{"id":"https://openalex.org/W4224102252","doi":"https://doi.org/10.3390/nano12081326","title":"New Fabrication Method of Silicon Sub-Micron Beams with Monolithic Contacts for Thermoelectric Transport Properties Analysis","display_name":"New Fabrication Method of Silicon Sub-Micron Beams with Monolithic Contacts for Thermoelectric Transport Properties Analysis","publication_year":2022,"publication_date":"2022-04-12","ids":{"openalex":"https://openalex.org/W4224102252","doi":"https://doi.org/10.3390/nano12081326","pmid":"https://pubmed.ncbi.nlm.nih.gov/35458033","pmcid":"https://www.ncbi.nlm.nih.gov/pmc/articles/9031604"},"language":"en","primary_location":{"id":"doi:10.3390/nano12081326","doi":"https://doi.org/10.3390/nano12081326","is_oa":true,"landing_page_url":"https://doi.org/10.3390/nano12081326","pdf_url":"https://www.mdpi.com/2079-4991/12/8/1326/pdf?version=1649814266","source":{"id":"https://openalex.org/S2764646681","display_name":"Nanomaterials","issn_l":"2079-4991","issn":["2079-4991"],"is_oa":true,"is_in_doaj":true,"is_core":true,"listed_in":["cwts-core","doaj","jufo-1","ki-jl-1","norway-1","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310310987","host_organization_name":"Multidisciplinary Digital Publishing Institute","host_organization_lineage":["https://openalex.org/P4310310987"],"host_organization_lineage_names":["Multidisciplinary Digital Publishing Institute"],"type":"journal"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Nanomaterials","raw_type":"journal-article"},"volume":null,"type":"article","is_traditional":true,"indexed_in":["crossref","doaj","pubmed"],"open_access":{"is_oa":true,"oa_status":"gold","oa_url":"https://www.mdpi.com/2079-4991/12/8/1326/pdf?version=1649814266","any_repository_has_fulltext":true},"authorships":[{"author_position":"first","author":{"id":"https://openalex.org/A5015838927","display_name":"Andrej Stranz","orcid":"https://orcid.org/0000-0002-0221-1595","observed_orcids":["https://orcid.org/0000-0002-0221-1595"]},"institutions":[{"id":"https://openalex.org/I4210147934","display_name":"Centro Nacional de Microelectr\u00f3nica","ror":"https://ror.org/03ycqrz18","country_code":"ES","type":"facility","lineage":["https://openalex.org/I134820265","https://openalex.org/I4210147934"]},{"id":"https://openalex.org/I4210160312","display_name":"Institut de Microelectr\u00f2nica de Barcelona","ror":"https://ror.org/04pnym676","country_code":"ES","type":"facility","lineage":["https://openalex.org/I134820265","https://openalex.org/I4210147934","https://openalex.org/I4210160312"]}],"countries":["ES"],"is_corresponding":true,"raw_author_name":"Andrej Stranz","raw_affiliation_strings":["Institute of Microelectronics of Barcelona, IMB-CNM (CSIC), C/Til\u00b7lers s/n\u2014Campus UAB, Bellaterra, 08193 Barcelona, Spain","Pronawo UG, Allee der Kosmonauten 26, 12681 Berlin, Germany"],"raw_orcid":"https://orcid.org/0000-0002-0221-1595","affiliations":[{"raw_affiliation_string":"Institute of Microelectronics of Barcelona, IMB-CNM (CSIC), C/Til\u00b7lers s/n\u2014Campus UAB, Bellaterra, 08193 Barcelona, Spain","institution_ids":["https://openalex.org/I4210147934","https://openalex.org/I4210160312"]},{"raw_affiliation_string":"Pronawo UG, Allee der Kosmonauten 26, 12681 Berlin, Germany","institution_ids":[]}]},{"author_position":"middle","author":{"id":"https://openalex.org/A5082542383","display_name":"Marc Salleras","orcid":"https://orcid.org/0000-0001-8812-8268","observed_orcids":["https://orcid.org/0000-0001-8812-8268"]},"institutions":[{"id":"https://openalex.org/I4210147934","display_name":"Centro Nacional de Microelectr\u00f3nica","ror":"https://ror.org/03ycqrz18","country_code":"ES","type":"facility","lineage":["https://openalex.org/I134820265","https://openalex.org/I4210147934"]},{"id":"https://openalex.org/I4210160312","display_name":"Institut de Microelectr\u00f2nica de Barcelona","ror":"https://ror.org/04pnym676","country_code":"ES","type":"facility","lineage":["https://openalex.org/I134820265","https://openalex.org/I4210147934","https://openalex.org/I4210160312"]}],"countries":["ES"],"is_corresponding":false,"raw_author_name":"Marc Salleras","raw_affiliation_strings":["Institute of Microelectronics of Barcelona, IMB-CNM (CSIC), C/Til\u00b7lers s/n\u2014Campus UAB, Bellaterra, 08193 Barcelona, Spain"],"raw_orcid":"https://orcid.org/0000-0001-8812-8268","affiliations":[{"raw_affiliation_string":"Institute of Microelectronics of Barcelona, IMB-CNM (CSIC), C/Til\u00b7lers s/n\u2014Campus UAB, Bellaterra, 08193 Barcelona, Spain","institution_ids":["https://openalex.org/I4210147934","https://openalex.org/I4210160312"]}]},{"author_position":"last","author":{"id":"https://openalex.org/A5055281913","display_name":"L. Fonseca","orcid":"https://orcid.org/0000-0002-1394-8074","observed_orcids":["https://orcid.org/0000-0002-1394-8074"]},"institutions":[{"id":"https://openalex.org/I4210147934","display_name":"Centro Nacional de Microelectr\u00f3nica","ror":"https://ror.org/03ycqrz18","country_code":"ES","type":"facility","lineage":["https://openalex.org/I134820265","https://openalex.org/I4210147934"]},{"id":"https://openalex.org/I4210160312","display_name":"Institut de Microelectr\u00f2nica de Barcelona","ror":"https://ror.org/04pnym676","country_code":"ES","type":"facility","lineage":["https://openalex.org/I134820265","https://openalex.org/I4210147934","https://openalex.org/I4210160312"]}],"countries":["ES"],"is_corresponding":false,"raw_author_name":"Luis Fonseca","raw_affiliation_strings":["Institute of Microelectronics of Barcelona, IMB-CNM (CSIC), C/Til\u00b7lers s/n\u2014Campus UAB, Bellaterra, 08193 Barcelona, Spain"],"raw_orcid":null,"affiliations":[{"raw_affiliation_string":"Institute of Microelectronics of Barcelona, IMB-CNM (CSIC), C/Til\u00b7lers s/n\u2014Campus UAB, Bellaterra, 08193 Barcelona, Spain","institution_ids":["https://openalex.org/I4210147934","https://openalex.org/I4210160312"]}]}],"institutions":[],"countries_distinct_count":1,"institutions_distinct_count":2,"corresponding_author_ids":["https://openalex.org/A5015838927"],"corresponding_institution_ids":["https://openalex.org/I4210147934","https://openalex.org/I4210160312"],"apc_list":{"value":2400,"currency":"CHF","value_usd":2513},"apc_paid":{"value":2400,"currency":"CHF","value_usd":2513},"fwci":0.1983,"has_fulltext":false,"cited_by_count":3,"citation_normalized_percentile":{"value":0.28025423,"is_in_top_1_percent":false,"is_in_top_10_percent":false},"cited_by_percentile_year":{"min":88,"max":95},"biblio":{"volume":"12","issue":"8","first_page":"1326","last_page":"1326"},"is_retracted":false,"is_paratext":false,"is_xpac":false,"primary_topic":{"id":"https://openalex.org/T10440","display_name":"Advanced Thermoelectric Materials and Devices","score":0.7631999850273132,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},"topics":[{"id":"https://openalex.org/T10440","display_name":"Advanced Thermoelectric Materials and Devices","score":0.7631999850273132,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T11277","display_name":"Thermal properties of materials","score":0.0997999981045723,"subfield":{"id":"https://openalex.org/subfields/2505","display_name":"Materials Chemistry"},"field":{"id":"https://openalex.org/fields/25","display_name":"Materials Science"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}},{"id":"https://openalex.org/T10369","display_name":"Advanced MEMS and NEMS Technologies","score":0.08590000122785568,"subfield":{"id":"https://openalex.org/subfields/2208","display_name":"Electrical and Electronic Engineering"},"field":{"id":"https://openalex.org/fields/22","display_name":"Engineering"},"domain":{"id":"https://openalex.org/domains/3","display_name":"Physical Sciences"}}],"keywords":[{"id":"https://openalex.org/keywords/thermoelectric-transport-properties","display_name":"thermoelectric transport properties","score":0.9419999718666077},{"id":"https://openalex.org/keywords/deep-reactive-ion-etching","display_name":"deep reactive ion etching","score":0.9629999995231628},{"id":"https://openalex.org/keywords/koh-etching","display_name":"KOH etching","score":0.8799999952316284},{"id":"https://openalex.org/keywords/silicon-on-insulator","display_name":"silicon-on-insulator","score":0.9139999747276306},{"id":"https://openalex.org/keywords/thermal-conductivity","display_name":"thermal conductivity","score":0.6579999923706055},{"id":"https://openalex.org/keywords/electrical-conductivity","display_name":"electrical conductivity","score":0.9990000128746033},{"id":"https://openalex.org/keywords/seebeck-coefficient","display_name":"Seebeck coefficient","score":0.9990000128746033},{"id":"https://openalex.org/keywords/surface-roughness","display_name":"surface roughness","score":0.8429999947547913},{"id":"https://openalex.org/keywords/device-geometry","display_name":"device geometry","score":0.30799999833106995}],"concepts":[{"id":"https://openalex.org/C192562407","wikidata":"https://www.wikidata.org/wiki/Q228736","display_name":"Materials science","level":0,"score":0.7976185083389282},{"id":"https://openalex.org/C160671074","wikidata":"https://www.wikidata.org/wiki/Q267131","display_name":"Wafer","level":2,"score":0.739791989326477},{"id":"https://openalex.org/C136525101","wikidata":"https://www.wikidata.org/wiki/Q5428139","display_name":"Fabrication","level":3,"score":0.6536057591438293},{"id":"https://openalex.org/C53143962","wikidata":"https://www.wikidata.org/wiki/Q1478788","display_name":"Silicon on insulator","level":3,"score":0.6513584852218628},{"id":"https://openalex.org/C544956773","wikidata":"https://www.wikidata.org/wiki/Q670","display_name":"Silicon","level":2,"score":0.6464837193489075},{"id":"https://openalex.org/C37977207","wikidata":"https://www.wikidata.org/wiki/Q175561","display_name":"Microelectromechanical systems","level":2,"score":0.628530740737915},{"id":"https://openalex.org/C100460472","wikidata":"https://www.wikidata.org/wiki/Q2368605","display_name":"Etching (microfabrication)","level":3,"score":0.5996080636978149},{"id":"https://openalex.org/C49040817","wikidata":"https://www.wikidata.org/wiki/Q193091","display_name":"Optoelectronics","level":1,"score":0.5953437089920044},{"id":"https://openalex.org/C2779439175","wikidata":"https://www.wikidata.org/wiki/Q132298","display_name":"Potassium hydroxide","level":2,"score":0.5683631896972656},{"id":"https://openalex.org/C1291036","wikidata":"https://www.wikidata.org/wiki/Q1191918","display_name":"Dry etching","level":4,"score":0.46539461612701416},{"id":"https://openalex.org/C139159486","wikidata":"https://www.wikidata.org/wiki/Q5953298","display_name":"Hybrid silicon laser","level":3,"score":0.44544920325279236},{"id":"https://openalex.org/C130472188","wikidata":"https://www.wikidata.org/wiki/Q1640159","display_name":"Reactive-ion etching","level":4,"score":0.4329306483268738},{"id":"https://openalex.org/C171250308","wikidata":"https://www.wikidata.org/wiki/Q11468","display_name":"Nanotechnology","level":1,"score":0.28102952241897583},{"id":"https://openalex.org/C71924100","wikidata":"https://www.wikidata.org/wiki/Q11190","display_name":"Medicine","level":0,"score":0.0},{"id":"https://openalex.org/C142724271","wikidata":"https://www.wikidata.org/wiki/Q7208","display_name":"Pathology","level":1,"score":0.0},{"id":"https://openalex.org/C178790620","wikidata":"https://www.wikidata.org/wiki/Q11351","display_name":"Organic chemistry","level":1,"score":0.0},{"id":"https://openalex.org/C185592680","wikidata":"https://www.wikidata.org/wiki/Q2329","display_name":"Chemistry","level":0,"score":0.0},{"id":"https://openalex.org/C2779227376","wikidata":"https://www.wikidata.org/wiki/Q6505497","display_name":"Layer (electronics)","level":2,"score":0.0},{"id":"https://openalex.org/C204787440","wikidata":"https://www.wikidata.org/wiki/Q188504","display_name":"Alternative medicine","level":2,"score":0.0}],"mesh":[],"locations_count":4,"locations":[{"id":"doi:10.3390/nano12081326","doi":"https://doi.org/10.3390/nano12081326","is_oa":true,"landing_page_url":"https://doi.org/10.3390/nano12081326","pdf_url":"https://www.mdpi.com/2079-4991/12/8/1326/pdf?version=1649814266","source":{"id":"https://openalex.org/S2764646681","display_name":"Nanomaterials","issn_l":"2079-4991","issn":["2079-4991"],"is_oa":true,"is_in_doaj":true,"is_core":true,"listed_in":["cwts-core","doaj","jufo-1","ki-jl-1","norway-1","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310310987","host_organization_name":"Multidisciplinary Digital Publishing Institute","host_organization_lineage":["https://openalex.org/P4310310987"],"host_organization_lineage_names":["Multidisciplinary Digital Publishing Institute"],"type":"journal"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Nanomaterials","raw_type":"journal-article"},{"id":"pmh:oai:pubmedcentral.nih.gov:9031604","doi":null,"is_oa":true,"landing_page_url":"https://www.ncbi.nlm.nih.gov/pmc/articles/9031604","pdf_url":null,"source":{"id":"https://openalex.org/S2764455111","display_name":"PubMed Central","issn_l":null,"issn":null,"is_oa":true,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I1299303238","host_organization_name":"National Institutes of Health","host_organization_lineage":["https://openalex.org/I1299303238"],"host_organization_lineage_names":[],"type":"repository"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Nanomaterials (Basel)","raw_type":"Text"},{"id":"pmid:35458033","doi":null,"is_oa":false,"landing_page_url":"https://pubmed.ncbi.nlm.nih.gov/35458033","pdf_url":null,"source":{"id":"https://openalex.org/S4306525036","display_name":"PubMed","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":"https://openalex.org/I1299303238","host_organization_name":"National Institutes of Health","host_organization_lineage":["https://openalex.org/I1299303238"],"host_organization_lineage_names":[],"type":"repository"},"license":null,"license_id":null,"version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Nanomaterials (Basel, Switzerland)","raw_type":"Journal Article"},{"id":"pmh:oai:doaj.org/article:28245cdd52ac4cb880726e795f54d423","doi":null,"is_oa":true,"landing_page_url":"https://doaj.org/article/28245cdd52ac4cb880726e795f54d423","pdf_url":null,"source":{"id":"https://openalex.org/S4306401280","display_name":"DOAJ (DOAJ: Directory of Open Access Journals)","issn_l":null,"issn":null,"is_oa":false,"is_in_doaj":false,"is_core":false,"listed_in":[],"host_organization":null,"host_organization_name":null,"host_organization_lineage":[],"host_organization_lineage_names":[],"type":"repository"},"license":"cc-by-sa","license_id":"https://openalex.org/licenses/cc-by-sa","version":"submittedVersion","is_accepted":false,"is_published":false,"raw_source_name":"Nanomaterials, Vol 12, Iss 8, p 1326 (2022)","raw_type":"article"}],"best_oa_location":{"id":"doi:10.3390/nano12081326","doi":"https://doi.org/10.3390/nano12081326","is_oa":true,"landing_page_url":"https://doi.org/10.3390/nano12081326","pdf_url":"https://www.mdpi.com/2079-4991/12/8/1326/pdf?version=1649814266","source":{"id":"https://openalex.org/S2764646681","display_name":"Nanomaterials","issn_l":"2079-4991","issn":["2079-4991"],"is_oa":true,"is_in_doaj":true,"is_core":true,"listed_in":["cwts-core","doaj","jufo-1","ki-jl-1","norway-1","poland-100","russia-white-list-1","vabb-shw"],"host_organization":"https://openalex.org/P4310310987","host_organization_name":"Multidisciplinary Digital Publishing Institute","host_organization_lineage":["https://openalex.org/P4310310987"],"host_organization_lineage_names":["Multidisciplinary Digital Publishing Institute"],"type":"journal"},"license":"cc-by","license_id":"https://openalex.org/licenses/cc-by","version":"publishedVersion","is_accepted":true,"is_published":true,"raw_source_name":"Nanomaterials","raw_type":"journal-article"},"sustainable_development_goals":[],"study_designs":[],"awards":[{"id":"https://openalex.org/G2981768217","display_name":"Opening Sphere UAB-CEI to PostDoctoral Fellows","funder_award_id":"665919","funder_id":"https://openalex.org/F4320320300","funder_display_name":"European Commission"}],"funders":[{"id":"https://openalex.org/F4320320300","display_name":"European Commission","ror":"https://ror.org/00k4n6c32"}],"has_content":{"pdf":true,"grobid_xml":false},"content_urls":{"pdf":"https://content.openalex.org/works/W4224102252.pdf"},"referenced_works_count":36,"referenced_works":["https://openalex.org/W769930022","https://openalex.org/W1898175369","https://openalex.org/W1975525336","https://openalex.org/W1980024941","https://openalex.org/W1988235362","https://openalex.org/W1994254798","https://openalex.org/W2009900668","https://openalex.org/W2013765884","https://openalex.org/W2018825318","https://openalex.org/W2028285928","https://openalex.org/W2036134495","https://openalex.org/W2040661631","https://openalex.org/W2057243007","https://openalex.org/W2059675257","https://openalex.org/W2064651168","https://openalex.org/W2070093297","https://openalex.org/W2080778956","https://openalex.org/W2089995323","https://openalex.org/W2134685049","https://openalex.org/W2152431951","https://openalex.org/W2170116274","https://openalex.org/W2322696562","https://openalex.org/W2560081802","https://openalex.org/W2571410346","https://openalex.org/W2739059749","https://openalex.org/W2806599258","https://openalex.org/W2807192597","https://openalex.org/W2841716954","https://openalex.org/W2883170906","https://openalex.org/W2884292345","https://openalex.org/W2888390457","https://openalex.org/W2906584575","https://openalex.org/W2918377466","https://openalex.org/W2953415084","https://openalex.org/W3120136667","https://openalex.org/W3175332899"],"related_works":["https://openalex.org/W2621895816","https://openalex.org/W3101656142","https://openalex.org/W2512882489","https://openalex.org/W1983438217","https://openalex.org/W2062946482","https://openalex.org/W2142123396","https://openalex.org/W2014484798","https://openalex.org/W1972542139","https://openalex.org/W1621474960","https://openalex.org/W3030381341"],"abstract_inverted_index":{"Micromachined":[0],"devices":[1,61,81],"were":[2,29],"developed":[3],"and":[4,40,49,53,78,98,126],"fabricated":[5,30],"using":[6],"complementary":[7],"metal-oxide-semiconductor":[8],"(CMOS)/micro-electro-mechanical":[9],"systems":[10],"(MEMS)":[11],"technology":[12],"allowing":[13],"for":[14,66],"the":[15,67,75,85,88,96,99,103,115,121,132],"analysis":[16],"of":[17,20,34,59,69,87,102],"transport":[18,123],"properties":[19],"silicon":[21,51,106],"sub-micron":[22],"beams":[23,28,107],"having":[24],"monolithic":[25],"contacts.":[26,79],"The":[27,91,110],"by":[31],"a":[32],"combination":[33],"deep":[35],"reactive":[36],"ion":[37],"etching":[38,44],"(RIE)":[39],"potassium":[41],"hydroxide":[42],"(KOH)":[43],"techniques":[45],"on":[46,62],"standard":[47],"p":[48],"n":[50],"bulk":[52],"silicon-on-insulator":[54],"(SOI)":[55],"wafers.":[56],"Simultaneous":[57],"fabrication":[58],"many":[60],"one":[63],"wafer":[64],"allows":[65],"extraction":[68],"statistical":[70],"information":[71],"to":[72,94,117],"properly":[73],"compare":[74],"different":[76],"layers":[77],"Fabricated":[80],"are":[82,108],"presented,":[83],"underlining":[84],"feasibility":[86],"proposed":[89],"microdevice.":[90],"methods":[92],"used":[93],"manipulate":[95],"geometry":[97],"surface":[100],"roughness":[101],"single":[104],"crystalline":[105],"described.":[109],"presented":[111],"measurement":[112],"device":[113],"offers":[114],"possibility":[116],"determine":[118],"simultaneously":[119],"all":[120],"main":[122],"values,":[124],"thermal,":[125],"electrical":[127],"conductivities":[128],"as":[129,131],"well":[130],"Seebeck":[133],"coefficient.":[134]},"counts_by_year":[{"year":2025,"cited_by_count":2},{"year":2023,"cited_by_count":1}],"updated_date":"2026-10-28T10:33:24.094632","created_date":"2022-04-19T00:00:00"}