,"cited_by_count":5,"citation_normalized_percentile":{"value":0.87159679,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":93,"max":97},"biblio":{"volume":"111","issue":"1","first_page":"41","last_page":"52"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.8159000277519226,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.8159000277519226,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11803","display_name":"Superconducting and THz Device Technology","score":0.06729999929666519,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10020","display_name":"Quantum Information and Cryptography","score":0.017799999564886093,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/al-alox-al-junctions","display_name":"Al/AlOx/Al junctions","score":0.871999979019165},{"id":"https://openalex.org/keywords/static-oxidation","display_name":"static oxidation","score":0.7839999794960022},{"id":"https://openalex.org/keywords/plasma-oxidation","display_name":"plasma oxidation","score":0.9319999814033508},{"id":"https://openalex.org/keywords/hydrogen-plasma","display_name":"hydrogen plasma","score":0.6740000247955322},{"id":"https://openalex.org/keywords/native-oxide-removal","display_name":"native oxide removal","score":0.6690000295639038},{"id":"https://openalex.org/keywords/ion-milling","display_name":"ion beam etching","score":0.7409999966621399},{"id":"https://openalex.org/keywords/oxide-thickness","display_name":"oxide thickness","score":0.5450000166893005},{"id":"https://openalex.org/keywords/qubit-fabrication","display_name":"qubit fabrication","score":0.7039999961853027},{"id":"https://openalex.org/keywords/200-mm-wafers","display_name":"200 mm wafers","score":0.9520000219345093},{"id":"https://openalex.org/keywords/quantum-circuits","display_name":"quantum circuits","score":0.5370000004768372}],"concepts":[{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.7356152534484863},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6054466366767883},{"id":"https://openalex.org/C513153333","wikidata":"https://www.wikidata.org/wiki/Q663","display_name":"Aluminium","level":2,"score":0.5927239060401917},{"id":"https://openalex.org/C2779851234","wikidata":"https://www.wikidata.org/wiki/Q50690","display_name":"Oxide","level":2,"score":0.5645660161972046},{"id":"https://openalex.org/C82706917","wikidata":"https://www.wikidata.org/wiki/Q10251","display_name":"Plasma","level":2,"score":0.5028488039970398},{"id":"https://openalex.org/C12038964","wikidata":"https://www.wikidata.org/wiki/Q764228","display_name":"Josephson effect","level":3,"score":0.5003936290740967},{"id":"https://openalex.org/C120398109","wikidata":"https://www.wikidata.org/wiki/Q175751","display_name":"Quantum tunnelling","level":2,"score":0.46714115142822266},{"id":"https://openalex.org/C18762648","wikidata":"https://www.wikidata.org/wiki/Q42213","display_name":"Work (physics)","level":2,"score":0.44367364048957825},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.3544459342956543},{"id":"https://openalex.org/C54101563","wikidata":"https://www.wikidata.org/wiki/Q124131","display_name":"Superconductivity","level":2,"score":0.2217806577682495},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.19351297616958618},{"id":"https://openalex.org/C26873012","wikidata":"https://www.wikidata.org/wiki/Q214781","display_name":"Condensed matter physics","level":1,"score":0.09892332553863525},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C78519656","wikidata":"https://www.wikidata.org/wiki/Q101333","display_name":"Mechanical engineering","level":1,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1149/11101.0041ecst","doi":"https://doi.org/10.1149/11101.0041ecst","is_oa":false,"landing_page_url":"https://doi.org/10.1149/11101.0041ecst","pdf_url":null,"source":{"id":"https://openalex.org/S4210205149","display_name":"ECS Transactions","issn_l":"1938-5862","issn":["1938-5862","1938-6737","2151-2051"],"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":["norway-1","poland-20"],"host_organization":"https://openalex.org/P4310311669","host_organization_name":"Institute of Physics","host_organization_lineage":["https://openalex.org/P4310311669"],"host_organization_lineage_names":["Institute of Physics"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"ECS Transactions","raw_type":"journal-article"},{"id":"pmh:oai:publica.fraunhofer.de:publica/452449","doi":null,"is_oa":true,"landing_page_url":"https://publica.fraunhofer.de/handle/publica/452449","pdf_url":null,"source":{"id":"https://openalex.org/S4306400318","display_name":"Fraunhofer-Publica (Fraunhofer-Gesellschaft)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I4923324","host_organization_name":"Fraunhofer-Gesellschaft","host_organization_lineage":["https://openalex.org/I4923324"],"host_organization_lineage_names":[],"type":"repository"},"license":"cc-by-nc","license_id":"https://openalex.org/licenses/cc-by-nc","version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":null,"raw_type":"conference paper"}],"best_oa_location":{"id":"pmh:oai:publica.fraunhofer.de:publica/452449","doi":null,"is_oa":true,"landing_page_url":"https://publica.fraunhofer.de/handle/publica/452449","pdf_url":null,"source":{"id":"https://openalex.org/S4306400318","display_name":"Fraunhofer-Publica (Fraunhofer-Gesellschaft)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I4923324","host_organization_name":"Fraunhofer-Gesellschaft","host_organization_lineage":["https://openalex.org/I4923324"],"host_organization_lineage_names":[],"type":"repository"},"license":"cc-by-nc","license_id":"https://openalex.org/licenses/cc-by-nc","version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":null,"raw_type":"conference paper"},"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W4386854110","https://openalex.org/W3024531883","https://openalex.org/W7163586266","https://openalex.org/W2271152630","https://openalex.org/W1975470662","https://openalex.org/W2982515008","https://openalex.org/W4385854554","https://openalex.org/W2121585532","https://openalex.org/W4285019982","https://openalex.org/W2241468574"],"abstract_inverted_index":{"This":[0,118],"work":[1,119],"focuses":[2],"on":[3,99,126],"the":[4,25,28,49,60,105,110],"manufacturing":[5,125],"of":[6,15,27,109],"Al/AlOx/Al":[7],"Josephson":[8],"junctions":[9],"(JJs),":[10],"which":[11],"are":[12],"essential":[13],"components":[14],"many":[16],"quantum":[17],"circuits.":[18],"Two":[19],"processes":[20],"were":[21,97],"studied":[22],"to":[23,90],"understand":[24],"oxidation":[26,32,64],"aluminum":[29,111],"surface.":[30],"Static":[31],"was":[33,65],"performed":[34,66],"by":[35,53,67,76],"removing":[36,68],"native":[37,69],"AlOx":[38,70],"in":[39,59],"a":[40,55,72,77,132],"cluster":[41],"system":[42],"with":[43,71,80,131],"Ar-ion":[44],"beam":[45],"milling":[46],"and":[47,93,107,113],"controlling":[48],"final":[50],"tunneling":[51],"oxide":[52],"applying":[54],"specific":[56],"O2":[57],"pressure":[58],"chamber.":[61],"Controlled":[62],"plasma":[63,74],"H2":[73],"followed":[75],"defined":[78],"reoxidation":[79],"an":[81],"oxygen":[82],"plasma.":[83],"The":[84],"resulting":[85],"oxides":[86,112],"had":[87],"thicknesses":[88],"up":[89],"10":[91],"nm":[92],"their":[94,114],"electrical":[95],"properties":[96],"analyzed":[98],"wafer":[100],"level,":[101],"providing":[102],"insight":[103],"into":[104],"structure":[106],"composition":[108],"applicability":[115],"for":[116,122],"Qubits.":[117],"is":[120],"crucial":[121],"reliable":[123],"industrial":[124],"full-scale":[127],"200":[128],"mm":[129],"wafers":[130],"very":[133],"high":[134],"uniformity":[135],"level.":[136]},"counts_by_year":[{"year":2026,"cited_by_count":3},{"year":2025,"cited_by_count":2}],"updated_date":"2026-11-07T11:25:07.637180","created_date":"2023-05-20T00:00:00"}