{"id":"https://openalex.org/W428286103","doi":"https://doi.org/10.34874/prsm.mjcm-vol5iss1.108","title":"ONE STEP ELECTRODEPOSITION OF CuInSe2 THIN FILMS","display_name":"ONE STEP ELECTRODEPOSITION OF CuInSe2 THIN FILMS","publication_year":2011,"publication_date":"2011-03-10","ids":{"openalex":"https://openalex.org/W428286103","doi":"https://doi.org/10.34874/prsm.mjcm-vol5iss1.108","mag":"428286103"},"language":"en","primary_location":{"id":"pmh:oai:CiteSeerX.psu:10.1.1.623.7937","doi":null,"is_oa":false,"landing_page_url":"http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.623.7937","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"http://www.fsr.ac.ma/MJCM/sup_pdf/pdf_vol5/vol5-n1-art14.pdf","raw_type":"text"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["datacite"],"open_access":{"is_oa":true,"oa_status":"bronze","oa_url":"https://doi.org/10.34874/prsm.mjcm-vol5iss1.108","any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5023617775","display_name":"F. Chra\u00efbi","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I126477371","display_name":"Mohammed V University","ror":"https://ror.org/00r8w8f84","country_code":"MA","type":"education","lineage":["https://openalex.org/I126477371"]},{"id":"https://openalex.org/I132053463","display_name":"Universit\u00e9 Libre de Bruxelles","ror":"https://ror.org/01r9htc13","country_code":"BE","type":"education","lineage":["https://openalex.org/I132053463"]}],"countries":["BE","MA"],"is_corresponding":false,"raw_author_name":"Chraibi, F.","raw_affiliation_strings":["Service de Sciences des Mat\u00e9riaux et Electrochimie, Facult\u00e9 des Sciences Appliqu\u00e9es, Universit\u00e9 Libre de Bruxelles, CP 194/ 03, Avenue F.D. Roosevelt 50 B-1050 Bruxelles Laboratoire de Physique des Mat\u00e9riaux, D\u00e9partement de Physique, Facult\u00e9 des Sciences, Universit\u00e9 Mohammed V, 1 Avenue Ibn Batouta, BP 1014, Rabat","Universit\u00e9 Libre de Bruxelles, Brussels, Belgium"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Service de Sciences des Mat\u00e9riaux et Electrochimie, Facult\u00e9 des Sciences Appliqu\u00e9es, Universit\u00e9 Libre de Bruxelles, CP 194/ 03, Avenue F.D. Roosevelt 50 B-1050 Bruxelles Laboratoire de Physique des Mat\u00e9riaux, D\u00e9partement de Physique, Facult\u00e9 des Sciences, Universit\u00e9 Mohammed V, 1 Avenue Ibn Batouta, BP 1014, Rabat","institution_ids":["https://openalex.org/I126477371","https://openalex.org/I132053463"]},{"raw_affiliation_string":"Universit\u00e9 Libre de Bruxelles, Brussels, Belgium","institution_ids":["https://openalex.org/I132053463"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5003168808","display_name":"M. Fahoume","orcid":"https://orcid.org/0000-0003-0669-4202","observed_orcids":["https://orcid.org/0000-0003-0669-4202"]},"institutions":[{"id":"https://openalex.org/I126477371","display_name":"Mohammed V University","ror":"https://ror.org/00r8w8f84","country_code":"MA","type":"education","lineage":["https://openalex.org/I126477371"]}],"countries":["MA"],"is_corresponding":false,"raw_author_name":"Fahoume, M.","raw_affiliation_strings":["Laboratoire de Physique des Mat\u00e9riaux, D\u00e9partement de Physique, Facult\u00e9 des Sciences, Universit\u00e9 Mohammed V, 1 Avenue Ibn Batouta, BP 1014, Rabat"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Laboratoire de Physique des Mat\u00e9riaux, D\u00e9partement de Physique, Facult\u00e9 des Sciences, Universit\u00e9 Mohammed V, 1 Avenue Ibn Batouta, BP 1014, Rabat","institution_ids":["https://openalex.org/I126477371"]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5079644865","display_name":"A. Ennaoui","orcid":"https://orcid.org/0000-0003-1389-7227","observed_orcids":["https://orcid.org/0000-0003-1389-7227"]},"institutions":[{"id":"https://openalex.org/I126477371","display_name":"Mohammed V University","ror":"https://ror.org/00r8w8f84","country_code":"MA","type":"education","lineage":["https://openalex.org/I126477371"]},{"id":"https://openalex.org/I3121676899","display_name":"Universit\u00e9 Ibn-Tofail","ror":"https://ror.org/02wj89n04","country_code":"MA","type":"education","lineage":["https://openalex.org/I3121676899"]}],"countries":["MA"],"is_corresponding":false,"raw_author_name":"Ennaoui, A.","raw_affiliation_strings":["Laboratoire de Physique des Mat\u00e9riaux, D\u00e9partement de Physique, Facult\u00e9 des Sciences, Universit\u00e9 Mohammed V, 1 Avenue Ibn Batouta, BP 1014, Rabat L.P.M.C., Facult\u00e9 des Sciences, Universit\u00e9 Ibn Tofail, BP 133-14000, K\u00e9nitra","Laboratoire de Physique des Mat\u00e9riaux, D\u00e9partement de Physique, Facult\u00e9 des Sciences, Universit\u00e9 Mohammed V, 1 Avenue Ibn Batouta, BP 1014, Rabat#R##N##R##N#L.P.M.C., Facult\u00e9 des Sciences, Universit\u00e9 Ibn Tofail, BP 133-14000, K\u00e9nitra"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Laboratoire de Physique des Mat\u00e9riaux, D\u00e9partement de Physique, Facult\u00e9 des Sciences, Universit\u00e9 Mohammed V, 1 Avenue Ibn Batouta, BP 1014, Rabat L.P.M.C., Facult\u00e9 des Sciences, Universit\u00e9 Ibn Tofail, BP 133-14000, K\u00e9nitra","institution_ids":["https://openalex.org/I126477371","https://openalex.org/I3121676899"]},{"raw_affiliation_string":"Laboratoire de Physique des Mat\u00e9riaux, D\u00e9partement de Physique, Facult\u00e9 des Sciences, Universit\u00e9 Mohammed V, 1 Avenue Ibn Batouta, BP 1014, Rabat#R##N##R##N#L.P.M.C., Facult\u00e9 des Sciences, Universit\u00e9 Ibn Tofail, BP 133-14000, K\u00e9nitra","institution_ids":["https://openalex.org/I126477371","https://openalex.org/I3121676899"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5111962521","display_name":"J.\u2010L. Delplancke","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I132053463","display_name":"Universit\u00e9 Libre de Bruxelles","ror":"https://ror.org/01r9htc13","country_code":"BE","type":"education","lineage":["https://openalex.org/I132053463"]}],"countries":["BE"],"is_corresponding":false,"raw_author_name":"Delplancke, J. L.","raw_affiliation_strings":["Service de Sciences des Mat\u00e9riaux et Electrochimie, Facult\u00e9 des Sciences Appliqu\u00e9es, Universit\u00e9 Libre de Bruxelles, CP 194/ 03, Avenue F.D. Roosevelt 50 B-1050 Bruxelles"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Service de Sciences des Mat\u00e9riaux et Electrochimie, Facult\u00e9 des Sciences Appliqu\u00e9es, Universit\u00e9 Libre de Bruxelles, CP 194/ 03, Avenue F.D. Roosevelt 50 B-1050 Bruxelles","institution_ids":["https://openalex.org/I132053463"]}]}],"institutions":[],"countries_distinct_count":2,"institutions_distinct_count":3,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.4334,"has_fulltext":false,"cited_by_count":7,"citation_normalized_percentile":{"value":0.66688183,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":93},"biblio":{"volume":null,"issue":null,"first_page":null,"last_page":null},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10590","display_name":"Chalcogenide Semiconductor Thin Films","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10590","display_name":"Chalcogenide Semiconductor Thin Films","score":0.9994999766349792,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11200","display_name":"Electrodeposition and Electroless Coatings","score":9.999999747378752e-05,"subfield":{"id":"https://openalex.org/subfields/2508","display_name":"Surfaces, Coatings and Films"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11907","display_name":"Copper-based nanomaterials and applications","score":0.0,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/cuinse2","display_name":"CuInSe2","score":0.8650000095367432},{"id":"https://openalex.org/keywords/chalcopyrite-thin-films","display_name":"chalcopyrite thin films","score":0.871999979019165},{"id":"https://openalex.org/keywords/electrodeposition","display_name":"electrodeposition","score":0.9350000023841858},{"id":"https://openalex.org/keywords/citrate-complexing-agent","display_name":"citrate complexing agent","score":0.8429999947547913},{"id":"https://openalex.org/keywords/aqueous-solution-deposition","display_name":"aqueous solution deposition","score":0.7820000052452087},{"id":"https://openalex.org/keywords/annealing","display_name":"annealing","score":0.9079999923706055},{"id":"https://openalex.org/keywords/stoichiometry","display_name":"stoichiometry","score":0.765999972820282},{"id":"https://openalex.org/keywords/surface-morphology","display_name":"surface morphology","score":0.5600000023841858},{"id":"https://openalex.org/keywords/texture","display_name":"texture","score":0.33399999141693115}],"concepts":[{"id":"https://openalex.org/C2778188036","wikidata":"https://www.wikidata.org/wiki/Q111044","display_name":"Chalcopyrite","level":3,"score":0.8856562376022339},{"id":"https://openalex.org/C2777855556","wikidata":"https://www.wikidata.org/wiki/Q4339544","display_name":"Annealing (glass)","level":2,"score":0.7531834840774536},{"id":"https://openalex.org/C146088050","wikidata":"https://www.wikidata.org/wiki/Q744818","display_name":"Transmission electron microscopy","level":2,"score":0.7363133430480957},{"id":"https://openalex.org/C144082473","wikidata":"https://www.wikidata.org/wiki/Q213185","display_name":"Stoichiometry","level":2,"score":0.6496602296829224},{"id":"https://openalex.org/C26771246","wikidata":"https://www.wikidata.org/wiki/Q321095","display_name":"Scanning electron microscope","level":2,"score":0.626198947429657},{"id":"https://openalex.org/C19067145","wikidata":"https://www.wikidata.org/wiki/Q1137203","display_name":"Thin film","level":2,"score":0.5300540328025818},{"id":"https://openalex.org/C184651966","wikidata":"https://www.wikidata.org/wiki/Q906356","display_name":"Aqueous solution","level":2,"score":0.5194951295852661},{"id":"https://openalex.org/C8010536","wikidata":"https://www.wikidata.org/wiki/Q160398","display_name":"Crystallography","level":1,"score":0.5147814750671387},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.47790345549583435},{"id":"https://openalex.org/C547737533","wikidata":"https://www.wikidata.org/wiki/Q696","display_name":"Argon","level":2,"score":0.47160324454307556},{"id":"https://openalex.org/C77557913","wikidata":"https://www.wikidata.org/wiki/Q864822","display_name":"Electron diffraction","level":3,"score":0.4463377594947815},{"id":"https://openalex.org/C113196181","wikidata":"https://www.wikidata.org/wiki/Q485223","display_name":"Analytical Chemistry (journal)","level":2,"score":0.4016229510307312},{"id":"https://openalex.org/C42360764","wikidata":"https://www.wikidata.org/wiki/Q83588","display_name":"Chemical engineering","level":1,"score":0.37577223777770996},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.36501049995422363},{"id":"https://openalex.org/C207114421","wikidata":"https://www.wikidata.org/wiki/Q133900","display_name":"Diffraction","level":2,"score":0.3618325889110565},{"id":"https://openalex.org/C544778455","wikidata":"https://www.wikidata.org/wiki/Q753","display_name":"Copper","level":2,"score":0.28673022985458374},{"id":"https://openalex.org/C191897082","wikidata":"https://www.wikidata.org/wiki/Q11467","display_name":"Metallurgy","level":1,"score":0.21866074204444885},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.21468064188957214},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.12172874808311462},{"id":"https://openalex.org/C147789679","wikidata":"https://www.wikidata.org/wiki/Q11372","display_name":"Physical chemistry","level":1,"score":0.11324146389961243},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.06353235244750977},{"id":"https://openalex.org/C159985019","wikidata":"https://www.wikidata.org/wiki/Q181790","display_name":"Composite material","level":1,"score":0.05930626392364502},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.0},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.0}],"mesh":[],"locations_count":2,"locations":[{"id":"pmh:oai:CiteSeerX.psu:10.1.1.623.7937","doi":null,"is_oa":false,"landing_page_url":"http://citeseerx.ist.psu.edu/viewdoc/summary?doi=10.1.1.623.7937","pdf_url":null,"source":null,"license":null,"license_id":null,"version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"http://www.fsr.ac.ma/MJCM/sup_pdf/pdf_vol5/vol5-n1-art14.pdf","raw_type":"text"},{"id":"doi:10.34874/prsm.mjcm-vol5iss1.108","doi":"https://doi.org/10.34874/prsm.mjcm-vol5iss1.108","is_oa":true,"landing_page_url":"https://doi.org/10.34874/prsm.mjcm-vol5iss1.108","pdf_url":null,"source":{"id":"https://openalex.org/S7407050941","display_name":"PRSM","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"journal"},"license":null,"license_id":null,"version":null,"is_accepted":false,"is_published":false,"raw_source_name":null,"raw_type":"JournalArticle"}],"best_oa_location":{"id":"doi:10.34874/prsm.mjcm-vol5iss1.108","doi":"https://doi.org/10.34874/prsm.mjcm-vol5iss1.108","is_oa":true,"landing_page_url":"https://doi.org/10.34874/prsm.mjcm-vol5iss1.108","pdf_url":null,"source":{"id":"https://openalex.org/S7407050941","display_name":"PRSM","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"journal"},"license":null,"license_id":null,"version":null,"is_accepted":false,"is_published":false,"raw_source_name":null,"raw_type":"JournalArticle"},"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"pdf":false,"grobid_xml":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W7098516124","https://openalex.org/W1973872836","https://openalex.org/W2066388915","https://openalex.org/W2082066018","https://openalex.org/W6940955480","https://openalex.org/W1988180687","https://openalex.org/W2001065741","https://openalex.org/W1988190959","https://openalex.org/W2066564811","https://openalex.org/W1843636793"],"abstract_inverted_index":{"Formation":[0],"of":[1,22,35,52,75,93,108,125],"CuInSe2":[2],"(CIS)":[3],"thin":[4],"films":[5,25,54,95,128],"from":[6],"aqueous":[7],"solution":[8],"containing":[9],"citrate":[10],"as":[11,120],"complexing":[12],"agent":[13],"is":[14,136],"reported.":[15],"The":[16,33,123],"surface":[17],"morphology":[18],"and":[19,38,46,81,99,133],"the":[20,23,36,53,64,73,86,90,94,106],"composition":[21],"deposited":[24],"are":[26,41],"characterized":[27],"by":[28,43],"scanning":[29],"electron":[30,48],"microscopy":[31,49],"(SEM).":[32],"texture":[34],"deposits":[37],"their":[39],"compositions":[40],"analyzed":[42],"X-ray":[44],"diffraction":[45],"transmission":[47],"(TEM).":[50],"Annealing":[51],"at":[55,61],"350\u00b0C":[56],"in":[57,63,72,89],"flowing":[58],"argon":[59],"electrodeposited":[60,96],"potentials":[62],"range":[65],"[-0.24,":[66],"-0.4":[67,98],"(V":[68],"vs":[69,102],"Ag/AgCl)]":[70],"resulted":[71],"formation":[74,107,124],"alpha-Cu":[76,115],"2":[77,111,116,127],"Se":[78,117],"(JCPDS":[79,83,112,118],"24-1131)":[80,119],"CuSe":[82],"6-0427).":[84],"On":[85],"contrary,":[87],"annealing":[88],"same":[91],"conditions":[92],"between":[97],"-0.6":[100],"V":[101],"Ag/AgCl":[103],"led":[104],"to":[105],"chalcopyrite":[109,131],"CuInSe":[110,126],"23-209)":[113],"with":[114,129],"secondary":[121],"phase.":[122],"a":[130],"structure":[132],"good":[134],"stoichiometry":[135],"observed.":[137]},"counts_by_year":[{"year":2023,"cited_by_count":1},{"year":2022,"cited_by_count":1},{"year":2019,"cited_by_count":1},{"year":2016,"cited_by_count":1},{"year":2014,"cited_by_count":1},{"year":2012,"cited_by_count":1}],"updated_date":"2026-11-06T12:05:46.655746","created_date":"2016-06-24T00:00:00"}