{"id":"https://openalex.org/W4367548841","doi":"https://doi.org/10.1117/12.2658440","title":"The potential of e-beam lithography for micro- and nano-optics on large areas","display_name":"The potential of e-beam lithography for micro- and nano-optics on large areas","publication_year":2023,"publication_date":"2023-04-30","ids":{"openalex":"https://openalex.org/W4367548841","doi":"https://doi.org/10.1117/12.2658440"},"language":"en","primary_location":{"id":"doi:10.1117/12.2658440","doi":"https://doi.org/10.1117/12.2658440","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.2658440","pdf_url":null,"source":{"id":"https://openalex.org/S7407087263","display_name":"SPIE Novel Patterning Technologies","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Novel Patterning Technologies 2023","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5007755364","display_name":"Uwe Detlef Zeitner","orcid":"https://orcid.org/0000-0002-3980-6971","observed_orcids":["https://orcid.org/0000-0002-3980-6971"]},"institutions":[{"id":"https://openalex.org/I4210115660","display_name":"Fraunhofer Institute for Applied Optics and Precision Engineering","ror":"https://ror.org/02afjh072","country_code":"DE","type":"facility","lineage":["https://openalex.org/I4210115660","https://openalex.org/I4923324"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Uwe D. Zeitner","raw_affiliation_strings":["Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)","Univ. of Applied Sciences (Germany)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)","institution_ids":["https://openalex.org/I4210115660"]},{"raw_affiliation_string":"Univ. of Applied Sciences (Germany)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5085081616","display_name":"Michael Banasch","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210126143","display_name":"Vistec Electron Beam (Germany)","ror":"https://ror.org/02yxqev59","country_code":"DE","type":"company","lineage":["https://openalex.org/I4210126143"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Michael Banasch","raw_affiliation_strings":["Vistec Electron Beam GmbH (Germany)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Vistec Electron Beam GmbH (Germany)","institution_ids":["https://openalex.org/I4210126143"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5043755398","display_name":"Marcus Trost","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4210115660","display_name":"Fraunhofer Institute for Applied Optics and Precision Engineering","ror":"https://ror.org/02afjh072","country_code":"DE","type":"facility","lineage":["https://openalex.org/I4210115660","https://openalex.org/I4923324"]}],"countries":["DE"],"is_corresponding":false,"raw_author_name":"Marcus Trost","raw_affiliation_strings":["Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)","institution_ids":["https://openalex.org/I4210115660"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.9038,"has_fulltext":false,"cited_by_count":2,"citation_normalized_percentile":{"value":0.62855538,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":93},"biblio":{"volume":null,"issue":null,"first_page":"4","last_page":"4"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9984999895095825,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11338","display_name":"Advancements in Photolithography Techniques","score":0.9984999895095825,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12224","display_name":"Nanofabrication and Lithography Techniques","score":0.0006000000284984708,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11517","display_name":"Advanced optical system design","score":0.00019999999494757503,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/electron-beam-lithography","display_name":"electron beam lithography","score":0.9900000095367432},{"id":"https://openalex.org/keywords/character-projection","display_name":"character projection","score":0.9309999942779541},{"id":"https://openalex.org/keywords/optical-nanostructures","display_name":"optical nanostructures","score":0.75},{"id":"https://openalex.org/keywords/micro-optics","display_name":"micro-optics","score":0.7429999709129333},{"id":"https://openalex.org/keywords/large-area-patterning","display_name":"large-area patterning","score":0.6890000104904175},{"id":"https://openalex.org/keywords/diffraction-gratings","display_name":"diffraction gratings","score":0.8040000200271606},{"id":"https://openalex.org/keywords/ultrashort-laser-pulses","display_name":"ultrashort laser pulses","score":0.8669999837875366},{"id":"https://openalex.org/keywords/spectrometer","display_name":"spectrometer","score":0.7599999904632568},{"id":"https://openalex.org/keywords/computer-generated-holograms","display_name":"computer-generated holograms","score":0.875},{"id":"https://openalex.org/keywords/optical-metamaterials","display_name":"optical metamaterials","score":0.8460000157356262}],"concepts":[{"id":"https://openalex.org/C204223013","wikidata":"https://www.wikidata.org/wiki/Q133036","display_name":"Lithography","level":2,"score":0.6990512013435364},{"id":"https://openalex.org/C121524040","wikidata":"https://www.wikidata.org/wiki/Q11942175","display_name":"Polarizer","level":3,"score":0.6975839734077454},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.6581354141235352},{"id":"https://openalex.org/C187590223","wikidata":"https://www.wikidata.org/wiki/Q527628","display_name":"Holography","level":2,"score":0.6010473370552063},{"id":"https://openalex.org/C200274948","wikidata":"https://www.wikidata.org/wiki/Q256845","display_name":"Electron-beam lithography","level":4,"score":0.5997456908226013},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.5939251184463501},{"id":"https://openalex.org/C41794268","wikidata":"https://www.wikidata.org/wiki/Q1408939","display_name":"X-ray lithography","level":4,"score":0.44728487730026245},{"id":"https://openalex.org/C137905882","wikidata":"https://www.wikidata.org/wiki/Q6783445","display_name":"Maskless lithography","level":5,"score":0.4411023259162903},{"id":"https://openalex.org/C2780357685","wikidata":"https://www.wikidata.org/wiki/Q154357","display_name":"Nano-","level":2,"score":0.4311069846153259},{"id":"https://openalex.org/C163581340","wikidata":"https://www.wikidata.org/wiki/Q1983848","display_name":"Next-generation lithography","level":5,"score":0.4228243827819824},{"id":"https://openalex.org/C70520399","wikidata":"https://www.wikidata.org/wiki/Q7607503","display_name":"Stencil lithography","level":5,"score":0.4191593527793884},{"id":"https://openalex.org/C162996421","wikidata":"https://www.wikidata.org/wiki/Q371965","display_name":"Extreme ultraviolet lithography","level":2,"score":0.4121840000152588},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.3533525764942169},{"id":"https://openalex.org/C53524968","wikidata":"https://www.wikidata.org/wiki/Q7315582","display_name":"Resist","level":3,"score":0.3062080442905426},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.29392868280410767},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.14933013916015625},{"id":"https://openalex.org/C125743686","wikidata":"https://www.wikidata.org/wiki/Q108779","display_name":"Birefringence","level":2,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1117/12.2658440","doi":"https://doi.org/10.1117/12.2658440","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.2658440","pdf_url":null,"source":{"id":"https://openalex.org/S7407087263","display_name":"SPIE Novel Patterning Technologies","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"conference"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Novel Patterning Technologies 2023","raw_type":"proceedings-article"},{"id":"pmh:oai:publica.fraunhofer.de:publica/450550","doi":null,"is_oa":false,"landing_page_url":"https://publica.fraunhofer.de/handle/publica/450550","pdf_url":null,"source":{"id":"https://openalex.org/S4306400318","display_name":"Fraunhofer-Publica (Fraunhofer-Gesellschaft)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I4923324","host_organization_name":"Fraunhofer-Gesellschaft","host_organization_lineage":["https://openalex.org/I4923324"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":null,"raw_type":"conference paper"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W4380449738","https://openalex.org/W2090197276","https://openalex.org/W2765766932","https://openalex.org/W7132105047","https://openalex.org/W2300573043","https://openalex.org/W2068369088","https://openalex.org/W6962591718","https://openalex.org/W1978589962","https://openalex.org/W2002873055","https://openalex.org/W2003223937"],"abstract_inverted_index":{"The":[0,41],"availability":[1],"of":[2,30,36,50],"high-resolution":[3],"and":[4,20,48,54],"high":[5,80],"throughput":[6],"lithographic":[7],"fabrication":[8],"technologies":[9],"such":[10],"as":[11,71,73],"electron-beam":[12],"lithography":[13],"based":[14],"on":[15],"Variable":[16],"Shaped":[17],"Beam":[18],"writing":[19],"Character":[21],"Projection":[22],"opens":[23],"the":[24,27,37,44],"way":[25],"for":[26,34,67,75,86],"flexible":[28],"use":[29],"various":[31,89],"optical":[32,65,90],"nano-structures":[33,66],"some":[35],"most":[38],"demanding":[39],"applications.":[40],"paper":[42],"discusses":[43],"technical":[45],"features,":[46],"advantages,":[47],"limitations":[49],"these":[51],"pattering":[52],"approaches":[53],"will":[55],"show":[56],"how":[57],"they":[58],"can":[59],"favorably":[60],"be":[61],"combined":[62],"to":[63],"realize":[64],"applications,":[68],"which":[69],"are":[70],"diverse":[72],"gratings":[74],"ultra-short":[76],"laser":[77],"pulses":[78],"or":[79,94],"resolution":[81],"spectrometers,":[82],"computer":[83],"generated":[84],"holograms":[85],"asphere":[87],"testing,":[88],"meta-structures":[91],"(lenses,":[92],"gratings),":[93],"UV-polarizers.":[95]},"counts_by_year":[{"year":2024,"cited_by_count":1},{"year":2023,"cited_by_count":1}],"updated_date":"2026-10-05T09:50:58.205359","created_date":"2023-05-01T00:00:00"}