{"id":"https://openalex.org/W4235213619","doi":"https://doi.org/10.1117/12.515958","title":"Low-cost amorphous silicon-based 160x120 uncooled microbolometer 2D array for high-volume applications","display_name":"Low-cost amorphous silicon-based 160x120 uncooled microbolometer 2D array for high-volume applications","publication_year":2004,"publication_date":"2004-02-19","ids":{"openalex":"https://openalex.org/W4235213619","doi":"https://doi.org/10.1117/12.515958"},"language":"en","primary_location":{"id":"doi:10.1117/12.515958","doi":"https://doi.org/10.1117/12.515958","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.515958","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"},"volume":null,"type":"conference-paper","is_traditional":true,"indexed_in":["crossref"],"open_access":{"is_oa":false,"oa_status":"closed","oa_url":null,"any_repository_has_fulltext":false},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5085192366","display_name":"Cyrille Trouilleau","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Cyrille Trouilleau","raw_affiliation_strings":["ULIS (France)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ULIS (France)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5013152667","display_name":"Arnaud Crastes","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Arnaud Crastes","raw_affiliation_strings":["ULIS (France)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ULIS (France)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5109231836","display_name":"Jean Luc Tissot","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Jean-Luc Tissot","raw_affiliation_strings":["ULIS (France)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ULIS (France)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5083355601","display_name":"Jean-Pierre Chatard","orcid":null,"observed_orcids":[]},"institutions":[],"countries":[],"is_corresponding":false,"raw_author_name":"Jean-Pierre Chatard","raw_affiliation_strings":["ULIS (France)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"ULIS (France)","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5110150209","display_name":"Jean-Jacques Yon","orcid":null,"observed_orcids":[]},"institutions":[{"id":"https://openalex.org/I2738703131","display_name":"Commissariat \u00e0 l'\u00c9nergie Atomique et aux \u00c9nergies Alternatives","ror":"https://ror.org/00jjx8s55","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131"]},{"id":"https://openalex.org/I4210150049","display_name":"Laboratoire d'\u00c9lectronique des Technologies de l'Information","ror":"https://ror.org/04mf0wv34","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131","https://openalex.org/I4210117989","https://openalex.org/I4210150049"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Jean-Jacques Yon","raw_affiliation_strings":["CEA-LETI (France)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"CEA-LETI (France)","institution_ids":["https://openalex.org/I2738703131","https://openalex.org/I4210150049"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5051935146","display_name":"Astrid Astier","orcid":"https://orcid.org/0009-0002-4130-3588","observed_orcids":["https://orcid.org/0009-0002-4130-3588"]},"institutions":[{"id":"https://openalex.org/I2738703131","display_name":"Commissariat \u00e0 l'\u00c9nergie Atomique et aux \u00c9nergies Alternatives","ror":"https://ror.org/00jjx8s55","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131"]},{"id":"https://openalex.org/I4210150049","display_name":"Laboratoire d'\u00c9lectronique des Technologies de l'Information","ror":"https://ror.org/04mf0wv34","country_code":"FR","type":"government","lineage":["https://openalex.org/I2738703131","https://openalex.org/I4210117989","https://openalex.org/I4210150049"]}],"countries":["FR"],"is_corresponding":false,"raw_author_name":"Astrid Astier","raw_affiliation_strings":["CEA-LETI (France)"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"CEA-LETI (France)","institution_ids":["https://openalex.org/I2738703131","https://openalex.org/I4210150049"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":[],"corresponding_institution_ids":[],"apc_list":null,"apc_paid":null,"fwci":0.4152,"has_fulltext":false,"cited_by_count":2,"citation_normalized_percentile":{"value":0.64575974,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":null,"biblio":{"volume":"5251","issue":null,"first_page":"129","last_page":"129"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T11637","display_name":"Advanced Semiconductor Detectors and Materials","score":0.9937000274658203,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T11637","display_name":"Advanced Semiconductor Detectors and Materials","score":0.9937000274658203,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T12389","display_name":"Infrared Target Detection Methodologies","score":0.002099999925121665,"subfield":{"id":"https://openalex.org/subfields/1707","display_name":"Computer Vision and Pattern Recognition"},"field":{"id":"https://openalex.org/fields/17","display_name":"Computer Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11992","display_name":"CCD and CMOS Imaging Sensors","score":0.0012000000569969416,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/amorphous-silicon","display_name":"amorphous silicon","score":0.9539999961853027},{"id":"https://openalex.org/keywords/infrared-focal-plane-arrays","display_name":"infrared focal plane arrays","score":0.8489999771118164},{"id":"https://openalex.org/keywords/low-cost-packaging","display_name":"low-cost packaging","score":0.7170000076293945},{"id":"https://openalex.org/keywords/infrared-thermography","display_name":"infrared thermography","score":0.8600000143051147},{"id":"https://openalex.org/keywords/pixel-pitch-reduction","display_name":"pixel pitch reduction","score":0.7459999918937683},{"id":"https://openalex.org/keywords/process-control","display_name":"process control","score":0.4429999887943268},{"id":"https://openalex.org/keywords/high-volume-manufacturing","display_name":"high-volume manufacturing","score":0.8130000233650208}],"concepts":[{"id":"https://openalex.org/C2776111576","wikidata":"https://www.wikidata.org/wiki/Q495462","display_name":"Microbolometer","level":4,"score":0.9308478832244873},{"id":"https://openalex.org/C160633673","wikidata":"https://www.wikidata.org/wiki/Q355198","display_name":"Pixel","level":2,"score":0.6796992421150208},{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.6444219946861267},{"id":"https://openalex.org/C205372480","wikidata":"https://www.wikidata.org/wiki/Q210521","display_name":"Image resolution","level":2,"score":0.6107697486877441},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.5909544229507446},{"id":"https://openalex.org/C179813606","wikidata":"https://www.wikidata.org/wiki/Q2032861","display_name":"Dot pitch","level":3,"score":0.5513642430305481},{"id":"https://openalex.org/C2776390347","wikidata":"https://www.wikidata.org/wiki/Q474163","display_name":"Amorphous silicon","level":4,"score":0.5385405421257019},{"id":"https://openalex.org/C20556612","wikidata":"https://www.wikidata.org/wiki/Q4469374","display_name":"Volume (thermodynamics)","level":2,"score":0.5374484658241272},{"id":"https://openalex.org/C138395690","wikidata":"https://www.wikidata.org/wiki/Q376733","display_name":"Cardinal point","level":2,"score":0.5025253295898438},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.4751203656196594},{"id":"https://openalex.org/C56052488","wikidata":"https://www.wikidata.org/wiki/Q103382","display_name":"Amorphous solid","level":2,"score":0.4494679272174835},{"id":"https://openalex.org/C21200559","wikidata":"https://www.wikidata.org/wiki/Q7451068","display_name":"Sensitivity (control systems)","level":2,"score":0.43770426511764526},{"id":"https://openalex.org/C120665830","wikidata":"https://www.wikidata.org/wiki/Q14620","display_name":"Optics","level":1,"score":0.3874809443950653},{"id":"https://openalex.org/C41008148","wikidata":"https://www.wikidata.org/wiki/Q21198","display_name":"Computer science","level":0,"score":0.3669995069503784},{"id":"https://openalex.org/C24326235","wikidata":"https://www.wikidata.org/wiki/Q126095","display_name":"Electronic engineering","level":1,"score":0.3215925097465515},{"id":"https://openalex.org/C21028948","wikidata":"https://www.wikidata.org/wiki/Q852212","display_name":"Bolometer","level":3,"score":0.284298837184906},{"id":"https://openalex.org/C2779667780","wikidata":"https://www.wikidata.org/wiki/Q18206302","display_name":"Crystalline silicon","level":3,"score":0.18047720193862915},{"id":"https://openalex.org/C94915269","wikidata":"https://www.wikidata.org/wiki/Q1834857","display_name":"Detector","level":2,"score":0.17063754796981812},{"id":"https://openalex.org/C127413603","wikidata":"https://www.wikidata.org/wiki/Q11023","display_name":"Engineering","level":0,"score":0.13763415813446045},{"id":"https://openalex.org/C121332964","wikidata":"https://www.wikidata.org/wiki/Q413","display_name":"Physics","level":0,"score":0.10827416181564331},{"id":"https://openalex.org/C62520636","wikidata":"https://www.wikidata.org/wiki/Q944","display_name":"Quantum mechanics","level":1,"score":0.0},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.0}],"mesh":[],"locations_count":1,"locations":[{"id":"doi:10.1117/12.515958","doi":"https://doi.org/10.1117/12.515958","is_oa":false,"landing_page_url":"https://doi.org/10.1117/12.515958","pdf_url":null,"source":{"id":"https://openalex.org/S183492911","display_name":"Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE","issn_l":"0277-786X","issn":["0277-786X","1996-756X"],"is_oa":false,"is_in_doaj":false,"is_core":true,"listed_in":["cwts-core","norway-1"],"host_organization":"https://openalex.org/P4310315543","host_organization_name":"SPIE","host_organization_lineage":["https://openalex.org/P4310315543"],"host_organization_lineage_names":["SPIE"],"type":"journal"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"SPIE Proceedings","raw_type":"proceedings-article"}],"best_oa_location":null,"sustainable_development_goals":[],"study_designs":[],"awards":[],"funders":[],"has_content":{"grobid_xml":false,"pdf":false},"content_urls":null,"referenced_works_count":0,"referenced_works":[],"related_works":["https://openalex.org/W2023132413","https://openalex.org/W4249782143","https://openalex.org/W2071109483","https://openalex.org/W4254708395","https://openalex.org/W2040418747","https://openalex.org/W1976703709","https://openalex.org/W2125144377","https://openalex.org/W2027280693","https://openalex.org/W2133177060","https://openalex.org/W2083051746"],"abstract_inverted_index":{"Uncooled":[0],"infrared":[1],"focal":[2],"plane":[3],"arrays":[4],"are":[5,17],"being":[6],"developed":[7,55,72],"for":[8,73],"a":[9,76],"wide":[10],"range":[11],"of":[12,22,28,100],"thermal":[13],"imaging":[14],"applications.":[15],"Developments":[16],"focused":[18],"on":[19,81],"the":[20,26,30,37,52],"improvement":[21],"their":[23],"sensitivity":[24],"enabling":[25],"possibility":[27],"reducing":[29],"pixel":[31,101],"pitch":[32],"in":[33],"order":[34],"to":[35,62,64,89],"decrease":[36],"total":[38],"system":[39],"(size":[40],"and":[41,60],"weight)":[42],"by":[43,56],"using":[44],"smaller":[45],"optics.":[46],"The":[47],"amorphous":[48],"silicon":[49],"technology":[50],"is":[51,86,103],"latest":[53],"one":[54],"CEA":[57],"/":[58],"LETI":[59],"transferred":[61],"ULIS":[63],"manufacture":[65],"160":[66],"x":[67],"120":[68],"2D":[69],"arrays.":[70],"We":[71],"this":[74],"device":[75,85,107],"low":[77],"cost":[78],"package":[79],"based":[80],"existing":[82],"technologies.":[83],"This":[84],"well":[87],"adapted":[88],"high":[90],"volume":[91],"process":[92],"control":[93],"applications":[94],"where":[95],"spatial":[96],"resolution":[97],"(in":[98],"terms":[99],"number)":[102],"less":[104],"important":[105],"than":[106],"costs.":[108]},"counts_by_year":[],"updated_date":"2026-09-25T08:18:29.962427","created_date":"2022-05-12T00:00:00"}