{"id":"https://openalex.org/W4250169352","doi":"https://doi.org/10.1002/9780470145333.ch73","title":"Ion Implantation","display_name":"Ion Implantation","publication_year":1999,"publication_date":"1999-01-01","ids":{"openalex":"https://openalex.org/W4250169352","doi":"https://doi.org/10.1002/9780470145333.ch73"},"language":"en","primary_location":{"id":"doi:10.1002/9780470145333.ch73","doi":"https://doi.org/10.1002/9780470145333.ch73","is_oa":false,"landing_page_url":"https://doi.org/10.1002/9780470145333.ch73","pdf_url":null,"source":{"id":"https://openalex.org/S4210216602","display_name":"Inorganic reactions and methods","issn_l":"1934-5097","issn":["1934-5097","1934-5100"],"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/P4310320595","host_organization_name":"Wiley","host_organization_lineage":["https://openalex.org/P4310320595"],"host_organization_lineage_names":["Wiley"],"type":"book series"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Inorganic Reactions and Methods","raw_type":"other"},"volume":{"id":"https://openalex.org/W4229733917","display_name":"Inorganic Reactions and Methods"},"type":"other","indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5006448685","display_name":"Richard B. Fair","orcid":"https://orcid.org/0000-0002-6728-1199","observed_orcids":["https://orcid.org/0000-0002-6728-1199"]},"institutions":[],"countries":[],"is_corresponding":true,"raw_author_name":"Richard B. Fair","raw_affiliation_strings":[],"raw_orcid":null,"affiliations":[]}],"institutions":[],"countries_distinct_count":0,"institutions_distinct_count":0,"corresponding_author_ids":["https://openalex.org/A5006448685"],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":null,"has_fulltext":false,"cited_by_count":0,"citation_normalized_percentile":null,"cited_by_percentile_year":null,"biblio":{"volume":null,"issue":null,"first_page":"111","last_page":"112"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T12166","display_name":"Ion-surface interactions and analysis","score":0.9765999913215637,"subfield":{"id":"https://openalex.org/subfields/2206","display_name":"Computational Mechanics"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T12166","display_name":"Ion-surface interactions and analysis","score":0.9765999913215637,"subfield":{"id":"https://openalex.org/subfields/2206","display_name":"Computational Mechanics"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10472","display_name":"Semiconductor materials and devices","score":0.014100000262260437,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11853","display_name":"Semiconductor materials and interfaces","score":0.00139999995008111,"subfield":{"id":"https://openalex.org/subfields/3107","display_name":"Atomic and Molecular Physics, and Optics"},"field":{"id":"https://openalex.org/fields/31","display_name":"Physics and Astronomy"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/ion-implantation","display_name":"ion implantation","score":1.0}],"concepts":[{"id":"https://openalex.org/C161191863","wikidata":"https://www.wikidata.org/wiki/Q199655","display_name":"Library science","level":1,"score":0.3347659111022949},{"id":"https://openalex.org/C138885662","wikidata":"https://www.wikidata.org/wiki/Q5891","display_name":"Philosophy","level":0,"score":0.32289743423461914},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.1986498236656189}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1002/9780470145333.ch73","doi":"https://doi.org/10.1002/9780470145333.ch73","is_oa":false,"landing_page_url":"https://doi.org/10.1002/9780470145333.ch73","pdf_url":null,"source":{"id":"https://openalex.org/S4210216602","display_name":"Inorganic reactions and methods","issn_l":"1934-5097","issn":["1934-5097","1934-5100"],"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/P4310320595","host_organization_name":"Wiley","host_organization_lineage":["https://openalex.org/P4310320595"],"host_organization_lineage_names":["Wiley"],"type":"book series"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Inorganic Reactions and Methods","raw_type":"other"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":1,"referenced_works":["https://openalex.org/W2093793077"],"related_works":["https://openalex.org/W1983134749","https://openalex.org/W3023019351","https://openalex.org/W2914337526","https://openalex.org/W4290863225","https://openalex.org/W2421609314","https://openalex.org/W4242242587","https://openalex.org/W2489072511","https://openalex.org/W2200349013","https://openalex.org/W4255006292","https://openalex.org/W4239017440"],"abstract_inverted_index":null,"counts_by_year":[],"updated_date":"2026-10-10T09:11:00.788812","created_date":"2022-05-12T00:00:00"}