{"id":"https://openalex.org/W4296798140","doi":"https://doi.org/10.1021/acsami.2c12247","title":"Surface-Dominated HfO2 Nanorod-Based Memristor Exhibiting Highly Linear and Symmetrical Conductance Modulation for High-Precision Neuromorphic Computing","display_name":"Surface-Dominated HfO2 Nanorod-Based Memristor Exhibiting Highly Linear and Symmetrical Conductance Modulation for High-Precision Neuromorphic Computing","publication_year":2022,"publication_date":"2022-09-23","ids":{"openalex":"https://openalex.org/W4296798140","doi":"https://doi.org/10.1021/acsami.2c12247","pmid":"https://pubmed.ncbi.nlm.nih.gov/36149315"},"language":"en","primary_location":{"id":"doi:10.1021/acsami.2c12247","doi":"https://doi.org/10.1021/acsami.2c12247","is_oa":false,"landing_page_url":"https://doi.org/10.1021/acsami.2c12247","pdf_url":null,"source":{"id":"https://openalex.org/S164001016","display_name":"ACS Applied Materials & Interfaces","issn_l":"1944-8244","issn":["1944-8244","1944-8252"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-b","jufo-2","ki-jl-1","medline","norway-1","poland-200","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320006","host_organization_name":"American Chemical Society","host_organization_lineage":["https://openalex.org/P4310320006"],"host_organization_lineage_names":["American Chemical Society"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"ACS Applied Materials & Interfaces","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref","pubmed"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5028960774","display_name":"Jae Uk Kwon","orcid":"https://orcid.org/0000-0001-6222-5043","observed_orcids":["https://orcid.org/0000-0001-6222-5043"]},"institutions":[{"id":"https://openalex.org/I197347611","display_name":"Korea University","ror":"https://ror.org/047dqcg40","country_code":"KR","type":"education","lineage":["https://openalex.org/I197347611"]},{"id":"https://openalex.org/I58716616","display_name":"Korea Institute of Science and Technology","ror":"https://ror.org/05kzfa883","country_code":"KR","type":"facility","lineage":["https://openalex.org/I27494661","https://openalex.org/I2801339556","https://openalex.org/I4210144908","https://openalex.org/I4387152098","https://openalex.org/I58716616"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Jae Uk Kwon","raw_affiliation_strings":["Department of Materials Science and Engineering, Korea University, Seoul 02841, Republic of Korea","Electronic Materials Research Center, Korea Institute of Science and Technology (KIST), Seoul 02791, Republic of Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Materials Science and Engineering, Korea University, Seoul 02841, Republic of Korea","institution_ids":["https://openalex.org/I197347611"]},{"raw_affiliation_string":"Electronic Materials Research Center, Korea Institute of Science and Technology (KIST), Seoul 02791, Republic of Korea","institution_ids":["https://openalex.org/I58716616"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5067692542","display_name":"Young Geun Song","orcid":"https://orcid.org/0000-0002-1837-0814","observed_orcids":["https://orcid.org/0000-0002-1837-0814","https://orcid.org/0000-0003-3169-9945"]},"institutions":[{"id":"https://openalex.org/I58716616","display_name":"Korea Institute of Science and Technology","ror":"https://ror.org/05kzfa883","country_code":"KR","type":"facility","lineage":["https://openalex.org/I27494661","https://openalex.org/I2801339556","https://openalex.org/I4210144908","https://openalex.org/I4387152098","https://openalex.org/I58716616"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Young Geun Song","raw_affiliation_strings":["Electronic Materials Research Center, Korea Institute of Science and Technology (KIST), Seoul 02791, Republic of Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Electronic Materials Research Center, Korea Institute of Science and Technology (KIST), Seoul 02791, Republic of Korea","institution_ids":["https://openalex.org/I58716616"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5100415628","display_name":"Ji Eun Kim","orcid":"https://orcid.org/0000-0003-0461-7107","observed_orcids":["https://orcid.org/0000-0003-0461-7107"]},"institutions":[{"id":"https://openalex.org/I197347611","display_name":"Korea University","ror":"https://ror.org/047dqcg40","country_code":"KR","type":"education","lineage":["https://openalex.org/I197347611"]},{"id":"https://openalex.org/I58716616","display_name":"Korea Institute of Science and Technology","ror":"https://ror.org/05kzfa883","country_code":"KR","type":"facility","lineage":["https://openalex.org/I27494661","https://openalex.org/I2801339556","https://openalex.org/I4210144908","https://openalex.org/I4387152098","https://openalex.org/I58716616"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Ji Eun Kim","raw_affiliation_strings":["Department of Materials Science and Engineering, Korea University, Seoul 02841, Republic of Korea","Electronic Materials Research Center, Korea Institute of Science and Technology (KIST), Seoul 02791, Republic of Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Department of Materials Science and Engineering, Korea University, Seoul 02841, Republic of Korea","institution_ids":["https://openalex.org/I197347611"]},{"raw_affiliation_string":"Electronic Materials Research Center, Korea Institute of Science and Technology (KIST), Seoul 02791, Republic of Korea","institution_ids":["https://openalex.org/I58716616"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5055337634","display_name":"Suk Yeop Chun","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I197347611","display_name":"Korea University","ror":"https://ror.org/047dqcg40","country_code":"KR","type":"education","lineage":["https://openalex.org/I197347611"]},{"id":"https://openalex.org/I58716616","display_name":"Korea Institute of Science and Technology","ror":"https://ror.org/05kzfa883","country_code":"KR","type":"facility","lineage":["https://openalex.org/I27494661","https://openalex.org/I2801339556","https://openalex.org/I4210144908","https://openalex.org/I4387152098","https://openalex.org/I58716616"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Suk Yeop Chun","raw_affiliation_strings":["Electronic Materials Research Center, Korea Institute of Science and Technology (KIST), Seoul 02791, Republic of Korea","KU-KIST Graduate School of Converging Science and Technology, Korea University, Seoul 02841, Republic of Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Electronic Materials Research Center, Korea Institute of Science and Technology (KIST), Seoul 02791, Republic of Korea","institution_ids":["https://openalex.org/I58716616"]},{"raw_affiliation_string":"KU-KIST Graduate School of Converging Science and Technology, Korea University, Seoul 02841, Republic of Korea","institution_ids":["https://openalex.org/I197347611"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5019121672","display_name":"Gu Hyun Kim","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I4575257","display_name":"Hanyang University","ror":"https://ror.org/046865y68","country_code":"KR","type":"education","lineage":["https://openalex.org/I4575257"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Gu Hyun Kim","raw_affiliation_strings":["Division of Materials Science and Engineering, Hanyang University, Seoul 04763, Republic of Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Division of Materials Science and Engineering, Hanyang University, Seoul 04763, Republic of Korea","institution_ids":["https://openalex.org/I4575257"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5058375672","display_name":"Gichang Noh","orcid":"https://orcid.org/0000-0003-0585-9976","observed_orcids":["https://orcid.org/0000-0003-0585-9976"]},"institutions":[{"id":"https://openalex.org/I58716616","display_name":"Korea Institute of Science and Technology","ror":"https://ror.org/05kzfa883","country_code":"KR","type":"facility","lineage":["https://openalex.org/I27494661","https://openalex.org/I2801339556","https://openalex.org/I4210144908","https://openalex.org/I4387152098","https://openalex.org/I58716616"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Gichang Noh","raw_affiliation_strings":["Center for Neuromorphic Engineering, Korea Institute of Science and Technology (KIST), Seoul 02791, Republic of Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Center for Neuromorphic Engineering, Korea Institute of Science and Technology (KIST), Seoul 02791, Republic of Korea","institution_ids":["https://openalex.org/I58716616"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5044241919","display_name":"Joon Young Kwak","orcid":"https://orcid.org/0000-0002-7799-8812","observed_orcids":["https://orcid.org/0000-0002-7799-8812"]},"institutions":[{"id":"https://openalex.org/I58716616","display_name":"Korea Institute of Science and Technology","ror":"https://ror.org/05kzfa883","country_code":"KR","type":"facility","lineage":["https://openalex.org/I27494661","https://openalex.org/I2801339556","https://openalex.org/I4210144908","https://openalex.org/I4387152098","https://openalex.org/I58716616"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Joon Young Kwak","raw_affiliation_strings":["Center for Neuromorphic Engineering, Korea Institute of Science and Technology (KIST), Seoul 02791, Republic of Korea"],"raw_orcid":"https://orcid.org/0000-0002-7799-8812","affiliations":[{"raw_affiliation_string":"Center for Neuromorphic Engineering, Korea Institute of Science and Technology (KIST), Seoul 02791, Republic of Korea","institution_ids":["https://openalex.org/I58716616"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5046349889","display_name":"Sunghoon Hur","orcid":"https://orcid.org/0000-0001-6985-5937","observed_orcids":["https://orcid.org/0000-0001-6985-5937"]},"institutions":[{"id":"https://openalex.org/I58716616","display_name":"Korea Institute of Science and Technology","ror":"https://ror.org/05kzfa883","country_code":"KR","type":"facility","lineage":["https://openalex.org/I27494661","https://openalex.org/I2801339556","https://openalex.org/I4210144908","https://openalex.org/I4387152098","https://openalex.org/I58716616"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Sunghoon Hur","raw_affiliation_strings":["Electronic Materials Research Center, Korea Institute of Science and Technology (KIST), Seoul 02791, Republic of Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Electronic Materials Research Center, Korea Institute of Science and Technology (KIST), Seoul 02791, Republic of Korea","institution_ids":["https://openalex.org/I58716616"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5081482561","display_name":"Chong\u2010Yun Kang","orcid":"https://orcid.org/0000-0002-4516-8160","observed_orcids":["https://orcid.org/0000-0002-4516-8160"]},"institutions":[{"id":"https://openalex.org/I197347611","display_name":"Korea University","ror":"https://ror.org/047dqcg40","country_code":"KR","type":"education","lineage":["https://openalex.org/I197347611"]},{"id":"https://openalex.org/I58716616","display_name":"Korea Institute of Science and Technology","ror":"https://ror.org/05kzfa883","country_code":"KR","type":"facility","lineage":["https://openalex.org/I27494661","https://openalex.org/I2801339556","https://openalex.org/I4210144908","https://openalex.org/I4387152098","https://openalex.org/I58716616"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Chong-Yun Kang","raw_affiliation_strings":["Electronic Materials Research Center, Korea Institute of Science and Technology (KIST), Seoul 02791, Republic of Korea","KU-KIST Graduate School of Converging Science and Technology, Korea University, Seoul 02841, Republic of Korea"],"raw_orcid":"https://orcid.org/0000-0002-4516-8160","affiliations":[{"raw_affiliation_string":"Electronic Materials Research Center, Korea Institute of Science and Technology (KIST), Seoul 02791, Republic of Korea","institution_ids":["https://openalex.org/I58716616"]},{"raw_affiliation_string":"KU-KIST Graduate School of Converging Science and Technology, Korea University, Seoul 02841, Republic of Korea","institution_ids":["https://openalex.org/I197347611"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5082971950","display_name":"Doo Seok Jeong","orcid":"https://orcid.org/0000-0001-7954-2213","observed_orcids":["https://orcid.org/0000-0001-7954-2213"]},"institutions":[{"id":"https://openalex.org/I4575257","display_name":"Hanyang University","ror":"https://ror.org/046865y68","country_code":"KR","type":"education","lineage":["https://openalex.org/I4575257"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Doo Seok Jeong","raw_affiliation_strings":["Division of Materials Science and Engineering, Hanyang University, Seoul 04763, Republic of Korea"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Division of Materials Science and Engineering, Hanyang University, Seoul 04763, Republic of Korea","institution_ids":["https://openalex.org/I4575257"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5075645050","display_name":"Soong Ju Oh","orcid":"https://orcid.org/0000-0003-1434-8844","observed_orcids":["https://orcid.org/0000-0003-1434-8844"]},"institutions":[{"id":"https://openalex.org/I197347611","display_name":"Korea University","ror":"https://ror.org/047dqcg40","country_code":"KR","type":"education","lineage":["https://openalex.org/I197347611"]}],"countries":["KR"],"is_corresponding":false,"raw_author_name":"Soong Ju Oh","raw_affiliation_strings":["Department of Materials Science and Engineering, Korea University, Seoul 02841, Republic of Korea"],"raw_orcid":"https://orcid.org/0000-0003-1434-8844","affiliations":[{"raw_affiliation_string":"Department of Materials Science and Engineering, Korea University, Seoul 02841, Republic of Korea","institution_ids":["https://openalex.org/I197347611"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5031827211","display_name":"Jung Ho Yoon","orcid":"https://orcid.org/0000-0002-2239-3680","observed_orcids":["https://orcid.org/0000-0002-2239-3680"]},"institutions":[{"id":"https://openalex.org/I58716616","display_name":"Korea Institute of Science and Technology","ror":"https://ror.org/05kzfa883","country_code":"KR","type":"facility","lineage":["https://openalex.org/I27494661","https://openalex.org/I2801339556","https://openalex.org/I4210144908","https://openalex.org/I4387152098","https://openalex.org/I58716616"]}],"countries":["KR"],"is_corresponding":true,"raw_author_name":"Jung Ho Yoon","raw_affiliation_strings":["Electronic Materials Research Center, Korea Institute of Science and Technology (KIST), Seoul 02791, Republic of Korea"],"raw_orcid":"https://orcid.org/0000-0002-2239-3680","affiliations":[{"raw_affiliation_string":"Electronic Materials Research Center, Korea Institute of Science and Technology (KIST), Seoul 02791, Republic of Korea","institution_ids":["https://openalex.org/I58716616"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":3,"corresponding_author_ids":["https://openalex.org/A5031827211"],"corresponding_institution_ids":["https://openalex.org/I58716616"],"apc_list":{"value":5000,"currency":"USD","value_usd":5000},"apc_paid":null,"fwci":2.248,"has_fulltext":false,"cited_by_count":46,"citation_normalized_percentile":{"value":0.88895824,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":93,"max":100},"biblio":{"volume":"14","issue":"39","first_page":"44550","last_page":"44560"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10502","display_name":"Advanced Memory and Neural Computing","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10502","display_name":"Advanced Memory and Neural Computing","score":1.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12808","display_name":"Ferroelectric and Negative Capacitance Devices","score":9.999999747378752e-05,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/memristors","display_name":"memristors","score":0.9800000190734863},{"id":"https://openalex.org/keywords/electroforming-free-switching","display_name":"electroforming-free switching","score":0.8019999861717224},{"id":"https://openalex.org/keywords/oxygen-vacancies","display_name":"oxygen vacancies","score":0.8399999737739563},{"id":"https://openalex.org/keywords/conductive-filaments","display_name":"conductive filaments","score":0.699999988079071},{"id":"https://openalex.org/keywords/neuromorphic-computing","display_name":"neuromorphic computing","score":0.7570000290870667},{"id":"https://openalex.org/keywords/spike-timing-dependent-plasticity","display_name":"spike-timing-dependent plasticity","score":0.9300000071525574},{"id":"https://openalex.org/keywords/pattern-recognition","display_name":"pattern recognition","score":0.5920000076293945},{"id":"https://openalex.org/keywords/oxide-thin-films","display_name":"oxide thin films","score":0.5109999775886536}],"concepts":[{"id":"https://openalex.org/C137808972","wikidata":"https://www.wikidata.org/wiki/Q5358014","display_name":"Electroforming","level":3,"score":0.878254771232605},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.8558777570724487},{"id":"https://openalex.org/C150072547","wikidata":"https://www.wikidata.org/wiki/Q212923","display_name":"Memristor","level":2,"score":0.8258169889450073},{"id":"https://openalex.org/C151927369","wikidata":"https://www.wikidata.org/wiki/Q1981312","display_name":"Neuromorphic engineering","level":3,"score":0.7840583324432373},{"id":"https://openalex.org/C126201875","wikidata":"https://www.wikidata.org/wiki/Q2684948","display_name":"Nanorod","level":2,"score":0.6837162971496582},{"id":"https://openalex.org/C121932024","wikidata":"https://www.wikidata.org/wiki/Q5159376","display_name":"Conductance","level":2,"score":0.6477720737457275},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.5420549511909485},{"id":"https://openalex.org/C2779851234","wikidata":"https://www.wikidata.org/wiki/Q50690","display_name":"Oxide","level":2,"score":0.5113179683685303},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.49390631914138794},{"id":"https://openalex.org/C123079801","wikidata":"https://www.wikidata.org/wiki/Q750240","display_name":"Modulation (music)","level":2,"score":0.48010969161987305},{"id":"https://openalex.org/C182019814","wikidata":"https://www.wikidata.org/wiki/Q1143830","display_name":"Resistive random-access memory","level":3,"score":0.47843459248542786},{"id":"https://openalex.org/C55904794","wikidata":"https://www.wikidata.org/wiki/Q82682","display_name":"Redox","level":2,"score":0.4775746166706085},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.4233735203742981},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.30391252040863037},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.2705707550048828},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.19051894545555115},{"id":"https://openalex.org/C119599485","wikidata":"https://www.wikidata.org/wiki/Q43035","display_name":"Electrical engineering","level":1,"score":0.14263296127319336},{"id":"https://openalex.org/C26873012","wikidata":"https://www.wikidata.org/wiki/Q214781","display_name":"Condensed matter physics","level":1,"score":0.09885361790657043},{"id":"https://openalex.org/C165801399","wikidata":"https://www.wikidata.org/wiki/Q25428","display_name":"Voltage","level":2,"score":0.09154757857322693},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0},{"id":"https://openalex.org/C107038049","wikidata":"https://www.wikidata.org/wiki/Q35986","display_name":"Aesthetics","level":1,"score":0.0},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C138885662","wikidata":"https://www.wikidata.org/wiki/Q5891","display_name":"Philosophy","level":0,"score":0.0},{"id":"https://openalex.org/C119857082","wikidata":"https://www.wikidata.org/wiki/Q2539","display_name":"Machine learning","level":1,"score":0.0},{"id":"https://openalex.org/C50644808","wikidata":"https://www.wikidata.org/wiki/Q192776","display_name":"Artificial neural network","level":2,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"doi:10.1021/acsami.2c12247","doi":"https://doi.org/10.1021/acsami.2c12247","is_oa":false,"landing_page_url":"https://doi.org/10.1021/acsami.2c12247","pdf_url":null,"source":{"id":"https://openalex.org/S164001016","display_name":"ACS Applied Materials & Interfaces","issn_l":"1944-8244","issn":["1944-8244","1944-8252"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","dongbi-b","jufo-2","ki-jl-1","medline","norway-1","poland-200","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310320006","host_organization_name":"American Chemical Society","host_organization_lineage":["https://openalex.org/P4310320006"],"host_organization_lineage_names":["American Chemical Society"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"ACS Applied Materials & Interfaces","raw_type":"journal-article"},{"id":"pmid:36149315","doi":null,"is_oa":false,"landing_page_url":"https://pubmed.ncbi.nlm.nih.gov/36149315","pdf_url":null,"source":{"id":"https://openalex.org/S4306525036","display_name":"PubMed","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I1299303238","host_organization_name":"National Institutes of Health","host_organization_lineage":["https://openalex.org/I1299303238"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"ACS applied materials & interfaces","raw_type":"Journal Article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[{"id":"https://openalex.org/G117122498","display_name":null,"funder_award_id":"NRF\u20102022R1C1C1004176","funder_id":"https://openalex.org/F4320322120","funder_display_name":"National Research Foundation of Korea"},{"id":"https://openalex.org/G282806528","display_name":null,"funder_award_id":"2E31771","funder_id":"https://openalex.org/F4320322091","funder_display_name":"Korea Institute of Science and Technology"},{"id":"https://openalex.org/G4092381334","display_name":null,"funder_award_id":"2V09333","funder_id":"https://openalex.org/F4320322091","funder_display_name":"Korea Institute of Science and Technology"},{"id":"https://openalex.org/G504586178","display_name":null,"funder_award_id":"NRF-2021M3F3A2A01037738","funder_id":"https://openalex.org/F4320322120","funder_display_name":"National Research Foundation of Korea"}],"funders":[{"id":"https://openalex.org/F4320322091","display_name":"Korea Institute of Science and Technology","ror":"https://ror.org/05kzfa883"},{"id":"https://openalex.org/F4320322120","display_name":"National Research Foundation of Korea","ror":"https://ror.org/013aysd81"}],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":43,"referenced_works":["https://openalex.org/W1678748398","https://openalex.org/W1898939874","https://openalex.org/W1976342705","https://openalex.org/W2016922062","https://openalex.org/W2018774711","https://openalex.org/W2039157731","https://openalex.org/W2051209243","https://openalex.org/W2054740765","https://openalex.org/W2059563768","https://openalex.org/W2067320359","https://openalex.org/W2069233440","https://openalex.org/W2074357625","https://openalex.org/W2089303882","https://openalex.org/W2096162446","https://openalex.org/W2118980095","https://openalex.org/W2147101007","https://openalex.org/W2154890396","https://openalex.org/W2310844153","https://openalex.org/W2323536052","https://openalex.org/W2338417149","https://openalex.org/W2585881542","https://openalex.org/W2759613137","https://openalex.org/W2765160642","https://openalex.org/W2767612289","https://openalex.org/W2783053830","https://openalex.org/W2793181810","https://openalex.org/W2794684839","https://openalex.org/W2901020704","https://openalex.org/W2910128286","https://openalex.org/W2944651134","https://openalex.org/W2947452984","https://openalex.org/W2953746659","https://openalex.org/W2960778947","https://openalex.org/W2979617046","https://openalex.org/W2997162785","https://openalex.org/W2997510972","https://openalex.org/W3005727100","https://openalex.org/W3040800200","https://openalex.org/W3045182508","https://openalex.org/W3090001109","https://openalex.org/W3098316772","https://openalex.org/W4200157328","https://openalex.org/W4233923606"],"related_works":["https://openalex.org/W3125550422","https://openalex.org/W7138140413","https://openalex.org/W3190080081","https://openalex.org/W3113001481","https://openalex.org/W4406382568","https://openalex.org/W4406084632","https://openalex.org/W2745659293","https://openalex.org/W3013238157","https://openalex.org/W7211872542","https://openalex.org/W4319788397"],"abstract_inverted_index":{"The":[0,93],"switching":[1,32,41,56,68,91,122,129],"characteristics":[2],"and":[3,17,88,127,171,175],"performance":[4],"of":[5,21,62,109,115,137,162,169],"oxide-based":[6],"memristors":[7],"are":[8],"predominately":[9],"determined":[10],"by":[11],"oxygen-":[12],"or":[13,60,117],"oxygen-vacancy-mediated":[14],"redox":[15,52,95],"reactions":[16],"the":[18,31,50,99,104,107,110,113,121,133,150,165],"consequent":[19],"formation":[20],"conducting":[22],"filaments":[23],"(CFs).":[24],"Devices":[25],"using":[26],"oxide":[27],"thin":[28],"films":[29],"as":[30],"layer":[33],"usually":[34],"require":[35],"an":[36,73],"electroforming":[37],"process":[38],"for":[39,81],"subsequent":[40],"operations,":[42],"which":[43],"induces":[44],"large":[45],"device-to-device":[46],"variations.":[47],"In":[48,70,131],"addition,":[49,132],"hard-to-control":[51],"reaction":[53,96],"during":[54,120],"repeated":[55],"causes":[57],"random":[58],"fluctuations":[59],"degradation":[61],"each":[63],"resistance":[64],"state,":[65],"hindering":[66],"reliable":[67,89,128],"operations.":[69],"this":[71],"study,":[72],"HfO":[74],"2":[75],"nanorod":[76],"(NR)-based":[77],"memristor":[78],"is":[79],"proposed":[80],"simultaneously":[82],"achieving":[83],"highly":[84,140],"uniform,":[85],"electroforming-free,":[86],"fast,":[87],"analogue":[90],"properties.":[92],"well-controlled":[94],"due":[97],"to":[98],"easy":[100],"gas":[101],"exchange":[102],"with":[103,144,149],"environment":[105],"at":[106],"surface":[108,135],"NRs":[111],"enhances":[112],"generation":[114],"oxygen":[116,118],"vacancies":[119],"operation,":[123],"resulting":[124,157],"in":[125,154,158,164],"electroforming-free":[126],"behavior.":[130],"one-dimensional":[134],"growth":[136,153],"CFs":[138],"facilitates":[139],"linear":[141],"conductance":[142,146],"modulation":[143],"smaller":[145],"changes":[147],"compared":[148],"two-dimensional":[151],"volume":[152],"thin-film-based":[155],"memristors,":[156],"a":[159],"high":[160],"accuracy":[161],">92%":[163],"Modified":[166],"National":[167],"Institute":[168],"Standards":[170],"Technology":[172],"pattern-recognition":[173],"test":[174],"desirable":[176],"spike-timing-dependent":[177],"plasticity.":[178]},"counts_by_year":[{"year":2026,"cited_by_count":13},{"year":2025,"cited_by_count":12},{"year":2024,"cited_by_count":8},{"year":2023,"cited_by_count":11},{"year":2022,"cited_by_count":2}],"updated_date":"2026-11-06T12:05:46.655746","created_date":"2022-09-24T00:00:00"}