{"id":"https://openalex.org/W4297464263","doi":"https://doi.org/10.3390/electronics11193094","title":"Microwave-Assisted Annealing Method for Low-Temperature Fabrication of Amorphous Indium-Gallium-Zinc Oxide Thin-Film Transistors","display_name":"Microwave-Assisted Annealing Method for Low-Temperature Fabrication of Amorphous Indium-Gallium-Zinc Oxide Thin-Film Transistors","publication_year":2022,"publication_date":"2022-09-28","ids":{"openalex":"https://openalex.org/W4297464263","doi":"https://doi.org/10.3390/electronics11193094"},"language":"en","primary_location":{"id":"doi:10.3390/electronics11193094","doi":"https://doi.org/10.3390/electronics11193094","is_oa":true,"landing_page_url":"https://doi.org/10.3390/electronics11193094","pdf_url":"https://www.mdpi.com/2079-9292/11/19/3094/pdf?version=1664355565","source":{"id":"https://openalex.org/S4210202905","display_name":"Electronics","issn_l":"2079-9292","issn":["2079-9292"],"is_oa":true,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","norway-1","poland-100","russia-white-list-2","vabb-shw"],"host_organization":"https://openalex.org/P4310310987","host_organization_name":"Multidisciplinary Digital Publishing Institute","host_organization_lineage":["https://openalex.org/P4310310987"],"host_organization_lineage_names":["Multidisciplinary Digital Publishing Institute"],"type":"journal"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Electronics","raw_type":"journal-article"},"parent_works":[],"lineage":["https://openalex.org/W4297464263"],"child_works_count":0,"type":"article","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":true,"oa_status":"gold","oa_url":"https://www.mdpi.com/2079-9292/11/19/3094/pdf?version=1664355565","any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5038372595","display_name":"Jong-Woo Kim","orcid":"https://orcid.org/0000-0002-0388-0619","observed_orcids":["https://orcid.org/0000-0002-0388-0619"]},"institutions":[{"id":"https://openalex.org/I197347611","display_name":"Korea University","ror":"https://ror.org/047dqcg40","country_code":"KR","type":"education","lineage":["https://openalex.org/I197347611"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Jong-Woo Kim","raw_affiliation_strings":["School of Electrical Engineering, Korea University, 145, Anam-ro, Seongbuk-gu, Seoul 02841, Korea"],"raw_orcid":"https://orcid.org/0000-0002-0388-0619","affiliations":[{"raw_affiliation_string":"School of Electrical Engineering, Korea University, 145, Anam-ro, Seongbuk-gu, Seoul 02841, Korea","institution_ids":["https://openalex.org/I197347611"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5010027427","display_name":"Seong-Geon Park","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I2250650973","display_name":"Samsung (South Korea)","ror":"https://ror.org/04w3jy968","country_code":"KR","type":"company","lineage":["https://openalex.org/I2250650973"]},{"id":"https://openalex.org/I4405259277","display_name":"Samsung Electronics (South Korea)","ror":"https://ror.org/020m7t761","country_code":"KR","type":"company","lineage":["https://openalex.org/I2250650973","https://openalex.org/I4405259277"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Seong-Geon Park","raw_affiliation_strings":["Semiconductor Research & Development, Samsung Electronics, Hwaseong 18448, Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Semiconductor Research & Development, Samsung Electronics, Hwaseong 18448, Korea","institution_ids":["https://openalex.org/I2250650973","https://openalex.org/I4405259277"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5015337240","display_name":"Min Yang","orcid":"https://orcid.org/0000-0002-8006-8405","observed_orcids":["https://orcid.org/0000-0002-8006-8405","https://orcid.org/0000-0001-7219-7816"]},"institutions":[{"id":"https://openalex.org/I27941296","display_name":"Sahmyook University","ror":"https://ror.org/04vxr4k74","country_code":"KR","type":"education","lineage":["https://openalex.org/I27941296"]}],"countries":["KR"],"is_corresponding":true,"raw_author_name":"Min Kyu Yang","raw_affiliation_strings":["Artificial Intelligence Convergence Research Lab, Sahmyook University, Seoul 01795, Korea"],"raw_orcid":"https://orcid.org/0000-0002-8006-8405","affiliations":[{"raw_affiliation_string":"Artificial Intelligence Convergence Research Lab, Sahmyook University, Seoul 01795, Korea","institution_ids":["https://openalex.org/I27941296"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5022748433","display_name":"Byeong\u2010Kwon Ju","orcid":"https://orcid.org/0000-0002-5117-2887","observed_orcids":["https://orcid.org/0000-0002-5117-2887","https://orcid.org/0000-0002-7232-3031"]},"institutions":[{"id":"https://openalex.org/I197347611","display_name":"Korea University","ror":"https://ror.org/047dqcg40","country_code":"KR","type":"education","lineage":["https://openalex.org/I197347611"]}],"countries":["KR"],"is_corresponding":true,"raw_author_name":"Byeong-Kwon Ju","raw_affiliation_strings":["School of Electrical Engineering, Korea University, 145, Anam-ro, Seongbuk-gu, Seoul 02841, Korea"],"raw_orcid":"https://orcid.org/0000-0002-5117-2887","affiliations":[{"raw_affiliation_string":"School of Electrical Engineering, Korea University, 145, Anam-ro, Seongbuk-gu, Seoul 02841, Korea","institution_ids":["https://openalex.org/I197347611"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":4,"corresponding_author_ids":["https://openalex.org/A5015337240","https://openalex.org/A5022748433"],"corresponding_institution_ids":["https://openalex.org/I197347611","https://openalex.org/I27941296"],"apc_list":{"value":2000,"currency":"CHF","value_usd":2094},"apc_paid":{"value":2000,"currency":"CHF","value_usd":2094},"fwci":0.8846,"has_fulltext":true,"cited_by_count":21,"citation_normalized_percentile":{"value":0.67706399,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":93,"max":99},"biblio":{"volume":"11","issue":"19","first_page":"3094","last_page":"3094"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10623","display_name":"Thin-Film Transistor Technologies","score":0.9990000128746033,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10623","display_name":"Thin-Film Transistor Technologies","score":0.9990000128746033,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10090","display_name":"ZnO doping and properties","score":9.999999747378752e-05,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":9.999999747378752e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/microwave-annealing","display_name":"microwave annealing","score":0.9520000219345093},{"id":"https://openalex.org/keywords/amorphous-indium-gallium-zinc-oxide","display_name":"amorphous indium gallium zinc oxide","score":0.906000018119812},{"id":"https://openalex.org/keywords/thin-film-transistors","display_name":"thin-film transistors","score":0.8849999904632568},{"id":"https://openalex.org/keywords/oxide-semiconductors","display_name":"oxide semiconductors","score":0.859000027179718},{"id":"https://openalex.org/keywords/low-temperature-processing","display_name":"low-temperature processing","score":0.9789999723434448},{"id":"https://openalex.org/keywords/annealing-temperature","display_name":"annealing temperature","score":0.6069999933242798},{"id":"https://openalex.org/keywords/saturation-mobility","display_name":"saturation mobility","score":0.7680000066757202},{"id":"https://openalex.org/keywords/threshold-voltage","display_name":"threshold voltage","score":0.8410000205039978},{"id":"https://openalex.org/keywords/subthreshold-swing","display_name":"subthreshold swing","score":0.796999990940094},{"id":"https://openalex.org/keywords/on-off-ratio","display_name":"on/off current ratio","score":0.8190000057220459},{"id":"https://openalex.org/keywords/flexible-electronics","display_name":"flexible electronics","score":0.8939999938011169}],"concepts":[{"id":"https://openalex.org/C2777855556","wikidata":"https://www.wikidata.org/wiki/Q4339544","display_name":"Annealing (glass)","level":2,"score":0.8204403519630432},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7931605577468872},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.6230494379997253},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.6096221804618835},{"id":"https://openalex.org/C108225325","wikidata":"https://www.wikidata.org/wiki/Q11456","display_name":"Semiconductor","level":2,"score":0.4744635224342346},{"id":"https://openalex.org/C87359718","wikidata":"https://www.wikidata.org/wiki/Q1271916","display_name":"Thin-film transistor","level":3,"score":0.4383935332298279},{"id":"https://openalex.org/C106782819","wikidata":"https://www.wikidata.org/wiki/Q6501076","display_name":"Electron mobility","level":2,"score":0.41309767961502075},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.21701765060424805},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.1765068769454956},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.3390/electronics11193094","doi":"https://doi.org/10.3390/electronics11193094","is_oa":true,"landing_page_url":"https://doi.org/10.3390/electronics11193094","pdf_url":"https://www.mdpi.com/2079-9292/11/19/3094/pdf?version=1664355565","source":{"id":"https://openalex.org/S4210202905","display_name":"Electronics","issn_l":"2079-9292","issn":["2079-9292"],"is_oa":true,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","norway-1","poland-100","russia-white-list-2","vabb-shw"],"host_organization":"https://openalex.org/P4310310987","host_organization_name":"Multidisciplinary Digital Publishing Institute","host_organization_lineage":["https://openalex.org/P4310310987"],"host_organization_lineage_names":["Multidisciplinary Digital Publishing Institute"],"type":"journal"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Electronics","raw_type":"journal-article"}],"best_oa_location":{"id":"doi:10.3390/electronics11193094","doi":"https://doi.org/10.3390/electronics11193094","is_oa":true,"landing_page_url":"https://doi.org/10.3390/electronics11193094","pdf_url":"https://www.mdpi.com/2079-9292/11/19/3094/pdf?version=1664355565","source":{"id":"https://openalex.org/S4210202905","display_name":"Electronics","issn_l":"2079-9292","issn":["2079-9292"],"is_oa":true,"is_in_doaj":false,"is_core":true,"listed_in":["anvur-scientific","cwts-core","norway-1","poland-100","russia-white-list-2","vabb-shw"],"host_organization":"https://openalex.org/P4310310987","host_organization_name":"Multidisciplinary Digital Publishing Institute","host_organization_lineage":["https://openalex.org/P4310310987"],"host_organization_lineage_names":["Multidisciplinary Digital Publishing Institute"],"type":"journal"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Electronics","raw_type":"journal-article"},"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[{"id":"https://openalex.org/F4320321338","display_name":"Sahmyook University","ror":"https://ror.org/04vxr4k74"}],"has_content":{"grobid_xml":true,"pdf":true},"content_urls":{"pdf":"https://content.openalex.org/works/W4297464263.pdf","grobid_xml":"https://content.openalex.org/works/W4297464263.grobid-xml"},"referenced_works_count":42,"referenced_works":["https://openalex.org/W614372590","https://openalex.org/W1483692646","https://openalex.org/W1679720425","https://openalex.org/W1964053261","https://openalex.org/W1968936366","https://openalex.org/W1976250511","https://openalex.org/W1984921419","https://openalex.org/W1985232250","https://openalex.org/W1985924545","https://openalex.org/W1997339932","https://openalex.org/W1999589524","https://openalex.org/W1999788029","https://openalex.org/W2008467865","https://openalex.org/W2010575114","https://openalex.org/W2011160719","https://openalex.org/W2011898791","https://openalex.org/W2019315878","https://openalex.org/W2026338878","https://openalex.org/W2028947885","https://openalex.org/W2038957825","https://openalex.org/W2041379058","https://openalex.org/W2046384765","https://openalex.org/W2052080822","https://openalex.org/W2064472067","https://openalex.org/W2066829328","https://openalex.org/W2077780244","https://openalex.org/W2087303001","https://openalex.org/W2088300792","https://openalex.org/W2105186215","https://openalex.org/W2139727635","https://openalex.org/W2159775085","https://openalex.org/W2160540583","https://openalex.org/W2323345496","https://openalex.org/W2550692454","https://openalex.org/W2587256876","https://openalex.org/W2759381232","https://openalex.org/W2784059173","https://openalex.org/W2911234724","https://openalex.org/W2911595037","https://openalex.org/W2945417495","https://openalex.org/W2971517369","https://openalex.org/W3163708342"],"related_works":["https://openalex.org/W1967390984","https://openalex.org/W1978653706","https://openalex.org/W4364376257","https://openalex.org/W2007858431","https://openalex.org/W1632860568","https://openalex.org/W2087934601","https://openalex.org/W3216421638","https://openalex.org/W4413910367","https://openalex.org/W2128453738","https://openalex.org/W3114977924"],"abstract_inverted_index":{"Compared":[0],"with":[1,84],"conventional":[2,86,145,216],"silicon-based":[3],"semiconductors,":[4],"amorphous":[5],"oxide":[6,29],"semiconductors":[7,30],"present":[8],"several":[9],"advantages,":[10],"including":[11],"the":[12,26,42,50,72,80,85,102,114,117,120,138,166,178,208,212,230],"possibility":[13],"of":[14,28,44,57,75,98,116,141,211,229],"room-temperature":[15],"fabrication,":[16],"excellent":[17],"uniformity,":[18],"high":[19,22],"transmittance,":[20],"and":[21,47,78,125,150,156,186,197,224],"electron":[23],"mobility.":[24],"Notably,":[25],"application":[27],"to":[31,106,144,169,207,215,227],"flexible":[32],"electronic":[33],"devices":[34,142],"requires":[35,53],"a":[36,65,76,95,107,129,243,253],"low-temperature":[37,66,130,250],"fabrication":[38,51,251],"process.":[39],"However,":[40],"for":[41,153,162,175,221,236],"realization":[43],"semiconductor":[45],"characteristics":[46,74,140],"stable":[48],"products,":[49],"process":[52],"annealing":[54,68,87,93,99,131,146,158,171,217,246],"at":[55,147,159,172,218,233],"temperatures":[56],"300":[58,151,234],"\u00b0C":[59,149,152,161,174,220,235],"or":[60],"higher.":[61],"To":[62],"address":[63],"this,":[64],"microwave":[67,123,157,170],"method,":[69,88,247],"which":[70,248],"improves":[71],"electrical":[73,139],"transistor":[77],"reduces":[79],"production":[81],"time":[82],"compared":[83],"is":[89,94,126],"presented":[90],"herein.":[91],"Microwave":[92],"well-known":[96],"method":[97],"that":[100],"minimizes":[101],"heat":[103,111],"energy":[104],"transferred":[105],"substrate":[108],"via":[109],"instantaneous":[110],"transfer":[112],"through":[113],"vibrations":[115],"lattice":[118],"in":[119,252],"material":[121],"during":[122],"irradiation":[124],"suitable":[127],"as":[128],"method.":[132],"In":[133],"this":[134,240],"study,":[135],"we":[136],"evaluate":[137],"subjected":[143,168,214],"200":[148,160,173,219],"1":[154,222,237],"h":[155,223],"10":[163,176],"min.":[164],"For":[165],"device":[167,213,231],"min,":[177],"threshold":[179],"voltage,":[180],"current":[181],"on/off":[182],"ratio,":[183],"subthreshold":[184],"swing,":[185],"saturation":[187],"mobility":[188],"are":[189,204,225],"13.9":[190],"V,":[191],"1.14":[192],"\u00d7":[193],"105,":[194],"3.05":[195],"V/dec,":[196],"4.23":[198],"cm2/V\u00b7s,":[199],"respectively.":[200],"These":[201],"characteristic":[202,209],"results":[203,210],"far":[205],"superior":[206],"equivalent":[226],"those":[228],"treated":[232],"h.":[238],"Thus,":[239],"study":[241],"develops":[242],"more":[244],"effective":[245],"facilitates":[249],"reduced":[254],"period.":[255]},"counts_by_year":[{"year":2026,"cited_by_count":8},{"year":2025,"cited_by_count":2},{"year":2024,"cited_by_count":8},{"year":2023,"cited_by_count":3}],"updated_date":"2026-11-13T13:42:25.865203","created_date":"2022-09-29T00:00:00"}
